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Suss Microtec confidential EPIC ONLINE TECHNOLOGY MEETING ON LITHOGRAPHY Friday, 3 July 2020 SUSS MICROOPTICS Reinhard Völkel (CEO) THE PLANAR PROCESS (1957) confidential Jean Hoerni invented in 1957 the revolutionary “Planar Process”, still the base of all semiconductor manufacturing today. Fairchild starts production of planar transistors in 1959 The eight founders later founded 65 companies in Silicon Valley The eight founders of Fairchild in 1960: (from left) Gordon Moore, Sheldon Roberts, Eugene Kleiner, Robert Noyce, Victor Grinich, Julius Blank, Jean Hoerni, and Jay Last Jean Hoerni (1924 - 1997) Integrated circuit (IC) chip by Fairchild in 1961 EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 2 MASK ALIGNER LITHOGRAPHY confidential „Shadow Printing“ Lithography Mask illumination using collimated UV light Resolution proximity gap Mask Wafer EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 3 LITHOGRAPHY IN 1980 confidential Min. Feature Size The Intel 4004 is a 4-bit central processing [Half-Pitch] unit (CPU) released by Intel Corporation in Year Micron 1971. It was the first commercially available 1957 120 microprocessor by Intel. (www.Wikipedia.org, www.4004.com) 1963 30 1971 10 1974 6 1976 3 Rubylith Mask Making at Intel (1970) 1982 1.5 1985 1.3 1989 1 Model of Fairchild’s Step & Repeat Mask Tool Karl Suss MJB3 Mask Aligner EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 4 CUSTOMIZED ILLUMINATION IN DUV LITHOGRAPHY confidential + + = 1994 Feasibility study at IMT Neuchâtel Excimer Diff. Opt. Element Pupil (Herzig/Dändliker) 1995 Diffractive Optical Elements (DOEs) for DUV-Lithography at CSEM 1997 Development of Refractive Microlens Arrays for DUV-Lithography 1999 Free-form Beam-shaping (CGH) 2009 MEMS Mirror Arrays (FlexRayTM) Diffractive Optical Elements (DOE) MEMS Mirror Arrays (FlexRay™) EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 5 KILLER APPLICATION: SEMICONDUCTOR INDUSTRY confidential DOEs, microlens and Microlens based Köhler micro-mirror arrays for Integrator Random Diffuser pupil shaping and coherence forming Pupil Phase-shift Shaping Reticle (Zoom) Masks ASML TWINSCAN NXT:2000i Synthetic Holograms for Asphere Testing Projection Wavefront Gratings for Pulse Optics Shaping Compression (FlexWave) Beam Delivery Diffraction-based Overlay and Wafer Sources: MonitoringRobert Brunner (formerly of at CZ SMT) Alignment Aberrations (Zernike), Plane Distortion, Overlay SUSS MicroOptics is “Preferred Supplier” for Carl Zeiss [Graph: Courtesy of Robert Brunner, formerly at Carl Zeiss AG, Germany] SMT GmbH Laser Beam Shaping for ASML Litho Stepper EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 6 NOT MOORE'S LAW – BUT INTERESTING! confidential Every 4 years the price for the ASML TWINSCAN leading edge litho tool doubled NXE:3400C [1970 – 2019] ASML TWINSCAN NXT:2000i Mask Aligner (Automatic production tool) EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 7 WHAT DID LITHOGRAPHY FOR US? WHAT DO WE DO? confidential Every year 30% cheaper! Mask Aligners are now used for IMPRINT LITHOGRAPHY Submit your paper to SPIE Advanced Lithography 2021 EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 8 confidential SUSS MicroOptics SA | Rouges-Terres 61 | CH-2068 Hauterive | Switzerland | www.suss.ch.
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