110 Brazilian Journal of Physics, vol. 26, no. 1, March, 1996
Quantum Wires and Quantum Dots in Hetero junction
Devices with Field-E ect Electro des
W. Hansen, D. Schmerek and H. Drexler
Ludwig-Maximilians-Universitat, Muchen
Geschwister-Schol l Pl. 1, 80539 Munchen, Germany
Received July 21, 1995
We generate in esp ecially designed hetero junction crystals one-dimensional electron wires
and zero-dimensional electron dots with a eld-e ect controlled numb er of electrons o c-
cupying the lowest quantum states. Very strong and well controlled con nement of one-
dimensional quantum wires is achieved with patterned eld electro des, that allowusto
study the electronic prop erties of quantum wires as function of the sti ness of the con ne-
mentpotential. For exp eriments on smallest electron dots with very large energy spacing of
the quantum dot levels we study structurally con ned electrons in self-assembled InGaAs
islands that are grown in the Stranski-Krastanow mo de. The electron systems are char-
acterized with capacitance sp ectroscopy and with far-infrared absorption exp eriments that
prob e the electronic ground states and the fundamental excitations, resp ectively.
[3]
or quantum dots . Such systems are preferentially I. Intro duction
prepared from a high mobilitytwo-dimensional elec-
Manyphysical prop erties of an electron system are
tron system at the interface of a mo dulation-dop ed
critically dep endent on its dimensionality. This is
hetero junction crystal. Their geometry is usually de-
mainly due to mo di ed screening and di usion and the
ned either byetching patterns into the crystal surface
reduced density of states (DOS) in lower-dimensional
or by means of patterned eld-e ect electro des biased
electron systems. The latter arises from the fact that
to deplete the areas b eneath the electro des of mobile
[4]
con nement of the electrons reduces the degree of free-
electrons . Then electron strip es or discs are left in
dom for free motion and thus the dimensionality of the
the unetched areas or in the gaps b etween the elec-
quasi-continuous regions in phase space. Thus energy
tro des. Although these techniques have b ecome quite
levels of electron systems con ned in one or two di-
sophisticated and manyintriguing results are obtained,
mensions form two- or one-dimensional subbands. Of
imp ortant parameters like the energy quantization due
course, con nementinto all three spatial dimensions
to the lateral con nement and the numb er of electrons
leads to a fully quantized energy sp ectrum likeinan
o ccupying the one-dimensional subbands of the wires
atom. So-called two-dimensional electron systems are
or the energy levels of the dots is often not well known
usually generated in the plane of a semiconductor-
and determined quite indirectly if at all. Furthermore,
insulator or semiconductor hetero junction interface and
the in uence of the density of states on transp ort and
[1]
are well known for more than three decades . The
optical prop erties is quite involved, so that in general
tunability of the electron densityaswell as the advan-
it is imp ossible to determine this fundamental quan-
tages asso ciated with the reduced dimensionalityhave
tity from such exp eriments. For instance, in transp ort
given rise to a vast numberoftechnological applications
exp eriments electron lo calization and in optical tran-
among which the b est known are eld e ect transistors
sitions selection rules as well as collective e ects are
[2]
and heterostructure lasers .
imp ortant aside from pure density of states e ects.
Within the last decade growing interest has b een
The exp eriments on quantum wires and quantum devoted to the fundamental prop erties of one- and zero-
dots describ ed in the following are p erformed with dimensional electron systems, so-called quantum wires
present address: Center for Free Electron Laser Studies, University of California, Santa Barbara.
H. Hansen et al. 111
nm, an undop ed GaAs spacer layerandanundoped devices esp ecially designed to havevery well de ned,
barrier layer are grown. The highly dop ed GaAs con- strong con nement and a go o d control of the electron
tains an electron system of low mobility, which is con- density. We present capacitance sp ectra that clearly
ducting (sheet conductivitytypical 10mS) even at re ect the quantization of the electronic energies due
the low temp eratures and high magnetic elds of our to the lateral con nement. Indeed, capacitance sp ec-
exp eriments. It forms a back electro de buried in the troscopy has previously b een very successfully applied
heterostructure sample. The front barrier is made of an to two-dimensional electron systems in order to obtain
undop ed short p erio d AlAs/GaAs sup erlattice (SPS), information ab out the two-dimensional thermo dynamic
[5 8] [7]
eachlayer typically 10 epitaxial monolayers thick. Such DOS . There with a re ned metho d it was even
a barrier exhibits a lowleakage current and serves here p ossible to determine quantitatively many-particle cor-
as an undop ed insulator. The thickness of the SPS is rections to the single particle DOS, which are found to
typically 32 nm and covered with a 10 nm thickun- be very imp ortant at small electron densities or in high
dop ed GaAs layer to protect the AlAs against oxida- magnetic elds. For technical reasons, that will b ecome
tion. On this hetero junction crystal a metal gate (typ- obvious in the following, this re ned metho d cannot
ically 30 nm Ti) is thermally evap orated. b e applied to one- or zero-dimensional electron systems
and a sophisticated quantitative analysis is only p os-
sible with self-consistentnumelical calculations basing
on parameters that are less well controlled. Neverthe-
less, the substructures observed in the di erential ca-
pacitance can b e interpreted on basis of very simple
mo dels yielding a go o d notion ab out imp ortant param-
eters suchasquantization energies, electron o ccupa-
tion and typical widths of the structures. Furthermore,
the electron wires realized in our exp eriments are of
such good quality, that unlike in previous exp eriments
the substructures are clearly observed in the direct ca-
pacitance signal rather than in the derivativemaking
a comparison to self-consistentnumerical calculations
less ambiguous.
The parameters obtained from the capacitance sp ec-
tra are used to understand the high frequency conduc-
tivity of the quantum wires. These exhibit characteris-
tic resonances in the Far-Infrared (FIR) that are asso ci-
ated with transitions b etween the one-dimensional sub-
bands of the wire or the energy levels of the dot. Com-
parison of the subband spacing extracted from the ca-
pacitance data to the resonance energies tells us ab out
the collective contributions to the intersubband transi-
tions, and in the case of the quantum dots it substan-
tiates our interpretation of the capacitance data.
Figure 1. (a) Cross section through the epitaxially grown
layers of a MIS-dio de. The distances b etween back elec-
I I. Samples
tro de and hetero junction interface z as well as top gate z
b t
are indicated. The thickness of the GaAs spacer layer on
top of this electro de is typically z = 100 nm. (b) Sketchof
The samples of our exp eriments are basically metal-
b
the conduction band edge as function of the co ordinate in
[9]
insulator hetero junction (MIS) dio des . The hetero-
growth direction at gate voltage b elow and ab ove a thresh-
junction is grown by molecular b eam epitaxy.Atypical
old voltage Vtll as describ ed in the text.
epitaxial layer sequence and an idealized band structure
are sketched in Fig. 1a and 1b. On the [100] surface
Note that unlike in a conventional mo dulation-
of a GaAs substrate wafer an undop ed GaAs bu er, a
[10]
highly dop ed GaAs layer with typical thickness of 20 dop ed hetero junction our MIS- dio des generally do
112 Brazilian Journal of Physics, vol. 26, no. 1, March, 1996
not contain mobile electrons at the hetero junction in- strip es is 150 nm so that at V 6= 0 the p erio d of the
d
terface at zero gate voltage as indicated in Fig. 1b. surface p otential is a=500 nm.
Like in a Si metal-oxide-semiconductor dio de the car-
riers have to b e eld induced by a p ositive gate volt-
age applied b etween the back electro de and the front
gate. If the gate voltage V is larger than a threshold
g
voltage V the conduction band edge forms a mini-
th
mum at the interface b etween the GaAs spacer layer
and the front barrier into which electrons are injected
from the back electro de. In all exp eriments discussed in
the following charge injection through the shallowtun-
Figure 2. Sketch of the electro de con guration for the gen-
nel barlier formed by the undop ed spacer layer happ ens
eration of eld-induced quantum wires. The gate voltage V
g
is applied b etween the back electro de in the heterostructure
suciently fast that we can assume equilibrium with re-
crystal and one of the interdigital electro des. The voltage
sp ect to charge exchange b etween the electron system
V is applied b etween the twointerdigital electro des.
d
at the hetero junction interface and the back electro de.
The advantage of our MIS-dio des is that no intentional
dopants are contained in the layers b etween the eld
induced electron system and the front gate. This is im-
p ortantifwewant to generate very small electron sys-
tems with high mobility and precisely controlled, strong
lateral geometry at the hetero junction interface. In
a conventional mo dulation-dop ed heterostructure large
areas would have to b e depleted from mobile electrons
in order to de ne small electron wires or dots. The re-
maining dopants in the front barrier are left unscreened
and thus seriously deteriorate the p otential in the wires
[11]
or dots .
Beneath a homogenous large gate electro de a two-
dimensional electron system is formed at the hetero-
junction interface at V >V . If the gate is patterned
g th
Figure 3. (a) Cross section through a MIS-dio de with an
in the plane of the crystal surface the geometry of the
interdigital gate. (b) Potential sup erlattice induced bythe
electron system will represent an according replica of
interdigital gate in the plane of the hetero junction interface.
Electrons are injected from the back electro de into the p o-
this pattern. In Fig. 2 the gate pattem, that we use for
tential minima if the gate voltage V is suciently high. The
g
the generation of eld-induced quantum wires, is de-
corresp onding lo cation of the electron wires is indicated in
(a).
picted together with the back electro de. The so-called
interdigital gate consists of two electro des that can b e
biased at di erentvoltages with resp ect to the back The interdigital gate o ers a go o d control of the
elect o de. As indicated in Fig. 2 they form a grating of p erio dically mo dulated surface p otential of our hetero-
parallel metal strip es with every second strip e biased at junction devices. At the op en crystal surface in the
avoltage V with resp ect to the back electro de and with gaps b etween the metal strip es the surface p otential
g
avoltage di erence V to the adjacent strip es. Wede- is not well known. The unknown b oundary condi-
d
ne the geometry of our interdigital gates by electron tions for the op en surface regions cause considerable
b eam lithography with a bilayer PMMA resist. The arbitrariness in mo del calculations of the p otential b e-
[12;13]
metal strip es are prepared by thermal evap oration and neath split gate devices However, with split gate
a lift-o pro cess. As indicated in Fig. 3 the width of devices the mo dulation amplitude of the surface p o-
[12]
the metal strip es is 100 nm, the gap b etween adjacent tential is xed, if stress e ects caused by di erent
H. Hansen et al. 113
thermal contraction of the electro de and semiconduc- growth of a strained InGaAs layer on a GaAs sub-
tor material can b e neglected. In Fig. 3 a cross section strate leads to sp ontaneous formation of semiconductor
through a MIS-dio de with a interdigital gate and the islands with very small sizes. This so-called Stranski-
sup erlattice p otential in the plane of the hetero junc- Krastanowgrowth mo de emerges after growthofafew
tion interface are indicated. The Fourier comp onents monolayers as is judged by the re ection high-energy
[15]
of the surface p otential decay rapidly in the z -direction electron di raction (RHEED) pattern .At this p oint
according to sinh[q (z z )]=sinh[qz ]. Here q = n2=a; the InGaAs layer sp ontaneously relaxes into dislo cation
t t
(n =1; 2; :::); is the wavevector of the corresp onding free, lens-shap ed InGaAs islands randomly distributed
Fourier comp onentandz is the distance of the plane and emb edded in a very thin InGaAs wetting layer.
in which the sup erlattice p otential is calculated from Insp ection with scanning an atomic force microscop e
the plane of the gate. However, since in our structures (AFM) and a transmission electron microscop e (TEM)
the distance d = z z between the hetero junction reveal that at optimized growth conditions the islands
t b
interface and the surface is small (typically d =40 have a diameter of typically 20 nm in the plane of the
nm) a considerable fraction of the mo dulation ampli- wetting layer and are ab out 6 nm high in the direc-
tude is still present in the plane of the electron system. tion p erp endicular. Furthermore, it is found that the
We estimate that the rst Fourier comp onentofthe size distribution is remarkably narrow with the diam-
unscreened sup erlattice p otential is reduced byabout eter uctuating only by ab out 10% and the heightby
[15;17]
50% at the hetero junction interface. At this p ointit only one monolayer . The dot densities are ad-
9 2 10
b ecomes apparent that mo dulation dop ed hetero junc- justable b etween typically 10 cm and several 10