Optimization of Wear Loss in Silicon Nitride (Si3n4)–Hexagonal Boron Nitride (Hbn) Composite Using Doe–Taguchi Method
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THE EFFECTS of DEPOSITION CONDITIONS on the MECHANICAL PROPERTIES of TITANIUM SILICON NITRIDE NANOCOMPOSITE COATINGS by SUO
THE EFFECTS OF DEPOSITION CONDITIONS ON THE MECHANICAL PROPERTIES OF TITANIUM SILICON NITRIDE NANOCOMPOSITE COATINGS by SUO LIU Presented to the Faculty of the Graduate School of The University of Texas at Arlington in Partial Fulfillment of the Requirement for the Degree of MASTER OF SCIENCE IN MATERIALS SCIENCE AND ENGINEERING THE UNIVERSITY OF TEXAS AT ARLINGTON MAY 2015 Copyright © by Suo Liu 2015 All Rights Reserve ii Acknowledgements Foremost, I would like to express my sincere gratitude to my advisor Dr. Efstathios I. Meletis for the continuous support of my graduate study and research, for his patience, motivation, enthusiasm, and immense knowledge. His guidance helped me in all the time of research and writing of this thesis. Besides my advisor, I would like to thank the rest of my thesis committee, Dr. Fuqiang Liu and Dr. Harry F. Tibbals, for their generous help. My sincere thanks also go to Dr. Jessica Mooney for preparation of the samples used in this study, as well as for training me on the optical profilometer. I thank each and every one of my group members for their advice, their help and their friendship. I thank Yishu Wang for his help with XPS. Last but not least, I would like to thank my family: my parents Dao Feng Xiang and Aiping Liu, for supporting me spiritually throughout my life. April 28, 2015 iii Abstract THE EFFECTS OF DEPOSITION CONDITIONS ON THE MECHANICAL PROPERTIES OF TITANIUM SILICON NITRIDE NANOCOMPOSITE COATINGS Suo Liu, M.S. The University of Texas at Arlington, 2015 Supervising Professor: Efstathios I. -
Boron Nitride Substrates for High-Quality Graphene Electronics C
LETTERS PUBLISHED ONLINE: 22 AUGUST 2010 | DOI: 10.1038/NNANO.2010.172 Boron nitride substrates for high-quality graphene electronics C. R. Dean1,2*,A.F.Young3,I.Meric1,C.Lee4,5,L.Wang2,S.Sorgenfrei1,K.Watanabe6,T.Taniguchi6, P. Kim 3,K.L.Shepard1 and J. Hone2* Graphene devices on standard SiO2 substrates are highly disor- atomically planar surface should suppress rippling in graphene, dered, exhibiting characteristics that are far inferior to the which has been shown to mechanically conform to both corrugated expected intrinsic properties of graphene1–12. Although suspend- and flat substrates9,21. The dielectric properties of h-BN (e ≈ 3–4 ≈ 21 ing the graphene above the substrate leads to a substantial and Vbreakdown 0.7 V nm ) compare favourably with those of 13,14 improvement in device quality ,thisgeometryimposes SiO2, allowing the use of h-BN as an alternative gate dielectric with severe limitations on device architecture and functionality. no loss of functionality22. Moreover, the surface optical phonon There is a growing need, therefore, to identify dielectrics that modes of h-BN have energies two times larger than similar modes allow a substrate-supported geometry while retaining the in SiO2, suggesting the possibility of an improved high-temperature quality achieved with a suspended sample. Hexagonal boron and high-electric-field performance of h-BN based graphene devices nitride (h-BN) is an appealing substrate, because it has an atom- over those using typical oxide/ graphene stacks23,24. ically smooth surface that is relatively free of dangling bonds and To fabricate graphene-on-BN, we used a mechanical transfer charge traps. -
Highly Selective Modification of Silicon Oxide Structures Fabricated by an AFM Anodic Oxidation
Korean J. Chem. Eng., 25(2), 386-389 (2008) SHORT COMMUNICATION Highly selective modification of silicon oxide structures fabricated by an AFM anodic oxidation Inhee Choi and Jongheop Yi† School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul 151-742, Korea (Received 25 June 2007 • accepted 24 July 2007) Abstract−Anodic oxidation via atomic force microscopy is a promising method for creating submicron-sized silicon dioxide patterns on a local surface. The area patterned by AFM anodic oxidation (AAO) has different chemical prop- erties from the non-patterned area, and thus site-selective modification of patterned surfaces is quite possible. In this study, we combined the AAO with self-assembly method and/or wet chemical etching method for the fabrication of positive and/or negative structures. These locally modified surfaces could be used to the site-selective arrangement and integration of various materials based on a pre-described pattern. Key words: AFM, Anodic Oxidation, Etching, Pattern, Self-assembly INTRODUCTION ification of pre-fabricated silicon oxide structures were successfully achieved by the treatments of organosilanes and etchants. The fabrication of submicron-sized structures, especially those that are silicon-based, has attracted considerable attention due to EXPERIMENTAL the potential applications of such structures, including micro/nano- 1. Materials electromechanical systems (MEMS and NEMS) [1] and miniaturized The following materials and chemicals were used: p-type and devices [2]. For this purpose, a wide variety of fabrication methods <100>-oriented silicon wafers with LPCVD (low pressure chemical have been developed to generate patterns on the nano- and micros- vapor deposition) silicon nitride as a resist, and KOH, IPA (isopropyl cales. -
Si Passivation and Chemical Vapor Deposition of Silicon Nitride: Final Technical Report, March 18, 2007
A national laboratory of the U.S. Department of Energy Office of Energy Efficiency & Renewable Energy National Renewable Energy Laboratory Innovation for Our Energy Future Si Passivation and Chemical Subcontract Report NREL/SR-520-42325 Vapor Deposition of Silicon Nitride November 2007 Final Technical Report March 18, 2007 H.A. Atwater California Institute of Technology Pasadena, California NREL is operated by Midwest Research Institute ● Battelle Contract No. DE-AC36-99-GO10337 Si Passivation and Chemical Subcontract Report NREL/SR-520-42325 Vapor Deposition of Silicon Nitride November 2007 Final Technical Report March 18, 2007 H.A. Atwater California Institute of Technology Pasadena, California NREL Technical Monitor: R. Matson/F. Posey-Eddy Prepared under Subcontract No. AAT-2-31605-01 National Renewable Energy Laboratory 1617 Cole Boulevard, Golden, Colorado 80401-3393 303-275-3000 • www.nrel.gov Operated for the U.S. Department of Energy Office of Energy Efficiency and Renewable Energy by Midwest Research Institute • Battelle Contract No. DE-AC36-99-GO10337 This publication was reproduced from the best available copy Submitted by the subcontractor and received no editorial review at NREL NOTICE This report was prepared as an account of work sponsored by an agency of the United States government. Neither the United States government nor any agency thereof, nor any of their employees, makes any warranty, express or implied, or assumes any legal liability or responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by trade name, trademark, manufacturer, or otherwise does not necessarily constitute or imply its endorsement, recommendation, or favoring by the United States government or any agency thereof. -
In Vitro Comparison of Bioactive Silicon Nitride Laser Claddings on Different Substrates
applied sciences Article In Vitro Comparison of Bioactive Silicon Nitride Laser Claddings on Different Substrates Elia Marin 1,2 , Matteo Zanocco 1,3 , Francesco Boschetto 1,2, Toshiro Yamamoto 2, Narisato Kanamura 2, Wenliang Zhu 1, Bryan J. McEntire 4 , Bhajanjit Sonny Bal 4, Ryutaro Ashida 5, Osam Mazda 3 and Giuseppe Pezzotti 1,3,6,7,* 1 Ceramic Physics Laboratory, Kyoto Institute of Technology, Sakyo-ku, Matsugasaki, Kyoto 606-8585, Japan; [email protected] (E.M.); [email protected] (M.Z.); [email protected] (F.B.); [email protected] (W.Z.) 2 Department of Dental Medicine, Graduate School of Medical Science, Kyoto Prefectural University of Medicine, Kamigyo-ku, Kyoto 602-8566, Japan; [email protected] (T.Y.); [email protected] (N.K.) 3 Department of Immunology, Graduate School of Medical Science, Kyoto Prefectural University of Medicine, Kamigyo-ku, 465 Kajii-cho, Kawaramachi dori, Kyoto 602-0841, Japan; [email protected] 4 SINTX Technologies Corporation, 1885 West 2100 South, Salt Lake City, UT 84119, USA; [email protected] (B.J.M.); [email protected] (B.S.B.) 5 Shinsei, Co., Shijohei Kawanishi Rikobo, Kyoto 610-0101, Japan; [email protected] 6 Department of Orthopedic Surgery, Tokyo Medical University, 6-7-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo 160-0023, Japan 7 The Center for Advanced Medical Engineering and Informatics, Osaka University, Yamadaoka, Suita, Osaka 565-0871, Japan * Correspondence: [email protected] Received: 9 November 2020; Accepted: 14 December 2020; Published: 17 December 2020 Abstract: The performance, durability, and bio-integration of functional biomedical coatings can be enhanced by changing or improving their substrate properties. -
Yttria-Doped Silicon Nitride
7"A7-.2/.._--z 3 1176 00162 3579 NASA Technical Memorandum 8152q NASA-TM-8152919800018982 EFFECT OF W AND WC ON THE OXIDATION RESISTANCE OF YTTRIA-DOPED SILICON NITRIDE Susan Schuon Lewis Research Center Cleveland, Ohio • - • • ' b _r • . .. __Tf" , . , , tl, Prepared for the ........ _...." Annual Meeting of the American Ceramic Society f Chicago, Illinois, April 28-30, 1980 N/ A ERRATA NASA Technical Memorandum 81528 EFFECT OF W AND WC ON THE OXIDATION RESISTANCE OF YTTRIA-DOPED SILICON NITRIDE Susan Schuon 1980 The report number should be NASA Technical Memorandum 81529, not 81528. Issued 1-28-81 EFFECT OF W AND WUON THE OXIDATION RESISTANCE OF YTTRIA-DOPED SILICON NITRIDE by Susan Schuon National Aeronautics and Space Administration Lewis Research Center Cleveland, Ohio 44135 ABSTRACT The effect of W and WCcontamination on the oxidation and cracking in air of sintered Si3N4 - 8 wlo Y203 ceramics was studied at 500° , 750°, and 1350° C. A mixture of Si3N4 - 8 Y203, milled with alumina balls, was divided into four portions. Three portions were doped with 2 wlo WU, Z wlo W, and 4 wlo W respectively,in order to simulatecontaminationduring milling. The fourth portion was undoped and used on a control. The addition of W or of , WCdid not affect the phase relationships in the system, as all bars with or without additions contained melilite as the major Si-Y-O-N phase after sinter- ing. At 750° C, instability (rapid oxidation and cracking) of W-doped bars ap- pears to have occurred as a result of oxidation of the tungsten-containing melilite phase. -
Ceramic Carbides: the Tough Guys of the Materials World
Ceramic Carbides: The Tough Guys of the Materials World by Paul Everitt and Ian Doggett, Technical Specialists, Goodfellow Ceramic and Glass Division c/o Goodfellow Corporation, Coraopolis, Pa. Silicon carbide (SiC) and boron carbide (B4C) are among the world’s hardest known materials and are used in a variety of demanding industrial applications, from blasting-equipment nozzles to space-based mirrors. But there is more to these “tough guys” of the materials world than hardness alone—these two ceramic carbides have a profile of properties that are valued in a wide range of applications and are worthy of consideration for new research and product design projects. Silicon Carbide Use of this high-density, high-strength material has evolved from mainly high-temperature applications to a host of engineering applications. Silicon carbide is characterized by: • High thermal conductivity • Low thermal expansion coefficient • Outstanding thermal shock resistance • Extreme hardness FIGURE 1: • Semiconductor properties Typical properties of silicon carbide • A refractive index greater than diamond (hot-pressed sheet) Chemical Resistance Although many people are familiar with the Acids, concentrated Good Acids, dilute Good general attributes of this advanced ceramic Alkalis Good-Poor (see Figure 1), an important and frequently Halogens Good-Poor overlooked consideration is that the properties Metals Fair of silicon carbide can be altered by varying the Electrical Properties final compaction method. These alterations can Dielectric constant 40 provide knowledgeable engineers with small Volume resistivity at 25°C (Ohm-cm) 103-105 adjustments in performance that can potentially make a significant difference in the functionality Mechanical Properties of a finished component. -
3-;0-Y1 E^'Oob
3-;0-Y1 E^'oob NASA Technical Memorandum 103777 Thermal Shock of Fiber Reinforced Ceramic Matrix Composites Andrew J. Eckel Lewis Research Center Cleveland, Ohio John Z. Gyekenyesi Cleveland State University Cleveland, Ohio Thomas P. Herbell and Edward R. Generazio Lewis Research Center Cleveland, Ohio Prepared for the 15th Annual Conference on Composites and Advanced Ceramics sponsored by the American Ceramic Society Cocoa Beach, Florida, January 13-16, 1991 NASA Trade names or manufacturers' names are used in this report for identification only. This usage does not constitute an official endorsement, either expressed or implied, by the National Aeronautics and Space Administration. THERMAL SHOCK OF FIBER REINFORCED CERAMIC MATRIX COMPOSITES Andrew J. Eckel National Aeronautics and Space Administration Lewis Research Center Cleveland, Ohio 44135 John Z. Gyekenyesi Cleveland State University Cleveland, Ohio 44115 Thomas P. Herbell and Edward R. Generazio National Aeronautics and Space Administration Lewis Research Center Cleveland, Ohio 44135 ABSTRACT Monolithic silicon carbide and silicon nitride and a Nicalon fiber reinforced silicon carbide composite were subjected to severe thermal shock conditions via impingement of a hydrogen/oxygen flame. Surface heating rates of 1000 'C/sec to 2500 'C/sec were generated. The performance of the monolithic reference materials are compared and contrasted with the significantly greater thermal shock CD resistance of the composite. Ultrasonic and radiographic NDE techniques were used to evaluate integrity Q0 `1J of the composite subsequent to thermal shock. Tensile tests were performed to determine the residual tensile strength and modulus. Physical property changes are discussed as a function of number and severity of thermal shock cycles. -
Gallium Nitride Nanocrystal Formation in Si3n4 Matrix by Ion Synthesis
Bull Mater Sci (2020) 43:234 Ó Indian Academy of Sciences https://doi.org/10.1007/s12034-020-02181-9Sadhana(0123456789().,-volV)FT3](0123456789().,-volV) Gallium nitride nanocrystal formation in Si3N4 matrix by ion synthesis MANOJ KUMAR RAJBHAR1, SARAVANAN RAJAMANI1, S K SINGH1, SERGEY SURODIN2, DMITRY NIKOLICHEV2, RUSLAN KRYUKOV2, DMITRY KOROLEV2, ALYONA NIKOLSKAYA2, ALEXEY BELOV2, ALEXEY NEZHDANOV2, ALEXEY MIKHAYLOV2, DAVID TETELBAUM2 and MAHESH KUMAR1,* 1 Department of Electrical Engineering, Indian Institute of Technology Jodhpur, Jodhpur 342011, India 2 Lobachevsky University, 603950 Nizhny Novgorod, Russia *Author for correspondence ([email protected]) MS received 23 October 2019; accepted 16 March 2020 Abstract. Synthesis of nanoparticles in insulators attracts tremendous attention due to their unique electrical and optical properties. Here, the gallium (Ga) and gallium nitride (GaN) nanoclusters have been synthesized in the silicon nitride matrix by sequential ion implantation (gallium and nitrogen ions) followed by either furnace annealing (FA) or rapid thermal annealing (RTA). The presence of Ga and GaN nanoclusters has been confirmed by Fourier-transform infrared, Raman and X-ray photoelectron spectroscopy. Thereafter, the effect of RTA and FA on the conduction of charge carriers has been studied for the fabricated devices. It is found from the current–voltage measurements that the carrier transport is controlled by the space charge limited current conduction mechanism, and the observed values of parameter m (trap density and the distribution of localized state) for the FA and RTA devices are *2 and *4.1, respectively. This reveals that more defects are formed in the RTA device and that FA provides better performance than RTA from the viewpoint of opto- and nano-electronic applications. -
High-Quality Graphene and Hexagonal- Boron Nitride Transfers on Sio2
High-Quality Graphene and Hexagonal- Boron Nitride Transfers on SiO2 1 MELISSA HUYNH CHEMICAL ENGINEERING DEPARTMENT OF OREGON STATE UNIVERSITY DR. JUN JIAO, LESTER LAMPERT REU - PORTLAND STATE UNIVERSITY Overview 2 Importance High- Results and Quality Methodology Interpretation Graphene & HBN Raman Analysis Overview 3 Importance High- Results and Quality Methodology Interpretation Graphene & HBN Raman Analysis 2D Materials 4 Graphene Zero overlap semimetal Durable Heat and electricity conductivity Hexagonal-Boron Nitride Similar properties to graphene Future Application 5 Biological engineering Optical Electronics Composite materials Super Capacitors/ Energy Storage Overview 6 Importance High- Results and Quality Methodology Interpretation Graphene & HBN Raman Analysis Growth 7 Chemical Vapor Deposition (CVD) Copper catalyst Vertical growth with furnace Methane, hydrogen, argon gases Transfer of Graphene 8 PMMA spin coat Ammonium Persulfate (APS) Rinse Heat Acetone bath Transfer of HBN 9 Copper foil APS Corral Pumps Polymer-Free Approach 10 Similar to H-BN Outflow: APS Inflow: DI H2O and Isopropyl Alcohol Overview 11 Importance High- Results and Quality Methodology Interpretation Graphene & HBN Raman Analysis Graphene Spectrum 12 D band G band D/g 2D Band 2D/G Ideal Spectrum HBN spectrum 13 1300-1400 range Weak readings Carbon contamination Ideal Spectrum Overview 14 Importance High- Results and Quality Methodology Interpretation Graphene & HBN Raman Analysis Graphene Analysis Grown at 830 ̊ C [edge] -
Surface Modification of Nano-Silicon Nitride with Silane Coupling Agent†
Asian Journal of Chemistry; Vol. 25, No. 10 (2013), 5589-5592 http://dx.doi.org/10.14233/ajchem.2013.OH29 Surface Modification of Nano-Silicon Nitride with Silane Coupling Agent† 1,2,* 1 XIAODONG WANG and XINJUN WAN 1Department of Chemistry and Material Science, Chaohu University, Chaohu 238000, P.R. China 2AnHui Province Key Laboratory of Environment-friendly Polymer Materials, Anhui University, Hefei 230039, P.R. China *Corresponding author: E-mail: [email protected] AJC-13272 In this work, a silane coupling agent was used for surface modification of native nano-sized silicon nitride (Si3N4) powder. According to the spectra of FT-IR and TGA, it can be inferred that this coupling agent covalently bonds on the surface of nano-Si3N4 particles and an organic coating layer was formed. The surface free energy experiments showed that the hydrophobic property of nano-Si3N4 modified with coupling agent was improved obviously. Analysis of nanoparticle size and TEM revealed that the modified nano-Si3N4 possessed good dispersibility and the average diameter was less than 100 nm. Key Words: Silicon nitride, Surface modification, Nanocomposite, Dispersibility. INTRODUCTION EXPERIMENTAL Composite materials are composed of metallic, inorganic The silicon nitride powder used in this study was a non-metallic or polymer material and they are a kind of multi- commercial product from Kaier Nano-materials Co. Ltd., phase materials, which possess a superior cooperative perfor- Hefei, P.R. China with following characteristics: average mance. Composite materials based on polymer with nano-size particle size 20-40 nm, specific surface area > 115 m2·g-1, is a kind of inorganic-organic composite materials and the total oxygen < 0.62 % (wt). -
Development of New Matrix and Interfacial Materials for Ceramic Matrix Composites Gavin C
University of Connecticut OpenCommons@UConn Doctoral Dissertations University of Connecticut Graduate School 8-26-2014 Development of New Matrix and Interfacial Materials for Ceramic Matrix Composites Gavin C. Richards University of Connecticut - Storrs, [email protected] Follow this and additional works at: https://opencommons.uconn.edu/dissertations Recommended Citation Richards, Gavin C., "Development of New Matrix and Interfacial Materials for Ceramic Matrix Composites" (2014). Doctoral Dissertations. 522. https://opencommons.uconn.edu/dissertations/522 Development of New Matrix and Interfacial Materials for Ceramic Matrix Composites Gavin C. Richards, PhD University of Connecticut, 2014 Pre-ceramic polymers are attractive, low cost materials for the manufacture of ceramic fibers and matrix materials in Ceramic Matrix Composites (CMCs). A new pre-ceramic polymer, an ethanol-modified polyvinylsilazane (PVSZ), was synthesized and characterized. The PVSZ polymer has been previously shown to be a viable precursor for silicon nitride and silicon carbide based ceramics, but lacked stability when exposed to air. The PVSZ polymer was synthesized via the ammonolysis of trichlorovinylsilazane in tetrahydrofuran (THF), and then reacted with ethanol to form the ethanol-modified PVSZ. The PVSZ polymer and ethanol- modified PVSZ resin were each characterized with Attenuated Total Reflectance spectroscopy (ATR), 1H Nuclear Magnetic Resonance ( 1H-NMR), and Gel Permeation Chromatography (GPC), Thermogravimetric Analysis (TGA), Residual Gas Analysis (RGA), and X-Ray Powder Diffraction (XRD) of the ceramic char after pyrolysis in various atmospheres. A second new modified PVSZ was also synthesized. Rather than use ethanol, a second silane monomer was added during synthesis, with the intent of stabilizing the polymer without incorporating oxygen. The new end cap modified PVSZ (EC-PVSZ) was characterized using the same methods outlined for the ethanol-modified PVSZ.