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A Polarization-Dependent Frequency-Selective Metamaterial Absorber with Multiple Absorption Peaks

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A Polarization-Dependent Frequency-Selective Metamaterial Absorber with Multiple Absorption Peaks applied sciences Article A Polarization-Dependent Frequency-Selective Metamaterial Absorber with Multiple Absorption Peaks Guangsheng Deng, Tianyu Xia, Yong Fang, Jun Yang and Zhiping Yin * Academy of Photoelectric Technology, Hefei University of Technology, Key Lab of Special Display Technology, Ministry of Education, No. 193, Tunxi Road, Hefei 230009, China; [email protected] (G.D.); [email protected] (T.X.); [email protected] (Y.F.); [email protected] (J.Y.) * Correspondence: [email protected]; Tel.: +86-551-6290-2791 Academic Editor: Kenneth Chau Received: 19 April 2017; Accepted: 31 May 2017; Published: 4 June 2017 Abstract: A polarization-dependent, frequency-selective metamaterial (MM) absorber based on a single-layer patterned resonant structure intended for F frequency band is proposed. The design, fabrication, and measurement for the proposed absorber are presented. The absorber’s absorption properties at resonant frequencies have unique characteristics of a single-band, dual-band, or triple-band absorption for different polarization of the incident wave. The calculated surface current distributions and power loss distribution provide further understanding of physical mechanism of resonance absorption. Moreover, a high absorption for a wide range of TE-polarized oblique incidence was achieved. Hence, the MM structure realized on a highly flexible polyimide film, makingthe absorber suitable for conformal geometry applications. The proposed absorber has great potential in the development of polarization detectors and polarizers. Keywords: absorber; metamaterial; multi-band absorption; polarization-dependent 1. Introduction Electromagnetic metamaterials, which represent a class of artificial structures whose electric and magnetic response can be controlled freely, have attracted a significant amount of attention [1–3]. Due to their unique benefits, metamaterials have provided many important effects, such as invisible cloaking [4], negative refractive index [5], and super-lens [6]. Since the metamaterial absorber (MA) was presented in 2008 by Landy et al. [7], metamaterial has attracted many researchers because of its advantages, such as size minimization and suitable thickness, for applications using electromagnetic wave absorbers [8–10]. In recent years, various structures, such as split rings [11], closed rings [12], and fishnet structures [13], have been proposed for MAs. A certain progress has been made in broadband MAs developing [14,15]. Meanwhile, some studies on tunable absorbers [16,17] and multiband absorbers [18–20] have been performed. Currently, research is focused on absorbers intended for application in polarization imaging and polarization detecting. Therefore, the polarization-dependent frequency-selective absorbers are highly demanded. For most single patterned resonant structures, the number of absorption peaks was fixed or the absorbers were polarization-independent [21,22]. Hokmabadi et al. proposed a stereometamaterial perfect absorber, wherein absorption frequency is related to polarization angles [23]. Hu et al. presented a polarization-dependent MA with different resonant frequencies in two orthogonal directions [24]. However, these structures have only one polarization-dependent absorption peak, which limits their application in spectroscopic imaging and detecting, wherein multiple absorption peaks are required [25,26]. Appl. Sci. 2017, 7, 580; doi:10.3390/app7060580 www.mdpi.com/journal/applsci Appl. Sci. 2017, 7, 580 2 of 9 In this paper, the focus is on the F frequency band (F-band), and a simple polarization- dependent Appl. Sci. 2017, 7, 580 2 of 9 frequency-selective metamaterial absorber is proposed. The proposed structure has three separate absorptionIn peaksthis paper, with the high focus absorption is on the for F TE-polarized frequency band and (F TM-polarized‐band), and a simple normal polarization incident waves.‐ Furthermore,dependent the frequency absorption‐selective peaks metamaterial can be dynamically absorber is controlled proposed. byThe adjusting proposed ofstructure a polarization has three angle of theseparate incident absorption wave. Comparedpeaks with high to the absorption previously for TE reported‐polarized MAs, and TM the‐polarized MA proposed normal inincident this paper has severalwaves. advantages.Furthermore, Firstly,the absorption compared peaks to complex can be resonancedynamically structures controlled with by multipleadjusting absorption of a peaks,polarization such as all-in-one angle of the packed incident super-unit wave. Compared cell [27 ,to28 the] and previously stacked reported layers [ 29MAs,], the the proposed MA proposed absorber has onlyin this one paper patterned has several resonant advantages. structure, Firstly, which compared meets current to complex demands resonance on miniaturization structures with and multiple absorption peaks, such as all‐in‐one packed super‐unit cell [27,28] and stacked layers [29], simplification. Secondly, the multiple absorption peaks can be dynamically tuned by changing of the proposed absorber has only one patterned resonant structure, which meets current demands on polarizationminiaturization angles and of the simplification. incident wave. Secondly, Lastly, the the multiple proposed absorption MA structure peaks can is realizedbe dynamically on a highly flexibletuned polyimide by changing film of without polarization a rigid angles substrate, of the incident so the absorber wave. Lastly, can the be easilyproposed used MA in structure the non-planar is and conformal-geometryrealized on a highly flexible applications. polyimide film without a rigid substrate, so the absorber can be easily used in the non‐planar and conformal‐geometry applications. 2. Structure and Design 2. Structure and Design The proposed MA structure and the unit cell structure of the copper pattern are presented in Figure1.The Unlike proposed previously MA structure reported and results, the unit where cell structure multiple of the different-sized copper pattern metal are presented patterns in were usedFigure to obtain 1. Unlike multi-band previously absorption, reported results, here, where the simple multiple etching different of‐sized a C-shaped metal patterns slot intowere aused circular patch,to provides obtain multi a triple-band‐band absorption, absorption. here, the The simple geometrical etching dimensions of a C‐shaped of slot the copperinto a circular pattern patch, shown in provides a triple‐band absorption. The geometrical dimensions of the copper pattern shown in Figure Figure1b are a = 820 µm, d = 60 µm, r1 = 112.5 µm, r2 = 161 µm, and r3 = 367.5 µm. The copper pattern 1b are a = 820 μm, d = 60 μm, r1 = 112.5 μm, r2 = 161 μm, and r3 = 367.5 μm. The copper pattern with a with a thickness of 0.5 µm and an electric conductivity of (5.8×107) S/m was printed on the top layer thickness of 0.5 μm and an electric conductivity of (5.8×107) S/m was printed on the top layer of a of a thickthick dielectricdielectric substrate substrate with with a athickness thickness of of50 μ 50mµ mthat that was was made made of polyimide of polyimide film filmwith witha relative a relative permittivitypermittivity of 3.6 of 3.6 and and a dielectric a dielectric loss loss tangent tangent of 0.02. Moreover, Moreover, a thick a thick copper copper plate plate that thatacts as acts a as a groundground plane plane was was printed printed on on the the bottom bottom of of the the dielectricdielectric substrate. substrate. FigureFigure 1. (a 1.) The (a) The proposed proposed metamaterial metamaterial absorber absorber (MA) (MA) unit unit cell cell structure; structure; (b) (layoutb) layout of the of unit the cell unit cell structure and its optimal values given in micrometers: a = 820, d = 60, r1 = 112.5, r2 = 161, and r3 = 367.5. structure and its optimal values given in micrometers: a = 820, d = 60, r1 = 112.5, r2 = 161, and r3 = 367.5. The absorptivity can be calculated by The absorptivity can be calculated by A = 1 − |S11|2 − |S21|2 (1) 2 2 where A, S11, and S21 are the absorptivity,A = 1 the− |Sreflection11| − coefficient,|S21| and the transmission coefficient, (1) respectively. In this case, the transmission coefficient S21 is zero because the thickness of the metal wheregroundA, S11 plane, and isS 21muchare larger the absorptivity, than its skin depth, the reflection so the absorptivity coefficient, is anddetermined the transmission by A = 1 − |S coefficient,11|2. respectively. In this case, the transmission coefficient S21 is zero because the thickness of the metal 3. SimulatedResultsandDiscussion 2 ground plane is much larger than its skin depth, so the absorptivity is determined by A = 1 − |S11| . The simulations were conducted in CST Microwave Studio 2014 (Darmstadt, Germany), using 3. SimulatedResultsandDiscussionthe finite‐element frequency‐domain method, and the unit cell boundary conditions were utilized in Theboth simulationsx and y directions. were Meanwhile, conducted the in Floquet CST Microwave port condition Studio was employed 2014 (Darmstadt, in the z‐direction. Germany), Since using the proposed absorber has similar absorption characteristics for TE‐polarized and TM‐polarized the finite-element frequency-domain method, and the unit cell boundary conditions were utilized normal incident waves, only the electromagnetic responses for the TE‐polarized incident wave, in both x and y directions. Meanwhile, the Floquet port condition was employed in the z-direction. whose electric field is parallel to the x‐axis, were calculated for the normal
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