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Durham E-Theses
Durham E-Theses A spectroscopic study of some halogeno-complexes of tellurium (IV) Gorrell, Ian Barnes How to cite: Gorrell, Ian Barnes (1983) A spectroscopic study of some halogeno-complexes of tellurium (IV), Durham theses, Durham University. Available at Durham E-Theses Online: http://etheses.dur.ac.uk/7890/ Use policy The full-text may be used and/or reproduced, and given to third parties in any format or medium, without prior permission or charge, for personal research or study, educational, or not-for-prot purposes provided that: • a full bibliographic reference is made to the original source • a link is made to the metadata record in Durham E-Theses • the full-text is not changed in any way The full-text must not be sold in any format or medium without the formal permission of the copyright holders. Please consult the full Durham E-Theses policy for further details. Academic Support Oce, Durham University, University Oce, Old Elvet, Durham DH1 3HP e-mail: [email protected] Tel: +44 0191 334 6107 http://etheses.dur.ac.uk A SPECTROSCOPIC STUDY OF SOME HALOGENO- COMPLEXES OF TELLURIUM (IV) by Ian Barnes Gorrell A thesis submitted in part fulfilment of the requirements for the degree of Master of Science in the University of Durham. The copyright of this thesis rests with the author. April 19 8 3 No quotation from it should be published without his prior written consent and information derived from it should be acknowledged. -5. OFC. 1983 TO MY MOTHER and MY FATHER1 S MEMORY' iii ACKNOWLEDGMENTS I wish to express my gratitude towards the late Professor T.C. -
Chemical Names and CAS Numbers Final
Chemical Abstract Chemical Formula Chemical Name Service (CAS) Number C3H8O 1‐propanol C4H7BrO2 2‐bromobutyric acid 80‐58‐0 GeH3COOH 2‐germaacetic acid C4H10 2‐methylpropane 75‐28‐5 C3H8O 2‐propanol 67‐63‐0 C6H10O3 4‐acetylbutyric acid 448671 C4H7BrO2 4‐bromobutyric acid 2623‐87‐2 CH3CHO acetaldehyde CH3CONH2 acetamide C8H9NO2 acetaminophen 103‐90‐2 − C2H3O2 acetate ion − CH3COO acetate ion C2H4O2 acetic acid 64‐19‐7 CH3COOH acetic acid (CH3)2CO acetone CH3COCl acetyl chloride C2H2 acetylene 74‐86‐2 HCCH acetylene C9H8O4 acetylsalicylic acid 50‐78‐2 H2C(CH)CN acrylonitrile C3H7NO2 Ala C3H7NO2 alanine 56‐41‐7 NaAlSi3O3 albite AlSb aluminium antimonide 25152‐52‐7 AlAs aluminium arsenide 22831‐42‐1 AlBO2 aluminium borate 61279‐70‐7 AlBO aluminium boron oxide 12041‐48‐4 AlBr3 aluminium bromide 7727‐15‐3 AlBr3•6H2O aluminium bromide hexahydrate 2149397 AlCl4Cs aluminium caesium tetrachloride 17992‐03‐9 AlCl3 aluminium chloride (anhydrous) 7446‐70‐0 AlCl3•6H2O aluminium chloride hexahydrate 7784‐13‐6 AlClO aluminium chloride oxide 13596‐11‐7 AlB2 aluminium diboride 12041‐50‐8 AlF2 aluminium difluoride 13569‐23‐8 AlF2O aluminium difluoride oxide 38344‐66‐0 AlB12 aluminium dodecaboride 12041‐54‐2 Al2F6 aluminium fluoride 17949‐86‐9 AlF3 aluminium fluoride 7784‐18‐1 Al(CHO2)3 aluminium formate 7360‐53‐4 1 of 75 Chemical Abstract Chemical Formula Chemical Name Service (CAS) Number Al(OH)3 aluminium hydroxide 21645‐51‐2 Al2I6 aluminium iodide 18898‐35‐6 AlI3 aluminium iodide 7784‐23‐8 AlBr aluminium monobromide 22359‐97‐3 AlCl aluminium monochloride -
Chapter 2. Selenium- and Tellurium-Halogen Reagents
Chapter 2. Selenium- and Tellurium-Halogen Reagents Tristram Chivers a and Risto S. Laitinen b a Department of Chemistry, University of Calgrary, 2500 University Drive NW, Calgary, Alberta, Canada T2N 1N4 b Laboratory of Inorganic Chemistry, Environmental and Chemical Engineering, University of Oulu, P.O. Box 3000, 90014 Oulu, Finland Table of Contents 2.1 Scope and Introduction 2.2 Binary Chalcogen-Halogen Reagents 2.2.1 Selenium Tetrahalides 2.2.2 Selenium Oxychloride 2.2.3 Selenium Dihalides 2.2.4 Selenium Dihalides 2.2.5 Mixtures of Selenium Halides 2.2.6 Tellurium Tetrahalides 2.2.7 Tellurium Tetrahalides and Ditellurium Dihalides 2.3 Organochalcogen-Halogen Reagents 2.3.1 Organoselenium and -tellurium Trihalides 2.3.2 Diorganoselenium and -tellurium Dihalides 2.3.3 Mixed-valent State Compounds RTeX2TeR 2.3.4 Organoselenium and -tellurium Monohalides 2.4 Conclusions 2.5 References 1 Abstract Selenium and tellurium form binary halides in which the chalcogen can be in formal oxidation states (IV), (II) or (I). They are versatile reagents for the preparation of a wide range of inorganic and organic selenium and tellurium compounds taking advantage of the reactivity of the chalcogen- halogen bond. With the exception of the tetrafluorides, the tetrahalides are either commercially available or readily prepared. On the other hand, the low-valent species, EX2 (E = Se, Te; X = Cl, Br) and E2X2 (E = Se, Te; X = Cl, Br) are unstable with respect to disproportionation and must be used as in situ reagents. Organoselenium and tellurium halides are well-known in oxidation states (IV) and (II), as exemplified by REX3, R2EX2, and REX (R = alkyl, aryl; E = Se, Te; X = F, Cl, Br, I), as well as mixed-valent (IV/II) compounds of the type RTeX2TeR are also known. -
The Geochemical Cycle of Tellurium in Volcanic Environments
Scienze della terra – indirizzo Geochimica Dipartimento di Scienze della Terra e del Mare Settore Scientifico Disciplinare GEO/08 The geochemical cycle of Tellurium in volcanic environments IL DOTTORE IL COORDINATORE Silvia Milazzo Prof. Francesco Parello IL TUTOR CO TUTOR Prof. Francesco Parello Dr. Walter D’Alessandro CO TUTOR Dr. Sergio Calabrese CICLO XXVI ANNO CONSEGUIMENTO TITOLO 2017 Università degli Studi di Palermo ______________________________________________________________________ Dipartimento di Scienze della Terra e del Mare The geochemical cycle of Tellurium in volcanic environments Tutor: Student: Prof. Francesco Parello Silvia Milazzo Co-tutor: Dr. Walter D’Alessandro Dr. Sergio Calabrese DOTTORATO DI RICERCA IN GEOCHIMICA XXVI CICLO 2013 – 2016 The geochemical cycle of Tellurium in volcanic environments A Chiara e a Simone Pag. 2 The geochemical cycle of Tellurium in volcanic environments Abstract This research is focused on the geochemistry of Tellurium (Te) in active volcanic environments. To this end concentrations of Te have been measured on different matrices (plume, ashes, soils, atmospheric depositions and plants). Samples were collected from different volcanoes around the world: volcanic aerosols from Etna and Vulcano (Italy), Turrialba (Costa Rica), Myakejima, Asama and Aso (Japan), Mutnovsky and Gorely (Kamchatka, Russia), Copahue (Argentina), Nyamuragira and Nyiragongo (D.R. Congo); atmospheric depositions from Etna and Vulcano (Italy), Nyiragongo (D.R. Congo); ash from Etna (Italy), Copahue (Argentina), San Miguel (El Salvador). Among with plume and rain samples, several leaves of plants from volcanic areas were collected for biomonitoring investigations: Etna, Vulcano and Stromboli (Italy), Nyiragongo (D.R. Congo), Nisyros (Greece), Gorely (Kamchatka), Turrialba (Costarica), Masaya (Nicaragua), Soufriere (Guadalupe); for comparison plant samples were collected also from an industrial area (Augusta, Italy) and a rural forest (Ficuzza, Italy). -
Structure and Chemistry of Sulfur Tetrafluoride James
STRUCTURE AND CHEMISTRY OF SULFUR TETRAFLUORIDE JAMES T. GOETTEL B.Sc., University of Alberta, 2011 A Thesis Submitted to the School of Graduate Studies of the University of Lethbridge in Partial Fulfilment of the Requirements for the Degree MASTER OF SCIENCE Department of Chemistry and Biochemistry University of Lethbridge LETHBRIDGE, ALBERTA, CANADA © James T. Goettel, 2013 ABSTRACT Sulfur tetrafluoride was shown to be a useful reagent in preparing salts of VII − V − VII − Re O2F4 , I OF4 , and I O2F4 . Sulfur tetrafluoride reacts with oxo-anions in acetonitrile or anhydrous HF (aHF) via fluoride-oxide exchange reactions to quantitatively form oxide fluoride salts, as observed by Raman and 19F NMR spectroscopy. Pure Ag[ReO2F4] as well as the new CH3CN coordination compounds [Ag(CH3CN)2][ReO2F4] and [Ag(CH3CN)4][ReO2F4]•CH3CN were prepared. The latter was characterized by single-crystal X-ray diffraction. The reaction of [N(CH3)4]IO3 with SF4 in acetonitrile gave the new [N(CH3)4][IOF4] salt. Sulfur tetrafluoride forms Lewis acid-base adducts with pyridine and its derivatives, i.e., 2,6-dimethylpyridine, 4-methylpyridine and 4- dimethylaminopyridine, which have recently been identified in our lab. In the presence of HF, the nitrogen base in the SF4 base reaction systems is protonated, which can formally be viewed as solvolysis of the SF4•base adducts by HF. The resulting salts have been studied by Raman spectroscopy and X-ray crystallography. + − Crystal structures were obtained for pyridinium salts: [HNC5H5 ]F •SF4, + − − + − [HNC5H5 ]F [HF2 ]•2SF4; 4-methylpyridinium salt: [HNC5H4(CH3) ]F •SF4, + − [HNC5H4(CH3) ][HF2 ]; 2,6-dimethylpyridinium salt: + − − [HNC5H3(CH3)2 ]2[SF5 ]F •SF4; 4-dimethylaminopyridinium salts: + − − + − [HNC5H4N(CH3)2 ]2[SF5 ]F •CH2Cl2, [NC5H4N(CH3)2 ][HF2 ]•2SF4; and the 4,4’- + − 2+ − bipyridinium salts: [HNH4C5−C5H4N ]F •2SF4, [HNH4C5−C5H4NH ]2F •4SF4. -
Department of Labor
Vol. 79 Friday, No. 197 October 10, 2014 Part II Department of Labor Occupational Safety and Health Administration 29 CFR Parts 1910, 1915, 1917, et al. Chemical Management and Permissible Exposure Limits (PELs); Proposed Rule VerDate Sep<11>2014 17:41 Oct 09, 2014 Jkt 235001 PO 00000 Frm 00001 Fmt 4717 Sfmt 4717 E:\FR\FM\10OCP2.SGM 10OCP2 mstockstill on DSK4VPTVN1PROD with PROPOSALS2 61384 Federal Register / Vol. 79, No. 197 / Friday, October 10, 2014 / Proposed Rules DEPARTMENT OF LABOR faxed to the OSHA Docket Office at Docket: To read or download (202) 693–1648. submissions or other material in the Occupational Safety and Health Mail, hand delivery, express mail, or docket go to: www.regulations.gov or the Administration messenger or courier service: Copies OSHA Docket Office at the address must be submitted in triplicate (3) to the above. All documents in the docket are 29 CFR Parts 1910, 1915, 1917, 1918, OSHA Docket Office, Docket No. listed in the index; however, some and 1926 OSHA–2012–0023, U.S. Department of information (e.g. copyrighted materials) Labor, Room N–2625, 200 Constitution is not publicly available to read or [Docket No. OSHA 2012–0023] Avenue NW., Washington, DC 20210. download through the Web site. All submissions, including copyrighted RIN 1218–AC74 Deliveries (hand, express mail, messenger, and courier service) are material, are available for inspection Chemical Management and accepted during the Department of and copying at the OSHA Docket Office. Permissible Exposure Limits (PELs) Labor and Docket Office’s normal FOR FURTHER INFORMATION CONTACT: business hours, 8:15 a.m. -
(12) United States Patent (10) Patent No.: US 7,585,805 B2 Luo (45) Date of Patent: Sep
US007585805B2 (12) United States Patent (10) Patent No.: US 7,585,805 B2 Luo (45) Date of Patent: Sep. 8, 2009 (54) NICKEL-BASED CATALYST COMPOSITION 3,170,907 A 2f1965 Ueda et al. 3,483,177 A 12, 1969 Throckmorton et al. (75) Inventor: Steven Luo, Copley, OH (US) 3,528,957 A 9, 1970 Throckmorton et al. 3,814,744 A 6/1974 Yagi et al. (73) Assignee: Bridgestone Corporation 3,816,567 A 6/1974 Yagi et al. 3,856,764 A 12, 1974 Throckmorton et al. (*) Notice: Subject to any disclaimer, the term of this 3,910,869 A 10, 1975 Throckmorton et al. patent is extended or adjusted under 35 4,522,988 A 6/1985 Kang et al. U.S.C. 154(b) by 577 days. 5,686,543 A 1 1/1997 Yasuda et al. 5,955,533 A 9, 1999 Miskovic et al. (21) Appl. No.: 11/285,434 6,699,813 B2 3/2004 Luo et al. (22) Filed: Nov. 22, 2005 (65) Prior Publication Data FOREIGN PATENT DOCUMENTS US 2007/01 17942 A1 May 24, 2007 GB 1373 701 11, 1974 (51) Int. Cl. CSF 4/70 (2006.01) Primary Examiner Caixia Lu BOI 3/16 (2006.01) (74) Attorney, Agent, or Firm Meredith E. Hooker; Arthur COSF36/04 (2006.01) Reginelli (52) U.S. Cl. ....................... 502/119; 502/103: 502/128; 502/131; 526/133; 526/134; 526/169.1:526/340.4 (57) ABSTRACT (58) Field of Classification Search ................. 502/103, 502/119, 128, 131; 526/133, 169.1, 340.4, A catalyst composition that is the combination of or the 526,134 reaction product of ingredients comprising (a) a nickel-con See application file for complete search history. -
Physical Property Data 11.1 Contents • Iii Ethylene Component Databank
Part Number: Aspen Physical Property System 11.1 September 2001 Copyright (c) 1981-2001 by Aspen Technology, Inc. All rights reserved. Aspen Plus®, Aspen Properties®, Aspen Engineering Suite , AspenTech®, ModelManager , the aspen leaf logo and Plantelligence are trademarks or registered trademarks of Aspen Technology, Inc., Cambridge, MA. BATCHFRAC and RATEFRAC are trademarks of Koch Engineering Company, Inc. All other brand and product names are trademarks or registered trademarks of their respective companies. This manual is intended as a guide to using AspenTech’s software. This documentation contains AspenTech proprietary and confidential information and may not be disclosed, used, or copied without the prior consent of AspenTech or as set forth in the applicable license agreement. Users are solely responsible for the proper use of the software and the application of the results obtained. Although AspenTech has tested the software and reviewed the documentation, the sole warranty for the software may be found in the applicable license agreement between AspenTech and the user. ASPENTECH MAKES NO WARRANTY OR REPRESENTATION, EITHER EXPRESSED OR IMPLIED, WITH RESPECT TO THIS DOCUMENTATION, ITS QUALITY, PERFORMANCE, MERCHANTABILITY, OR FITNESS FOR A PARTICULAR PURPOSE. Corporate Aspen Technology, Inc. Ten Canal Park Cambridge, MA 02141-2201 USA Phone: (1) (617) 949-1021 Toll Free: (1) (888) 996-7001 Fax: (1) (617) 949-1724 URL: http://www.aspentech.com Division Design, Simulation and Optimization Systems Aspen Technology, Inc. Ten Canal -
United States Patent Office Patented May 27, 1969 2 3,446,788 Polybutadiene Segment Has a High Content of Cis 1,4 Struc POLYMERIZATION of BUTADENE by a Ture
3,446,788 United States Patent Office Patented May 27, 1969 2 3,446,788 polybutadiene segment has a high content of cis 1,4 struc POLYMERIZATION OF BUTADENE BY A ture. Other objects will become apparent as the descrip CATALYST CONTAINING ALUMNUM tion proceeds. ALKYLS, ORGANONICKEL COMPOUNDS AND METAL FLUORDES According to the invention, butadiene or butadiene in Morford C. Throckmorton and William M. Saltman, combination with other diolefins is polymerized by con Akron, Ohio, assignors to The Goodyear Tire & Rub tact under solution polymerization conditions with a cat ber Company, Akron, Ohio, a corporation of Ohio alyst comprising (1) at least one organometallic com No Drawing. Filed Mar. 20, 1967, Ser. No. 624,219 pound in which the metal is selected from Groups I, II int. C. C08d 1/14, 3/08; B01j 1 1/84 and III of the periodic system, (2) at least one organo U.S. C. 260-94.3 10 Claims 0. nickel compound and (3) a metal fluoride selected from the group consisting of phosphorus pentafluoride, ABSTRACT OF THE DISCLOSURE vanadium pentafluoride, A method and a catalyst system for the solution uranium hexafluoride, polymerization of butadiene or butadiene in mixture with 5 osmium hexafluoride, other diolefins to form polymers containing a high con rhenium hexafluoride, tent of cis 14 addition is described. The solution iodine pentafluoride, polymerization is carried out under conventional antimony pentafluoride, polymerization conditions. The catalyst employed is a tin tetrafluoride, mixture of (1) organometallic compounds of metals of 20 -
Tellurium and Tellurium Compounds
Tellurium and tellurium compounds (excluding TeF6) Health-based Reassessment of Administrative Occupational Exposure Limits Committee on Updating of Occupational Exposure Limits, a committee of the Health Council of the Netherlands No. 2000/15OSH/055, The Hague, 31 October 2002 Preferred citation: Health Council of the Netherlands: Committee on Updating of Occupational Exposure Limits. Tellurium and tellurium compounds (excluding TeF6); Health-based Reassessment of Administrative Occupational Exposure Limits. The Hague: Health Council of the Netherlands, 2002; 2000/15OSH/055. all rights reserved 1 Introduction The present document contains the assessment of the health hazard of tellurium and its compounds, except for tellurium hexafluoride, by the Committee on Updating of Occupational Exposure Limits, a committee of the Health Council of the Netherlands. The first draft of this document was prepared by MA Maclaine Pont, M.Sc. (Wageningen University, Wageningen, the Netherlands). The evaluation of the toxicity of tellurium and its compounds has been based on the review by the American Conference of Governmental Industrial Hygienists (ACG99). Where relevant, the original publications were reviewed and evaluated as will be indicated in the text. In addition, literature was retrieved from the data bases Toxline, Medline, and Chemical Abstracts, covering the periods of 1981 to April 1999, 1966 to May 1999, and 1937 to April 1999, respectively*. The final literature search was carried out in May 1999. The literature search focused on those tellurium compounds of which some information could be found in either the Dictionary of chemical names and synonyms (How92) or in the CRC Handbook of chemistry and physics (Lid96); for dimethyltelluride and diethyltelluride a separate search was performed. -
Durham E-Theses
Durham E-Theses Some reactions of tetrasulphur tetranitride and trithiazyl trichloride Alange, G. G. How to cite: Alange, G. G. (1969) Some reactions of tetrasulphur tetranitride and trithiazyl trichloride, Durham theses, Durham University. Available at Durham E-Theses Online: http://etheses.dur.ac.uk/8384/ Use policy The full-text may be used and/or reproduced, and given to third parties in any format or medium, without prior permission or charge, for personal research or study, educational, or not-for-prot purposes provided that: • a full bibliographic reference is made to the original source • a link is made to the metadata record in Durham E-Theses • the full-text is not changed in any way The full-text must not be sold in any format or medium without the formal permission of the copyright holders. Please consult the full Durham E-Theses policy for further details. Academic Support Oce, Durham University, University Oce, Old Elvet, Durham DH1 3HP e-mail: [email protected] Tel: +44 0191 334 6107 http://etheses.dur.ac.uk SOME REACTIONS OP TETRASULPHUR TETRANITRIDE AND TRITHIAZYL TRICHLORIDE by G.G. ALANGE A thesis submitted for the degree of Doctor of Philosophy in the University of Durham August 1969 TABLE OF CONTENTS Page INTRODUCTION SULPHUR NITRIDES (i) The sulphur nitrides 1 (ii) Disulphur dinitride 3 (iii) Tetrasulphur tetranitride 5 (a) Reduction and oxidation of S^N^ 9 (b) Tetrasulphur tetranitride adducts 11 (c) Reactions of S^N^ in polar solvents 13 (d) Some other important reactions of S^N^ 14 (iv) Polymeric sulphur -
Aspen Plus7 10 STEADY STATE SIMULATION
Aspen Plus7 10 STEADY STATE SIMULATION Version Physical Property Data AspenTech7 REFERENCE MANUAL COPYRIGHT 1981—1999 Aspen Technology, Inc. ALL RIGHTS RESERVED The flowsheet graphics and plot components of Aspen Plus were developed by MY-Tech, Inc. Aspen Aerotran, Aspen Pinch, ADVENT®, Aspen B-JAC, Aspen Custom Modeler, Aspen Dynamics, Aspen Hetran, Aspen Plus®, AspenTech®, B-JAC®, BioProcess Simulator (BPS), DynaPlus, ModelManager, Plantelligence, the Plantelligence logo, Polymers Plus®, Properties Plus®, SPEEDUP®, and the aspen leaf logo are either registered trademarks, or trademarks of Aspen Technology, Inc., in the United States and/or other countries. BATCHFRAC and RATEFRAC are trademarks of Koch Engineering Company, Inc. Activator is a trademark of Software Security, Inc. Rainbow SentinelSuperPro is a trademark of Rainbow Technologies, Inc. Élan License Manager is a trademark of Élan Computer Group, Inc., Mountain View, California, USA. Microsoft Windows, Windows NT, Windows 95 and Windows 98 are either registered trademarks or trademarks of Microsoft Corporation in the United States and/or other countries. All other brand and product names are trademarks or registered trademarks of their respective companies. The License Manager portion of this product is based on: Élan License Manager © 1989-1997 Élan Computer Group, Inc. All rights reserved Use of Aspen Plus and This Manual This manual is intended as a guide to using Aspen Plus process modeling software. This documentation contains AspenTech proprietary and confidential information and may not be disclosed, used, or copied without the prior consent of AspenTech or as set forth in the applicable license agreement. Users are solely responsible for the proper use of Aspen Plus and the application of the results obtained.