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Photomask Japan 2017 Poster Presentation As of March 3

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Photomask Japan 2017 Poster Presentation As of March 3 Photomask Japan 2017 Poster Presentation as of March 3 Session Session Program Date Session Title Presentation Title Name Affiliation Time No. No. Materials of and for Quartz 9-inch size Mask Blanks for ArF PSM (Phase Shift Noriyuki ULVAC COATING 9a 9a-1 Photomasks Mask) Harashima CORPORATION 9b-1 Mask crosstalk defect between develop to etch process Yuan Hsu Photronics DNP Mask Corp. 9b Process Stabilize OMOG photomask post-repair CD variation by 9b-2 Vincent Shen Photronics DNP Mask Corp. cleaning strategy and post-repair treatment Old and new techniques mixed up into optical photomask 9c-1 Jumpei Fukui Nikon Engineering Co., Ltd. measurement method Quickly Identifying and Resolving Particle Issues in 9c-2 Yukinobu Hayashi CyberOptics Corporation Photolithographic Scanners Metrology Tools and 9c Technologies Best Practices for Monitoring Humidity in Emersion Scanner 9c-3 Yukinobu Hayashi CyberOptics Corporation Reticle Environments to Reduce Reticle Haze Effects LMS IPRO: enabling accurate registration metrology on SiN- Hendrik 9c-4 KLA-Tencor MIE GmbH based Phase-Shift Masks Steigerwald Inspection Tools and Development of Photomask Insitu Inspection system for 9d 9d-1 Shingo Yoshikawa Dai Nippon Printing Co., Ltd. Technologies 1Xnm lithography mask and beyond Repairing Tools and How Smart is your BEOL? 9e 9e-1 Kristian Schulz Carl Zeiss SMT Technologies Productivity Improvement through Intelligent Automation Semiconductor Manufacturing 9f-1 Physical Model based Mask Registration Correction Rivan Li International Corp. 16:20- April 6 9f EDA & MDP 17:50 Resolution and Writing Time Improvement by MBMDP SHANG FENG United Microelectronics 9f-2 Evaluation on Advanced node WENG Corporation The capabilities of measuring cross-sectional profile for hole 9g NIL 9g-1 patterns in nanoimprint templates using small-angle X-ray Kazuki Hagihara Toshiba corporation scattering FPD Photomasks Application of Advanced Structure to Multi-Tone Mask for 9h 9ｈ-1 Jin-Han Song PKL Company Material and Process FPD Process Fabrication of Cylindrical Micro-Parts Using Synchronous 9s-1 Kaiki Ito Tokyo Denki University Scan-Projection Lithography and Chemical Etching Laser-Scan Lithography and Electrolytic Etching of Fine 9s-2 Hiroshi Takahashi Tokyo Denki University Pipes with a Diameter of 100 micro-meter Basic Research on Fabrication of Resist Mold patterns for 9s-3 Kouta Shimizu Tokyo Denki University Electroplating Mask/Lithography Observation of EUVL Mask Using Coherent EUV 9s Related Technologies 9s-4 Scatterometry Microscope with High-Harmonic-Generation Daiki Mamezaki University of Hyogo in Academia EUV Source Development of Polarization Control Unit with Broadband Masanori 9s-5 University of Hyogo Mo/Si Multilayer for Accurate EUV Reflectometry Watanabe Enormous lateral distribution of electrons generated by 9s-6 Shota Nishimura Osaka Institute of Technology electron beam in a scanning electron microscope Exposure characteristics of positive tone electron beam resist 9s-7 Shunsuke Ochiai Yamaguchi University containing p-chloro-a-methylstyrene.
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