Vacuum Technology for Particle Accelerators JUAS 2013 Paolo Chiggiato Technology Department Vacuum Surfaces and Coatings Group CERN, CH-1211 Geneva 1
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Vacuum Technology for Particle Accelerators JUAS 2013 Paolo Chiggiato Technology Department Vacuum Surfaces and Coatings Group CERN, CH-1211 Geneva 1. A quick view of vacuum technology 2. The basis of vacuum technology: pressure, conductance, pumping speed 3. Calculation of simple pressure profiles 4. Gas sources: thermal outgassing and beam-induced desorption 5. Gas pumping: momentum-transfer and capture pumps 6. Instruments 7. Seminar: Example of vacuum system design for particle accelerators (by Roberto Kersevan) 2 Selected books Karl Jousten (Ed.), Handbook of Vacuum Technology Book (Verlag-VCH, Weinheim, 2008) James M. Lafferty (Ed.), Foundations of Vacuum Science and Technology (John Wiley and Sons, 1998) A.Berman, Vacuum Engineering calculation, Formulas, and Solved Exercises (Academic Press, 1992) P. A. Redhead, J. P. Hobson, E. V. Kornelsen, The Physical Basis of Ultrahigh Vacuum, (Chapman and Hall, 1968) John F. O'Hanlon, A User's Guide to Vacuum Technology Handbook of Materials and Techniques for Vacuum Devices (AVS Classics in Vacuum Science and Technology) A. Berman, Total pressure measurement in vacuum technology, Academic Press, 1985 3 Part 1 A quick view of vacuum technology 4 A quick view of vacuum technology Vacuum systems are made of several components. The connection between them is obtained by flanges. Flange Beam pipe Pump (sputter ion pump) 5 A quick view of vacuum technology Sector valves Beam pipe & NEG coating A vacuum sector is delimited by gate valves. Room temp. The pressure is monitored cold in each vacuum sector by gauges. The beam pipes can be at different temperatures Pressure measurement Flange Pump (sputter ion pump) 6 A quick view of vacuum technology Sector valves Beam pipe & NEG coating Gauge Pump (sputter ion pump) Flange 7 A quick view of vacuum technology Sector valves Example of vacuum components: • pumping ports • bellows • RF shield • flanges 8 A quick view of vacuum technology Sector valves Example of vacuum components: • Copper beam pipes with stainless steel flanges 9 A quick view of vacuum technology Sector valves Example of vacuum components: • Beryllium beam pipes in the collision area of the ATLAS experiment (CERN) 10 A quick view of vacuum technology Sector valves In general the leak-tight connection is made by copper gaskets that are squeezed between two stainless steel knives. 11 In general vacuum systems for particle accelerators are made of metals: • Austenitic stainless steel • Copper and its alloys • Aluminum and its alloys • Inconel (a Ni alloy) • Beryllium In several components the characteristics of the surface is modified by chemical treatment and coating. 12 Some example of surface treatments: • Chemical cleaning (mandatory!) • Electropolishing • Passivation • Elecroplating • Thin-film coating by sputtering 13 A quick view of vacuum technology Steps in the production of vacuum systems: • Identification of requirements • Choice of materials and treatments • Design, mechanical evaluation and pressure profile calculation • Machining & assembly (welding, brazing) • Surface treatments • Leak test and global assessment. • Installation and in situ final check. 14 Example of vacuum system: The H- source of the Linac4 15 A quick view of vacuum technology Mechanical engineering for vacuum technology Buckling mode Dynamic nodal forces Principal stress 16 Part 2 The basis of vacuum technology 17 Why do we need vacuum in accelerators? Collisions between gas molecules and particles have to be minimized, otherwise: Particle energy is reduced and trajectories are modified, so that: Excessive Losses Bunch-size growth Damage to Excessive noise in Increased induced Reduced bunch instrumentation detectors radioactivity intensity Risk of quench in Excessive Lower luminosity superconductive ‘bremsstrahlung’ magnet radiation Beam instability Induced corrosion and Risk for personnel material damage safety Vacuum is also necessary: - to avoid electrical discharge in high-voltage (tens di MV/m)… - To thermically isolate cryogenic devices 18 The basis of vacuum technology: pressure 퐹 퐹표푟푐푒 푐표푚푝표푛푒푛푡 푛 푛표푟푚푎푙 푑푟푒푐푡표푛 Definition of pressure: 푆푢푟푓푎푐푒 푎푟푒푎 퐹표푟푐푒 푁 Unit of measurement: → = 푃푎 → 105푃푎 = 1 푏푎푟 → 1 푎푡푚 = 1.013 푏푎푟 푆푢푟푓푎푐푒 푚2 In vacuum technology ∶ 푚푏푎푟 표푟 푃푎 Still used in vacuum technology: 1 푇표푟푟 = 푝푟푒푠푠푢푟푒 푒푥푒푟푡푒푑 푏푦 푎 푐표푙푢푚푛 표푓 1 푚푚 표푓 퐻푔; 1 푎푡푚 = 760 푇표푟푟 Conversion Table Pa bar atm Torr 1 Pa 1 10-5 9.87 10-6 7.5 10-3 1 bar 105 1 0.987 750.06 1 atm 1.013 105 1.013 1 760 1 Torr 133.32 1.33 10-3 1.32 10-3 1 19 The basis of vacuum technology: pressure Degree of Vacuum Pressure boundaries Pressure boundaries [mbar] [Pa] Low Vacuum LV 1000-1 105-102 Medium Vacuum MV 1-10-3 102-10-1 High Vacuum HV 10-3-10-9 10-1-10-7 Ultra High vacuum 10-9-10-12 10-7-10-10 UHV Extreme Vacuum XHV <10-12 <10-10 Pressures and gas quantities are correlated by the gas equation of state. In vacuum the ideal gas law is always fulfilled : 푃 푉 = 푛 푅 푇 (thermodynamic) 푃 푉 = 푁 푘퐵T (statistical mechanics) P pressure, V volume, T temperature, quantity of gas in moles (n) and number of molecules (N), R gas constant, kB Boltzmann constant 20 The basis of vacuum technology: gas density 푚표푙푒푐푢푙푒푠 푐푚3 Pressure Gas Gas [Pa] Density Density 293 K 4.3K Atmosphere 1.013 105 2.5 1019 1.7 1021 Plasma chambers 1 2.5 1014 1.7 1016 LINAC pressure upper limit 10-5 2.5 109 1.7 1011 Lowest pressure ever measured at 10-12 250 1.7 104 room T 푁 푃푎 푚3 푇표푟푟 푙 푃 푉 = 푁푘 푇 → 푃 = 푘 푇 푘 = 1.38 10−23 = 1.04 10−22 퐵 푉 퐵 퐵 퐾 퐾 21 CO CO2 Ar N2 H2O CH O2 4 Gas density on the Moon: 105 cm-3 (10-10 Intergallactical vacuum: 10-17 Pa Pa) during night and 107 cm-3 (10-8 Pa) Vacuum in Via Lattea: 10-15 Pa during lunar day. Lowest pressure ever measured at room temperature: 10-12 Pa Lowest air pressure variation perceptible by human ears: 2 10-5 Pa -> about 1/1010 of the atmospheric pressure 22 The basis of vacuum technology: gas quantity Gas quantities can be expressed in: • Number of molecules: N 푁 23 푚표푙푒푐푢푙푒푠 • Moles: 푁퐴 = 6.022 10 푁퐴 푚표푙푒 • PV quantities if the temperature is known and constant : 푃 푉 = 푁(푘퐵푇) 3 3 1 푃푎.푚 20 Example: 1 Pa m at 293K contains 푁 = 퐽 = 2.47 10 molecules 1.38.10−23 293 퐾 퐾 19 1 Torr l = 3.3 10 molecules 19 1 mbar l = 2.47 10 molecules 23 The basis of vacuum technology: gas kinetics In the kinetic theory of gas the mean speed of a molecule is the mathematical average of the speed distribution: 8 푘 푇 8 푅 푇 푣 = 퐵 = 휋 푚 휋 푀 m is the molecular mass [Kg] M is the molar mass [Kg] 24 The basis of vacuum technology: gas kinetics 풎 풎 Gas 풗 풂풕 ퟐퟗퟑ 푲 풗 풂풕 ퟒ. ퟑ 푲 풔 풔 H2 1761 213 He 1244 151 CH4 622 75 N2 470 57 Ar 394 48 25 The basis of vacuum technology: impingement rate 1 1 8 푘 푇 −2 −1 22 푃 푚푏푎푟 φ = 푛 푣 = 푛 퐵 φ 푐푚 푠 = 2.635 10 4 4 휋 푚 푀 푔 푇 퐾 Gas Pressure Impingement rate [mbar] 293 K [cm-2s-1] 10-3 1.1 1018 -8 13 H2 10 1.1 10 10-14 1.1 108 10-3 2.9 1017 N 2 10-8 2.9 1012 10-3 2.4 1017 Ar 10-8 2.4 1012 26 The basis of vacuum technology: mean free path The molecular collision rate w in a gas is: 휔 = 2 푛 푣 휎푐 where 휎푐 is the collision cross section. For a single gas, in case of elastic collision of solid spheres: 2 2 휎푐= 휋훿 → 휔 = 2 휋 푛 푣 훿 and 훿 is the molecular diameter. The mean free path 휆 , i.e. the average distance travelled by a molecule between collisions, is given by: ퟐ Gas 흈풄 풏풎 푣 1 푘퐵푇 휆 = = = H2 0.27 2 2 휔 2 휋 푛 훿 2 휋 푃 훿 He 0.21 N2 0.43 푇 퐾 휆 푚 = 4.3 10−5 O 0.40 퐻2 푃 푃푎 2 CO2 0.52 27 The basis of vacuum technology: mean free path Mean Free Path for H at 293 K 2 1010 Earth diameter 108 106 Moon-Earth distance Paris-New York 104 distance 2 10 Typical dimension of standard vacuum system 100 Mean Free Path [m] Path Free Mean 10-2 Kn≈1 10-4 10-14 10-12 10-10 10-8 10-6 10-4 0.01 1 Pressure [mbar] 28 The basis of vacuum technology: mean free path When the mean free path is of the order of typical dimensions of the vacuum vessel, for example the diameter of cylindrical beam pipes, molecular collisions with the wall of the vacuum envelope become preponderant. For even longer λ , the gas dynamics is dominated by molecule-wall collisions; intermolecular interactions lose any effect on the gas displacement. 29 The basis of vacuum technology: Knudsen number 휆 퐾 = 푛 퐷 흀 is the mean free path and D is a characteristic dimension of a vacuum system (p.ex. the diameter of a beam pipe). Kn range Regime Description Kn >0.5 Free molecular flow The gas dynamic is dominated by molecular collisions with the walls of the system Kn <0.01 Continuous (viscous) flow The gas dynamic is dominated by intermolecular collisions 0.5<Kn <0.01 Transitional flow Transition between molecular and viscous flow Except for ion source’s plasma chambers, vacuum systems of accelerators operate in free molecular regime; only this vacuum regime is considered in this lesson.