Inorganic Seminar Abstracts

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Inorganic Seminar Abstracts C 1 « « « • .... * . i - : \ ! -M. • ~ . • ' •» »» IB .< L I B RA FLY OF THE. UN IVERSITY Of 1LLI NOIS 546 1^52-53 Return this book on or before the Latest Date stamped below. University of Illinois Library «r L161— H41 Digitized by the Internet Archive in 2012 with funding from University of Illinois Urbana-Champaign http://archive.org/details/inorganicsemi195253univ INORGANIC SEMINARS 1952 - 1953 TABLE OF CONTENTS 1952 - 1953 Page COMPOUNDS CONTAINING THE SILICON-SULFUR LINKAGE 1 Stanley Kirschner ANALYTICAL PROCEDURES USING ACETIC ACID AS A SOLVENT 5 Donald H . Wilkins THE SOLVENT PHOSPHORYL CHLORIDE, POCl 3 12 S.J. Gill METHODS FOR PREPARATION OF PURE SILICON 17 Alex Beresniewicz IMIDODISULFINAMIDE 21 G.R. Johnston FORCE CONSTANTS IN POLYATOMIC MOLECILES 28 Donn D. Darsow METATHESIS IN LIQUID ARSENIC TRICHLORIDE 32 Harold H. Matsuguma THE RHENI DE OXIDATION STATE 40 Robert L. Rebertus HALOGEN CATIONS 45 L.H. Diamond REACTIONS OF THE NITROSYL ION 50 M.K. Snyder THE OCCURRENCE OF MAXIMUM OXIDATION STATES AMONG THE FLUOROCOMPLEXES OF THE FIRST TRANSITION SERIES 56 D.H. Busch POLY- and METAPHOSPHATES 62 V.D. Aftandilian PRODUCTION OF SILICON CHLORIDES BY ELECTRICAL DISCHARGE AND HIGH TEMPERATURE TECHNIQUES 67 VI. £, Cooley FLUORINE CONTAINING OXYHALIDES OF SULFUR 72 E.H. Grahn PREPARATION AND PROPERTIES OF URANYL CARBONATES 76 Richard *• Rowe THE NATURE OF IODINE SOLUTIONS 80 Ervin c olton SOME REACTIONS OF OZONE 84 Barbara H. Weil ' HYDRAZINE BY ELECTROLYSIS IN LIQUID AMMONIA 89 Robert N. Hammer NAPHTHAZARIN COMPLEXES OF THORIUM AND RARE EARTH METAL IONS 93 Melvin Tecotzky THESIS REPORT 97 Perry Kippur ION-PAIR FORMATION IN ACETIC ACID 101 M.M. Jones IRON VERSENATES 105 R.L. Rebertus AMPHOTERISM IN NON-AQUEOUS SYSTEMS 110 Harold J. Matsuguma PLACE IN THE PERIODIC SYSTEM OF THE HEAVIEST ELEMENTS 115 Ervin Col ton COMPLEX ANION DETERMINATION BY ION EXCHANGE 121 M.K. Snyder THE NATURE OF THE FRIEDEL-CRAFTS COMPLEX 124 Clayton T. Els ton ACID-BASE BEHAVIOR IN INERT SOLVENTS 127 Daryle H. Busch METAL-DIAMINE CHELATE COMPOUNDS CONTAINING HIGHER-MEHBERED RINGS 135 William E. Cooley CYCLOPENTADIENYL COMPLEXES 139 Victor D. Af tandilian DISULFUR HEPTOXIDE 144 A.B. Galun SULFANURIC CHLORIDE 147 L.H. Diamond ROLL CALL - THALLIUM TRI IODIDE 149a Robert H. Marshall PREPARATION OF COPPER HYDRIDE IN AQUEOUS MEDIUM 150 N.rl. Bojars INORGANIC PAPER CHROMATOGRAPHY 154 Mary Joan Sirotek INORGANIC COLUMN CHROMATOGRAPHY 161 S.a. Bartkiewicz AMMONOLYSIS AND AMINOLYSIS OF SOME SUBSTITUTED SILICON HALIDES 164 A.S. Hay THESIS REPORT 167 Niels C. Nielsen THESIS REPORT - THE SYNTHESIS OF HYDRAZINE 168 Roger W, Sanftner -3- P.A. Horrigan 170 THE LITERATURE OP JNOHJAMIC CHEMISTRY COMPOUNDS CONTAINING THE SILICON-SULFUR LINKAGE Stanley Kirschner September 30, 1952 1« Nomenclature At a recent conference of the International Union of Pure and Applied Chemistry (5) , it was decided that since the term "silicone" had been taken over as a trade name by industry, it no longer had a place in systematic nomenclature. At this same meeting a nomenclature for organo-silicon compounds was presented,. It was decided that prefixes such as di- and tri- would be used to designate the number of silicon atoms present in a compound. Some examples are: A - Silanes 1* SiH* is silane* 2» H 3 Si-SiH 3 is d.isilane* B - Silazanes 1. H 3 Si-PJH-SiH 3 is disilazane. C - Silthianes 1. H 3 Si-S-SiH 3 is disilthiane* 1) - Siloxanes 1, H 3 Si-0~SiH 3 is dilsiloxane. E - Hydroxy Derivatives 1. H 3 SiOH is silanol. 2. H 2 Si('0H) 2 is silandiol. 3. H 3 Si-0~SiH 2 0H' is dislloxanol. For a more comprehensive survey of organo-silicon nomenclature, the reader is referred to reference (5) . 2« Historical Summary Until as recently as ten years ago there were less than about a dozen known compounds which contained the silicon-sulfur linkage. The best characterized of these were: (a) silicon disulfide, SiS 2, which was prepared (9) by heating a mixture of silicon, carbon, and carbon disulfide; (b) silicon monosulfide, SiS, and (c) silicon oxy sulfide, SiOS, which were prepared simultaneously (4,12) by heating silicon and sulfur vapor in a porcelain reaction tube; (d) , silicon thiochloricle SiSCl 2 , which" was formed (2) along with SiS 2 and SiCl 4 by passing sulfur mono- chloride over crystallized silicon in a heated tube; (e) silicon thiobromide, SiSBr 2 , which was prepared (1,11) by the reaction 150oC. between SiBr* and H 2 S at with an A13r 3 catalyst; "(f) sili- con chlorohydrosulfide, SiCl 3 SH (today called trichloro-thio- silanol), which was formed (11,8) by heating a mixture of SiCl 4 and H 2 S in a porcelain tube; and (g) silicothiourea, SiS(NH 2 ) 2 , 4 • '.'," '.. .. .'....., . -*» ; -2- which was prepared (l) by the reaction between SiSBr 2 and gaseous NH 3 in anhydrous benzene; the M-I 4 Br produced was removed by washing with liquid ammonia. 3* decent Developments in the Chemistry of Compounds Containing the Silicon-Sulfur Linkage In 1950, Eaborn (6,7) described what he believed to be the first organosilicon sulfides to be reported. (However, Friedel and Ladenburg (8) described the preparation of Si(0C 2H 5 ) 3 SH in 1872). These compounds are hexaethyl- and hexamethyldisilthiane, which were prepared as products in a conversion series developed by Eaborn, The series is: 3 -> R 3 SiI -> (R 3 Si) 2 S -> R 3 SiBr -^SiH)-^ ^^-* R 3 SiNCS -> R 3 SiNC0 ( (R 3 Si) 2 o) H3 SiP J J Any compound in the series may be converted to any other on its right by heating with the appropriate silver salt. The yields are frequently better than 90$, and the reverse conversions do not seem to occur. For example, the hexa-alkyldi silthianes were prepared by heating the corresponding trialkyliodosilane with Ag2S. Eaborn states that the silthianes are the sulfur analogues of the siloxanes, but they are (a) less stable (thermally) than the siloxanes, and (b) completely hydrolyzed when brought into solution. He feels that this is due largely to a weaker bond between silicon and sulfur than between silicon and oxygen, and he cites the values for the heats of formation of the Sl-S bond and the Si-0 bond given in Sidgwick (13) in support of his ideas: Heats of Formation of Links from Atoms (H a ) Si-0 89.3 kcal/mole Si~S 60,9 kcal/mole However, Eaborn prepared these di silthianes from trialkyl- iodosilanes, and, according to Larsson and Marin (10), these are rather difficult to obtain. They, therefore, devised a method for the preparation of hexaethyldisilthiane which does not involve any of the iodosilanes. They report that, after passing H 2 S through (C 2H s ) 3 SirJH 2 (163 grams) for several hours," they obtained 34.5 g of (C 2H 5 ) 3 SiSH and 95,2 g of (C 3H 5 ) 3 S5>S"~Si(C 2 H 5 ) 3 . In addition, they found that similar treatment on tr'i-n-propyl- aminosilane gave tri-n-propylthiosilanol and hexa-n-propyldisil- thiane . The methyl derivatives were not prepared because the authors were unable to prepare the starting material, trimethylaminosilane© . I '.)•' . 5 -3- - Champetier, Etienne, and Kullman (3) continued the study of silicon-sulfur compounds and have recently described the prepara- tion of some silan thiols and " thiosilicones"* Although Friedel and Ladenburg (8) had been able to prepare trichlorothiosilanol by heating SiCl 4 and H 2S above 600°, a method utilizing so^'high a temperature could not be used in the preparation of organo- silicon compounds, so the authors reacted alkali and alkaline earth hydro sulfides with alkylhalosilanes to prepare the alkyl- thiosilanols. For example, the authors reacted H S S with a Grignard Reagent to get a magnesium hydrosulf ide: 2H 2 S + 2RMgX -> (HS) 2 Mg'MgX a + 2RH which was reacted with the trie thy lhalosilane (C 2H 5 ) 3 SiY, The products were (C 2H 5 ) 3 SiX (when the halogen Y was classified before the halogen X in the series F, Ql, Br, I) and hexaethyldisilthiane! 1, 2(C s H 5 ) 3 SiY +,MgX 2 -+2(C 2 H 5 ) 3 SiX + MgY 2 r or 2 + %^H) s -^2(C 2H 5 ) 3 SiSH + '(2(C 2H") 3 iiY)° ^J -> 3. 2(C 2H 5 ) 3 SiSH (G 2H 5 ) 3 Si-S-Si(G 2 H 5 ) 3 + H 2 S In order to obtain trimethyl thiosilanol with only a small percentage of the hexamethyldisilthiane, LiSH was used in place of a magnesium compound: LiR + H 2 S *hJ LiSH + RH — 6H 5 0H 3 When 0,75 moles of LiSH was treated with C % 5 moles of trimethyl- chlorosilane at room temperature, a 48^ yield of (CH 3 ) 3 SiSH and only a small quantity of hexamethyldisilthiane were obtained upon fractional distillation* These authors also report that a convenient way to obtain a high yield of various disilthianes is to react an alkylhalosilane with H a S in the presence of pyridine: 2(C 2H s ) 3 SiCl + H 2 S + 2G 6H 5 k-+ (C 2 H 5 ) 3 Si-S-Si (G 2 H 5 ) 3 + 2C 6H 4 N.HC1 Diethyldichlorosilane leads to tetraethylcyclodisilthiane room C 2H 5 ^S v ^G 2 H 5 + 2H + H + H N.HC1 2(G 2H 5 ) 2 SiCl 3 2 S 4C 6 5 N ^L Si ^Si v 4G 6 5 (in petroleum dry ' ' C 2H S ^S"" G 2 H 5 ether) in a 78% yield, which the authors claim is the first example of a " thiosilicone" , and which is similar in structure to silicon disulfide: .Si £i Si ^ XS^ x s^ ^ A great deal of additional investigation remains to be carried out in the field of silicon-sulfur chemistry, as can be seen from the following tabulation of the few silicon-sulfur compounds which have been reported.
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