Electron Spectroscopy of Rutile-Type Metal Oxides Sigrun Eriksen B.Sc

Total Page:16

File Type:pdf, Size:1020Kb

Electron Spectroscopy of Rutile-Type Metal Oxides Sigrun Eriksen B.Sc 1 Electron Spectroscopy of Rutile-type Metal Oxides r Sigrun Eriksen B.Sc. A.R.C.S. A thesis submitted for the degree of Doctor of Philosophy of the University of London and for the Diploma of Membership of Imperial College. Department of Chemistry Imperial College London SW7 2AZ August 1987 2 Abstract This thesis presents a study of defective and defect-free rutile TiO (110) surfaces, using ultraviolet photoelectron spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and high resolution electron energy loss spectroscopy (HREELS). The use of argon ion and electron bombardment for creation of surface defects is investigated. An oxygen -20 -2 desorption cross section of 1.5 x 10 cm is found for electron irradiation, and a desorption mechanism suggested. An electronic excitation due to the oxygen vacancies is identified; this modifies the effective surface dielectric constant. The oscillator strength for this excitation is found to be 0.1, indicating an allowed transition. The adsorption of water on the TiO2(110) surface is also studied. From HREELS and He(II) UPS, it is found that water will not adsorb on a defect-free TiO^MIO) surface at 300K, but will adsorb on a surface in which oxygen vacancy defects have been created. It is shown that this adsorption involves dissociation of the water molecule, leaving 0-H species bonded to the surface. Finally, the effects of oxygen vacancies on the rutile SnO^MIO) surface are investigated. It is confirmed that argon ion bombardment gives rise to selective oxygen loss, and the Sn species on the 2 + 4 + resulting defective surface are Sn and Sn ; total oxygen loss is never greater than 502. This process also creates deep band-gap states which do not give rise to conductivity. Electron irradiation of the surface is found to be capable of desorbing at least 702 of surface 2 + 4 + oxygen, and as well as Sn and Sn , clusters of metallic tin are formed on the surface. EELS shows that this situation leads to a broad spread of bandgap states, whose distribution is not readily controllable. Acknowledgements I would like to express my thanks to all those people who have helped and assisted during the course of this work. In particular, I am very grateful to the following people: Russell Egdell, for supervision, advice and encouragement throughout the last three years. Wendy Flavell, for support, advice and valuable discussions, as well as considerable help with the SnO^ work. David Bassett for introducing me to surface science in the first place, for encouragement over the years and for the loan of a very useful power supply. Chris Jones, Bill Young, Mark Appleton, Humphrey Drummond and Steve Bleazard for a great deal of assistance with the computing; specifically Humphrey for help with Padread, Bill for the FFT algorithm, Mark for the Epson Emulator and Chris for introducing me to Pascal and the Z80. Chris Jones, again, for unfailing support, endless patience, and the loan of the Rotring drawing equipment. John Albery and his group, past and present, for providing a lively social life, and invaluable relief from the frustrations of research. Gail Craigie, for typing the figure captions and Zoeta Brown for numbering the pages. 4 Contents page Abstract 2 Acknowledgements 3 Table of Contents 4 List of Figures 8 List of Tables 11 List of Symbols and Abbreviations 12 Chapter 1 Introduction 15 1.1 The Structure of the Rutile Oxides 15 1.2 Applications of Ti02 21 1.3 Previous Studies of Ti02 - a Summary 22 1.3.1 Defects on Ti02 Surfaces 22 1.3.2 Adsorbates on Ti02 Surfaces 25 1.3.3 A Brief Look at Some Other Titanium Oxides 29 1.4 Applications of Sn02 30 1.5 Previous Studies of Sn02 - a Summary 31 1.6 An Outline of this Thesis 34 Chapter 2 Theory 36 2.1 Principles of Photoelectron Spectroscopy 36 2.1.1 Surface Sensitivity 38 2.1.2 Ultraviolet Photoelectron Spectroscopy 40 2.1.3 X-ray Photoelectron Spectroscopy 41 2.1.4 Fine Structure in PES 47 2.2 Auger Electron Spectroscopy 49 2.3 Low Energy Electron Diffraction 51 2.3.1 LEED for Lattice Characterisation 52 2.4 Electron Energy Loss Spectroscopy 53 2.4.1 The Nature of Dipole Scattering 54 2.4.2 Excitations in Dipole Scattering 57 2.4.3 EELS of Ionic Solids - a Brief Historical Survey 60 2.4.4 Introducing the Theory of Dipole Scattering 61 2.4.5 The Energy Loss Probability 62 2.4.6 The Explicit Form of the Dielectric Constant 71 Chapter 3 Apparatus and Experimental Methods 75 3.1 The Need for Ultrahigh Vacuum 75 3.2 The Ultrahigh Vacuum System 75 3.3 The HREEL Spectrometer 80 3.3.1 The Spectrometer Construction 80 3.3.2 The Effect of the Analyser Acceptance Angle 82 3.3.3 Calibration of the Spectrometer 86 3.3.4 Operation of the Spectrometer 86 3.3.5 Overcoming Difficulties 90 3.4 The General Surface Analysis Facilities 92 3.4.1 The Radiation Sources 93 3.4.2 The Energy Analyser 94 3.5 The LEED Optics 97 3.6 Data Collection and Processing 101 3.6.1 Data Collection 101 3.6.2 Data Processing 102 3.7 Sample Preparation and Mounting 105 3.7.1 Initial Sample Treatment 105 3.7.2 Sample Mounting 105 3.7.3 Cleaning the Samples In Vacuo 111 Chapter 4 The (110) Surface of Rutile TiO^ 112 4.1 Sample Preparation 112 4.1.1 Preparation of a Defect Free TiO2(110) Surface 112 4.1.2 Criteria for Stoichiometry 113 4.1.3 Criteria for Surface Order 116 4.1.4 Criteria for Cleanliness 121 6 4.2 HREELS of the Stoichiometric TiO^dlO) Surface 124 4.2.1 Symmetry and Phonons in the HREELS of TiO^ 124 4.2.2 The Effect of Anisotropy 131 4.2.3 The HREEL Spectrum of TiOgdIO) 131 4.3 The Creation of Oxygen Deficiency in TiO^MIO) 135 4.3.1 The Knotek Fiebelman Mechanism 138 4.3.2 The Practice of Electron Bombardment 138 4.3.3 The Oxygen Desorption Cross Section 140 4.3.4 The Depth of the Oxygen Vacancy Defects 145 4.4 The Effect of Oxygen Deficiency on UPS, ELS and HREELS 147 4.4.1 The UPS of Defective TiOgdIO) 147 4.4.2 The ELS of Defective Ti02(110) 151 4.4.3 The HREELS of Defective TiO (110) 155 4.5 Towards an Explanation 163 4.5.1 The Oscillator Strength of the Excitation 163 4.5.2 The Nature of the Defect Sites 164 4.5.3 The Final Model 165 4.5.4 Notes on Previous Work 166 Chapter 5 The Adsorption of Water on TiO^f110) 168 5.1 A Detailed Look at Some Previous Work 168 5.1.1 Water on TiO^ 168 5.1.2 Water on SrTi03 174 5.1.3 Water on Other Oxides 180 5.2 Some Experimental Aspects 181 5.2.1 Water Dosage 182 5.2.2 Sample Mounting and Attempts to Cool the Surface 182 5.3 UPS of Water on TiOgdIO) 184 5.3.1 The Spectra Obtained 184 5.3.2 A Discussion of the Results 187 5.A HREELS of Water on TiO (110) 190 Chapter B The (110) Surface of Rutile SnO^ 194 6.1 Sample Preparation 194 6.2 Oxygen Loss and the Desorption Cross Section 196 6.2.1 Oxygen Loss by Argon Ion Bombardment 196 6.2.2 Oxygen Loss by Electron Bombardment 198 6.2.3 ELS of the Defective Surface 205 Appendix A Classical Theory of Dipole Electron Scattering 208 Appendix B Program Collect 216 Appendix C Program Padread 221 Appendix D Program Stripper 229 Appendix E Program Fitter 235 Appendix F Program Eelsim 240 References 250 8 List of Figures page Figure 1: (a) structure of the rutile unit cell and (b) orientation of orbitals in the rutile unit cell 16 Figure 2: DOS diagram for TiO^ 18 Figure 3: DOS digram for SnO^ 19 Figure 4: Atomic arrangement of the (110) face of rutile 20 Figure 5: Illustration of the photoelectric effect 37 Figure 6: Variation of inelastic mean free path with photoelectron energy 39 Figure 7: UPS He(I) of defect free TiO (110) 42 Figure 8: UPS He(II) of defect free TiO (110) 43 Figure 9: Wide scan XPS of defect free TiO (110) 45 Figure 10:: Narrow scan XPS of defect free TiO^t110) 46 Figure 1 1 :: The Auger process 50 Figure 12:: Polar plot of the dipole scattering lobe in HREELS 55 Figure 13:: Illustration of the dipole selection rule 56 Figure 14 :: Phonon dispersion curve 59 Figure 15:: EELS dipole scattering mechanisms 63 Figure 16:: Plot of variation of {Q/[Q^+1]^> with Q 65 Figure 17:: Geometry of the EELS two-layer model 69 Figure 18:: Plot of variation of e(u>) with u) 73 Figure 19:: Photograph of the Leybold Heraeus vacuum system 77 Figure 20:: Schematic diagram of the vacuum system 79 Figure 21 :: Diagram of the construction of the HREELS optics 81 Figure 22:: The geometry of scattering in EELS 84 Figure 23:: Photograph of the HREELS instrumentation panel 88 Figure 24:: Montage of XPS MgKa Ag spectra at different Eq 98 Figure 25:: Plot of variation in FWHM with E in the spectra of figure 24 99 9 page Figure 26: Plot of variation in peak height with Eq in the spectra of figure 24 100 Figure 27: XPS of TiOgtHO) before and after stripping by the computer program "Stripper" 103 Figure 28: XPS of TiO^ with "fitted" curves as created by the computer program "Fitter" 104 Figure 29: Photograph of two of the samples used 106 Figure 30: Drawing of the room-temperature sample mount 109 Figure 31 : Drawing of the "low temperature" sample mount 110 Figure 32: XPS of TiO (110), defective and defect-free, showing Ti4+ and Ti3+ core peaks 115 Figure 33: ELS of TiO^lHO), defective and defect-free 117 Figure 34: UPS He(I) of TiO (110), defective and defect-free 118 Figure 35: UPS He(II) of TiOgtllO), defective and defect-free 119 Figure 36: LEED photograph of the ordered TiO^MIO) surface 120 Figure 37: Plot of the variation in HREELS TiO (110) elastic peak intensities with deviation of the collection angle from the specular 122 Figure 38: As figure 37, but for a well-ordered GaAs surface 123 Figure 39: XPS TiO_(110) showing the carbon peak for clean and contaminated surfaces 125 Figure 40: Diagram of the translations in the rutile unit cell involved in phonon excitations 129 Figure 41 : HREELS of defect-free TiO^tHO) 132 Figure 42: Calculated HREELS of defect-free TiO^MIO) 134 Figure 43: XPS of a typical argon-etched TiOgMIO) surface 137 Figure 44 : Diagram of the Knotek Feibelman Mechanism 139 Figure 45: Diagram of the electron bombardment assembly 141 Figure 46: XPS of TiO_(110) showing changes as electron bombardment progresses 142 Figure 47: Log plot of variation in surface oxygen concentration with electron bombardment for the TiOgUIO) surface 144 Figure 48: UPS He(I) of defect free and argon ion bombarded TiO (110) 148 Figure 49: UPS He(I); detail of fig.
Recommended publications
  • X-Ray Photoelectron Spectroscopy (XPS)
    XX--RayRay PhotoelectronPhotoelectron SpectroscopySpectroscopy (XPS)(XPS) Louis Scudiero http://www.wsu.edu/~scudiero; 5-2669 Electron Spectroscopy for Chemical Analysis (ESCA) • The basic principle of the photoelectric effect was enunciated by Einstein [1] in 1905 E = hν There is a threshold in frequency below which light, regardless of intensity, fails to eject electrons from a metallic surface. hνc > eΦm where h is the Planck constant ( 6.62 x 10-34 J s ) and ν– the frequency of the radiation • In photoelectron spectroscopy such XPS, Auger and UPS, the photon energies range from 20 -1500 eV (even higher in the case of Auger, up to 10,000eV) much greater than any typical work function values (2-5 eV). • In these techniques, the kinetic energy distribution of the emitted photoelectrons (i.e. the number of emitted electrons as a function of their kinetic energy) can be measured using any appropriate electron energy analyzer and a photoelectron spectrum can thus be recorded. [1] Eintein A. Ann. Physik 1905, 17, 132. • By using photo-ionization and energy-dispersive analysis of the emitted photoelectrons the composition and electronic state of the surface region of a sample can be studied. • Traditionally, these techniques have been subdivided according to the source of exciting radiation into : • X-ray Photoelectron Spectroscopy (XPS or ESCA) - using soft x-ray (200 - 1500 eV) radiation to examine core-levels. • Ultraviolet Photoelectron Spectroscopy (UPS) - using vacuum UV (10 - 45 eV) radiation to examine valence levels. • Auger Electron Spectroscopy (AES or SAM) – using energetic electron (1000 – 10,000 eV) to examine core-levels. • Synchrotron radiation sources have enabled high resolution studies to be carried out with radiation spanning a much wider and more complete energy range ( 5 - 5000+ eV ) but such work will remain, a very small minority of all photoelectron studies due to the expense, complexity and limited availability of such sources.
    [Show full text]
  • Roadmap for Photoelectron Spectroscopy
    Roadmap for Photoelectron Spectroscopy Prepared on behalf of EPSRC by David Payne, Imperial College London Preface This roadmap has been prepared in consultation with the community over the last few years, during which time there have been a number of significant developments that have either directly or indirectly affected the PES community. These include the recently announced EPSRC Mid-Range Facility for XPS at the Research Complex at Harwell (HarwellXPS), as well new equipment being acquired as part of the Sir Henry Royce Institute. Whilst the conclusions from this exercise, and the recommendations remain unchanged, an exercise is now underway to capture some of the impacts of these changes. It is planned for an updated roadmap to become available in the next 6 months. 2 Contents page 1. Executive Summary...............................................................................................................................................................................................................................................................3 2. Key Findings and Recommendations...................................................................................................................................................................................................4 3. Introduction........................................................................................................................................................................................................................................................................................6
    [Show full text]
  • Photoelectron Spectroscopy on Atoms, Molecules and Clusters
    Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology 375 Photoelectron Spectroscopy on Atoms, Molecules and Clusters The Geometric and Electronic Structure Studied by Synchrotron Radiation and Lasers TORBJÖRN RANDER ACTA UNIVERSITATIS UPSALIENSIS ISSN 1651-6214 UPPSALA ISBN 978-91-554-7047-0 2007 urn:nbn:se:uu:diva-8343 ! " #! !$ %! & ' "!$ ( %$ $ #! ) * + ,$ %! - ' ) ) ) ! ( .$ * $ $ / $ $ 0)12 /334343$ * " 5 $ %! " ! " ! ! 5 " ! 6$ 0 ! ! 7 8 ,91 *:8 *:; *:<= 2= 2 < > ! " " ! ! & "!$ ! 3 ! 7;#)> ! $ ! ! 7 #)> *" 7(*)> 3 " 3 72';*?)> ! $ , " ! ! 7?%> +@3# ! 7+#> & $ %! " & " 7+> ! $ ( ! ! ,9 1 8 $ %! ! 2 ! !A ! " !2 ! ! $ %! " ! ,9 1 ! ! ,9 1 ! ! ! 5 $ %! ! 8 < ; " * " ! " $ %! !53 & ! 2 <$ . 2 ! ! & " " $ %! !53 & & !A ! " ! ! " 3 <$ ? ' . *5 ' - ;3 ! 7;#)> ( *" 7(*)> 23!! 3 72';*?)> ! 7 #)> " 3 7 ?> ) # 8" 1 ! *" ; < + " , ! , ! " #" $ % &'(" " )*+&,-, " B % 6C ( 0))2 D3D4 0)12 /334343 3/4 7! :: $5$: E F 3/4> “Och kallas därför höga bergen hos oss fjäll, av orsak att där oppå inga trän eller örter växa, utan de är glatta och bara såsom fjäll uppå en fisk” – Olof Rudbäck d. ä.
    [Show full text]
  • Unit 3 :Electronic Spectroscopy Contents
    UNIT 3 :ELECTRONIC SPECTROSCOPY CONTENTS • PHOTOELECTRON SPECTROSCOPY-INTRODUCTION • PRINCIPLE • INSTRUMENTATION INTRODUCTION • Photoelectron spectroscopy (PES) is the energy measurements of photoelectrons emitted from solids, gases, or liquids by the photoelectric effect. • Depending on the source of ionization energy, PES can be divided accordingly into Ultraviolet Photoelectron Spectroscopy (UPS) and X- ray Photoelectron Spectroscopy The photoelectric effect is a phenomenon in which electrons are ejected from the surface of a metal when light is incident on it. These ejected electrons are called photoelectrons. It is important to note that the emission of photoelectrons and the kinetic energy of the ejected photoelectrons is dependent on the frequency of the light that is incident on the metal’s surface. The process through which photoelectrons are ejected from the surface of the metal due to the action of light is commonly referred to as photoemission. Explaining the Photoelectric Effect: The Concept of Photons The photoelectric effect cannot be explained by considering light as a wave. However, this phenomenon can be explained by the particle nature of light, in which light can be visualized as a stream of particles of electromagnetic energy. These ‘particles’ of light are called photons. The energy held by a photon is related to the frequency of the light via Planck’s equation: E = h휈 = hc/λ Where, •E denotes the energy of the photon •h is Planck’s constant •휈 denotes the frequency of the light •c is the speed of light (in a vacuum) •λ is the wavelength of the light Threshold Energy for the Photoelectric Effect For the photoelectric effect to occur, the photons that are incident on the surface of the metal must carry sufficient energy to overcome the attractive forces that bind the electrons to the nuclei of the metals.
    [Show full text]
  • Introduction to X-Ray Photoelectron Spectroscopy
    Introduction to x-ray photoelectron spectroscopy Cite as: J. Vac. Sci. Technol. A 38, 063204 (2020); https://doi.org/10.1116/6.0000412 Submitted: 22 June 2020 . Accepted: 31 August 2020 . Published Online: 24 September 2020 Fred A. Stevie, and Carrie L. Donley COLLECTIONS Paper published as part of the special topic on Special Topic Collection: Reproducibility Challenges and Solutions ARTICLES YOU MAY BE INTERESTED IN Assessment of the frequency and nature of erroneous x-ray photoelectron spectroscopy analyses in the scientific literature Journal of Vacuum Science & Technology A 38, 061204 (2020); https:// doi.org/10.1116/6.0000685 XPS guide: Charge neutralization and binding energy referencing for insulating samples Journal of Vacuum Science & Technology A 38, 031204 (2020); https:// doi.org/10.1116/6.0000057 Procedure which allows the performance and calibration of an XPS instrument to be checked rapidly and frequently Journal of Vacuum Science & Technology A 38, 043206 (2020); https:// doi.org/10.1116/6.0000224 J. Vac. Sci. Technol. A 38, 063204 (2020); https://doi.org/10.1116/6.0000412 38, 063204 © 2020 Author(s). ARTICLE avs.scitation.org/journal/jva Introduction to x-ray photoelectron spectroscopy Cite as: J. Vac. Sci. Technol. A 38, 063204 (2020); doi: 10.1116/6.0000412 Submitted: 22 June 2020 · Accepted: 31 August 2020 · View Online Export Citation CrossMark Published Online: 24 September 2020 Fred A. Stevie1,a) and Carrie L. Donley2,b) AFFILIATIONS 1Analytical Instrumentation Facility, North Carolina State University, Raleigh, North Carolina 27695 2Chapel Hill Analytical and Nanofabrication Laboratory, University of North Carolina, Chapel Hill, North Carolina 27599 Note: This paper is part of the Special Topic Collection on Reproducibility Challenges and Solutions.
    [Show full text]
  • X-Ray Photoelectron Spectroscopy
    XX--rayray PhotoelectronPhotoelectron SpectroscopySpectroscopy RogerRoger Smart,Smart, StewartStewart McIntyre,McIntyre, MikeMike Bancroft,Bancroft, IgorIgor BelloBello && FriendsFriends DepartmentDepartment ofof PhysicsPhysics andand MaterialsMaterials ScienceScience CityCity UniversityUniversity ofof HongHong KongKong SurfaceSurface ScienceScience Western,Western, UWOUWO Introduction Photoelectric effect Photoelectric effect Einstein, Nobel Prize 1921 Photoemission as an analytical tool Kai Siegbahn, Nobel Prize 1981 XPS, also known as ESCA, is the most widely used surface analysis technique because of its relative simplicity in use and data interpretation. XPS X-ray Photoelectron Spectroscopy ESCA Electron Spectroscopy for Chemical Analysis UPS Ultraviolet Photoelectron Spectroscopy PES Photoemission Spectroscopy AnalyticalAnalytical MethodsMethods --- X-ray Photoelectron Spectroscopy (XPS) Photon ν ϕ hν KE = h - (EB+ ) Kinetic Photoelectron Energy E 0 v XPS spectrum: φ Intensities of photoelectrons 0 Ef versus EB or KE VB Binding — Elemental identification and Energy 3s chemical state of element 2p 2s — Relative composition of the constituents in the surface region 1s — Valence band structure Binding Energy Reference K.E. = hνφ -B.E..F - sample - (φφ- ) K.E. = hνφ -B.E. - spec sample .F sample- = hνφ -B.E. - e .F spec Vacuum level Vacuum level φspec φsample Fermi level Fermi level B.E.F core level B.E..F = hνφ - K.E. - spec Instrumentation • Electron energy analyzer • X-ray source • Ar ion gun • Neutralizer • Vacuum system • Electronic controls • Computer system Ultrahigh vacuum system < 10-9 Torr (< 10-7 Pa) • Detection of electrons • Avoid surface reactions/ contaminations Background: Photoelectrons with energy loss Peak: Photoelectrons without energy loss Relative binding energies and ionization cross-section for U For p, d and f peaks, two peaks are observed.
    [Show full text]
  • And Auger Electron Spectroscopy (AES)
    6/9/2008 Advanced Materials Characterization Workshop X‐ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) Rick Haasch, Ph.D. Supported by the U.S. Department of Energy under grants DEFG02-07-ER46453 and DEFG02-07-ER46471 © 2008 University of Illinois Board of Trustees. All rights reserved. What is Surface Analysis? >1000 nm 100 nm <10 nm Bulk Analysis Thin- Thin-filmfilm Analysis Surface Analysis The Study of the Outer-Most Layers of Materials (~10 nm). 2 © 2008 University of Illinois Board of Trustees. All rights reserved. 1 6/9/2008 Particle Surface Interactions Primary beam Secondary beam (source) (spectrometers, detectors) Ions Ions Elec trons Elec trons Photons Photons Vacuum 3 © 2008 University of Illinois Board of Trustees. All rights reserved. Spatial resolution versus Detection Limit 4 © 2008 University of Illinois Board of Trustees. All rights reserved. 2 6/9/2008 Particle Surface Interactions Photoelectron Spectroscopy Ions Ions Electrons Electrons Photons Photons Joe E. Greene2) Vacuum 5 © 2008 University of Illinois Board of Trustees. All rights reserved. X-ray Photoelectron Spectroscopy (XPS) X-ray Photoelectron Spectroscopy (XPS), also known as Electron Spectroscopy for Chemical Analysis (ESCA) is a widely used technique to investigate the chemical composition of surfaces. X-ray1 Photoelectron spectroscopy, based on the photoelectric effect,2,3 was developed in the mid-1960’s as a practical technique by Kai Siegbahn and his research group at the University of Uppsala, Sweden.4 Wilhelm Conrad Röntgen Heinrich Rudolf Hertz Albert Einstein Kai M. Siegbahn 1. W. Röntgen, 1901 Nobel Prize in Physics “in recognition of the extraordinary services he has rendered by the discovery of the remarkable rays subsequently named after him.” 2.
    [Show full text]
  • X-Ray Photoelectron Spectroscopy (XPS)
    XX--RayRay PhotoelectronPhotoelectron SpectroscopySpectroscopy (XPS)(XPS) Louis Scudiero http://www.wsu.edu/~scudiero; 5-2669 Electron Spectroscopy for Chemical Analysis (ESCA) • The basic principle of the photoelectric effect was enunciated by Einstein [1] in 1905 E = hν There is a threshold in frequency below which light, regardless of intensity, fails to eject electrons from a metallic surface. hνc > eFm Where h - Planck constant ( 6.62 x 10-34 J s ), ν– frequency (Hz) of the radiation • In photoelectron spectroscopy such XPS, Auger and UPS, the photon energies range from 20 -1500 eV (even higher in the case of Auger, up to 10,000eV) much greater than any typical work function values (2-5 eV). • In these techniques, the kinetic energy distribution of the emitted photoelectrons (i.e. the number of emitted electrons as a function of their kinetic energy) can be measured using any appropriate electron energy analyzer and a photoelectron spectrum can thus be recorded. [1] Eintein A. Ann. Physik 1905, 17, 132. • By using photo-ionization and energy-dispersive analysis of the emitted photoelectrons the composition and electronic state of the surface region of a sample can be studied. • Traditionally, these techniques have been subdivided according to the source of exciting radiation into : • X-ray Photoelectron Spectroscopy (XPS or ESCA) - using soft x-ray (200 - 1500 eV) radiation to examine core-levels. • Ultraviolet Photoelectron Spectroscopy (UPS) - using vacuum UV (10 - 45 eV) radiation to examine valence levels. • Auger Electron Spectroscopy (AES or SAM) – using energetic electron (1000 – 10,000 eV) to examine core-levels. • Synchrotron radiation sources have enabled high resolution studies to be carried out with radiation spanning a much wider and more complete energy range ( 5 - 5000+ eV ) but such work will remain, a very small minority of all photoelectron studies due to the expense, complexity and limited availability of such sources.
    [Show full text]