To Fabricate Nanostructures for Electronic and Optical Applications Darren J
Reviews G. M. Whitesides et al. DOI: 10.1002/anie.201101024 Nanofabrication Use of Thin Sectioning (Nanoskiving) to Fabricate Nanostructures for Electronic and Optical Applications Darren J. Lipomi, Ramses V. Martinez, and George M. Whitesides* Keywords: nanofabrication · nanoskiving · plasmonics · soft lithography · ultramicrotomy Angewandte Chemie 8566 www.angewandte.org 2011 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim Angew. Chem. Int. Ed. 2011, 50, 8566 – 8583 Nanoskiving This Review discusses nanoskiving—a simple and inexpensive method From the Contents of nanofabrication, which minimizes requirements for access to cleanrooms and associated facilities, and which makes it possible to 1. Introduction 8567 fabricate nanostructures from materials, and of geometries, to which 2. Ultramicrotomy and more familiar methods of nanofabrication are not applicable. Nano- Nanoskiving 8569 skiving requires three steps: 1) deposition of a metallic, semi- conducting, ceramic, or polymeric thin film onto an epoxy substrate; 3. Electronic Applications of 2) embedding this film in epoxy, to form an epoxy block, with the film Nanoskiving 8573 as an inclusion; and 3) sectioning the epoxy block into slabs with an 4. Optical Applications of ultramicrotome. These slabs, which can be 30 nm–10 mm thick, contain Nanoskiving 8576 nanostructures whose lateral dimensions are equal to the thicknesses of the embedded thin films. Electronic applications of structures 5. Summary and Outlook 8580 produced by this method include nanoelectrodes for electrochemistry, chemoresistive nanowires, and heterostructures of organic semi- conductors. Optical applications include surface plasmon resonators, 1.2. Nanofabrication plasmonic waveguides, and frequency-selective surfaces. Nanofabrication refers to the gen- eration of patterns whose individual elements have at least one lateral 1.
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