Vacuum Diffusion Pumps: Description of Geometry, Operation Principals, Design Characteristics, Specifications and Simulation Approaches
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Vacuum – Nothing but Pressure
By Mike Tuohey, Sales & Marketing Communications Manager, Piab USA Inc. Vacuum – nothing but pressure According to the dictionary, vacuum is a space completely empty of substance. Yet, in engineering, vacuum is employed for a number of tasks. So, how can nothing be utilized to do something? Well, without pressure it wouldn’t work. Vacuum is an ideal and elusive state, and from a practical point of view it is perhaps not necessary to use this theoretical term, once a hot topic among philosophers in ancient Greece, especially since most modern thinkers agree that a complete or perfect vacuum does not exist. Even if all matter could be removed from a volume, it would still not be empty due to dark energy, rays, neutrinos and other phenomena in quantum physics. However, in particle physics, the vacuum state is considered the basic state of matter. In applied physics and engineering, on the other hand, it is probably more helpful to view vacuum as a negative pressure, as this is the force that can be harnessed to do work. The pressure controlled by a vacuum pump can be a powerful force. In a vacuum system, it is the differential between the atmospheric pressure and the vacuum (negative) pressure that creates the ability to lift, hold, move, and perform many types of work. Atmospheric pressure – the pressure we’re all under Atmospheric pressure is the pressure of the weight of the air above us. A cross section of a column of air, measured from sea level to the top of the atmosphere, would exert a pressure of approximately 14.7 pounds per square inch (psi). -
General Disclaimer One Or More of the Following Statements May Affect
General Disclaimer One or more of the Following Statements may affect this Document This document has been reproduced from the best copy furnished by the organizational source. It is being released in the interest of making available as much information as possible. This document may contain data, which exceeds the sheet parameters. It was furnished in this condition by the organizational source and is the best copy available. This document may contain tone-on-tone or color graphs, charts and/or pictures, which have been reproduced in black and white. This document is paginated as submitted by the original source. Portions of this document are not fully legible due to the historical nature of some of the material. However, it is the best reproduction available from the original submission. Produced by the NASA Center for Aerospace Information (CASI) s . 4 NASA TECHN@CAL 6 D^ MEMORANDUM Repor t No 53927d'- T4,79';'0 v ION- AND D IFFUS ION-PUMP HIGH VACUUM SYSTEMS By Philip W. Tashbar, W. Walding :Moore, Jr., William L. Prince and John R. Williams Space Sciences Laboratory September 16, 1969 NASA George C. Marshall Space Flight Center Marshall Space Flight Center, Alabama 0 C4. °o (A S `MBE (THRU) O W (PAGES) (CODE - w8rC - irwa 3190 e+PnObw 19") > TMx - 532 2 7___ (NASA CR OR TMX OR AD NUMBER) (CATEGORY) f- PRECEDING PAGE BLANK NOT FILMED. - TABLE OP-CONTENTS - Section Page 1. INTRODUCTION 1 - - 11. DIFFUSION PUMPS A. General - l - - B. Advantages z - - C. Operational_ Problems _ Z III. GETTER-ION PUMPS A. Ceneral 5 B. -
Introduction to the Principles of Vacuum Physics
1 INTRODUCTION TO THE PRINCIPLES OF VACUUM PHYSICS Niels Marquardt Institute for Accelerator Physics and Synchrotron Radiation, University of Dortmund, 44221 Dortmund, Germany Abstract Vacuum physics is the necessary condition for scientific research and modern high technology. In this introduction to the physics and technology of vacuum the basic concepts of a gas composed of atoms and molecules are presented. These gas particles are contained in a partially empty volume forming the vacuum. The fundamentals of vacuum, molecular density, pressure, velocity distribution, mean free path, particle velocity, conductivity, temperature and gas flow are discussed. 1. INTRODUCTION — DEFINITION, HISTORY AND APPLICATIONS OF VACUUM The word "vacuum" comes from the Latin "vacua", which means "empty". However, there does not exist a totally empty space in nature, there is no "ideal vacuum". Vacuum is only a partially empty space, where some of the air and other gases have been removed from a gas containing volume ("gas" comes from the Greek word "chaos" = infinite, empty space). In other words, vacuum means any volume containing less gas particles, atoms and molecules (a lower particle density and gas pressure), than there are in the surrounding outside atmosphere. Accordingly, vacuum is the gaseous environment at pressures below atmosphere. Since the times of the famous Greek philosophers, Demokritos (460-370 B.C.) and his teacher Leukippos (5th century B.C.), one is discussing the concept of vacuum and is speculating whether there might exist an absolutely empty space, in contrast to the matter of countless numbers of indivisible atoms forming the universe. It was Aristotle (384-322 B.C.), who claimed that nature is afraid of total emptiness and that there is an insurmountable "horror vacui". -
Vacuum Technology for Superconducting Devices
Published by CERN in the Proceedings of the CAS-CERN Accelerator School: Superconductivity for Accelerators, Erice, Italy, 24 April – 4 May 2013, edited by R. Bailey, CERN–2014–005 (CERN, Geneva, 2014) Vacuum Technology for Superconducting Devices P. Chiggiato1 CERN, Geneva, Switzerland Abstract The basic notions of vacuum technology for superconducting applications are presented, with an emphasis on mass and heat transport in free molecular regimes. The working principles and practical details of turbomolecular pumps and cryopumps are introduced. The specific case of the Large Hadron Collider’s cryogenic vacuum system is briefly reviewed. Keywords: vacuum technology, outgassing, cryopumping, LHC vacuum. 1 Introduction Vacuum is necessary during the production of superconducting thin films for RF applications and for the thermal insulation of cryostats. On the other hand, vacuum systems take an advantage from the low temperatures necessary for superconducting devices. This chapter focuses on the principles and the main definitions of vacuum technologies; some insights about gas and heat transfer in a free molecular regime are given. Only turbomolecular pumping and cryopumping are described, since they are the most relevant for superconducting applications. Pressure measurement is not included because, in general, it is not considered a critical issue in such a domain. A comprehensive introduction to vacuum technology may be found in the books listed in the references. 2 Basic notions of vacuum technology The thermodynamic properties of a rarefied gas are described by the ideal gas equation of state: = (1) PV Nmoles RT where P, T and V are the gas pressure, temperature, and volume, respectively, and R is the ideal gas −1 −1 constant (8.314 J K mol in SI units); Nmoles is the number of gas moles. -
History of Vacuum Coating Technologies the History of Vacuum Coating Technologies
The History of Vacuum Coating Technologies The History of Vacuum Coating Technologies Donald M. Mattox © 2002 Donald M. Mattox 1 The History of Vacuum Coating Technologies About the Author Donald M. Mattox, co-owner of Management Plus, Inc., is the Technical Director of the Society of Vacuum Coaters and the Executive Editor of the magazine Vacuum Technology & Coating. © 2002, Donald M. Mattox. All rights reserved. No parts of this book may be reproduced, stored in a retrieval system, transmitted in any form or by any means, photocopied, or microfilmed without permission from Donald M. Mattox. The author encourages readers to provide comments, corrections, and/or additions, and would like to be made aware of any historical references not given in this work. Copies of such references would be appreciated. Donald M. Mattox 71 Pinon Hill Place NE Albuquerque, NM 87122-1914 USA [email protected] Fax (505) 856-6716 © 2002 Donald M. Mattox 2 The History of Vacuum Coating Technologies Introduction plasma-enhanced chemical vapor deposition—PECVD). In some cases PVD and CVD processes are combined to deposit the material in a Vacuum coatings processes use a vacuum (sub-atmospheric “hybrid process.” For example, the deposition of titanium carbonitride pressure) environment and an atomic or molecular condensable vapor (TiCxNy or Ti(CN)) may be performed using a hybrid process where the source to deposit thin films and coatings. The vacuum environment is titanium may come from sputtering; the nitrogen is from a gas and the used not only to reduce gas particle density but also to limit gaseous carbon from acetylene vapor. -
Vacuum Systems
EE-527: MicroFabrication Vacuum Systems R. B. Darling / EE-527 / Winter 2013 Outline • Vacuum principles • Vacuum pumps • Vacuum systems • Vacuum instrumentation • Vacuum materials and components R. B. Darling / EE-527 / Winter 2013 Uses of Vacuum in Microfabrication Rough Vacuum High Vacuum Ultra-High Vacuum wafer chucks evaporation surface analysis load locks ion implantation molecular beam epitaxy (MBE) sputtering reactive ion etching (RIE) low pressure chemical vapor deposition (LPCVD) R. B. Darling / EE-527 / Winter 2013 Units of Pressure Measurement • 1 atmosphere = – 760 mm Hg = 760 torr – 760,000 millitorr or microns – 29.9213 in. Hg – 14.6959 psi – 1.01325 bar 760 mm Hg – 1013.25 millibar 33.93 ft H2O – 101,325 pascals (Pa) – 407.189 in. H2O – 33.9324 ft. H2O 1 Pascal = 1 N/m2 1 torr = 1 mm Hg 1 micron = 1 m Hg R. B. Darling / EE-527 / Winter 2013 Vacuum Ranges • Low or Rough Vacuum (LV) – 760 to 1 torr • Medium Vacuum (MV) –1 to 10-3 torr • High Vacuum (HV) –10-3 to 10-7 torr • Ultra-High Vacuum (UHV) –10-7 to 10-12 torr R. B. Darling / EE-527 / Winter 2013 Partial Pressures of Gases in Air at STP Gas Symbol Volume Percent Partial Pressure, Torr Nitrogen N2 78 593 Oxygen O2 21 159 Argon Ar 0.93 7.1 Carbon Dioxide CO2 0.03 0.25 Neon Ne 0.0018 1.4 x 10-2 Helium He 0.0005 4.0 x 10-3 Krypton Kr 0.0001 8.7 x 10-4 -4 Hydrogen H2 0.00005 4.0 x 10 Xenon Xe 0.0000087 6.6 x 10-5 Water H2O Variable 5 to 50, typ. -
Vacuum Pump (Edited from Wikipedia)
Vacuum Pump (Edited from Wikipedia) SUMMARY A vacuum pump is a device that removes gas molecules from a sealed volume in order to leave behind a partial vacuum. The first vacuum pump was invented in 1650 by Otto von Guericke, and was preceded by the suction pump, which dates to antiquity. HISTORY The predecessor to the vacuum pump was the suction pump, which was known to the Romans. Dual-action suction pumps were found in the city of Pompeii. Arabic engineer Al-Jazari also described suction pumps in the 13th century. He said that his model was a larger version of the siphons the Byzantines used to discharge the Greek fire. The suction pump later reappeared in Europe from the 15th century. By the 17th century, water pump designs had improved to the point that they produced measurable vacuums, but this was not immediately understood. What was known was that suction pumps could not pull water beyond a certain height: 18 Florentine yards according to a measurement taken around 1635. (The conversion to meters is uncertain, but it would be about 9 or 10 meters.) This limit was a concern to irrigation projects, mine drainage, and decorative water fountains planned by the Duke of Tuscany, so the Duke commissioned Galileo to investigate the problem. Galileo advertised the puzzle to other scientists, including Gaspar Berti who replicated it by building the first water barometer in Rome in 1639. Berti's barometer produced a vacuum above the water column, but he could not explain it. The breakthrough was made by Evangelista Torricelli in 1643. -
Oerlikon Leybold Products Overview 2019 Brochure.Pdf
Product Overview 2019 Innovative Vacuum Pumps, Systems and Components for Diverse Applications 3613 0019 02 Technical alterations reserved Product Overview 2019 The entire world of vacuum Table of contents: Page Leybold - Consulting, Sales and Service ................................................ 4 Forevacuum pumps Oil sealed vacuum pumps: Rotary vane pumps SOGEVAC B/BI/D/DI ............................................. 4 Rotary vane pumps SOGEVAC NEO D ................................................ 5 Rotary vane pumps TRIVAC B, E and T ............................................... 5 Dry compressing vacuum pumps: Scroll pumps SCROLLVAC SC 30, SC 60 and SCROLLVAC plus ......... 6 Multiple stage roots pumps ECODRY plus .............................................. 6 Claw pumps CLAWVAC ........................................................................... 6 Screw pumps VARODRY ........................................................................ 7 Screw pumps and systems LEYVAC ...................................................... 7 Screw pumps and systems DRYVAC ..................................................... 8 Power saving unit for DRYVAC screw pumps ....................................... 8 Screw pumps and systems SCREWLINE ............................................... 9 Roots pumps: RUVAC WA(U)/WS(U) ............................................................................. 9 RUVAC WH(U) ........................................................................................ 10 High vacuum pumps Fluid entrainment -
Bibliography and Index on Vacuum And
NATL INST OF STANDARDS & TECH R.I.C. All 100988737 /NBS monograph QC100 .U556 W5;SUPP1;1967 C.I NBS-PUB-C NBS PUBLICATIONS NBS MONOGRAPH 35—Supplement 1 Bibliography and Index on Vacuum and Low Pressure IVIeasurement January 1960 to December 1965 U.S. DEPARTMENT OF COMMERCE NATIONAL BUREAU OF STANDARDS — THE NATIONAL BUREAU OF STANDARDS The National Bureau of Standards^ provides measurement and technical information services essential to the efficiency and effectiveness of the work of the Nation's scientists and engineers. The Bureau serves also as a focal point in the Federal Government for assuring maximum application of the physical and engineering sciences to the advancement of technology in industry and commerce. To accomplish this mission, the Bureau is organized into three institutes covering broad program areas of research and services: THE INSTITUTE FOR BASIC STANDARDS . provides the central basis within the United States for a complete and consistent system of physical measurements, coordinates that system with the measurement systems of other nations, and furnishes essential services leading to accurate and uniform physical measurements throughout the Nation's scientific community, industry, and commerce. This Institute comprises a series of divisions, each serving a classical subject matter area: —Applied Mathematics—Electricity—Metrology—Mechanics—Heat—Atomic Physics—Physical Chemistry—Radiation Physics—Laboratory Astrophysics-—Radio Standards Laboratory,^ which includes Radio Standards Physics and Radio Standards Engineering- -Office of Standard Refer- ence Data. THE INSTITUTE FOR MATERIALS RESEARCH . conducts materials research and provides associated materials services including mainly reference materials and data on the properties of ma- terials. Beyond its direct interest to the Nation's scientists and engineers, this Institute yields services which are essential to the advancement of technology in industry and commerce. -
Gas Physics and Vacuum Technology
1 1 Gas Physics and Vacuum Technology 1.1 The term “vacuum” In standard specification list DIN 28400, Part 1, the term “vacuum” is defined as follows: Vacuum is the state of a gas, the particle density of which is lower than the one of the atmosphere on the earth’s surface. As within certain limits the particle density depends on place and time, a general upper limit of vacuum cannot be determined. In practice, the state of a gas can mostly be defined as vacuum in cases in which the pressure of the gas is lower than atmosphere pressure, i.e. lower than the air pressure in the respective place. The correlation between pressure (p) and particle density (n) is p= n · K · T (1-1) k Boltzmann constant T thermodynamic temperature Strictly speaking, this formula is valid only for ideal gases. The legal pressure unit is Pascal (Pa) as SI unit. The usual pressure unit in vacuum technology is millibar (mbar). This pressure unit is valid for the whole vacuum range from coarse vacuum to ultrahigh vacuum. 1.2 Application of vacuum technology Vacuum is often used in chemical reactions. It serves to influence the affinity and therefore the reaction rate of the phase equilibrium gaseous – solid, gaseous – liquid and liquid – solid. The lowering of the pressure causes a decrease in the reaction density of a gas. This effect is used e. g. in the metallurgy for the bright-annealing of metals. There are several kilograms of metal for 1 liter annealing space, whereas less than 1/3 of the total volume is filled with gas; as a result, the oxygen content of Liquid Ring Vacuum Pumps, Compressors and Systems. -
Present Status of Vacuum Metallurgy in the Iron-Steel Industry
Present Status of Vacuum Metallurgy in the Iron-Steel Industry of Japan* Report of Vacuum Metallurgy S ubdivision, Nell' Technique Development Division, Joint Research Society By M llS ayoshi Hasega IV a**, Toshihiko Asakuma*** all d Tetsuya Watallabe*** * 1. Introduction arc melting of titanium, and since around 1957, steel The Vacuum Metallurgy Subdivision, establish m elting by vacuum arc melting furnace has been draw ed in 1958 within the Steel T echnology J oint R esearch ing the attention of industry. At present, 12 furnaces Society in order to promote the exchange of technical of 10 companies are in operation, including a 20-i nch informa tion among the mills concerned, a nd to push diameter furnace Cor 4-ton ingots imported from NRC rapid progress of domestic technique and improvement Equipment Corporation and a 640-mm diameter fur oCfacilities, has been m a king efforts to improve vacuum nace for 6.8-ton ingots. Although the latter is the larg metallurgy through a nnouncing the results oC technical e t at p resent, severa l larger furnaces- of 30-inch dia research, holding discussions, and publishing research meter-for melting ingots of over 10 tons will make reports. The history a nd the present status of vacuum their debut w ithin this year. metallurgy in J apan is outli ned hereunder. The vacuum induction melting process was initiated Vacuum techniques a lready employed on a commer by Tohoku Metal Industries, Ltd., which imported a cia l basis include vacuum degassing, vacuum arc melt 50-kg furnace from N R C Corporation in 1954 to ing a nd vacuum induction melting. -
Fundamentals of Vacuum Technology
B5 FUNDAMENTALS OF VACUUM TECHNOLOGY Fundamentals of Vacuum Technology Fundamentals of Vacuum Technology revised and compiled by Dr. Walter Umrath with contributions from Dr. Hermann Adam , Alfred Bolz, Hermann Boy, Heinz Dohmen, Karl Gogol, Dr. Wolfgang Jorisch, Walter Mšnning, Dr. Hans-JŸrgen Mundinger, Hans-Dieter Otten, Willi Scheer, Helmut Seiger, Dr. Wolfgang Schwarz, Klaus Stepputat, Dieter Urban, Heinz-Josef Wirtzfeld, Heinz-Joachim Zenker 1 Fundamentals of Vacuum Technology 2 Preface Preface A great deal has transpired since the final reprint of the previous edition of Fundamentals of Vacuum Technology appeared in 1987. LEYBOLD has in the meantime introduced a number of new developments in the field. These include the dry-running ALL×ex chemicals pump, the COOLVAC-FIRST cryopump systems with quick regeneration feature, turbomolecular pumps with magnetic bearings, the A-Series vacuum gauges, the TRANSPECTOR and XPR mass spectrometer transmitters, leak detectors in the UL series, and the ECOTEC 500 leak detector for refrigerants and many other gases. Moreover, the present edition of the ÒFundamentalsÓ goes into much greater detail on some topics. Among these are residual gas analyses at low pressures, measurement of low pressures, pressure monitoring, open- and closed-loop pressure control, and leaks and their detection. Included for the first time are the sections covering the devices used to measure and control the application of coatings and uses for vacuum technology in the coating process. Naturally LEYBOLDÕs ÒVacuum Technology Training CenterÓ at Cologne was dependent on the invaluable support of numerous associates in collating the literature on hand and preparing new sections; I would like to expressly thank all those individuals at this juncture.