Photonics in Colorado

October 2010 Vol. 24, No. 5 www.PhotonicsSociety.org

NEWS

NEWS October 2010 Volume 24, Number 5

COLUMNS Editor’s Column ...... 2 President’s Column ...... 3

RESEARCH HIGHLIGHTS “Tabletop Extreme Ultraviolet Lasers Bring New Light to the Nanoworld” ...... 6 9 Mario C. Marconi and Carmen S. Menoni DEPARTMENTS Careers ...... 12 Graduate Student Fellowship Recipients News ...... 16 • 2010 Chapter Awards Call for Nominations • 2011 Quantum Electronics Award and 2011 Distinguished Lecturer Awards Membership ...... 17 • Nominate a Colleague for IEEE Fellow 9 • Benefits of IEEE Senior Membership and New Senior Members Conferences...... 18 • 2010 Photonics Society Conference Calendar • Preview of the 2010 Annual Meeting • Photonics Society 23rd Annual Meeting • GOLD Session at the Annual Meeting • Celebrate Laserfest at the Annual Meeting • Laserfest • Sensors Conference • Asia Communications and Photonics Conference and Exhibition • Photonics Global Conference • Winter Topicals • Nano/Micro Engineered and Molecular System Conference • Optical Fiber Communication Conference 9 • International Symposium on Technology and Society • Optical Memory and Optical Data Storage Topical Meeting • Summer Topicals • Group IV Photonics • Avionics, Fiber Optics and Photonics Conference • Forthcoming Events with ICO Participation Publications ...... 37 Call for Papers • Journal of Selected Topics in Quantum Electronics (JSTQE) Nonlinear-Optical Signal Processing • JSTQE Semiconductor Lasers • Sensors for Non-Invasive Physiological Monitoring • Journal of Display Technology: Display Technologies for Consumer Electronics • OFS-21

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 1 Editor’s IEEE Photonics Society Column KRISHNAN PARAMESWARAN President Newsletter Staff James Coleman The Photonics Society Annual Meeting is the flagship Dept of E & C Engineering Executive Editor conference of our society, where members can interact University of Illinois Krishnan R. Parameswaran 208 N Wright Street and learn about the latest in our field. I fondly remember Physical Sciences Inc. Urbana, IL 81801-2355 20 New England Business Center the first Annual Meeting I attended in San Francisco in Tel: +1 217 333 2555 Andover, MA 01810 E-mail: [email protected] 1999, when the optical communications boom was in Tel: +1 978 738 8187 Email: [email protected] full swing. A special reception announcing the spinout of Past President Agilent Technologies from Hewlett Packard caused quite John H. Marsh Associate Editor of Asia & Pacific Dept of E & E Engineering Hon Tsang a stir that year. This year, the Annual Meeting in Denver Rankine Building Dept. of Electronic Engineering promises similar surprises and excitement. Conference University of Glasgow The Chinese University of Hong Kong Glasgow G12 8LT, Scotland, UK Shatin, Hong Kong Chair Dr. Dalma Novak has written a nice preview of the Tel: +44 141 330 4901 Tel: +852 260 98254 meeting in this issue. To highlight photonics activities Fax: +44 141 330 4907 Fax: +852 260 35558 E-mail: [email protected] Email: [email protected] in Colorado, we are pleased to have an article from Prof. Associate Editor of Canada Carmen Menoni of Colorado State University and her Secretary-Treasurer Lawrence R. Chen colleagues describing activities in extreme ultraviolet Jerry Meyer Department of Electrical & Naval Research Laboratory Computer Engineering science and technology there. Code 5613 McConnell Engineering Building, I encourage all members to attend the meeting, par- Washington, DC 20375-0001 Rm 633 Tel: +1 202 767 3276 McGill University ticularly student members, who are the future of our So- E-mail: [email protected] 3480 University St. ciety. Recipients of Photonics Society Graduate Student Montreal, Quebec Canada H3A-2A7 Executive Director Fellowships are listed in the Careers Section of this issue Tel: +514 398 1879 Richard Linke Fax: 514 398 3127 and will be honored at the meeting. Please congratulate IEEE Photonics Society Email: [email protected] those outstanding students when you see them. 445 Hoes Lane Piscataway, NJ 08855-1331 I look forward to seeing you in Denver! Tel: +1 732 562 3891 Associate Editor of Europe/ Cheers, Fax: +1 732 562 8434 Mid East/Africa Email: [email protected] Kevin A. Williams Krishnan Parameswaran Eindhoven University of Technology Inter-University Research Institute Board of Governors COBRA on Communication Y. Arakawa T. Koonen Technology S.L. Chuang M. Lipson Department of Electrical Engineering J. Capmany J. Meyer PO Box 513 M. Glick L. Nelson 5600 MB Eindhoven, The Netherlands J. Jackel I. White Email: [email protected] J. Kash P. Winzer

Staff Editor Vice Presidents Lisa Jess Conferences - K. Choquette IEEE Photonics Society Finance & Administration - F. Bartoli 445 Hoes Lane Membership & Regional Activities - Piscataway, NJ 08854 A. Helmy Tel: 1 732 465 6617 Publications - R. Tucker Fax: 1 732 981 1138 Technical Affairs - A. Seeds E-mail: [email protected]

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2 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 President’s Column JAMES J. COLEMAN

The days are starting to get longer and, even though it is still definitely hot August nights in central Illinois, there is a feeling that it won’t be long before kids are back in school and the summer is over. On the plus side, that means football season for Americans. On the minus side, it won’t be long before it starts getting cold outside again in the northern hemisphere. It also means that we in the Photonics Society need to collect our thoughts from the spring and begin again to attend seriously to the business of the society. By the time you read this, it will only be a few weeks until the Annual Meeting in Denver.

Let’s make a meeting…

“The scientific theory I like best is that the rings of Saturn are composed entirely of lost airline luggage.” Mark Russell

Not long ago I was standing at the baggage carousel in Ter- minal 5 at London’s Heathrow airport waiting an interminable length of time for my luggage (which did eventually arrive via Saturn) and thinking about technical conferences. What I was really thinking, to begin with, was that the airlines seem to be on a vector that will make them extinct in 20 years. Here is a business that has long relied on traveling professionals as the main source of revenue. Yet they seem determined to make travelling as unpleasant as possible. The size of cabin crews has been reduced while passenger loads have increased to the bursting point. There is very limited spare capacity in the system so any problem – technical, weather, volcanoes, strikes – causes several days or weeks worth of disruption to the traveling public. The food gets ever worse and more expensive, in the air or in the airport. Legroom is reduced, delays are increased, and cabin maintenance is minimal. On balance, the airline industry seems to operate as if the supply of passengers is inexhaustible. Meanwhile, it seems apparent that the airline industry doesn’t feel threatened by the technology for virtual meetings. Perhaps they should be. Many of us use Skype or similar software for individual communications and there are web-based services that host meetings on line. The first few times you use these tools it is strange but it isn’t difficult to get used to them. So let’s go back to technical conferences. Conferences offer many good things including the technical presentations, questions and answers, informal and social interactions, and those unpredictable chance discussions that lead to new ideas and collaborations. But these come at a significant expense – money, time, and ever increasing inconvenience. And, from a sponsoring society’s point-of-view, the biggest part of the fi- nancial cost for attendees goes to third parties – hotels, restau- rants and, you guessed it, the airlines. I wonder if it isn’t time for our society, which has a truly enviable record in leading the way in many forms of technology, to take a hard look at the

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 3 future of conferences and come up with some new ways of ex- also been to another IEEE Technical Activities Board Meeting ploiting our technologies to allow us to get to the good things where new journals have been approved on the topics of THz while avoiding some of the rest. and photovoltaics. We are in the process of determining what Let me know if you have some thoughts on this subject. I manner of involvement the Photonics Society will have with think the topic might be worth some pointed discussion over these new publications activities. the next year or so. With Warm Wishes, This and that… Jim Coleman Since the last column, I have heard reports that the Summer University of Illinois Topicals were really well done and technically exciting. I have [email protected]

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For additional titles, sample chapters, and ordering information, please visit us at www.elsevierdirect.com/communicationengineering Use discount code IEEE2010 when checking out. Research Highlights Tabletop Extreme Ultraviolet Lasers Bring New Light to the Nanoworld Mario C. Marconi and Carmen S. Menoni Colorado State University, Fort Collins, CO

Introduction ns), high degree of spatial and temporal coherence, and high In the 50 years since the invention of the laser, technological spectral brightness. applications of coherent light have expanded to become an in- dispensable part of our world. Continued advances in nanotech- Compact High Average nology, materials science and chemistry require increasingly Power EUV/SHR Lasers sophisticated ways of accessing and controlling the nanoworld. Compact High Average Power EUV/Soft X-Ray Lasers Re- As a result, developing coherent light sources at ever shorter searchers at Colorado State University are developing compact wavelengths, in the extreme ultraviolet (EUV) and soft x-ray high brightness EUV/soft x-ray lasers based on laser action in (SXR) regions of the spectrum, is becoming increasingly im- plasma ions. These Tabletop systems that presently operate at portant. This spectral region corresponds to wavelengths 10– wavelengths between 10 and 50 nm are the descendent of the 500 times shorter than visible light, or ~1–100 nm. Given the visible Argon-ion laser. In the EUV lasers, a much hotter plas- diffraction limit in imaging resolution, such short wavelengths ma creates and excites highly ionized atoms with laser transi- make it possible to “see” smaller features and “write” smaller tions at much shorter wavelengths. Two different schemes have patterns than when using visible light. Furthermore, EUV/ been successfully used to create these hot dense plasmas. One is SXR light is exceptionally useful for a variety of spectroscopic a fast electrical discharge through a capillary tube that contains applications, since these wavelengths span the primary atomic the laser material. The other is use of an intense ultrashort laser resonances of most elements, allowing for elemental and chemi- pulse to heat a plasma. cally specific spectroscopy. Short wavelength light thus enables The discharge-pumped EUV laser benefits from a scheme a variety of techniques such as ultra high resolution microscopy, to efficiently deposit electrical energy into a needle-shaped spectroscopy, coherent nano-scale patterning and imaging, and plasma by creating a hot, dense, axially uniform plasma col- materials analysis that are complementary to other technologies umn using a very fast, low impedance electrical discharge such as atomic force microscopy and electron microscopy. into a gas-filled capillary tube. It consists in creating a hot These and other compelling applications have motivated and dense axially uniform plasma column by a very fast, low- the construction of several dozen large scale light sources, in- impedance electrical discharge into a gas-filled capillary tube. cluding a few of the latest “fourth generation” which are x-ray The electromagnetic force generated by the fast current pulse free-electron laser (XFEL) light sources designed to generate compresses the plasma to form a dense needle-shaped plasma highly coherent, ultra-high brightness, femtosecond duration, column, in which lasing is generated in transitions of Ne-like soft x-ray beams. [1][2] Nevertheless, these accelerator-based ions (i.e. in Ar8+) ions. [3] This laser operates at a wavelength light sources have major limitations, including their cost of 46.9 nm (26.5 eV photon energy) and can produce an aver- (several $100M) and scale (building-size), and reduced acces- age power in excess of 1 mW at repetition rates up to 10 Hz. sibility compared with third-generation synchrotron sources. (Figure 1) [4, 5] This compact EUV laser has been used in Thus while next-generation XFELs result in unprecedented capabilities for basic science and technology, they are only applicable to experiments that can be brought to the source. For EUV/SRX techniques to gain more widespread use, the size and cost of sources need to shrink dramatically. In some cases, an incoherent short wavelength “light bulb” source can be used effectively. For example, incoherent laser-produced and discharge-produced plasmas are the most effective sources for implementing EUV lithography, which the semiconductor industry expects to use for producing advanced nanoelectronics in 2014. For other applications such as coherent imaging, advanced nanoscale metrologies, nano-scale printing or interferometry, laser-like output beams are needed. In this article we describe advances in the demonstration of emerging Tabletop EUV lasers and their application in nanoscale imaging and coherent lithography that make use of Figure 1. Desk-top EUV laser producing .0.1 mW at l 5 46.9 the high pulse energy (nJ to mJ), short pulse duration (ps to nm when operating at 10 Hz.

6 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 numerous applications, including high resolution microscopy, 20 microwatts [13] these Tabletop lasers emit picosecond puls- interferometry of dense plasmas, the measurement of optical es with peak brightness orders of magnitude higher than that constants, the characterization of soft x-ray optics, materials of third generation synchrotron beam lines. Injection seeding ablation, and nanopatterning. An even more compact truly of these EUV laser amplifiers with high harmonic pulses pro- portable “desktop” version of this capillary discharge laser was duces fully coherent pulses of ~1 ps duration [14–17]. In a developed and successfully used as a single-photon ionization very recent development we have demonstrated the first EUV source in numerous nanocluster spectroscopy studies. [6, 7] laser pumped by a solid state laser fully pumped by compact Bright Tabletop lasers at shorter wavelengths, down to and efficient diode lasers [18]. This new development prom- 10.9 nm [8, 9] have been created in hot dense plasmas created ises to lead EUV/soft x-ray lasers that operate at significantly by focusing picosecond pulses from a Ti:sapphire laser operat- increased repetition rates and average powers. ing at 1–10 Hz and 800 nm wavelength into slab targets of selected materials. A sequence of optical laser pulses creates the Selected Applications of EUV Lasers to plasma that is transiently heated to very high electron temper- Nanoscience and Nanotechnology ature to generate population inversion and gain in transitions of nickel-like or neon-like ions. The heating laser pulse im- Nanoscale Resolution Full Field Microscopy pinges on the plasma at grazing incidence to allow refraction The short wavelength and high average power of EUV lasers to selectively deposit the pump energy into the plasma region allow for the implementation of full field microscopes, the ana- with most favorable conditions for amplification [10, 11]. Fig- log of optical microscopes, that produce broad area images of ure 2 shows on-axis spectra corresponding to a series of EUV surfaces and small samples, but with a greatly improved spatial laser lines obtained by electron collision excitation of transi- resolution. Our EUV full microscopes use EUV laser illumina- tions of nickel-like ions at wavelengths from 18.9 to 10.9 nm. tion in combination with either reflective or diffractive optics, [8, 12]. With average power ranging from a few microwatts to as at EUV wavelengths most materials are highly absorptive.

20 15 Mo 10 18.9 nm 5 20 3-8 ps 15 Ru XRL 10 16.5 nm 5 20 Pd 200 ps 15 10 14.7 nm 5

) 20

–2 Ag 15 θ 10 13.9 nm 5 N Pump Critical Pulse 20 Cd 15 10 13.2 nm

CCD Pixels ( × 10 CCD Pixels 5 20 Pre-Pulse Sn 15 10 11.9 nm 5 20 Sb 15 11.4 nm 10 ne 5 no 20 15 10.9 nm Te 10 5 10 12 14 16 18 10 12 14 16 18 20 Wavelength (nm) Wavelength (nm)

Figure 2. Schematic representation of laser-pumped EUV/SXR laser plasma amplifier (left), that generates bright laser beams at wavelengths between 18.9 and 10.9 nm from transitions in Ni-like ions (right). A pre-pulse impinging at normal incidence on a slab target of a selected material creates a plasma that is subsequently rapidly heated by a short pulse impinging at grazing incidence. Refraction deposits the heating pulse energy into a plasma region with moderate density gradient where large EUV/SXR amplification takes place.

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 7 Capillary Discharge Pumped EUV λ = 49.9 nm Laser Microscope Vacuum Chamber

EUV-Sensitive CCD 2 μm Connected to Computer

λ = 46.9 nm (hv = 26.4 eV) (c) Capillary Discharge Laser

Schwarzschild Condenser

Objective Power Supply and Zone Plate Gas Handling Controls Sample (a)

10 μm

CCD Detector (d) (b)

Figure 3. (a) Compact l 5 46.9 nm microscope for imaging of nanostructures and surfaces. (b) Transmission geometry. (c) Single shot image of a 50 nm Carbon nanotube. (d) Full field image of grains on Zr surface.

[19] One of these EUV microscope uses light from a desktop tion EUVL stepper. The implementation of this microscope is size l 5 46.9 nm capillary discharge laser that generates driven by the EUVL industry need for at-wavelength inspec- .0.1 mW (2.4 3 1013 photons/sec) output. [20, 21] The com- tion of printable defects in EUV lithography (EUVL) masks. pactness of the source allows the entire imaging system to fit (Figure 4a) The EUV microscope produces high quality im- on a 2' 3 5' section of an optical table (Figure 3). The EUV ages in which 55 nm features are resolved. [26, 27] (Figure optics consists of a 16% throughput reflective Schwarzschild 4b) These images are suitable for analysis of key mask metrics, condenser and a diffractive zone plate objective lens. The high such as line edge roughness, used in EUVL to assess the print- throughput condenser is based on Si/Sc multilayer mirror tech- ing quality of the masks. These proof-of-principle results are nology developed by our collaborators at the Lebedev Physical a significant step towards the demonstration of practical high Institute and the National Technical University “KhPI”, Khar- resolution Tabletop imaging systems for at-wavelength defect kov, Ukraine. [22] Custom engineered free standing zone plate characterization. objectives with a numerical aperture of up to 0.32 are used. The zone plate optics have been developed at the Center’s UC Nanopatterning by Coherent Lithography Berkeley facilities using advanced electron beam writing and The high flux and high coherence of the compact EUV laser processing techniques. [23] The microscope has reached a dif- sources developed at Colorado State University have enabled fraction limited spatial resolution of 50 nm operating in trans- the implementation of a variety of coherent printing tech- mission, and a resolution of ,80 nm operating in reflection niques that do not require EUV optics to rapidly print arrays [20, 21, 24]. Furthermore, we demonstrated that the micro- of nanostructures on a tabletop. These coherent techniques in- scope captures images with near-wavelength resolution with clude interferometric lithography, Talbot lithography and ho- only a single laser shot. This is significant because it will allow lographic projection lithography. us to perform stop-action imaging of rapid dynamic nano-scale Interferometric lithography is based on the activation of a processes. Figure 3 exemplifies the capabilities of this compact photoresist or other photosensitive material by the interfer- microscope in imaging nanostructures and surfaces. ence pattern generated by two or more spatially coherent light These EUV full field microscopes are wavelength scalable, beams. This technique can efficiently print periodic patterns and thus by using illumination from optically pumped EUV with resolution approaching half of the wavelength of the il- lasers at around l 5 13 nm we have extended their resolving lumination. Therefore the use of coherent EUV light enables power to better than 38 nm. [25] We have exploited the high interference patterns with dimensions of tens of nanometers reflectivity of extreme ultraviolet lithography EUVL masks and below. Figure 5 shows atomic force microscope images at l 5 13.2 nm, to implement a reflection microscope that of periodic structures printed in PMMA (polymethyl meth- can image EUVL mask patterns under the same conditions acrylate) and HSQ (hydrogen silsesquioxane) photoresist with in which the masks are used in a 43 0.25 NA demagnifica- EUV laser light. Different motifs, from dots to holes or from

8 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 EUVL Mask

Condenser

Objective

Turning Mirror (a) (b)

From EUV Figure 5. Atomic force microscope image of (a) a periodic pat- Laser tern of arbitrary shape printed on PMMA by EUV Talbot Inter- (a) ferometric Lithography. The area covered equals the area of the To CCD Talbot mask, that in this example was 650 3 650 mm. (b) Array of holes 100 nm in diameter, 100 nm thick printed on high resolution resist by EUV interferometric lithography.

front, self images are formed at specific planes defined by the Talbot distance. Placing the samples at the Talbot distances allows one to print a replica of the mask on the photoresist surface. Since the images at the different Talbot planes are formed by the collective contribution of the individual cells, eventual 1 μm errors in the unitary cells are averaged over the very large number of total cells giving a virtually defect-free printing. Figure (b) 4 shows atomic force microscope images of different patterns printed in photoresist using the EUV Tabletop coherent lithography systems described. Figure 4. (a) Schematic of EUV laser-based reflection microscope for EUV lithography mask defect inspection. The microscope uses a specialized zone plate condenser and off-axis objective to Acknowledgments form the image on an array detector. The microscope uses the The authors are with the National Science Foundation Engi- same illumination conditions as the mask encounters in a 43 neering Research Center for Extreme Ultraviolet Science and demagnification stepper. (b) Image of 180 nm elbow pattern on Technology, a consortium between Colorado State University, a EUVL mask. the University of Colorado in Boulder and the University of California Berkeley/Lawrence Berkeley National Laboratory. circular to elongated dots, can be printed by changing the dose The authors thankfully acknowledge the support of the and the exposure geometry. [28] National Science Foundation Engineering Research Center The high coherent flux of the EUV laser also allows for Program (NSF Award Number EEC-0310717). They also the implementation of alternative photolithography methods acknowledge the enormous contributions of many students, that can print arbitrary shape structures. We demonstrated postdoctoral associates, and collaborators, to their ongoing re- patterning of nanostructures using holographic projection li- search efforts. thography and Talbot self imaging. [29] In this case, a mask fabricated in the form of a digital hologram or Talbot diffrac- References tive mask fabricated on a thin SiN membrane by electron beam 1. W. Ackermann, G. Asova, V. Ayvazyan, A. Azima, N. lithography, is placed in front of a substrate coated with pho- Baboi, J. Bahr, V. Balandin, B. Beutner, A. Brandt, toresist and is illuminated with the coherent EUV laser out- A. Bolzmann, R. Brinkmann, O.I. Brovko, M. Castel- put. The mask diffraction pattern is used to expose the resist, lano, P. Castro, L. Catani, E. Chiadroni, S. Choroba, A. thus eliminating the need for projection optics. The resolution Cianchi, J.T. Costello, D. Cubaynes, J. Dardis, W. Deck- of these coherent lithography techniques depends on the mask ing, H. Delsim-Hashemi, A. Delserieys, G. Di Pirro, size, and is given by d 5 2l/NA, where l is the wavelength M. Dohlus, S. Dusterer, A. Eckhardt, H.T. Edwards, B. of the illumination and NA the numerical aperture that varies Faatz, J. Feldhaus, K. Flottmann, J. Frisch, L. Frohlich, D with D the reconstruction distance and the mask size Mask as T. Garvey, U. Gensch, C. Gerth, M. Gorler, N. Golube- 5 D NA Mask/2D. In the case of holographic projection lithogra- va, H.J. Grabosch, M. Grecki, O. Grimm, K. Hacker, U. phy, a binary hologram is utilized to project a real image onto Hahn, J.H. Han, K. Honkavaara, T. Hott, M. Huning, the sample. In Talbot lithography, the photoresist is exposed Y. Ivanisenko, E. Jaeschke, W. Jalmuzna, T. Jezynski, R. by the collective diffraction from a mask composed of multiple Kammering, V. Katalev, K. Kavanagh, E.T. Kennedy, identical unitary cells. When illuminated by a coherent wave- S. Khodyachykh, K. Klose, V. Kocharyan, M. Korfer,

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 9 M. Kollewe, W. Koprek, S. Korepanov, D. Kostin, M. 11. B.M. Luther, Y. Wang, M.A. Larotonda, D. Alessi, M. Krassilnikov, G. Kube, M. Kuhlmann, C.L.S. Lewis, L. Berrill, M.C. Marconi, J.J. Rocca, and V.N. Shlyaptsev, Lilje, T. Limberg, D. Lipka, F. Lohl, H. Luna, M. Luong, Saturated high-repetition-rate 18.9-nm tabletop laser in nickel- M. Martins, M. Meyer, P. Michelato, V. Miltchev, W.D. like molybdenum. Optics Letters, 2005. 30(2): p. 165–167. Moller, L. Monaco, W.F.O. Muller, O. Napieralski, O. 12. J.J. Rocca, Y. Wang, M.A. Larotonda, B.M. Luther, M. Napoly, P. Nicolosi, D. Nolle, T. Nunez, A. Oppelt, C. Berrill, and D. Alessi, Saturated 13.2 nm high-repetition-rate Pagani, R. Paparella, N. Pchalek, J. Pedregosa-Gutierr- laser in nickellike cadmium. Optics Letters, 2005. 30(19): ez, B. Petersen, B. Petrosyan, G. Petrosyan, L. Petrosyan, p. 2581–2583. J. Pfluger, E. Plonjes, L. Poletto, K. Pozniak, E. Prat, D. 13. D.H. Martz, D. 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Tischer, S. M. Berrill, and J.J. Rocca, Phase-coherent, injection-seeded, Toleikis, R. Treusch, D. Trines, I. Tsakov, E. Vogel, T. tabletop soft-X-ray lasers at 18.9 nm and 13.9 nm. Nat Pho- Weiland, H. Weise, M. Wellhoffer, M. Wendt, I. Will, ton, 2008. 2(2): p. 94–98. A. Winter, K. Wittenburg, W. Wurth, P. Yeates, M.V. 16. Y. Wang, M. Berrill, F. Pedaci, M.M. Shakya, S. Gilbert- Yurkov, I. Zagorodnov and K. Zapfe, Operation of a free- son, Z. Chang, E. Granados, B.M. Luther, M.A. Laroton- electron laser from the extreme ultraviolet to the water window. da, and J.J. Rocca, Measurement of 1-ps soft-x-ray laser pulses Nature Photonics, 2007. 1(6): p. 336–342. from an injection-seeded plasma amplifier. Physical Review A, 2. B. McNeil, First light from hard X-ray laser. Nature Photo- 2009. 79(2). nics, 2009. 3(7): p. 375–377. 17. P. Zeitoun, G. Faivre, S. Sebban, T. Mocek, A. Hallou, 3. J.J. Rocca, V. Shlyaptsev, F.G. Tomasel, O.D. Cortazar, D. M. Fajardo, D. Aubert, P. Balcou, F. Burgy, D. Douillet, Hartshorn, and J.L.A. Chilla, Demonstration of a discharge S. Kazamias, G. de Lacheze-Murel, T. Lefrou, S. le Pape, pumped tabletop soft x-ray laser. Physical Review Letters, P. Mercere, H. Merdji, A.S. Morlens, J.P. Rousseau, and 1994. 73(16): p. 2192–2195. C. Valentin, A high-intensity highly coherent soft X-ray fem- 4. C.D. Macchietto, B.R. Benware, and J.J. Rocca, Generation tosecond laser seeded by a high harmonic beam. Nature, 2004. of millijoule-level soft-x-ray laser pulses at a 4-Hz repetition 431(7007): p. 426–429. rate in a highly saturated tabletop capillary discharge amplifier. 18. F.J. Furch, B.A. Reagan, B.M. Luther, A.H. Curtis, S.P. Optics Letters, 1999. 24(16): p. 1115–1117. Meehan, and J.J. Rocca, Demonstration of an all-diode- 5. B.R. Benware, C.D. Macchietto, C.H. Moreno, and J.J. pumped soft x-ray laser. Optics Letters, 2009. 34(21): Rocca, Demonstration of a high average power tabletop soft X- p. 3352–3354. ray laser. Physical Review Letters, 1998. 81(26): p. 5804– 19. D.T. Attwood, Soft X-Rays and Extreme Ultraviolet Radia- 5807. tion. 1999: Cambridge University Press. 6. S. Heinbuch, M. Grisham, D. Martz, and J.J. Rocca, Dem- 20. C.A. Brewer, F. Brizuela, P. Wachulak, D.H. Martz, W. onstration of a desk-top size high repetition rate soft x-ray laser. Chao, E.H. Anderson, D.T. Attwood, A.V. Vinogradov, Optics Express, 2005. 13(11): p. 4050–4055. I.A. Artyukov, A.G. Ponomareko, V.V. Kondratenko, 7. S. Heinbuch, F. Dong, J.J. Rocca, and E.R. Bernstein, M.C. Marconi, J.J. Rocca, and C.S. Menonil, Single-shot Single photon ionization of hydrogen bonded clusters with a soft extreme ultraviolet laser imaging of nanostructures with wave- x-ray laser: (HCOOH)(x) and (HCOOH)(y)(H2O)(z). Jour- length resolution. Optics Letters, 2008. 33(5): p. 518–520. nal of Chemical Physics, 2007. 126(24). 21. F. Brizuela, G. Vaschenko, C. Brewer, M. Grisham, C.S. 8. Y. Wang, M.A. Larotonda, B.M. Luther, D. Alessi, M. Menoni, M.C. Marconi, J.J. Rocca, W. Chao, J.A. Liddle, Berrill, V.N. Shlyaptsev, and J.J. Rocca, Demonstration of E.H. Anderson, D.T. Attwood, A.V. Vinogradov, I.A. high-repetition-rate tabletop soft-x-ray lasers with saturated Artioukov, Y.P. Pershyn, and V.V. Kondratenko, Reflec- output at wavelengths down to 13.9 nm and gain down to 10.9 tion mode imaging with nanoscale resolution using a compact nm. Physical Review A, 2005. 72(5). extreme ultraviolet laser. Optics Express, 2005. 13(11): 9. D. Alessi, D.H. Martz, Y. Wang, M. Berrill, B.M. Luther, p. 3983–3988. and J.J. Rocca, Gain-saturated 10.9 nm tabletop laser operat- 22. Y.A. Uspenskii, V.E. Levashov, A.V. Vinogradov, A.I. Fe- ing at 1 Hz repetition rate. Optics Letters, 2010. 35(3): p. dorenko, V.V. Kondratenko, Y.P. Pershin, E.N. Zubarev, 414–416. S. Mrowka, and F. Schafers, Sc-Si normal incidence mirrors 10. R. Keenan, J. Dunn, P.K. Patel, D.F. Price, R.F. Smith, for a VUV interval of 35-50 nm. Nuclear Instruments & and V.N. Shlyaptsev, High-repetition-rate grazing-incidence Methods In Physics Research Section A-Accelerators Spec- pumped x-ray laser operating at 18.9 nm. Physical Review trometers Detectors And Associated Equipment, 2000. Letters, 2005. 94(10). 448(1-2): p. 147–151.

10 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 23. E.H. Anderson, Specialized electron beam nanolithography for masks with 13.2 nm tabletop laser illumination. Optics Let- EUV and X-ray diffractive optics. Ieee Journal Of Quantum ters, 2009. 34(3): p. 271–273. Electronics, 2006. 42(1-2): p. 27–35. 27. F. Brizuela, S. Carbajo, A. Sakdinawat, D. Alessi, D.H. 24. G. Vaschenko, F. Brizuela, C. Brewer, M. Grisham, Martz, Y. Wang, B. Luther, K.A. Goldberg, I. Mochi, H. Mancini, C.S. Menoni, M.C. Marconi, J.J. Rocca, W. D.T. Attwood, B. La Fontaine, J.J. Rocca, and C.S. Chao, J.A. Liddle, E.H. Anderson, D.T. Attwood, A.V. Menoni, Extreme ultraviolet laser-based tabletop aerial im- Vinogradov, I.A. Artioukov, Y.P. Pershyn, and V.V. Kon- age metrology of lithographic masks. Optics Express. 18(14): dratenko, Nanoimaging with a compact extreme-ultraviolet p. 14467–14473. laser. Optics Letters, 2005. 30(16): p. 2095–2097. 28. P.W. Wachulak, M.G. Capeluto, M.C. Marconi, C.S. 25. G. Vaschenko, C. Brewer, F. Brizuela, Y. Wang, M.A. Menoni, and J.J. Rocca, Patterning of nano-scale arrays by Larotonda, B.M. Luther, M.C. Marconi, J.J. Rocca, and C.S. tabletop extreme ultraviolet laser interferometric lithography. Menoni, Sub-38 nm resolution tabletop microscopy with 13 nm wave- Optics Express, 2007. 15(6): p. 3465–3469. length laser light. Optics Letters, 2006. 31(9): p. 1214–1216. 29. A. Isoyan, F. Jiang, Y.C. Cheng, F. Cerrina, P. Wachulak, 26. F. Brizuela, Y. Wang, C.A. Brewer, F. Pedaci, W. Chao, L. Urbanski, J. Rocca, C. Menoni, and M. Marconi, E.H. Anderson, Y. Liu, K.A. Goldberg, P. Naulleau, P. Talbot lithography: Self-imaging of complex structures. Jour- Wachulak, M.C. Marconi, D.T. Attwood, J.J. Rocca, and nal of Vacuum Science & Technology B, 2009. 27(6): C.S. Menoni, Microscopy of extreme ultraviolet lithography p. 2931–2937.

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October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 11 Career Section

IEEE PHOTONICS SOCIETY 2010 Graduate Student Fellowship Recipients

The IEEE Photonics Society established the Graduate Stu- the Denver Marriott Tech Center, Denver, Colorado, USA dent Fellowship Program to provide Graduate Fellowships on Monday 8th November, 2010. to honor outstanding Photonics Society student members The IEEE Photonics Society is proud to present profiles pursuing graduate education within the Photonics Society of our 2010 Graduate Student Fellows: field of interest. Applicants are normally in their penulti- Mohammad Alfiad – Eindhoven University of Technology mate year of study and receive the award for their final year Yanbo Bai – Northwestern University and must be a Photonics Society student member. Recipi- Koen Huybrechts – Ghent University ents are apportioned geographically in approximate propor- Caroline Lai – Columbia University tion to the numbers of student members in each of the main Dimitrios Mandridis – University of Central Florida geographical regions (Americas, Europe/Mid-East/Africa, Binh-Minh Nguyen – Northwestern University Asia/Pacific). There are 10 Fellows per year. The deadline Joris Roels – Ghent University for nominations is 30 May. Ibrahim Murat Soganci – The University of Tokyo The presentation will be made during the Awards Cer- V.R. Supradeepa – Purdue University emony at the Photonics Society 2010 Annual Meeting at Shaoliang Zhang – National University of Singapore

Mohammad S Alfiad was born in Currently he is working towards his Ph.D. in the Zarqa, Jordan in 1982. He received Eindhoven University of Technology in cooperation with the M.Sc. in Broadband Telecom- Nokia Siemens Networks in Munich, Germany. His re- munication (Cum Laude) from the search focuses on digital signal processing and 100 Gbit/s Eindhoven University of Technol- Ethernet for long-haul fiber-optic transmission systems. ogy, The Netherlands, in 2007. In 2009 he received the Nokia Siemens Networks Qual- His master thesis research was con- ity Award, and in 2010 he received the Telecommunica- ducted in Siemens AG in Munich, tion Award from the Royal Dutch Engineering Society Mohammad S Alfiad Germany. (KIVI-NIRIA).

Yanbo Bai was born in China in to deliver watt level output with single mode spectrum and 1981. He received his B.Sc. degree single mode far-field. in Physics from University of Science Over the past 5 years, he has published 8 papers in high and Technology of China (USTC), in impact journals. He is the first author of 6 papers in Nature 2004. He obtained the M.Sc. degree Photonics and Applied Physics Letters. He is also the author in Physics in 2005 at Northwestern or co-author of another 8 conference papers. His presentation University, USA. Since 2005, he has in 2008 SPIE Photonics West received the “Best Student Pa- been working toward a PhD degree in per” award. He is the winner of the SPIE scholarship in Opti- Yanbo Bai the department of Electrical Engineer- cal Science and Engineering of 2010. He serves as an active ing and Computer Science of North- reviewer for many peer reviewed journals, including Applied western University, under the supervision of Prof. Manijeh Physics Letters, Journal of Applied Physics, IEEE transaction Razeghi. on Electron Devices, Journal of Physics D: Applied Physics, His research focuses on high performance quantum cas- and Optical Engineering. Currently he is working towards his cade lasers (QCLs). He demonstrated mid-infrared QCLs Ph.D. in the Eindhoven University of Technology in coopera- with the highest wall plug efficiency (WPE) in room tem- tion with Nokia Siemens Networks in Munich, Germany. His perature (RT) continuous wave (cw) operation. Besides WPE, research focuses on digital signal processing and 100 Gbit/s he also demonstrated the world’s first watt level QCL in RT Ethernet for long-haul fiber-optic transmission systems. In cw operation. In an effort to improve the beam quality of 2009 he received the Nokia Siemens Networks Quality Award, broad area QCLs, he demonstrated the world’s first photo- and in 2010 he received the Telecommunication Award from nic crystal distributed feedback (PCDFB) QCL, which is able the Royal Dutch Engineering Society (KIVI-NIRIA).

12 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Career Section (cont’d)

Koen Huybrechts was born in realization of all-optical flip-flop devices and all-optical sig- Bonheiden, Belgium in 1983. He nal processing using single laser diodes. More specifically, received his B.Sc. and M.Sc. degree he has demonstrated fast all-optical flip-flop operation and in Physics Engineering from Ghent 2R regeneration in a standard distributed feedback laser. He University (Ghent, Belgium) in was also involved in the realization of ultra-small micro- 2004 and 2006. He spent the last disk-based all-optical flip-flops heterogeneously integrated year of his engineering studies at on silicon. During his doctoral research, there was an active the Kungliga Tekniska Högskolan collaboration with the research group of Prof. Yoshiaki Na- Koen Huybrechts (Stockholm, Sweden) and finished kano from the Research Center for Advanced Science and his Master’s thesis work at the re- Technology (RCAST) at the University of Tokyo (Tokyo, search group of prof. Min Qiu. Japan) and Prof. C. Peucheret from the Department of Pho- Since August 2006, he is working towards a PhD degree tonics Engineering at the Technical University of Denmark at the Photonics Research Group of Prof. Roel Baets in the (Lyngby, Denmark). He was also active within the European Department of Information Technology at Ghent Universi- FP7 Historic project. Currently, he has published 8 papers ty (associated lab of imec). He received a specialization grant in international peer-reviewed journals and over 20 con- from the Flemish “Institute for the promotion of innovation tributions in international conference proceedings. He has through Science and Technology” (IWT). His research, un- been Vice-Chairman and Chairman of the IEEE Photonics der the supervision of Prof. Geert Morthier, is focused on the Society Benelux Student Chapter in 2009 and 2010.

Caroline P. Lai received the B.A.Sc. munications, impairment-aware architectures, and real- degree (with honours) in Electrical time performance monitoring for next-generation optical Engineering from the University of networks, as well as optical interconnection networks for Toronto, Toronto, ON, Canada, in high-performance computing systems and optical packet 2006 and the M.S. degree in Elec- switching. She is a student member of the IEEE Photo- trical Engineering from Columbia nics Society and the Optical Society of America. She has University, New York, NY, in 2008. authored or co-authored numerous papers in peer-reviewed Currently, she is pursuing the Ph.D. journals and international conferences, and regularly serves Caroline P. Lai degree in Electrical Engineering at as a reviewer for several journals, including the Journal Columbia University under the su- of Optical Communications and Networking, IEEE/OSA pervision of Professor Keren Bergman. From May 2010 to Journal of Lightwave Technology, and IEEE Photonics August 2010, she was a research intern in the Optical Link Technology Letters. She is actively involved in the NSF En- and Systems Design group at IBM T. J. Watson Research gineering Research Center for Integrated Access Networks Center, Yorktown Heights, NY, working under Dr. Jef- (CIAN), as well as the Global Environment for Network frey A. Kash. Her research interests lie in cross-layer com- Innovations (GENI).

Dimitrios Mandridis (S’06) was hydrogen fluoride (HF) laser system and its applications. born in Athens, Greece in 1981. He Currently, he is a member of the Ultrafast Photonics Group received his BS and MSc degrees in at CREOL under the advisory of Dr. Peter J. Delfyett. His Applied Math and Physics with spe- current research involves a blend of microwave photonics, cialization in Optoelectronics and metrology and laser development with a focus on ultra-low Material Science (2004) from the Na- noise semiconductor-based lasers at low repetition rates for tional Technical University of Athens high-speed photonic analog-to-digital conversion. (NTUA). In July 2005, he joined Mr. Mandridis is an author and coauthor of more than Dimitrios Mandridis CREOL, the College of Optics & 10 journal papers, 25 conference proceedings and 1 patent. Photonics at the University of Central He serves as a reviewer for the Photonics Technology Let- Florida, where he received the MSc in Optics degree in 2007 ters, the Photonics Journal and Optics Express. He is a stu- while continuing his studies towards the PhD in Optics. dent member of the Institute of Electrical and Electronics During his diploma thesis at the NTUA, Mr. Mandridis Engineers (IEEE) Photonics Society and the Optical Society was with the Laser Development and Application Group, of America (OSA). He has received the IEEE Photonics where he worked on the development of a double amplified Society Graduate Student Fellowship (2010).

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 13 Career Section (cont’d)

Binh-Minh Nguyen received an infrared detectors which can outperform currently existed Engineer degree from Ecole Poly- devices. He invented a new superlattice design called M- technique, France in 2005. He is structure and new device architectures that brought more currently an Electrical Engineer- than one order of magnitude of improvement in the de- ing PhD candidate in the Center tector’s performance and still holds the world record for for Quantum Device (CQD) at this material. He is the author/co-author for three book Northwestern University. His the- chapters and has more than 40 scientific papers published sis is part of a project at CQD to de- in refereed journals and proceedings. Nguyen is recipient Binh-Minh Nguyen velop a novel material, called Type of a SPIE Educational Scholarship in Optical Science and II InAs/GaSb superlattices, for the Engineering in 2009 and 2010; the Edward G. Weston infrared detection. Nguyen is investigating the theoreti- 2010 Summer Fellowship from the Electro Chemical cal properties of the novel quantum system; design appro- Society (ECS) and an IEEE Photonics Society 2010 Grad- priate device architectures then experimentally fabricate uate Student Fellowship.

Joris Roels was born in Hamme, but eventually shifted towards integrated optomechanical Belgium in 1982. He received his circuits. More specifically he has studied the mechanical ac- B. Sc. and M. Sc. Degree in Electrical tuation of nanophotonic wires (and slotted waveguides) on Engineering from the University of a silicon-on-insulator chip through attractive and repulsive Ghent in 2002 and 2005 respective- optical gradient forces. He has authored or co-authored 6 ly. Currently he is pursuing a Ph.D papers in peer reviewed journals, including the premier sci- degree in the Photonics Research entific journals Nature Nanotechnology and Nature Photo- Group of Prof. Roel Baets at the nics. He also published over 15 contributions in conference Joris Roels Dept. of Information Technology proceedings and was an invited speaker in the Special Sym- (INTEC) of Ghent University. His posium on Optomechanics (OSA-IPR 2010) and two other research, under the supervision of Prof. Dries Van Thourhout conferences. He is a student member of IEEE Photonics and in close collaboration with imec, initially focused on Society since 2005 and has been awarded the IEEE Photon- MEMS diffractive gratings for time-of-flight applications, ics Society Graduate Student Fellowship in 2010.

Ibrahim Murat Soganci received his and communication subsystems. His MS thesis was on BS and MS degrees from Bilkent Uni- the utilization of semiconductor and metal nanoparticles versity in Turkey in 2005 and 2007 to improve the performance of optoelectronic devices. His respectively, both in Electrical and Elec- present research interest is on integrated scalable semicon- tronics Engineering. He is currently a ductor photonic switches and their applications in large- PhD candidate under the supervision capacity optical packet switching networks. of Professor Yoshiaki Nakano at the Murat is the author or co-author of more than 35 journal Electronics Engineering Department and conference publications, including ten invited talks, Ibrahim Murat of the University of Tokyo. In 2009, and is a co-inventor of two patents. Besides IEEE Photo- Soganci he spent approximately three months nics Society 2010 Graduate Student Fellowship, he was at Electro-Optical Communication awarded scholarships by Japanese Ministry of Education, Group of COBRA Research School, Eindhoven University of Global Center of Excellence in Electronics at the University Technology in the Netherlands as a visiting graduate student. of Tokyo, Turkish Ministry of Education, Bilkent Univer- His research on photonics has covered a broad range of sity Board of Trustees, and Scientific Research Foundation topics, extending from basic physical properties to devices of Turkey.

V. R. Supradeepa was born in Ban- At Purdue, he works with Prof. Andrew Weiner in the galore (India) in 1984. He received area of Ultrafast Photonics. His research work has been his BTech degree in Engineering mainly focused on methods to generate, manipulate and Physics from the Indian Institute characterize high repetition rate optical frequency combs of Technology, Madras in 2006. and on new applications enabled by their unique properties. From August 2006, he has been Over the last four years, he has authored/coauthored 9 working towards his PhD degree in peer reviewed journal publications and over 16 interna- Electrical Engineering at Purdue tional conference presentations. He serves as a reviewer V. R. Supradeepa University. for IEEE Journal of Lightwave Technology, Optics Letters,

14 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Career Section (cont’d)

Optics Express and Optics Communications journals. He America (OSA) and the electrical engineering honor society, is a student member of Institute of Electrical and Electron- Eta Kappa Nu (HKN). He is a recipient of the IEEE Photo- ics Engineers (IEEE) Photonics Society, Optical Society of nics Society Graduate Student Fellowship for 2010–2011.

Shaoliang Zhang received the B. focuses on digital signal processing algorithms and per- Eng. degree in communication en- formance analysis for coherent optical single-carrier gineering from Beijing University systems. of Posts and Telecommunications During his PhD study, till now he has published 7 jour- in 2006. He is now pursuing the nal papers, 13 conference papers, and 1 book chapter (as Ph.D. degree (Main supervisor: Dr. the first author for 17 papers). He also serves as a reviewer Changyuan Yu and Co-supervisor: for IEEE Transaction on Communications, IEEE Photonics Prof. Pooi Yuen Kam) in Depart- Technology Letters, IEEE/OSA Journal of Lightwave Tech- Shaoliang Zhang ment of Electrical and Computer nology and Physical Communication. He has been awarded Engineering, National University the NUS President Graduate Fellowship in 2010. And he of Singapore (NUS). In summer 2009 and 2010, he was is one of the recipients of the 2010 IEEE Photonics Society a visiting researcher at NEC Labs America. His research Graduate Student Fellowship.

Prototype

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 15 News

IEEE PHOTONICS SOCIETY 2010 Chapter Award Winners

The IEEE Photonics Society announced the winners Chapter of the Year Award – Hong Kong Chapter of the five (5) Photonics Society Chapter Awards Largest Membership Increase Award – for 2010. The Chapters will be recognized dur- Singapore Chapter ing the during the Awards Ceremony at the Photonics Most Improved Chapter Award – Italy Chapter Society 2010 Annual Meeting at the Denver Marriott Most Innovative Chapter Award – Thailand Chapter Tech Center, Denver, Colorado, USA on Monday 8th Senior Member Initiative Award – Phoenix Chapter November, 2010.

Call for Nominations IEEE PHOTONICS SOCIETY 2011 Quantum Electronics Award and 2011 Distinguished Lecturer Awards

Nominations for Quantum Electronics Award and Distin- presented at the Conference on Lasers and Electro-Optics/ guished Lecturer Awards are now being solicited for sub- Quantum Electronics and Laser Science Conference (CLEO/ mission to the Photonics Society Executive Office. The QELS 2011). deadline for nominations is 16 February. The Distinguished Lecturer Awards are presented to A list of previous winners and awards information honor interesting speakers who have made recent signifi- is available on the Photonics Society web site: www. cant contributions to the field of lasers and electro-optics, PhotonicsSociety.org under the “Awards” tab. or who have industrial or entrepreneurial experience at a The Quantum Electronics Award is given for excep- senior level in the fields of interest to the Photonics So- tional and outstanding technical contributions that have ciety. The program is designed to honor excellent speak- had a major impact in the fields of quantum electronics and ers who have made technical, industrial or entrepreneurial lasers and electro-optics. This award is given for truly excel- contributions of high quality and to enhance the technical lent and time-tested work in any of the fields of interest of programs of the Photonics Society chapters. Consideration the Photonics Society. It may be given to an individual or to is given to having a balance of speakers who can address a a group for a single outstanding contribution or for a long wide range of topics of current interest in the fields covered history of significant technical work in the field. No can- by the Photonics Society. The term for the Lecturers is July didate shall have previously received a major IEEE award 1 of the year of election until June 30 for the following year. for the same work. Candidates need not be members of the Candidates need not be members of the IEEE or PHOTO- IEEE or the PHOTONICS SOCIETY. The award will be NICS SOCIETY.

16 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Membership Section

Nominate a Colleague for IEEE Fellow

If you are considering nominating a colleague from indus- You are strongly encouraged to read the information on try, government, or academia for elevation to IEEE Fellow “Before You Hit Submit” and then use the Online Applica- grade, the opportunity to do so is now. This prestigious 46 tion process which is quick and easy. Once you have started year old group now numbers over 6000. These Fellows are the application, it can be held in Draft status until you the visionaries, the dreamers, the pioneers, and technology have completed the entire form and are ready to send the leaders in their field as well influential members in the in- information to us. Once you have submitted the applica- ternational technology community. tion, the electronic process will automatically send emails IEEE Senior members or IEEE Life Senior members in to your references and endorsers and provide the means for good standing, who have completed five years of service you to track their status. Also once you have submitted the in any grade of IEEE Membership and who have made an nomination, no changes for whatever reason can be made outstanding contribution to the electronic or electrical en- which is why we encourage you to put the maximum num- gineering profession may be nominated in one of four cate- ber of references on the form and find out if they are will- gories: application engineer/practitioner, educator, research ing to help you with the submission before sending the engineer/scientist, or technical leader. The IEEE Fellow web nomination. site, http://www.ieee.org/fellows, has all the information you The IEEE Fellow Staff is working to make your nomina- will need including the requirements for nominee eligibil- tion process as trouble free as possible and they are ready to ity as well as nomination instructions and all the necessary assist with all phases of the application process. Should you forms. The nomination period is presently open and will have any question during the completion process you can continue through March 1, 2011 for the Class of 2012. email [email protected] with any questions.

Benefits of IEEE Senior Membership

There are many benefits to becoming an IEEE Senior Member: technical executive or originator in IEEE-designated fields. • The professional recognition of your peers for technical The candidate shall have been in professional practice for at and professional excellence least ten years and shall have shown significant performance • An attractive fine wood and bronze engraved Senior over a period of at least five of those years. Member plaque to proudly display. To apply, the Senior Member application form is avail- • Up to $25 gift certificate toward one new Society able in 3 formats: Online, downloadable, and electronic membership. version. For more information or to apply for Senior Mem- • A letter of commendation to your employer on the bership, please see the IEEE Senior Member Program achievement of Senior member grade (upon the request website: http://www.ieee.org/organizations/rab/md/smpro- of the newly elected Senior Member.) gram.html • Announcement of elevation in Section/Society and/or local newsletters, newspapers and notices. New Senior Members • Eligibility to hold executive IEEE volunteer positions. The following individuals were elevated to Senior Member- • Can serve as Reference for Senior Member applicants. ship Grade thru July-August: • Invited to be on the panel to review Senior Member applications. Erin N. Hogbin The requirements to qualify for Senior Member elevation Bing-yu Hsieh are a candidate shall be an engineer, scientist, educator, Aydogan Ozcan

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 17 Conference Section

2010 Photonics Society Conference Calendar

MWP October 5 – 9, 2010 2010 IEEE Topical Meeting on Microwave Photonics Hilton Hotel Montreal, Quebec, Canada www.mwp2010.org/

MOC October 31 – November 3, 2010 2010 16th Microoptics Conference National Chiao Tung University Hsinchu, Taiwan www.ieo.nctu.tw/moc2010

HPD November 3 – 4, 2010 2010 High Power Diode Lasers and Systems Conference The International Centre Telford, UK www.photonex.org/conference/hpdls.php

PHO November 7 – 11, 2010 2010 IEEE Photonics Society Annual Meeting Denver Marriott Tech Center Denver, Colorado, USA www.photonicsconferences.org/PHO2010

IEDMS November 18 – 19, 2010 International Electron Devices and Materials Symposium National Central University Chungli, Taiwan www.iedms2010.ee.ncu.edu.tw/

AOM December 3 – 6, 2010 2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics South China Normal University GuangZhou, China http://iomt.scnu.edu.cn/AOM2010/home.html

ACOFT December 5 – 9, 2010 35th Australian Conference on Optical Fibre Technology Melbourne Convention & Exhibition Centre Melbourne, Australia www.aip2010.org.au/

18 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Conference Section (cont’d)

ACP December 8 – 12, 2010 Asia Communications & Photonics Conference Shanghai International Conference Center Shanghai, China http://www.acp-ce.org/

PHOTONICS December 11 – 15, 2010 International Conference on Fiber Optics and Photonics Indian Institute of Technology Guwahati, India www.iitg.ernet.in/photonics2010

COMMAD December 12 – 15, 2010 2010 Conference on Ooptoelectronic and Microelectronic Materials and Devices The Australian University Canberra, Australia commad2010.anu.edu.au

PGC December 14 – 16, 2010 2010 Photonics Global Conference Nanyang Technological University Singapore www.photonicsglobal.org/index.php

IEEE Photonics Technology Letters )astHU online publishingWKDQHYHUEHIRUH •Stringent, high-quality review process •Online posting 1-2 weeks after acceptance Ranked #2 in •Color figures online electrical engineering •Permanently archived journals by Eigenfactor •No mandatory author fees (www.eigenfactor.org) •Hard copy version DYDLODEOH

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October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 19 Conference Section (cont’d)

Preview of the 2010 Annual Meeting

The 2010 Annual Meeting of the IEEE Pho- aspects of teaching. This year’s session will tonics Society will be held in Denver, Colo- feature Prof. Roberta Ramponi from the rado during 7–11 November. Following in Politecnico di Milano, Italy; Prof. David the path of previous successful meetings, Plant from McGill University, Canada; and this year’s conference will feature an exten- Prof. Martin Richardson from University of sive range of technical activities in addition Central Florida. The last event on Sunday’s to some unique events. schedule will be the “Careers in Research The conference will commence on Sun- Forum,” a regular activity which is dedi- day morning with a session focused on cated to promoting career awareness among career development and networking op- students and young researchers in photon- portunities for recent graduates in the ics and related fields. Speaking at this year’s photonics field. This GOLD (Graduates Of session will be Prof. John Dudley from the the Last Decade) session will include an in- Program Chair Université de Franche-Comté, France, Dr. vited talk by recent graduate, Dr. Yannick Dr. Dalma Novak Sarah Kurtz from the National Renewable Keith Lize from Opnext Subsystems, Inc., USA, as well Energy Laboratory in Colorado, and Dr. Cary Gunn from as poster presentations from the Society’s graduate fellow- Genalyte, CA. The three presentations in the Careers Forum ship winners. will be followed by a reception, to which all participants Following the GOLD session, conference participants are invited. will be invited to celebrate the 50th Anniversary of the Laser Monday’s program will start with the Plenary Session during the LaserFest session. The first Ruby Laser was de- which will highlight four distinguished speakers cover- veloped by Theodore Maiman in 1960 and LaserFest is a ing a range of topics. Dr. Ryne Raffaelle from the National year-long celebration of this milestone. The IEEE Photon- Renewable Energy Laboratory will review “Photovoltaics ics Society has been a founding partner of LaserFest and Technology: Opportunities and Challenges”; Prof. Susumu activities are being held throughout the year to celebrate Noda from Kyoto University, Japan will speak about the Golden Jubilee of Laser development. The Society and “Photonic Crystal Devices”; Prof. David Payne from the its members have played a crucial role in the development University of Southampton, UK will talk about “The Op- of lasers and it is befitting that we celebrate LaserFest dur- tical Internet”; and finally, Prof. Stefen Hell from the Max ing this year’s Annual Meeting. As part of the LaserFest Planck Institute for Biophysical Chemistry, Germany will session, three renowned laser pioneers will give historical discuss “Nanoscopy With Focused Light.” perspectives and share their experiences in the develop- Following Monday morning’s Plenary Session, the main ment of lasers. They will also discuss their thoughts on technical program of the Annual Meeting will commence what the future holds for laser technology. The LaserFest and will run through till Thursday afternoon. The Soci- distinguished speakers will comprise Dr. Tingye Li, for- ety’s various program sub-committees have put together merly of Bell Labs; Prof. Anthony Siegman, from Stan- an outstanding program comprising 3 Special Symposia, ford University; and Prof. Federico Capasso from Harvard 130 invited talks and 266 contributed papers, over half of University. which were submitted by student authors. This year the After the LaserFest event, two special sessions will be Special Symposia topics include “Extreme Photonics,” held. The first is devoted to “Creative Teaching Meth- “Hybrid Optical-Wireless Networks,” and “Packaging and ods” and will highlight experienced teachers sharing their Integration Technologies for Optical MEMS/NEMS, Opto- perspectives on photonics course development and other electronic and Nanophotonic Devices.”

20 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Conference Section (cont’d)

7-11 November

ieee2010photonics society 23rd annual meeting

Pre-Registration Deadline: 1 October 2010

Denver Marriott Tech Center Denver, Colorado USA

Conference General Chair: Chennupati Jagadish Australian National University, Canberra, Australia

Program Chair: Dalma Novak www.PhotonicsSociety.org Pharad, LLC, USA

Member-At-Large: Sponsored by Roel Baets Ghent University, Gent, Belgium Cover Image Courtesy of Jeffrey W. Nicholson, OFS Laboratories

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 21 Conference Section (cont’d)

Join us! For the The IEEE Photonics Society GOLD Session Taking place at the IEEE Photonics Society Annual Meeting 2010 7, November 2010 10.30am – 12.00pm

The GOLD session (GRADUATES OF THE LAST DECADE) is a forum for graduate students and young professionals to:

The GOLD session will be made up of one invited talk and special poster presentations from the graduate fellowship winners.

The invited talk will focus on how to develop academic or industrial careers after graduation. The poster presentations from the graduate fellowship winners are aimed at giving attendees an opportunity to mix with successful academic and industrial leaders in the photonics field.

Invited Talk Yannick Keith Lize, M.Sc., Ph.D., Opnext Subsystems, Inc., USA

The IEEE Photonics Society 2010 GOLD Organizing Committee

Ju Han Lee, Chair (University of Seoul, Republic of Korea) Takuo Tanemura (Univ. Tokyo, Japan) Yannick Keith Lize (Opnext, USA) Roberto Llorente (Polytechnical University of Valencia, Spain) Kin Kee Chow (Nanyang Technological University, Singapore) Jose Azana (INRS, Canada)

)25025(,1)250$7,21 3/($6(9,6,7 :::3+2721,&6&21)(5(1&(625*

22 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Conference Section (cont’d)

CELEBRATECELEBRATE LASERFESTLASERFEST WITH UUS!S!

At the

“GOLDEN JUBILEE OF LASERS: PAST, PRESENT, FUTURE”

DENVER MARRIOT TECH CENTER

Lasers are being widely used in our daily lives and we cannot imagine life without lasers in the modern world. In 2010, we are celebrating LaserFest based on the development of first Ruby Laser by Theodore Maiman in 1960. IEEE Photonics Society has been a founding partner of the LaserFest and activities are being held throughout the year to celebrate the Golden Jubilee of Laser development. IEEE Photonics Society and its members played a crucial role in the development of lasers, as part of these celebrations. Three Laser Pioneers will give historical perspective and share their experiences in the development of lasers and give their thoughts on what the future holds for lasers:

Dr. Tingye Li, Formerly Bell Labs, Laser Resonators and Fiber Optical Communications

Professor Anthony E. Siegman, Stanford University, Laser Developments

FOR MORE INFORMATION PLEASE VISIT: WWW.PHOTONICSCONFERENCES.ORG

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 23 Conference Section (cont’d)

Get Involved. Celebrate Lasers.

The entire laser community is invited to celebrate the 50th Anniversary of the laser. Companies, schools, universities and local communities can participate.

Visit www.LaserFest.org to learn how your organization can participate in LaserFest.

Founding Partner of

JOIN THE CELEBRATION.

24 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Conference Section (cont’d)

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 25 Conference Section (cont’d)

AsiaAsia CCommunicationsommunications aandnd Photonics ConferenceConference anandd AExhibitionExhibition C 8-12 December “Where““Where sciencesc ience anand d industry in dus merge”

ShanghaiShanghai IInternationalnternational CConferenceConon Center & OOrientalriental Riverside Hotel P ShanghaiShang China 2010 General Co-Chairs Weisheng Hu, Shanghai Jiao Tong University, China Ming-Jun Li, Corning, USA Dennis Matthews, University of California at Davis, USA

2010 Program Co-Chairs Dominique Chiaroni, Alcatel-Lucent Bell Labs, France Jian-Jun He, Zhejiang University, China Ken-ichi Kitayama, Osaka University, Japan Xingde Li, Johns Hopkins University, USA Sponsored by

www.photonicsconferences.org/ACP2010

26 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Conference Section (cont’d)

Photonics Global Conference 2010 14 - 16 December, 2010 Singapore

The Photonics Global Conference (PGC) is a biennial event held since 2008. The aim of this conference is to foster interactions among broad disciplines in the photonics family. The conference will provide a platform for international academics, researchers, practitioners and students working in the photonics areas to discuss new developments, concepts and practices, and to identify synergies in research directions that will lead to broader and deeper applications of photonics.

All major areas in photonics technologies will be covered in talks, including but not limited to, optofluidics and biophotonics, fiber-based devices and applications, green photonics, high-power lasers and their industrial applications, metamaterials and plasmonics, nanophotonics, and optical communication and networks. Several high-level invited/special sessions, and industrial exhibitions will also be organized simultaneously.

Previous conference in 2008 attracted about 300 delegates from 32 countries. This year we have Prof. Federico Capasso from Harvard University and Prof. Stefan Hell from Max-Planck- Institute to give plenary talks in Singapore.

All submitted abstracts will be peer-reviewed. The conference proceedings will be distributed to the registered participants in a CD and will also be available through IEEE Xplore. All presented papers with final manuscripts accepted will be Ei indexed.

Singapore has been Southeast Asia's most modern city for over a century. The city blends Malay, Chinese, Arab, Indian and English cultures and religions. Its unique ethnic tapestry affords visitors a wide array of sightseeing and culinary opportunities from which to choose. Singapore Flyer, Night Safari, and newly-built Casino are just a few examples. The first-ever Youth Olympic Games is also held in August 2010 in the city.

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 27 Conference Section (cont’d)

CALL FOR PAPERS

PAPER SUBMISSIONONN DEADLINE: Photonic Materials, Devices, 11 October 2010 and Applications PRE-REGISTRATION TOPICS: DEADLINE: Optoﬂuidics 20 December 2010 Co-Chairs: Yeshaiahu (Shaya) Fainman, University of California, USA Changhuei Yang, Caltech, USA Demetri Psaltis, EPFL, Switzerland

10 -12 Photonic Materials and Integration Architectures Co-Chairs: January Weidong Zhou, University of Texas at Arlington, USA Zetian Mi, McGill University, Canada

2 011 Low Dimensional Nanostructures and Sub-Wavelength Photonics Co-Chairs: Keystone Lodge & Spa Mike Gerhold, Army Research Ofﬁce, USA Keystone, Cun-Zheng Ning, Arizona State University, USA Colorado USA Specialty Optical Fibers and Their Applications Co-Chairs: Stefan Wabnitz, University of Brescia, Italy Bertand Desthieux, Alcatel, Belgium

Sponsored by

32 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Conference Section (cont’d)

CALL FOR PAPERS

Paper Submission Deadline: 18 March 2011

Pre-Registration Deadline: 17 June 2011

18-20 JULY

Hilton Montreal Bonaventure Montreal, Quebec Canada

www.PhotonicsTopicals.org

Sponsored by www.PhotonicsConferences.org

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 33 Conference Section (cont’d)

CALL FOR PAPERS

8th International Conference on GROUP IV PHOTONICS

14-16 September

THE ROYAL SOCIETY | LONDON, ENGLAND

PROGRAM CHAIRS: Graham Reed, University of Surrey, UK Jean Marc Fedeli, Commissariat À I’Énergie Atomique (CEA), France

PAPER SUBMISSION DEADLINE: PRE-REGISTRATION DEADLINE: 9 May 2011 12 August 2011

Sponsored by www.PhotonicsConferences.org

34 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Conference Section (cont’d)

CALL FOR PAPERS AVFOP 4-6 October 2 0 11 Avionics, Fiber Optics and Photonics CONFERENCE

Holiday Inn On The Bay | San Diego, CA USA

General Chair: Praveen Anumolu, ASR International, USA

Program Chair: Bill Jacobs, SPAWAR Systems Center Paciﬁc, USA

Exhibits Chair: John Gallo, Xadair Technologies, USA

PAPER SUBMISSION DEADLINE: 2 June 2011

PRE-REGISTRATION DEADLINE: Sponsored by 2 September 2011

www.PhotonicsConferences.org

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 35 Conference Section (cont’d) Forthcoming Events with ICO Participation

Below is a list of events with ICO participation that are India coming up. For further information, see www.ico-optics. Contact: Sunil Khijwania; org/events.html. tel + 91 361-2582716; fax + 91 361-2582749, 17–21 October [email protected] Transparent Conductive Materials (TCM 2010) www.iitg.ernet.in/photonics2010 Crete, Greece Contact: George Kiriakidis, 31 January–11 February 2011 tel +302810391271, fax +302810391306, ICTP Winter College on Optics in Imaging Science [email protected] Trieste, Italy www.tcm2010.org Contact: ICTP Secretariat, tel +39 040-2240-9932; 26–29 October fax +39 040-2240-7932; Annual Meeting of the European Optical [email protected] Society (EOS AM 2010) Paris, France 3–7 May 2011 Contact: Silke Kramprich, International Conference on Applications of tel +49 511-2788-117, Optics and Photonics [email protected] Braga, Portugal www.myeos.org/eosam2010 Contact: Manuel Filipe Pereira da Cunha Martins Costa, tel 00351253 604070/604320; 26–29 October fax 00351253604061, ICO/EOS Topical Meeting on Optics & Energy (TOM 7) [email protected] Paris, France www.spidof.pt/AOP Contact: Maria Calvo, tel +34 91-394 4684, 18–20 May 2011 [email protected] Information Photonics (IP 2011) www.myeos.org/events/eosam2010-TOM7 Ottawa, Canada Contact: Pavel Cheben, 11–15 December tel 1-613-9931624, International Conference on Fiber Optics and Photonics fax 1-613-9907656, (Photonics 2010) [email protected]

“Nick” Cartoon Series by Christopher Doerr

36 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Publication Section

Call for Papers

Announcing an Issue of the IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS on Nonlinear-Optical Signal Processing Submission Deadline: November 14, 2010

The IEEE Journal of Selected Topics in Quantum Electronics invites contributions of original papers in the area of nonlinear- optical signal processing. All-optical processing of high-speed signals, enabled by nonlinear-optical devices, is a critical function for future optical communication, computing, and military applications. Progress in nonlinear materials, such as highly nonlinear fibers, photonic- crystal structures, silicon and chalcogenide waveguides, quasi-phase-matched crystals etc., has led to the reduction of the powers required for nonlinear-optical signal processing down to levels compatible with compact semiconductor lasers, and has paved the way to on-chip integration of such processing devices and systems. These advances enable the development of novel optical signal processing architectures and schemes that can bring nonlinear-optical signal processing to practical deployment. The purpose of this issue of JSTQE is to document the state of the art and recent developments in the field, from both experimental and theoretical perspectives. Solicitation topics include (but are not limited to): Nanophotonic nonlinear-optical devices Optical data format conversion Nonlinear-optical applications of plasmonics Optical limiting Nonlinear processing systems on-a-chip 2R and 3R regeneration Quantum information processing All-optical clock recovery Phase-sensitive amplification All-optical switching / gating Phase conjugation Parallel multi-wavelength processing Wavelength conversion Optical buffering Frequency translation Optical burst / packet switching Frequency comb generation All-optical OTDM multiplexing / demultiplexing / sampling Nonlinear pulse shaping Optical bi-stability The Guest Editors for this issue are: Michael Vasilyev (University of Texas at Arlington, USA), Yikai Su (Shanghai Jiao Tong University, China), and Colin J. McKinstrie (Alcatel-Lucent Bell Labs, USA). The deadline for submission of manuscripts is November 14, 2010; printed publication is scheduled for November/December 2011. JSTQE aims for rapid time from submission to online publication. Ideally, accepted papers will be posted online at the IEEE Xplore website within 6 weeks after the authors have uploaded their Final Files, if there are no page proof corrections. Online submission is mandatory at: http://mc.manuscriptcentral.com/pho-ieee . Please select the Journal of Selected Topics in Quantum Electronics from the drop down menu. All submissions will be reviewed in accordance with the normal procedures of the Journal. For inquiries regarding this special Nonlinear-Optical Signal Processing Issue, please contact: JSTQE Editorial Office - Chin Tan Lutz IEEE/Photonics Society, 445 Hoes Lane, Piscataway, NJ 08854, USA Phone: 732-465-5813, e-mail: [email protected] The following supporting documents are required during manuscript submission: 1) PDF or MS Word manuscript (double-columned, 12 pages for an Invited Paper, 8 pages for a Contributed Paper). Manuscripts over the standard page limit will have an overlength charge of $220.00 imposed per page. Biographies of ALL authors are mandatory, photos are optional. You may find the Tools for Authors link useful: http://www.ieee.org/web/publications/authors/transjnl/index.html 2) Completed IEEE Copyright Form. Copy and paste the link below: http://www.ieee.org/web/publications/rights/copyrightmain.html 3) Completed Color Agreement/decline form. Please e-mail [email protected] to request this form. 4) MS Word document list of ALL Authors’ FULL Contact information as stated below: Last name (Family name): / First name: Suffix (Dr./Prof./Ms./Mr.): / Affiliation: / Dept. / Address: / Telephone: / Fax: / E- mail: / Alternative E-mail:

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 37 Publication Section (cont’d)

Announcing an Issue of the IEEE Journal Of Selected Topics In Quantum Electronics On Preliminary Call For Papers on Semiconductor Lasers *** Submission Deadline: December 1, 2010 *** The IEEE Journal of Selected Topics in Quantum Electronics invites manuscript submissions in the area of semiconductor lasers. The purpose of this issue of JSTQE is document the current state of the art in semiconductor lasers through a collection of original papers. Although the issue will serve as a venue for publication of full-length journal papers expanding upon talks presented at the 2010 International Semiconductor Laser Conference, the issue is open to any relevant submissions in the semiconductor laser field. Possible topics for this issue include but are not necessarily limited to: high-speed VCSELs high-speed edge-emitting lasers laser dynamics high power lasers with extra features short pulse sources micro- and nanolasers dilute-nitride lasers short wavelength and visible lasers quantum dot/wire lasers photonic crystal lasers lasers on new semiconductor compounds tunable lasers lasers in photonic integrated circuits quantum cascade and mid-IR lasers THz lasers The Primary Guest Editor for this Issue is Prof. Luke F. Lester of the University of New Mexico, USA. The Guest Co-Editors include Dr. Vassilios Kovanis of the Air Force Research Laboratory and Dr. Yuichi Tohmori of NTT Electronics Corp., Japan. The deadline for submission of manuscripts is December 1, 2010 and publication is scheduled July/August 2011. *Please note: Accepted papers will be rapid posted online in IEEE Xplore ideally within six weeks after author has uploaded his/her final files, pending no page proof corrections. Online Submission is Mandatory at: http://mc.manuscriptcentral.com/pho-ieee. Please select the Journal of Selected Topics Of Quantum Electronics Journal from the drop down menu. For any questions about this Special Issue, please contact: Chin Tan Lutz IEEE/Photonics Society JSTQE Publication Coordinator 445 Hoes Lane Piscataway, NJ 08854 USA Phone: 732-465-5813 Email: [email protected] The following supporting documents are required during manuscript submission: 1) MS Word or PDF formatted manuscript (double columned, 12 pages for an Invited Paper. Contributed paper should be double columned, 8 pages in length before overlength page charges of $220.00 per page are levied. Authors of papers that appear to be overlength are notified and given the option to shorten the paper. Additional charges will apply if color figures are required.) Bios of ALL authors are mandatory, photos are optional. You may find the Tools for Authors link useful: http://www.ieee.org/web/ publications/authors/transjnl/index.html 2) Completed the IEEE Copyright Form. Copy and paste the link below: http://www.ieee.org/web/publications/rights/ copyrightmain.html 3) Completed Color Agreement/decline form. If your paper is accepted, you may have it in color, online in our IEEE Explore site for free. However, if you wish for color in print, please check of the appropriate Agree/decline box. (Please email c.tanlutz@ ieee.org to request for this form.) 4) MS Word list of ALL Authors FULL Contact information as stated below: Last name (Family name): /First name:Suffix (Dr./Prof./Ms./Mr): /Affiliation: /Dept: /Address: /Telephone: /Fax: /Email: / Alternative Email:

38 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Publication Section (cont’d)

CALL FOR PAPERS IEEE Sensors Journal Special issue on Sensors for Non-Invasive Physiological Monitoring

A modern health diagnostic approaches evolve, clinicians increasingly rely on modern sensor tools to aid in patient care. Engineering approaches to non-invasive physiological monitoring have the potential to revolutionize the ways that doctors can diagnose and manage complex patient health care issues, and this can result in increased standards of health care. Technologies that allow for non-invasive physiological monitoring will need to incorporate novel sensors that will meet a range of engineering design challenges. This special topics issue will explore novel sensors and methods that are currently being researched and developed in academic, national laboratories and industrial settings. Original research contributions, tutorials and review papers are sought in non-invasive physiological monitoring areas including (but not limited to): · Non-contact respiration and heart rate · System level designs for hand-held measurements mobile breath sensing systems · Chemical sensors for metabolite monitoring in · Imaging approaches for diagnostics human effluents · Rapid and non-invasive stress · Informatics approaches to interpret sensor measurement devices outputs for health diagnostics · Neuro-physiology · Signal processing · Non invasive and wearable devices · Metrology aspects · Tactile or galvanic skin sensors

Solicited and invited papers shall undergo the standard IEEE Sensors Journal peer review process. All manuscripts must be submitted on-line using the IEEE Sensors manuscript template and Information for Authors, via the IEEE Manuscript CentralTM found at http://mc.manuscriptcentral.com/sensors. Upon submission, authors should select the “Sensors for Non-Invasive Physiological Monitoring” manuscript type instead of “Regular Paper.” Authors for this Special Issue are encouraged to suggest names of potential reviewers for their manuscripts in the space provided for these recommendations in Manuscript Central. Deadlines: Manuscript Submission: 01 November 2010 Notification of Acceptance: February 2011 Final Manuscript due: April 2011 Tentative publication date: July 2011 Guest Editors:

Aimé Lay-Ekuakille Olfa Kanoun Università del Salento (Italy) Technische Universität Chemnitz (Germany) [email protected] [email protected]

Cristina Davis Zhihong Li University of California, Davis (USA) Peking University (China) [email protected] [email protected]

Antonio Trabacca IRCCS “Eugenio Medea” Scientific Institute – LNF (Italy) [email protected]

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 39 Publication Section (cont’d)

Announcing a Special Issue of the IEEE/OSA Journal of Display Technology in Association with the 29th IEEE International Conference on Consumer Electronics (ICCE 2011) Display Technologies for Consumer Electronics

Deadline for Abstracts (2-page IEEE format) – 31st July 2010 Deadline for Full Manuscripts – 15th January 2011

Submissions are invited of 2-page extended abstracts for presentation at ICCE 2011, to be followed by full manuscripts and subsequent publication in a special issue of the Journal of Display Technology. Submissions are open on any topic which is relevant to modern Consumer Electronic devices, systems or services but the focus should be on the display technology and its relevance or significance for CE. Topics for which submissions are particularly welcome include 3D and immersive display technology; low power and energy efficient displays; eBook and micro-projector displays; im- provements in current display technologies; novel and emerging technologies which are relevant for next-generation CE products. Extended abstracts – 2 pages in IEEE format – may be submitted up to the 31st July for presentation in a number of special sessions at ICCE 2011 to be held immediately after Jan CES in Las Vegas. ICCE is where key technologies, services, devices and architectures for consumer entertainment and information delivery are first presented. Full papers based on accepted abstracts – up to 12 pages IEEE format – may also be submitted by mid-January and will be considered for publication in a special issue of the JDT later in 2011. Guest Editors for this issue are Dr. Atul Batra of Marvell Semiconductors Inc., Prof Uwe E. Kraus of the University of Wuppertal and Dr Peter Corcoran of the National University of Ireland, Galway. Associate Guest Editors are Dr. Wang-He Lou of Mitsubishi Digital Electronics America and William Rowe of WA Rowe Consultancy. All submissions will be reviewed in accordance with the normal procedures of the Journal and ICCE 2011. Two page conference digest papers will be published in the Proceedings of ICCE 2011 and full manuscripts should be submitted by 15th January 2011. Manuscripts which are not submitted to ICCE may be considered for publication in this special issue, but preference will be given to manuscripts which are initially presented at the conference. The IEEE Copyright Form should be submitted after acceptance. For ICCE digest papers details can be found on http:// www.icce.org. For full manuscripts the form will appear online in the Author Center in Manuscript Central after an acceptance decision has been rendered. For all papers published in JDT, there are voluntary page charges of $110.00 per page for each page up to eight pages. Invited papers can be twelve pages in length before overlength page charges of $220.00 per page are levied. The length of each paper is estimated when it is received. Authors of papers that appear to be overlength are notified and given the option to shorten the paper. Authors may opt to have figures displayed in color on IEEE Xplore at no extra cost, even if they are printed in black and white in the hardcopy edition. Additional charges will apply if figures appear in color in the hardcopy edition of the Journal. Extended abstracts should first be submitted to http://www.icce.org by July 31st 2010. Following acceptance full manuscripts should be submitted electronically through IEEE’s Manuscript Central: http://mc.manuscriptcentral.com/jdt-ieee. Be sure to select “2011 Display Technologies for Consumer Electronics” as the Manuscript Type, rather than “Original Paper.” This will ensure that your paper is directed to the special issue editors. IEEE Tools for Authors are available online at: http://www.ieee.org/organizations/pubs/transactions/information.htm Inquiries can be directed to Lisa Jess, Publications Administrative Assistant, IEEE Photonics Society Editorial Office, [email protected] (phone +1-732-465-6617; fax +1 732 981 1138).

40 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Publication Section (cont’d)

May 15-19, 2011 http://www.ofs21.org

Conference Chair:

Prof. Wojtek J. Bock University of Québec

Technical Programme CALL FOR PAPERS Committee Co-Chairs:

Prof. Jacques Albert Carleton University OFS21 will embrace all research into guided wave optics for instrumentation, sensing and imaging, and its applications in physical, chemical and biological measurements. The scope Prof. Xiaoyi Bao extends from relevant theory and fundamental science to engineering realization. University of Ottawa Contributed papers will be presented both orally and in poster sessions at the discretion of the Technical Programme Committee.

Director of operations: Original paper submissions dealing with the following topics are invited to be considered for Dr. Mike Scott presentation at the Conference Canadian Photonics : Consortium 1. Closing the Gap Between Theory, Development and Applications a) Novel sensing modalities for distributed and point sensors b) New fiber and coating materials for sensing Local Organizing c) Micro- and Nano-structured fiber sensors Committee: d) Sensor characterization and specifications Dr. Boris Elenkrig e) Sensor interrogation systems and techniques OntarioCentres of Excellence f) Sensor multiplexing and large sensor arrays g) Sensor reliability, field tests and standardization Nicole Lamoureux Ottawa Centre for Research and Innovation 2. Society Issues in the 21st Century a) Geophysical sensors Dr. Kexing Liu b) Structural Health Monitoring EcoVu c) Aerospace, automotive and marine engineering Kathy Mahoney d) Environmental sensors for air and water Ottawa Centre for Research e) Biomedical sensors and Innovation f) Sensors for harsh environments Dr. Mateusz Smietana g) Intrusion, transportation and border security University of Québec A 4-page paper and a separate 100 word abstract must be submitted electronically via the Dr. George Xiao OFS21 website, where full instructions can be found. NRC Ottawa Dr. Jessica Zhang The firm deadline for submission is 21 October 2010. Canadian Microelectronics Corporation All submissions will be reviewed by The OFS21 Technical Program Committee. Notification Andrzej Zlotorzynski of acceptance will be by 31 January 2011. Accepted abstracts will be included in the University of Ottawa Conference Programme and the papers will be published in the Conference Proceedings by SPIE.

Contributors to OFS21 are also invited to submit their expanded papers to a Special Issue of IEEE/OSA Journal of Lightwave Technology. Papers will be subject to the same high standards of the peer review as regular submissions to the Journal. The deadline for submissions to the Special Issue is 30 June 2011.

A Student Paper Contest will be held with cash awards for the best papers

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42 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 “IEEE Standards Online gives us access to up-to-date standards with minimal effort.”

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IEEE Information Driving Innovation

October 2010 IEEE PHOTONICS SOCIETY NEWSLETTER 43 ADVERTISER’S INDEX The Advertiser’s Index contained in this issue is IEEE Photonics compiled as a service to our readers and advertisers. The publisher is not liable for errors or omis- sions although every effort is made to ensure its Society Newsletter accuracy. Be sure to let our advertisers know you found them through the IEEE Photonics Society Advertising Sales Offices Newsletter. 445 Hoes Lane, Piscataway NJ 08854 Advertiser ...... Page # www.ieee.org/ieeemedia Impact this hard-to-reach audience in their own Society Optiwave Systems Inc ...... CVR2 publication. For further information on product and Rsoft Design Group ...... 3 recruitment advertising, call your local sales office.

California scientific, inc...... 4 MANAGEMENT Midwest/Ontario, Canada New England/ James A. Vick Eastern Canada Elsevier, Inc...... 5 Will Hamilton Staff Director, Advertising John Murphy John Restchack Phone: 212-419-7767 Optimax Systems, Inc...... 15 Phone: 269-381-2156 Phone: 212-419-7578 Fax: 212-419-7589 Fax: 269-381-2556 Fax: 212-419-7589 [email protected] IEEE Marketing ...... CVR3 [email protected] [email protected] [email protected] ME, VT, NH, MA, RI Susan E. Schneiderman General Photonics ...... CVR4 IN, MI. Canada: Ontario Canada: Quebec, Business Development Nova Scotia, Manager Prince Edward Island, Phone: 732-562-3946 Southwest Newfoundland, Fax: 732-981-1855 Shaun Mehr New Brunswick [email protected] Phone: +1 949 923 1660; Photonics Society Fax: +1 775 908 2104 Marion Delaney Southeast [email protected] Mission Statement Advertising Sales Director Cathy Flynn AR, LA, OK, TX Photonics Society shall advance the interests Phone: 415-863-4717 Phone: 770-645-2944 of its members and the laser, optoelectronics, Fax: 415-863-4717 Fax: 770-993-4423 and photonics professional community by: [email protected] West Coast/ Northwest/ [email protected] • providing opportunities for information Western Canada VA, NC, SC, GA, FL, AL, PRODUCT MS, TN exchange, continuing education, and Marshall Rubin ADVERTISING Phone: +1 818 888 2407; professional growth; Midatlantic Fax: +1 818 888 4907 Midwest/Texas/ • publishing journals, sponsoring confer- Lisa Rinaldo [email protected] Central Canada ences, and supporting local chapter and Phone: 732-772-0160 Fax: 732-772-0161 AZ, CO, HI, NM, NV, Darcy Giovingo student activities; [email protected] UT, AK, ID, MT, WY, Phone: 847-498-4520 • formally recognizing the professional NY, NJ, PA, DE, MD, DC, OR, WA, CA. Canada: Fax: 847-498-5911 contributions of members; KY, WV British Columbia [email protected]; • representing the laser, optoelectronics, AR, IL, IN, IA, KS, LA, New England/ MI, MN, MO, NE, ND, Europe/Africa/Middle East and photonics community and serving as Eastern Canada SD, OH, its advocate within the IEEE, the broader Jody Estabrook Heleen Vodegel OK, TX, WI. scientific and technical community, and Phone: 774-283-4528 Phone: +44-1875-825-700 Canada: Ontario, Fax: +44-1875-825-701 society at large. Fax: 774-283-4527 Manitoba, Saskatchewan, [email protected] [email protected] Alberta ME, VT, NH, MA, RI, CT Europe, Africa, Middle East Photonics Society Canada: Quebec, Nova Scotia, Newfoundland, Prince Edward West Coast/Southwest/ Field of Interest Island, New Brunswick Asia/Far East/ Mountain States/Asia The Field of Interest of the Society shall be la- Pacific Rim Tim Matteson sers, optical devices, optical fibers, and associat- Southeast Susan Schneiderman Phone: 310-836-4064 ed lightwave technology and their applications Thomas Flynn Phone: 732-562-3946 Fax: 310-836-4067 in systems and subsystems in which quantum Phone: 770-645-2944 Fax: 732-981-1855 [email protected] Fax: 770-993-4423 AZ, CO, HI, NV, NM, electronic devices are key elements. The Society [email protected] [email protected] Asia, Far East, Pacific Rim, UT, CA, AK, ID, MT, is concerned with the research, development, VA, NC, SC, GA, FL, AL, Australia, New Zealand WY, OR, WA. design, manufacture, and applications of ma- MS, TN Canada: British Columbia terials, devices and systems, and with the vari- Midwest/Central Canada RECRUITMENT ous scientific and technological activities which Dave Jones ADVERTISING Europe/Africa/ contribute to the useful expansion of the field of Phone: 708-442-5633 Midatlantic Middle East quantum electronics and applications. Fax: 708-442-7620 Lisa Rinaldo Heleen Vodegel The Society shall aid in promoting close coop- [email protected] Phone: 732-772-0160 Phone: +44-1875-825-700 Fax: 732-772-0161 Fax: +44-1875-825-701 eration with other IEEE groups and societies IL, IA, KS, MN, MO, NE, ND, SD, WI, OH [email protected] [email protected] in the form of joint publications, sponsorship Canada: Manitoba, NY, NJ, CT, PA, DE, MD, Europe, Africa, of meetings, and other forms of information Saskatchewan, Alberta DC, KY, WV Middle East exchange. Appropriate cooperative efforts will also be undertaken with non-IEEE societies.

44 IEEE PHOTONICS SOCIETY NEWSLETTER October 2010 Can tactile computing prevent a car accident?

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