Formation of Oxide Films for High-Capacitance Aluminum Electrolytic Capacitor by Liquid-Phase Deposition and Anodizing
Title Formation of oxide films for high-capacitance aluminum electrolytic capacitor by liquid-phase deposition and anodizing Author(s) Sakairi, Masatoshi; Fujita, Ryota; Nagata, Shinji Surface and Interface Analysis, 48(8), 899-905 Citation https://doi.org/10.1002/sia.5851 Issue Date 2016-08 Doc URL http://hdl.handle.net/2115/66901 This is the peer reviewed version of the following article: Surface and interface analysis, 48(8), August 2016, pp.899- Rights 905, which has been published in final form at http://onlinelibrary.wiley.com/doi/10.1002/sia.5851/full. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving. Type article (author version) File Information Sakair-SIA48(8)899-905.pdf Instructions for use Hokkaido University Collection of Scholarly and Academic Papers : HUSCAP Formation of oxide films for high-capacitance aluminum electrolytic capacitor by liquid phase deposition and anodizing Masatoshi. Sakairi1), Ryota Fujita2), and Shinji Nagata3) 1)Faculty of Engineering, Hokkaido University, Kita-13, Nishi-8, Kita-ku, Sapporo, 060-8628, Japan 2)Graduate School of Engineering, Hokkaido University, Kita-13, Nishi-8, Kita-ku, Sapporo, 060-8628, Japan (Presently; Frukawa Electric CO. LTD., 601-2, Otorizawa, Nikko, 321-2336, Japan) 3) Institute for Materials Research, Tohoku University, Katahira-2-1-1, Aoba-ku, Sendai, 980-8577, Japan Abstract Liquid phase deposition (LPD) treatment and anodizing were used to form oxide layer for a high-capacitance aluminum electrolytic capacitor. Formation of protective oxide layers and modification of LPD conditions make it possible to prolong the LPD duration and lead to the formation of TiO2 and NaF deposits on aluminum.
[Show full text]