confidential

EPIC ONLINE TECHNOLOGY MEETING ON LITHOGRAPHY

Friday, 3 July 2020

SUSS MICROOPTICS Reinhard Völkel (CEO) THE PLANAR PROCESS (1957) confidential

 Jean Hoerni invented in 1957 the revolutionary “Planar Process”, still the base of all semiconductor manufacturing today.  Fairchild starts production of planar transistors in 1959  The eight founders later founded 65 companies in Silicon Valley

The eight founders of Fairchild in 1960: (from left) Gordon Moore, Sheldon Roberts, Eugene Kleiner, Robert Noyce, Victor Grinich, Julius Blank, Jean Hoerni, and Jay Last

Jean Hoerni (1924 - 1997)

Integrated circuit (IC) chip by Fairchild in 1961

EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 2 MASK ALIGNER LITHOGRAPHY confidential „Shadow Printing“ Lithography  Mask illumination using collimated UV light  Resolution  proximity gap

Mask

Wafer

EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 3 LITHOGRAPHY IN 1980 confidential

Min. Feature Size The Intel 4004 is a 4-bit central processing [Half-Pitch] unit (CPU) released by Intel Corporation in Year Micron 1971. It was the first commercially available 1957 120 microprocessor by Intel. (www.Wikipedia.org, www.4004.com) 1963 30 1971 10 1974 6 1976 3 Rubylith Mask Making at Intel (1970) 1982 1.5 1985 1.3 1989 1

Model of Fairchild’s Step & Repeat Mask Tool

Karl Suss MJB3 Mask Aligner

EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 4 CUSTOMIZED ILLUMINATION IN DUV LITHOGRAPHY confidential

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1994 Feasibility study at IMT Neuchâtel Excimer Diff. Opt. Element Pupil (Herzig/Dändliker) 1995 Diffractive Optical Elements (DOEs) for DUV-Lithography at CSEM 1997 Development of Refractive Microlens Arrays for DUV-Lithography 1999 Free-form Beam-shaping (CGH) 2009 MEMS Mirror Arrays (FlexRayTM)

Diffractive Optical Elements (DOE) MEMS Mirror Arrays (FlexRay™)

EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 5 KILLER APPLICATION: SEMICONDUCTOR INDUSTRY confidential

DOEs, microlens and Microlens based Köhler micro-mirror arrays for Integrator Random Diffuser pupil shaping and coherence forming

Pupil Phase-shift Shaping Reticle (Zoom) Masks ASML TWINSCAN NXT:2000i

Synthetic Holograms for Asphere Testing

Projection Wavefront Gratings for Pulse Optics Shaping Compression (FlexWave)

Beam

Delivery Diffraction-based Overlay and Wafer Sources: MonitoringRobert Brunner (formerly of at CZ SMT) Alignment Aberrations (Zernike), Plane Distortion, Overlay

SUSS MicroOptics is “Preferred Supplier” for Carl Zeiss [Graph: Courtesy of Robert Brunner, formerly at Carl Zeiss AG, Germany] SMT GmbH Laser Beam Shaping for ASML Litho Stepper

EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 6 NOT MOORE'S LAW – BUT INTERESTING! confidential

Every 4 years the price for the ASML TWINSCAN leading edge litho tool doubled NXE:3400C [1970 – 2019] ASML TWINSCAN NXT:2000i

Mask Aligner (Automatic production tool)

EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 7 WHAT DID LITHOGRAPHY FOR US? WHAT DO WE DO? confidential

 Every year 30% cheaper!

 Mask Aligners are now used for IMPRINT LITHOGRAPHY

Submit your paper to SPIE Advanced Lithography 2021

EPIC Online Technology Meeting on Lithography - SUSS MicroOptics SA 8 confidential

SUSS MicroOptics SA | Rouges-Terres 61 | CH-2068 Hauterive | Switzerland | www.suss.ch