(12) United States Patent (10) Patent No.: US 6,799,137 B2 Schietinger Et Al
USOO67991.37B2 (12) United States Patent (10) Patent No.: US 6,799,137 B2 Schietinger et al. (45) Date of Patent: Sep. 28, 2004 (54) WAFER TEMPERATURE MEASUREMENT 3.262,758 A 7/1966 Stewart et al. METHOD FOR PLASMA ENVIRONMENTS 4,075,493 A 2/1978 Wickersheim 4,348,110 A 9/1982 Ito Inventors: Charles W. Schietinger, Milwaukie, 4,574.486 A 3/1986 Drechsler (75) 4,750,139 A 6/1988 Dils OR (US); Ronald A. Palfenier, Oregon 4,845,647 A 7/1989 Dils et al. City, OR (US) 4.956,538 A 9/1990 Moslehi 5,154,512 A 10/1992 Schietinger et al. (73) Assignees: Engelhard Corporation, Iselin, NJ 5,231,595 A * 7/1993 Makino et al. ............. 702/134 (US); Exactus, Inc., Boca Raton, FL 5,305,416 A * 4/1994 Fiory ............... ... 392/416 (US) 5,624,590 A * 4/1997 Fiory ......................... 219/390 Notice: Subject to any disclaimer, the term of this (List continued on next page.) patent is extended or adjusted under 35 OTHER PUBLICATIONS U.S.C. 154(b) by 65 days. “Optical Pyrometry Begins to Fulfill its Promise,” Alex ander Braun, Semiconductor International, Mar. 1998, pp. 1 (21) Appl. No.: 10/197,230 and 2. (22) Filed: Jul. 16, 2002 (List continued on next page.) (65) Prior Publication Data Primary Examiner John Barlow US 2003/0033110 A1 Feb. 13, 2003 ASSistant Examiner Demetrius R. Pretlow (74) Attorney, Agent, or Firm-Stoel Rives LLP Related U.S. Application Data (57) ABSTRACT (63) Continuation-in-part of application No. 09/872,752, filed on Jun.
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