(12) United States Patent (10) Patent No.: US 8,900,802 B2 Allen Et Al
USOO890O802B2 (12) United States Patent (10) Patent No.: US 8,900,802 B2 Allen et al. (45) Date of Patent: Dec. 2, 2014 (54) POSITIVE TONE ORGANIC SOLVENT (56) References Cited DEVELOPED CHEMICALLY AMPLIFIED RESIST U.S. PATENT DOCUMENTS 3,586,504 A 6, 1971 Coates et al. (71) Applicants: International Business Machines 4,833,067 A 5/1989 Tanaka et al. Corporation, Armonk, NY (US); JSR 5,126.230 A 6/1992 Lazarus et al. Corporation, Tokyo (JP) 5,185,235 A 2f1993 Sato et al. 5,266.424 A 1 1/1993 Fujino et al. 5,554.312 A 9, 1996 Ward (72) Inventors: Robert D. Allen, San Jose, CA (US); 5,846,695 A 12/1998 Iwata et al. Ramakrishnan Ayothi, San Jose, CA 6,599,683 B1 7/2003 Torek et al. (US); Luisa D. Bozano, Los Gatos, CA 7,585,609 B2 9, 2009 Larson et al. (US); William D. Hinsberg, Fremont, (Continued) CA (US); Linda K. Sundberg, Los Gatos, CA (US); Sally A. Swanson, San FOREIGN PATENT DOCUMENTS Jose, CA (US); Hoa D. Truong, San Jose, CA (US); Gregory M. Wallraff, JP 54143232 8, 1979 JP 58219549 12/1983 San Jose, CA (US) JP 6325.9560 10, 1988 (73) Assignees: International Business Machines OTHER PUBLICATIONS Corporation, Armonk, NY (US); JSR Corporation, Tokyo (JP) Ito et al., Positive/negative mid UV resists with high thermal stability, SPIE 0771:24-31 (1987). (*) Notice: Subject to any disclaimer, the term of this (Continued) patent is extended or adjusted under 35 U.S.C. 154(b) by 99 days.
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