The State of Stratospheric Ozone Depletion
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MAC Report 2013: IV Industrial Processes Sector
IV. Industrial Processes Sector NITRIC AND ADIPIC ACID PRODUCTION IV.1. Nitric and Adipic Acid Production IV.1.1 Sector Summary he production of nitric and adipic acid results in significant nitrous oxide (N2O) emissions as a by-product. Nitric and adipic acid are commonly used as feedstocks in the manufacture of a variety of commercial products, particularly fertilizers and synthetic fibers (USEPA, 2012a). T Combined global emissions of N2O from nitric and adipic acid production are shown in Figure 1-1. Globally, emissions have declined by about 13% (17 MtCO2e) over the past decade; however, over the next 20 years—2010 to 2030—emissions are expected to increase steadily (~20%) growing by 24 MtCO2e over the time period. This trend is largely due to increased demand for fertilizer (nitric acid is an input) and increased demand for synthetic fibers (adipic acid is an input). In 2030, the United States, South Korea, Brazil, China, and Ukraine are expected to be five largest emitters of N2O from nitric and adipic acid production. Figure 1-1: N2O Emissions from Nitric and Adipic Acid: 2000–2030 160 142 135 140 125 118 120 Ukraine 100 e 2 China 80 Brazil MtCO 60 South Korea 40 United States 20 Rest of World 0 2000 2010 2020 2030 Year Source: USEPA, 2012a. Over the coming decades, increased demand for adipic acid in Asia is expected to contribute to higher N2O emissions from adipic acid production, while abatement control technologies employed at adipic acid production facilities in the 1990s in the United States, Canada, and some countries of the EU are expected to reduce N2O emissions (USEPA, 2012a). -
Difluoromethane (HFC-32) CAS No
Difluoromethane (HFC-32) CAS No. 75-10-5 (Second Edition) JACC No. 54 ISSN-0773-6339-54 Brussels, June 2008 Difluoromethane (HFC-32) CAS No. 75-10-5 ECETOC JACC REPORT No. 54 © Copyright – ECETOC AISBL European Centre for Ecotoxicology and Toxicology of Chemicals 4 Avenue E. Van Nieuwenhuyse (Bte 6), B-1160 Brussels, Belgium. All rights reserved. No part of this publication may be reproduced, copied, stored in a retrieval system or transmitted in any form or by any means, electronic, mechanical, photocopying, recording or otherwise without the prior written permission of the copyright holder. Applications to reproduce, store, copy or translate should be made to the Secretary General. ECETOC welcomes such applications. Reference to the document, its title and summary may be copied or abstracted in data retrieval systems without subsequent reference. The content of this document has been prepared and reviewed by experts on behalf of ECETOC with all possible care and from the available scientific information. It is provided for information only. ECETOC cannot accept any responsibility or liability and does not provide a warranty for any use or interpretation of the material contained in the publication. ECETOC JACC No. 54 Difluoromethane (HFC-32) CAS No. 75-10-5 Difluoromethane (HFC-32) CAS No. 75-10-5 CONTENTS EXECUTIVE SUMMARY 1 ECETOC SCHEME FOR THE JOINT ASSESSMENT OF COMMODITY CHEMICALS 2 1. SUMMARY AND CONCLUSIONS 3 2. IDENTITY, PHYSICAL AND CHEMICAL PROPERTIES, ANALYTICAL METHODS 5 2.1 Identity 5 2.2 EU classification and labelling 6 2.3 Physical and chemical properties 6 2.4 Conversion factors 8 2.5 Analytical methods 8 3. -
JUN 241996Science
Non-Perfluorocompound Chemistries for Plasma Etching of Dielectrics by Benjamin A. Tao S.B., Materials Science and Engineering Massachusetts Institute of Technology, 1993 Submitted to the Department of Materials Science and Engineering in partial fulfillment of the requirements for the degree of Master of Science in Materials Science and Engineering at the Massachusetts Institute of Technology June 1996 © 1996 Massachusetts Institute of Technology. All rights reserved. Signature of Author .............. I6epartment of Materials Science and Engineering May 10, 1996 Certified b y ............. ......................................... L. Rafael Reif Director, Microsystems Technology Laboratories Professor, Department of Electrical Engineering and Computer Science Thesis Supervisor Accepted by.............. -ivncnaeI P. Rubner TDK Professor of Polymer Materials Science and Engineering Chair, Departmental Committee on Graduate Students Rea( byby... ... ...................... SEugene A. Fitzgerald Professor, Department of Materials Science and Engineering .aASSACGHIS iNS 0tU! E OF TECHNO'OGY JUN 241996Science LIBRARIES Non-Perfluorocompound Chemistries for Plasma Etching of Dielectrics by Benjamin A. Tao Submitted to the Department of Materials Science and Engineering on May 10, 1996 in partial fulfillment of the requirements for the degree of Master of Science in Materials Science and Engineering ABSTRACT Perfluorocompounds commonly used by the microelectronics industry are considered potent global warming gases. These fully fluorinated compounds have global warming potentials thousands to tens of thousands times greater than that of carbon dioxide. Using gases with lower or zero global warming potential as replacements is an option for reducing this environmental threat. This thesis begins the work of determining the viability of using replacement chemistries as an option for controlling perfluorocompound emissions. This work was comprised of three stages. -
HCFC-123) CAS No
1,1-Dichloro-2,2,2-trifluoroethane (HCFC-123) CAS No. 306-83-2 (Third Edition) JACC No. 47 ISSN-0773-6339-47 Brussels, May 2005 1,1-Dichloro-2,2,2-trifluoroethane (HCFC-123) ECETOC JACC REPORT No. 47 © Copyright – ECETOC European Centre for Ecotoxicology and Toxicology of Chemicals 4 Avenue E. Van Nieuwenhuyse (Bte 6), B-1160 Brussels, Belgium. All rights reserved. No part of this publication may be reproduced, copied, stored in a retrieval system or transmitted in any form or by any means, electronic, mechanical, photocopying, recording or otherwise without the prior written permission of the copyright holder. Applications to reproduce, store, copy or translate should be made to the Secretary General. ECETOC welcomes such applications. Reference to the document, its title and summary may be copied or abstracted in data retrieval systems without subsequent reference. The content of this document has been prepared and reviewed by experts on behalf of ECETOC with all possible care and from the available scientific information. It is provided for information only. ECETOC cannot accept any responsibility or liability and does not provide a warranty for any use or interpretation of the material contained in the publication. ECETOC JACC No. 47 1,1-Dichloro-2,2,2-trifluoroethane (HCFC-123) 1,1-Dichloro-2,2,2-trifluoroethane (HCFC-123) CAS No. 306-83-2 (Third Edition) CONTENTS EXECUTIVE SUMMARY 1 THE ECETOC SCHEME FOR THE JOINT ASSESSMENT OF COMMODITY CHEMICALS 2 LIST OF SPECIAL ABBREVIATIONS 3 1. SUMMARY AND CONCLUSIONS 4 2. IDENTITY, PHYSICAL AND CHEMICAL PROPERTIES, ANALYTICAL METHODS 8 2.1 Identity 8 2.2 EU classification and labelling 8 2.3 Physical and chemical properties 9 2.4 Conversion factors 10 2.5 Analytical methods 10 3.