The Introduction of Functional Groups Into Some Organosilanes Russell N
Total Page:16
File Type:pdf, Size:1020Kb
Load more
Recommended publications
-
The Preparation and Reactions of the Lower Chlorides and Oxychlorides of Silicon Joseph Bradley Quig Iowa State College
Iowa State University Capstones, Theses and Retrospective Theses and Dissertations Dissertations 1926 The preparation and reactions of the lower chlorides and oxychlorides of silicon Joseph Bradley Quig Iowa State College Follow this and additional works at: https://lib.dr.iastate.edu/rtd Part of the Inorganic Chemistry Commons Recommended Citation Quig, Joseph Bradley, "The preparation and reactions of the lower chlorides and oxychlorides of silicon " (1926). Retrospective Theses and Dissertations. 14278. https://lib.dr.iastate.edu/rtd/14278 This Dissertation is brought to you for free and open access by the Iowa State University Capstones, Theses and Dissertations at Iowa State University Digital Repository. It has been accepted for inclusion in Retrospective Theses and Dissertations by an authorized administrator of Iowa State University Digital Repository. For more information, please contact [email protected]. INFORMATION TO USERS This manuscript has been reproduced from the microfilm master. UlVli films the text directly from the original or copy submitted. Thus, some thesis and dissertation copies are in typewriter face, while others may be from any type of computer printer. The quality of this reproduction is dependent upon the quality of the copy submitted. Broken or indistinct print, colored or poor quality illustrations and photographs, print bleedthrough, substandard margins, and impiroper alignment can adversely affect reproduction. In the unlikely event that the author did not send UMI a complete manuscript and there are missing pages, these will be noted. Also, if unauthorized copyright material had to be removed, a note will indicate the deletion. Oversize materials (e.g., maps, drawings, charts) are reproduced by sectioning the original, beginning at the upper left-hand corner and continuing from left to right in equal sections with small overiaps. -
Fluorosilicic Acid CAS No
Product Safety Summary Fluorosilicic Acid CAS No. 16961-83-4 This Product Safety Summary is intended to provide a general overview of the chemical substance. The information in the summary is basic information and is not intended to provide emergency response information, medical information or treatment information. The summary should not be used to provide in-depth safety and health information. In-depth safety and health information can be found in the Safety Data Sheet (SDS) for the chemical substance. Names Fluorosilicic acid (FSA) Hexafluorosilicic acid (HFA or HFS) Sand acid Silicate(2-), hexafluoro- hydrogen (1:2) Silicofluoride Fluosilicic acid Hydroflurosilicic acid Silicofluoric acid Silicon hexafluoride dihydride Silicate(2-), hexafluoro-, dihydrogen Product Overview Solvay Fluorides, LLC does not sell fluorosilicic acid solutions directly to consumers. Most fluorosilicic acid is used in industrial or municipal applications/processes. Concentrated fluorosilicic acid solution (FSA) is used for water fluoridation, as a metal surface treatment and cleaner and for pH adjustment in industrial textile processing or laundries. It can also be used in the processing of hides, for hardening masonry and ceramics and in the manufacture of other chemicals. FSA can only exist as a liquid. There is no solid form. Fluorosilicic acid solutions are corrosive and contact can severely irritate and burn the skin and eyes causing possible permanent eye damage. Breathing concentrated fluorosilicic acid solutions can severely irritate and burn the nose, throat, and lungs, causing nosebleeds, cough, wheezing and shortness of breath. Many of the symptoms described are due to the hydrogen fluoride present as an impurity. Page 1 of 7 Copyright 2010-2013, Solvay America, Inc. -
PRODUCTION of ELECTRONIC GRADE LUNAR SILICON by DISPROPORTIONATION of SILICON DIFLUORIDE, William N
PRODUCTION OF ELECTRONIC GRADE LUNAR SILICON BY DISPROPORTIONATION OF SILICON DIFLUORIDE, William N. Agosto, Lunar Industries, P.O. Box 590004, Houston, TX 77259-0004 Waldron (1) has proposed to extract lunar silicon by sodium reduction of sodium fluorosilicate derived from reacting sodium fluoride with lunar silicon tetrafluoride. Silicon tetrafluoride is obtained by the action of hydrofluoric acid on lunar silicates. While these reactions are well understood, the resulting lunar silicon is not likely to meet electronic specifications of 5 nines purity. Dale and Margrave (2) have shown that silicon difluoride can be obtained by the action of silicon tetrafluoride on elemental silicon at elevated temperatures (1100-1200 C) and low pressures (1-2 torr). The resulting silicon difluoride will then spontaneously disproportionate into hyperpure silicon and silicon tetrafluoride in vacuum at approximately 400 C. On its own merits, silicon difluoride polymerizes into a tough waxy solid in the temperature range from liquid nitrogen to about 100 C. It is the silicon analog of teflon. Silicon difluoride ignites in moist air but is stable under lunar surface conditions and may prove to be a valuable industrial material that is largely lunar derived for lunar surface applications. The most effective driver for lunar industrialization may be the prospects for industrial space solar power systems in orbit or on the moon that are built with lunar materials. Such systems would require large quantities of electronic grade silicon or compound semiconductors for photovoltaics and electronic controls. Since silicon is the most abundant semimetal in the silicate portion of any solar system rock (approximately 20 wt%), lunar silicon production is bound to be an important process in such a solar power project. -
SAFETY DATA SHEET Silicon Tetrachloride
SAFETY DATA SHEET Silicon Tetrachloride Section 1. Identification GHS product identifier : Silicon Tetrachloride Chemical name : silicon tetrachloride Other means of : Silane, tetrachloro-; Silicon chloride; Tetrachlorosilane; Silicon(Ⅳ)chloride identification Product type : Liquid. Product use : Synthetic/Analytical chemistry. Synonym : Silane, tetrachloro-; Silicon chloride; Tetrachlorosilane; Silicon(Ⅳ)chloride SDS # : 001075 Supplier's details : Airgas USA, LLC and its affiliates 259 North Radnor-Chester Road Suite 100 Radnor, PA 19087-5283 1-610-687-5253 24-hour telephone : 1-866-734-3438 Section 2. Hazards identification OSHA/HCS status : This material is considered hazardous by the OSHA Hazard Communication Standard (29 CFR 1910.1200). Classification of the : ACUTE TOXICITY (inhalation) - Category 2 substance or mixture SKIN IRRITATION - Category 2 EYE IRRITATION - Category 2A SPECIFIC TARGET ORGAN TOXICITY (SINGLE EXPOSURE) (Respiratory tract irritation) - Category 3 GHS label elements Hazard pictograms : Signal word : Danger Hazard statements : Fatal if inhaled. Causes serious eye irritation. Causes skin irritation. May cause respiratory irritation. Precautionary statements General : Read label before use. Keep out of reach of children. If medical advice is needed, have product container or label at hand. Prevention : Wear eye or face protection. In case of inadequate ventilation wear respiratory protection. Use only outdoors or in a well-ventilated area. Do not breathe vapor. Wash thoroughly after handling. Response : IF INHALED: Remove person to fresh air and keep comfortable for breathing. Immediately call a POISON CENTER or doctor. Take off contaminated clothing and wash it before reuse. IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing. If eye irritation persists: Get medical advice or attention. -
Synthesis and Characterization of Organic Silicates Using Appropriate Catalysts Adam H
IJISET - International Journal of Innovative Science, Engineering & Technology, Vol. 3 Issue 1, January 2016. www.ijiset.com ISSN 2348 – 7968 Synthesis and Characterization of Organic Silicates Using Appropriate Catalysts Adam H. E. Yousif a, Omer . Y. Alhusseinb ,Elgorashi.A.M. Elgorashic ,Mohammed S. Alic and wagdi .I. Eldogdugd a Department of Chemistry, Faculty of Education, Alfashir University , Alfashir, Sudan. b Department of Chemistry, Faculty of Science Albaha University, Albaha, KSA c Department of Chemistry, Faculty of Science, Sudan University, Khartoum, Sudan. d Department of Chemistry, University College in Al-Jamoum, Umm Al-Qura University, KSA Abstract: Tetraethoxysilane (TEOS) was prepared from elemental silicon and liquid ethanol using silica or alumina supported copper oxide catalysts .The effects of catalyst, reaction conditions were studied . Moreover, the product characterized by IR,GLC,H1NMR and scanning electron microscope (SEM), also Silica and alumina supported copper oxide catalysts were prepared and characterized by the analytical and spectroscopic methods. The results indicated that silica or alumina supported copper oxide were effective catalysts for the direct synthesis of tetraethoxysilane . Moreover, tetraethoxysilane has been isolated in high yield and purity as showed by H1NMR and GLC analyses. Keywords: Tetraethoxysilane, Catalyst, Elemental Silicon, Ethanol. Crrospondin author: email: [email protected] 1. Introduction Ethyl silicates is a chemical substance which has been known to be excellent precursor (starting material) for production of metal oxides [1] which are vital in electronics and ceramics industries for fabrication of electronics, glassy and ceramic materials. Sol – gel process has been used as novel method for preparation of these oxides materials from ethyl silicates [2]. -
On the Enhancement of Silicon Chemical Vapor Deposition Rates at Low Temperatures
Lawrence Berkeley National Laboratory Recent Work Title ON THE ENHANCEMENT OF SILICON CHEMICAL VAPOR DEPOSITION RATES AT LOW TEMPERATURES Permalink https://escholarship.org/uc/item/9pp8142m Author Chang, Chin-An. Publication Date 1976-08-01 eScholarship.org Powered by the California Digital Library University of California u u \J ·i,) "'i .j u ;;) 6 6 9 t({!,-6S Published in Journal of Electrochemical LBL-3938 Rev. Society, Vol.123, No. 8, 1245- 1247 Preprint C. I {August 1976) ON THE ENHANCEMENT OF SILICON CHEMICAL VAPOR DEPOSITION RATES AT LOW TEMPERATURES Chin-An Chang· ·._\,::~FL~:?·{ ;'-~"'-;!'~·~ August 1976 ~. t ~; ... · j\/{ ~;:""" ·...J · r ~-.:, .~· r.-.:... c·. - · r\1 Prepared for the U •. S. Energy Research and. Development Administration under Contract W -7405-ENG -48 For Reference Not to be taken from this room DISCLAIMER This document was prepared as an account of work sponsored by the United States Government. While this document is believed to contain conect information, neither the United States Government nor any agency thereof, nor the Regents of the University of California, nor any of their employees, makes any wananty, express or implied, or assumes any legal responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by its trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply its endorsement, recommendation, or favoring by the United States Government or any agency thereof, or the Regents of the University of California. The views and opinions of authors expressed herein do not necessarily state or reflect those of the United States Government or any agency thereof or the Regents of the University of California. -
United States Patent Office Patented Apr
3,128,297 United States Patent Office Patented Apr. 7, 1964 1. 2 The various operable organo-silicon compounds, operable 3,128,297 catalysts and reaction conditions will now be defined in PROCESS FOR SELICON-HALOGEN BOND more detail. The term "halogen' as used herein includes RED STRIBUTION the elements fluorine, chlorine, bromine and iodine. Bernard Kanner, Tonawanda, and Donald L. Bailey, Sny Monomeric silanes which can be employed as reactants der, N.Y., assignors to Union Carbide Corporation, a in the process of this invention may be represented by corporation of New York No Drawing. Filed Mar. 31, 1961, Ser. No. 99,667 the formula: 20 Claims. (C. 260-448.2) (B) R (Y-R-) six This invention relates to a process for the redistribution 10 wherein R is a divalent hydrocarbon group, the Y group of silicon-halogen chemical bonds. More particularly, is hydrogen, fluoro, chloro, bromo, iodo, cyano, the invention is directed to a process for the redistribution O of silicon-fluorine and other silicon-halogen bonds, pref -COO G, -NG, G -O G, erably silicon-chlorine bonds, in organo-silicon com -V-va, pounds. This application is a continuation-in-part of our 5 or nitro, the R' group is hydrogen, the vinyl group or an copending application Serial No. 15,841, filed March 18, Y-R- group, X is a halogen, G is a monovalent hy 1960, now abandoned. drocarbon group, e is an integer having a value from 0 We have discovered that an efficient and rapid redis to 3, f is an integer having a value from 0 to 1 and the tribution of silicon-fluorine and other silicon-halogen sum of e and f is never greater than 3. -
Silicon Tetrafluoride on Io
Icarus, in press Silicon Tetrafluoride on Io Laura Schaefer and Bruce Fegley, Jr. Planetary Chemistry Laboratory, Department of Earth and Planetary Sciences, Washington University, St. Louis, MO 63130-4899 [email protected] [email protected] ABSTRACT Silicon tetrafluoride (SiF4) is observed in terrestrial volcanic gases and is predicted to be the major F – bearing species in low temperature volcanic gases on Io (Schaefer and Fegley, 2005b). SiF4 gas is also a potential indicator of silica – rich crust on Io. We used F/S ratios in terrestrial and extraterrestrial basalts, and gas/lava enrichment factors for F and S measured at terrestrial volcanoes to calculate equilibrium SiF4/SO2 ratios in volcanic gases on Io. We conclude that SiF4 can be produced at levels comparable to the observed NaCl/SO2 gas ratio. We also considered potential loss processes for SiF4 in volcanic plumes and in Io’s atmosphere including ion-molecule reactions, electron chemistry, photochemistry, reactions with the major atmospheric constituents, and condensation. Photochemical destruction (tchem ~266 days) and/or condensation as Na2SiF6 (s) appear to be the major sinks for SiF4. We recommend searching for SiF4 with infrared spectroscopy using its 9.7 µm band as done on Earth. KEYWORDS: Io, volcanic gases, silicon, fluorine, silicon tetrafluoride, condensates, geochemistry, atmospheric chemistry INTRODUCTION During our previous work on alkali halide chemistry on Io (Schaefer and Fegley, 2005b), we learned that silicon tetrafluoride is observed at several terrestrial volcanoes including Mount Iwodake, Vulcano, Mount Etna, and Popocatépetl (Francis et al., 1996; Love et al., 1998; Mori et al., 2002). Gaseous SiF4 is detected on Earth by observing its 9.7 µm band with infrared (IR) absorption spectroscopy, which is used to measure SiF4/SO2 molar ratios. -
(12) United States Patent (10) Patent No.: US 7,030,260 B2 Asirvatham Et Al
USOO7030260B2 (12) United States Patent (10) Patent No.: US 7,030,260 B2 Asirvatham et al. (45) Date of Patent: Apr. 18, 2006 (54) PREPARATION OF MIXED-HALOGEN Uhlig, W., Synthesis of Functional Substituted Oligosilanes HALO-SILANES Based on Sillyltriflate Derivatives, Organosilicon Chemistry: From Molecules to Materials, Eds. N. Auner, J. Weiss (75) Inventors: Edward Asirvatham, Chatham, NJ Federal Republic of Germany, (1994), pp. 21-26. (US); Jeff Czarnecki, Branchburg, NJ Katzenbeisser, U. Si-Si-Coupling Constants of Bromo (US); Matthew H. Luly, Hamburg, NY and Iododislanes and -trisilanes XSi-H and XSi-Hs. (US); Lawrence F. Mullan, (X= Br, I), Organosilicon Chemistry: From Molecules to Williamsville, NY (US); Alagappan Materials, Eds. N. Auner, J. Weiss, Federal Republic of Then appan, Wilmington, DE (US) Germany, (1994), pp. 37-38. (73) Assignee: Honeywell International Inc., Pátzold, U. Synthesis of Heavily Halogenated Vinylsilanes, Morristown, NJ (US) Organosilicon Chemistry IV: From Molecules to Materials, Eds. N. Auner, J. Weiss, Federal Republic of Germany, *) Notice: Subject to anyy disclaimer, the term of this (1996), pp. 226-228. patent is extended or adjusted under 35 Hassler, K., Köll, W., Synthesis and Spectroscopy of U.S.C. 154(b) by 214 days. Phenylated and Halogenated Trisilanes and Disilanes, Organosilicon Chemistry II: From Molecules to Materials, (21) Appl. No.: 10/377,367 Eds. N. Auner, J. Weiss, Federal Republic of Germany, (1996), pp. 81-88. (22) Filed: Feb. 27, 2003 Hassler, K. Schenzel, K., Syntheses, Si NMR Spectra, and (65) Prior Publication Data Vibrational Spectra of Methylated Trisilanes, Organosilicon Chemistry II: From Molecules to Materials, Eds. N. -
5.157 TABLE 5.29 Van Der Waals' Constants for Gases the Van Der
DEAN #37261 (McGHP) RIGHT INTERACTIVE top of rh PHYSICAL PROPERTIES 5.157 base of rh cap height TABLE 5.29 Van der Waals’ Constants for Gases base of text The van der Waals’ equation of state for a real gas is: na2 ͩͪP ϩ (V Ϫ nb) ϭ nRT for n moles V2 where P is the pressure, V the volume (in liters per mole ϭ 0.001 m3 per mole in the SI system), T the temperature (in degrees Kelvin), n the amount of substance (in moles), and R the gas constant. To use the values of a and b in the table, P must be expressed in the same units as in the gas constant. Thus, the pressure of a standard atmosphere may be expressed in the SI system as follows: 1 atm ϭ 101,325 N · mϪ2 ϭ 101,325 Pa ϭ 1.01325 bar The appropriate value for the gas constant is: 0.083 144 1 L · bar · KϪ1 · molϪ1 or 0.082 056 L · atm · KϪ1 · molϪ1 The van der Waals’ constants are related to the critical temperature and pressure, tc and Pc, in Table 6.5 by: 27 RT22 RT a ϭ ccand b ϭ 64 Pcc8 P Substance a,L2 · bar · molϪ2 b,L·molϪ1 Acetaldehyde 11.37 0.08695 Acetic acid 17.71 0.1065 Acetic anhydride 26.8 0.157 Acetone 16.02 0.1124 Acetonitrile 17.89 0.1169 Acetyl chloride 12.80 0.08979 Acetylene 4.516 0.05218 Acrylic acid 19.45 0.1127 Acrylonitrile 18.37 0.1222 Allene 8.235 0.07467 Allyl alcohol 15.17 0.1036 Aluminum trichloride 42.63 0.2450 2-Aminoethanol 7.616 0.0431 Ammonia 4.225 0.03713 Ammonium chloride 2.380 0.00734 Aniline 29.14 0.1486 Antimony tribromide 42.08 0.1658 Argon 1.355 0.03201 Arsenic trichloride 17.23 0.1039 Arsine 6.327 0.06048 Benzaldehyde 30.30 0.1553 Benzene 18.82 -
Influence of Silicon on High-Temperature
Solar Energy Materials & Solar Cells 160 (2017) 410–417 Contents lists available at ScienceDirect Solar Energy Materials & Solar Cells journal homepage: www.elsevier.com/locate/solmat Influence of silicon on high-temperature (600 °C) chlorosilane interactions with iron crossmark ⁎ Josh Allera, , Nolan Swainb, Michael Babera, Greg Tatarb, Nathan Jacobsonc, Paul Gannonb a Mechanical and Industrial Engineering, Montana State University, Bozeman, MT 59717, USA b Chemical and Biological Engineering, Montana State University, Bozeman, MT 59717, USA c NASA Glenn Research Center, Cleveland, OH 44135, USA ARTICLE INFO ABSTRACT Keywords: High-temperature ( > 500 °C) chlorosilane gas streams are prevalent in the manufacture of polycrystalline Iron silicon, the feedstock for silicon-based solar panels and electronics. This study investigated the influence of Chlorosilane metallurgical grade silicon on the corrosion behavior of pure iron in these types of environments. The Silicon experiment included exposing pure iron samples at 600 °C to a silicon tetrachloride/hydrogen input gas mixture Silicon tetrachloride with and without embedding the samples in silicon. The samples in a packed bed of silicon had significantly Iron silicide higher mass gains compared to samples not in a packed bed. Comparison to diffusion studies suggest that the Corrosion increase in mass gain of embedded samples is due to a higher silicon activity from the gas phase reaction with silicon. The experimental results were supported by chemical equilibrium calculations which showed that more- active trichlorosilane and dichlorosilane species are formed from silicon tetrachloride in silicon packed bed conditions. 1. Introduction most common material added to a chlorosilane gas stream is silicon. Silicon may be present in a fluidized bed reactor used to convert silicon Chlorosilane species are used at high temperatures in the refine- tetrachloride to trichlorosilane or deposition equipment used to deposit ment, manufacture, and deposition of silicon and silicon-containing silicon on a wafer. -
Silicon Tetrafluoride Interim AEGL Document
Silicon Tetrafluoride INTERIM: 06-2008 1 2 3 4 ACUTE EXPOSURE GUIDELINE LEVELS (AEGLs) 5 FOR 6 Silicon Tetrafluoride 7 (CAS Reg. No. 7783-61-1) 8 9 Si-F4 10 11 12 13 14 INTERIM 15 16 17 18 19 20 21 22 Silicon Tetrafluoride INTERIM: 06-2008/ Page 2 of 26 1 2 ACUTE EXPOSURE GUIDELINE LEVELS (AEGLs) 3 FOR 4 SILICON TETRAFLUORIDE 5 (CAS Reg. No. 7783-61-1) 6 7 8 INTERIM 9 10 Silicon Tetrafluoride INTERIM: 06-2008/ Page 3 of 26 1 2 PREFACE 3 4 Under the authority of the Federal Advisory Committee Act (FACA) P. L. 92-463 of 5 1972, the National Advisory Committee for Acute Exposure Guideline Levels for Hazardous 6 Substances (NAC/AEGL Committee) has been established to identify, review and interpret 7 relevant toxicologic and other scientific data and develop AEGLs for high priority, acutely toxic 8 chemicals. 9 10 AEGLs represent threshold exposure limits for the general public and are applicable to 11 emergency exposure periods ranging from 10 minutes to 8 hours. Three levels C AEGL-1, 12 AEGL-2 and AEGL-3 C are developed for each of five exposure periods (10 and 30 minutes, 1 13 hour, 4 hours, and 8 hours) and are distinguished by varying degrees of severity of toxic effects. 14 The three AEGLs are defined as follows: 15 16 AEGL-1 is the airborne concentration (expressed as parts per million or milligrams per 17 cubic meter [ppm or mg/m3]) of a substance above which it is predicted that the general 18 population, including susceptible individuals, could experience notable discomfort, irritation, or 19 certain asymptomatic, non-sensory effects.