2300V Reverse Breakdown Voltage Ga2o3 Schottky Rectifiers
Q92 ECS Journal of Solid State Science and Technology, 7 (5) Q92-Q96 (2018) 2162-8769/2018/7(5)/Q92/5/$37.00 © The Electrochemical Society 2300V Reverse Breakdown Voltage Ga2O3 Schottky Rectifiers Jiancheng Yang,1,∗ F. Ren, 1,∗∗ Marko Tadjer,2 S. J. Pearton, 3,∗∗,z and A. Kuramata4 1Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, USA 2Naval Research Laboratory, Washington, DC 20375, USA 3Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611, USA 4Tamura Corporation and Novel Crystal Technology, Inc., Sayama, Saitama 350-1328, Japan We report field-plated Schottky rectifiers of various dimensions (circular geometry with diameter 50–200 μm and square diodes −3 −2 2 15 −3 with areas 4 × 10 –10 cm ) fabricated on thick (20μm), lightly doped (n = 2.10 × 10 cm ) β-Ga2O3 epitaxial layers grown by Hydride Vapor Phase Epitaxy on conducting (n = 3.6 × 1018 cm−3) substrates grown by Edge-Defined, Film-Fed growth. The −4 −2 maximum reverse breakdown voltage (VB) was 2300V for a 150 μm diameter device (area = 1.77 × 10 cm ), corresponding to a breakdown field of 1.15 MV.cm−1. The reverse current was only 15.6 μA at this voltage. This breakdown voltage is highest reported 2 2 for Ga2O3 rectifiers. The on-state resistance (RON) for these devices was 0.25 .cm , leading to a figure of merit (VB /RON)of21.2 MW.cm−2. The Schottky barrier height of the Ni was 1.03 eV, with an ideality factor of 1.1 and a Richardson’s constant of 43.35 A.cm−2.K−2 obtained from the temperature dependence of the forward current density.
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