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21St American Conference on Crystal Growth and Epitaxy (ACCGE-21)
Program Book 21st American Conference on Crystal Growth and Epitaxy (ACCGE-21) and 18th US Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-18) and 3rd Symposium on 2D Electronic Materials and Symposium on Epitaxy of Complex Oxides July 30 – August 4 1 | P a g e Table of Contents Table of Contents ........................................................................................................... 2 Welcome to Santa Fe, New Mexico………………………………...………………………..3 Maps of Conference Area and Resort ............................................................................ 4 Conference Sponsors & Supporters ............................................................................... 7 Conference Exhibitors .................................................................................................... 7 Conference Organizers .................................................................................................. 8 OMVPE Workshop Committee………………………. ...................................................... 9 AACG Organization (2015-2017) ................................................................................. 10 ACCGE Symposia and Organizers .................................................... ………………….11 Plenary Speakers ............................................................................... ………………….13 Award Recipients ............................................................................... ………………….14 Scope and Purpose of the Conferences ...................................................................... -
Growth and Characterization of Lif Single-Crystal Fibers by the Micro
ARTICLE IN PRESS Journal of Crystal Growth 270 (2004) 121–123 Growth and characterization of LiF single-crystal fibers by the micro-pulling-down method A.M.E. Santoa, B.M. Epelbaumb, S.P. Moratoc, N.D. Vieira Jr.a, S.L. Baldochia,* a Instituto de Pesquisas Energeticas! e Nucleares, IPEN-CNEN/SP, Av. Prof. Lineu Prestes, CEP 05508-900, Sao* Paulo, SP, Brazil b Department of Materials Science, University of Erlangen-Nurnberg, D-91058, Erlangen, Germany c LaserTools Tecnologia Ltda., 05379-130,Sao* Paulo, SP, Brazil Accepted 27 May 2004 Available online 20 July 2004 Communicated by G. Muller. Abstract Good optical quality LiF single-crystalline fibers ranging from 0:5to0:8 mm in diameter and 100 mm in length were successfully grown by the micro-pulling-down technique in the resistive mode. A commercial equipment was modified in order to achieve suitable conditions to grow fluoride single-crystalline fibers. r 2004 Elsevier B.V. All rights reserved. PACS: 81.10.Fq; 78.20.Àe Keywords: A2. Micro-pulling-down method; A2. Single crystal growth; B1. Fluorides 1. Introduction oxide single-crystals have already been grown by the laser heated pedestal growth (LHPG) [2] and There is an increasinginterest in the production by the micro-pulling-down (m-PD) [3] methods. of single-crystalline fibers. Their unique properties However, the growth and hence the possible indicate their use for production of a variety of applications of fluoride single-crystalline fibers optical and electronic devices [1]. The final shape has not yet been investigated. of the single-crystalline fiber is already in a form As it is already known from other methods of suitable for optical testingand applications, fluoride growth, these materials are very sensitive reducingthe time and cost of preparation. -
Epitaxy and Characterization of Sigec Layers Grown by Reduced Pressure Chemical Vapor Deposition
Epitaxy and characterization of SiGeC layers grown by reduced pressure chemical vapor deposition Licentiate Thesis by Julius Hållstedt Stockholm, Sweden 2004 Laboratory of Semiconductor materials, Department of Microelectronics and Information Technology (IMIT), Royal Institute of Technology (KTH) Epitaxy and characterization of SiGeC layers grown by reduced pressure chemical vapor deposition A dissertation submitted to the Royal Institute of Technology, Stockholm, Sweden, in partial fulfillment of the requirements for the degree of Teknologie Licentiat. TRITA-HMA REPORT 2004:1 ISSN 1404-0379 ISRN KTH/HMA/FR-04/1-SE © Julius Hållstedt, March 2004 This thesis is available in electronic version at: http://media.lib.kth.se Printed by Universitetsservice US AB, Stockholm 2004 ii Julius Hållstedt Epitaxy and characterization of SiGeC layers grown by reduced pressure chemical vapor deposition Laboratory of Semiconductor Materials (HMA), Department of Microelectronics and Information Technology (IMIT), Royal Institute of Technology (KTH), Stockholm, Sweden TRITA-HMA Report 2004:1, ISSN 1404-0379, ISRN KTH/HMA/FR-04/1-SE Abstract Heteroepitaxial SiGeC layers have attracted immense attention as a material for high frequency devices during recent years. The unique properties of integrating carbon in SiGe are the additional freedom for strain and bandgap engineering as well as allowing more aggressive device design due to the potential for increased thermal budget during processing. This work presents different issues on epitaxial growth, defect density, dopant incorporation and electrical properties of SiGeC epitaxial layers, intended for various device applications. Non-selective and selective epitaxial growth of Si1-x-yGexCy (0≤x≤0.30, 0≤y≤0.02) layers have been optimized by using high-resolution x-ray reciprocal lattice mapping. -
Single-Crystal Metal Growth on Amorphous Insulating Substrates
Single-crystal metal growth on amorphous insulating substrates Kai Zhanga,1, Xue Bai Pitnera,1, Rui Yanga, William D. Nixb,2, James D. Plummera, and Jonathan A. Fana,2 aDepartment of Electrical Engineering, Stanford University, Stanford, CA 94305; and bDepartment of Materials Science and Engineering, Stanford University, Stanford, CA 94305 Contributed by William D. Nix, December 1, 2017 (sent for review October 12, 2017; reviewed by Hanchen Huang, David J. Srolovitz, and Carl Thompson) Metal structures on insulators are essential components in advanced Our method is based on liquid phase epitaxy, in which the electronic and nanooptical systems. Their electronic and optical polycrystalline metal structures are encapsulated in an amor- properties are closely tied to their crystal quality, due to the strong phous insulating crucible, together with polycrystalline seed dependence of carrier transport and band structure on defects and structures of differing material, and heated to the liquid phase. grain boundaries. Here we report a method for creating patterned As the system cools, the metal solidifies into single crystals. single-crystal metal microstructures on amorphous insulating sub- Liquid phase epitaxy has been previously studied in the context of strates, using liquid phase epitaxy. In this process, the patterned semiconductor-on-oxide growth (24–26), but has not been ex- metal microstructures are encapsulated in an insulating crucible, plored for metal growth. We will examine gold as a model system together with a small seed of a differing material. The system is in this study. Gold is an essential material in electronics and heated to temperatures above the metal melting point, followed by plasmonics because of its high conductivity and chemical inertness. -
Hafnium Review Awaiting the Nuclear Renaissance
Monday, August 17, 2020 Hallgarten & Company Sector Review Christopher Ecclestone [email protected] Hafnium Review Awaiting the Nuclear Renaissance The Hafnium Wannabes Strategy Ticker Market Cap Project Country Developers Australian Strategic Materials Hold ASM.ax AUD$128mn Dubbo Australia Leading Edge Hold LEM.v CAD$21.9mn Norra Karr Sweden Search Minerals Avoid SMY.v CAD$9.3mn Foxtrot Canada Texas Mineral Resources Avoid TMRC US$123mn Round Top USA Hallgarten & Company (44) 795 08 53 621 Monday, August 17, 2020 Hafnium Review Awaiting the Nuclear Renaissance + Hafnium (Hf) has become a metal that is discussed more often, principally as a by-product credit by developers of Rare Earth deposits where it appears as an accessory mineral + Hf is joined at the hip with Zirconium and there is little prospect of developing one without the other, fortunately there is good demand for Zr at current times + The burgeoning construction of nuclear power stations in China promises stronger demand for Hf from its uses in such facilities + The production of HF is currently dominated by the US and France, with China having limited influence (thus far) The Hafnium price has been bouncing along the bottom for years with little sign of recuperation on the horizon Two projects that have cited Hafnium resources, DZP and Silver Fox, are burdened by massive capex (the former) and little prospect of getting to production (the latter) Financing of projects remains very difficult and almost inevitably requires a committed offtaker The Highest of High Tech Usages The metal we shall look at here is obscure even compared to others we have covered in recent times. -
Inorganic Chemistry for Dummies® Published by John Wiley & Sons, Inc
Inorganic Chemistry Inorganic Chemistry by Michael L. Matson and Alvin W. Orbaek Inorganic Chemistry For Dummies® Published by John Wiley & Sons, Inc. 111 River St. Hoboken, NJ 07030-5774 www.wiley.com Copyright © 2013 by John Wiley & Sons, Inc., Hoboken, New Jersey Published by John Wiley & Sons, Inc., Hoboken, New Jersey Published simultaneously in Canada No part of this publication may be reproduced, stored in a retrieval system or transmitted in any form or by any means, electronic, mechanical, photocopying, recording, scanning or otherwise, except as permitted under Sections 107 or 108 of the 1976 United States Copyright Act, without either the prior written permis- sion of the Publisher, or authorization through payment of the appropriate per-copy fee to the Copyright Clearance Center, 222 Rosewood Drive, Danvers, MA 01923, (978) 750-8400, fax (978) 646-8600. Requests to the Publisher for permission should be addressed to the Permissions Department, John Wiley & Sons, Inc., 111 River Street, Hoboken, NJ 07030, (201) 748-6011, fax (201) 748-6008, or online at http://www.wiley. com/go/permissions. Trademarks: Wiley, the Wiley logo, For Dummies, the Dummies Man logo, A Reference for the Rest of Us!, The Dummies Way, Dummies Daily, The Fun and Easy Way, Dummies.com, Making Everything Easier, and related trade dress are trademarks or registered trademarks of John Wiley & Sons, Inc. and/or its affiliates in the United States and other countries, and may not be used without written permission. All other trade- marks are the property of their respective owners. John Wiley & Sons, Inc., is not associated with any product or vendor mentioned in this book. -
6Th International Workshop on Crystal Growth Technology
GERMANY, JUNE 15 - 19 BERLIN 2014 6th International Workshop on Crystal Growth Technology THE FUTURE OF Advances in bulk crystal growth of semiconductor & photovoltaic materials CRYSTAL GROWTH Optical and laser crystals TECHNOLOGY – Scintillators, piezo- and magnetoelectrics BRINGING NEW Substrates for wide band-gap and oxide semiconductors TECHNOLOGIES TO Growth control, quality assurance, and management of resources INDUSTRIAL GROWTH Crystal shaping and layer transfer technologies APPLICATION Frontiers in crystal growth technology Leibniz Institute for International Organization Crystal Growth (IKZ) for Crystal Growth The Organizing Committee would like to acknowledge support provided by CrysTec GmbH Köpenicker Str. 325 D-12555 Berlin, Germany http://www.crystec.de Deutsche Forschungsgemeinschaft e.V. Kennedyallee 40 53175 Bonn, Germany http://www.dfg.de EFG GmbH Beeskowdamm 6 D-14167 Berlin, Germany http://www.efg-berlin.de Leibniz Institute for Crystal Growth Max-Born-Str. 2 D-12489 Berlin, Germany http://www.ikz-berlin.de PVA TePla AG Im Westpark 10 - 12 35435 Wettenberg, Germany http://www.pvatepla.com STR Group, Inc. Engels av. 27, P.O. Box 89, 194156 St. Petersburg, Russia http://www.str-soft.com Systec Johann-Schöner-Str. 73 D-97753 Karlstadt http://www.systec-sa.de Takatori Corporation European Representative JTA Equipment Technology 34 St Peters Wharf Newcastle upon Tyne, NE6 1TW, UK http://www.jta-ltd.com Umicore Electro-Optic Materials Watertorenstraat 33 B-2250, Olen, Belgium http://eom.umicore.com/en/eom/ IWCGT-6 6th International Workshop on Crystal Growth Technology Berlin, Germany June 15 - 19, 2014 Systec Johann-Schöner-Str. 73 D-97753 Karlstadt http://www.systec-sa.de IWCGT-6 2014 3 4 IWCGT-6 2014 Welcome message Dear participants of the IWCGT-6, a warm welcome to you, and sincere thanks that you take part in this exciting event, the 6th International Workshop on Crystal Growth Technology (IWCGT-6) held at June 15-19, 2014 at the Novotel Am Tiergarten, Berlin, Germany. -
Solid-Phase Epitaxy
Published in Handbook of Crystal Growth, 2nd edition, Volume III, Part A. Thin Films and Epitaxy: Basic Techniques edited by T.F. Kuech (Elsevier North-Holland, Boston, 2015) Print book ISBN: 978-0-444-63304-0; e-book ISBN: 97800444633057 7 Solid-Phase Epitaxy Brett C. Johnson1, Jeffrey C. McCallum1, Michael J. Aziz2 1 SCHOOL OF PHYSICS, UNIVERSITY OF MELBOURNE, VICTORIA, AUSTRALIA; 2 HARVARD SCHOOL OF ENGINEERING AND APPLIED SCIENCES, CAMBRIDGE, MA, USA CHAPTER OUTLINE 7.1 Introduction and Background.................................................................................................... 318 7.2 Experimental Methods ............................................................................................................... 319 7.2.1 Sample Preparation........................................................................................................... 319 7.2.1.1 Heating.................................................................................................................... 321 7.2.2 Characterization Methods................................................................................................ 321 7.2.2.1 Time-Resolved Reflectivity........................................................................................ 321 7.2.2.2 Other Techniques ....................................................................................................323 7.3 Solid-Phase Epitaxy in Si and Ge .............................................................................................. 323 7.3.1 Structure -
Crystal Shape Engineering
Crystal Shape Engineering Michael A. Lovette, Andrea Robben Browning, Derek W. Gri±n, Jacob P. Sizemore, Ryan C. Snyder and Michael F. Doherty¤ Department of Chemical Engineering University of California Santa Barbara, CA 93106-5080 USA June 19, 2008 Abstract In an industrial crystallization process, crystal shape strongly influences end-product quality and functionality as well as downstream processing. Additionally, nucleation events, solvent e®ects and polymorph selection play critical roles in both the design and operation of a crystallization plant and the patentability of the product and process. Therefore, investigation of these issues with respect to a priori prediction is and will continue to be an important avenue of research. In this review, we discuss the state-of-the-art in modeling crystallization processes over a range of length scales relevant to nucleation through process design. We also identify opportunities for continued research and speci¯c areas where signi¯cant advancements are needed. ¤To whom correspondence should be addressed. Phone: (805) 893{5309 e{mail: [email protected] 1 Introduction Crystallization from solution is a process used in the chemical industries for the preparation of many types of solids (e.g., pharmaceutical products, chemical intermediates, specialty chemicals, catalysts). Several key properties of the resultant materials originate from this process, including chemical purity and composition, internal structure (polymorphic state), size and shape distribu- tions and defect density (crystallinity). Size and shape distributions impact various solid properties including end-use e±cacy (e.g., bioavailability for pharmaceuticals, reactivity for catalytics1), flowa- bility, wettability and adhesion. In turn, these properties impact down-stream processing e±ciency (e.g., ¯ltering/drying times and the possible need for milling), storage and handling. -
Springer Handbook of Crystal Growth
Springer Handbook of Crystal Growth Springer Handbooks provide a concise compilation of approved key information on methods of research, general principles, and functional relationships in physi- cal sciences and engineering. The world’s leading experts in the fields of physics and engineer- ing will be assigned by one or several renowned editors to write the chapters comprising each vol- ume. The content is selected by these experts from Springer sources (books, journals, online content) and other systematic and approved recent publications of physical and technical information. The volumes are designed to be useful as readable desk reference books to give a fast and comprehen- sive overview and easy retrieval of essential reliable key information, including tables, graphs, and bibli- ographies. References to extensive sources are provided. HandbookSpringer of Crystal Growth Govindhan Dhanaraj, Kullaiah Byrappa, Vishwanath Prasad, Michael Dudley (Eds.) With DVD-ROM, 1320 Figures, 134 in four color and 124 Tables 123 Editors Govindhan Dhanaraj ARC Energy 18 Celina Avenue, Unit 17 Nashua, NH 03063, USA [email protected] Kullaiah Byrappa Department of Geology University of Mysore Manasagangotri Mysore 570 006, India [email protected] Vishwanath Prasad University of North Texas 1155 Union Circle #310979 Denton, TX 76203-5017, USA [email protected] Michael Dudley Department of Materials Science & Engineering Stony Brook University Stony Brook, NY 11794-2275, USA [email protected] ISBN: 978-3-540-74182-4 e-ISBN: 978-3-540-74761-1 DOI 10.1007/978-3-540-74761-1 Springer Heidelberg Dordrecht London New York Library of Congress Control Number: 2008942133 c Springer-Verlag Berlin Heidelberg 2010 This work is subject to copyright. -
Fabrication Technology
Fabrication Technology By B.G.Balagangadhar Department of Electronics and Communication Ghousia College of Engineering, Ramanagaram 1 OUTLINE Introduction Why Silicon The purity of Silicon Czochralski growing process Fabrication processes Thermal Oxidation Etching techniques Diffusion 2 Expressions for diffusion of dopant, concentration Ion implantation Photomask generation Photolithography Epitaxial growth Metallization and interconnections, Ohmic contacts Planar PN junction diode fabrication, Fabrication of resistors and capacitors in IC's. 3 INTRODUCTION ¾The microminiaturization of electronics circuits and systems and then concomitant application to computers and communications represent major innovations of the twentieth century. These have led to the introduction of new applications that were not possible with discrete devices. ¾Integrated circuits on a single silicon wafer followed by the increase of the size of the wafer to accommodate many more such circuits served to significantly reduce the costs while increasing the reliability of these circuits. 4 5 WHY SILICON? Semiconductor devices are of two forms (i) Discrete Units (ii) Integrated Units Discrete Units can be diodes, transistors, etc. Integrated Circuits uses these discrete units to make one device. Integrated Circuits can be of two forms (i) Monolithic-where transistors, diodes, resistors are fabricated and interconnected on the same chip. (ii) Hybrid- in these circuits, elements are discrete form and others are connected on the chip with discrete elements externally to those formed on the chip 6 9Two other semiconductors, germanium and gallium arsenide, present special problems while silicon has certain specific advantages not available with the others. 9A major advantage of silicon, in addition to its abundant availability in the form of sand, is that it is possible to form a superior stable oxide, SiO2, which has superb insulating properties. -
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General principles of extraction of metals (i) Crushing and pulverization (ii) Concentration or dressing of the ore (iii) Calcination or roasting of the ore (iv) Reduction of metal oxides to free metal (v) Purification and refining of metal. Crushing and Pulverization The ore is generally obtained as big rock pieces. These big lumps of the ore are crushed to smaller pieces by using jaw-crushers and grinders. One of the plates of the crusher is stationary while the other moves to and fro and the crushed pieces are collected below The crushed pieces of the ore are then pulverized (powdered) in a stamp mill Concentration or Dressing of the Ore Generally, the ores are found mixed with earthy impurities like sand, clay, lime stone etc. These unwanted impurities in the ore are called gangue or matrix. The process of removal of gangue from powdered ore is called concentration or ore dressing. several methods for concentrating the ores. The choice of method depends on the nature of the ore. (i) Gravity separation (Hydraulic washing): concentration of heavier oxide ores, like haematite (Fe2O3) tinstone (SnO2) and gold (Au). (ii) Magnetic separation method: Those ores can be concentrated which either contain impurities which are magnetic or are themselves magnetic in nature. For example, the tin ore, tin stone (SnO2 ) itself is non-magnetic but contains magnetic impurities such as iron tungstate (FeWO4 ) and manganese tungstate (MnWO4 ) . (iii) Froth floatation method This method is especially applied to sulphide ores, such as galena (PbS), zinc blende (ZnS), or copper pyrites (CuFeS2 ). It is based on the different wetting properties of the surface of the ore and gangue particles.