THE 53Rd INTERNATIONAL CONFERENCE on ELECTRON, ION, and PHOTON BEAM TECHNOLOGY & NANOFABRICATION
THE 53rd INTERNATIONAL CONFERENCE on ELECTRON, ION, and PHOTON BEAM TECHNOLOGY & NANOFABRICATION Marco Island Marriott Resort, Golf Club and Spa Marco Island, Florida May 26 – May 29, 2009 Co-sponsored by: The American Vacuum Society in cooperation with: The Electron Devices Society of the Institute of Electrical and Electronic Engineers and The Optical Society of America Conference at a Glance Conference at a Glance CONFERENCE ORGANIZATION CONFERENCE CHAIR Stephen Chou, Princeton University PROGRAM CHAIR Elizabeth Dobisz, Hitachi Global Storage Technologies MEETING PLANNER Melissa Widerkehr, Widerkehr and Associates STEERING COMMITTEE R. Blakie, University of Canterbury A. Brodie, KLA-Tencor S. Brueck, University of New Mexico S. Chou, Princeton University E. Dobisz, Hitachi Global Storage Technologies M. Feldman, Louisiana State University C. Hanson, SPAWAR J.A. Liddle, NIST F. Schellenberg, Mentor Graphics G. Wallraff, IBM ADVISORY COMMITTEE Ilesanmi Adesida, Robert Bakish, Alec N. Broers, John H. Bruning, Franco Cerrina, Harold Craighead, K. Cummings, N. Economou, D. Ehrlich, R. Englestad, T. Everhart, M. Gesley, T. Groves, L. Harriott, M. Hatzakis, F. Hohn, R. Howard, E. Hu, J. Kelly, D. Kern, R. Kubena, R. Kunz, N. MacDonald, C. Marrian, S. Matsui, M. McCord, D. Meisburger, J. Melngailis, A. Neureuther, T. Novembre, J. Orloff, G. Owen, S. Pang, R.F. Pease, M. Peckerar, H. Pfeifer, J. Randall, D. Resnick, M. Schattenburg, H. Smith, L. Swanson, D. Tennant*, L. Thompson, G. Varnell, R. Viswanathan, A. Wagner, J. Wiesner, C. Wilkinson, A. Wilson, Shalom Wind, E. Wolfe *Financial Trustee COMMERCIAL SESSION Alan Brodie, KLA Tencor Rob Illic, Cornell University Reginald Farrow, New Jersey Institute of Technology Brian Whitehead, Raith PROGRAM COMMITTEE & SECTION HEADS Lithography E- Beam Optical Lithography A.
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