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7 X 11 Long.P65 Cambridge University Press 978-0-521-89542-2 - Fundamentals of Micro-Optics Hans Zappe Index More information Index Abbe anti-reflection coating, 154, 315, 356 diagram, 83 ants number, 70–71, 84, 85, 245 fried, 213 number, diffractive lens, 304 aperture, 221, 239 Abbe, Ernst, 10, 70 circular, 278–283 aberrations, lens, see lenses diffraction from, 266–270 absorption, 77–81, 86 dual slit, 274–275 coefficient, 77–79, 399, 437, 457 multiple slits, 275–276 in waveguides, 361–363 rectangular, 277–278 of photons, 395 single slit, 270–273 spectroscopy, 455–459 waveguide, 361 achromatic lenses, 245–246, 307–308, 512 aplanatic lenses, 237 adaptive optics, xii, 189–193 apochromatic lenses, 245 afocal, 230, 234 apodization, 274 Ag APS, see photodetectors for metamaterials, 557 AR, see anti-reflection coating for plasmonics, 553, 556 Arago, Dominique Francois, 8 for reflection, 171–172 arrayed waveguide grating, 368, 383, 384 air aspheric lenses, 237, 251, 258, 480, 484 refractive index, 26, 164 assembly, optical, 489–496 Airy active alignment, 490–491 disk, 188, 219, 220, 281–283 flip-chip, 492–494 Airy, George, 8, 10, 188 passive alignment, 491 Al Si optical bench, 493–496 for plasmonics, 553 V-grooves, 491–492, 494 for reflection, 170–171 astigmatism, 45, 240–241 mole fraction, 90 in laser diodes, 420 Al2O3, 157, 413 in microlenses, 472 AlGaAs, 90–92, 351, 360, 404, 412 waveguide far field, 361 AlGaInP, 90, 404, 406 athermal lenses, 305–307 laser characteristics, 416 attenuation AlGaN, 413 in waveguides, 361–363 Alhazen (Ibn-al-Haitham), 4, 7, 9 optical, 77–82, 399 alignment Au active, 490–491 for contacts, 493 passive, 491 for electroplating, 480 aluminum, see Al for plasmonics, 553, 556 Ampère’s law, 20 for reflection, 172 Ampère, André Marie, 20 avalanche photodiodes, 429 amplification AWG, see arrayed waveguide grating optical, 396–397 anamorphic optics, 316, 361, 420 BaF2, 372 angular frequency, 25 back focal length, 226, 257 © in this web service Cambridge University Press www.cambridge.org Cambridge University Press 978-0-521-89542-2 - Fundamentals of Micro-Optics Hans Zappe Index More information 606 Index Bacon, Roger, 9 candela ball lenses, 224, 256–257, 494 definition, 408 Balmer, Johann, 6 carrots band tails, 80, 362 novel uses, 449 bandgap energy, 87, 90–92 CCD, see photodetectors values, 92 CD, 452–455, 480 bandpass filter, 163 CdSe, 411 bandwidth, 431 chalcogenides, 83, 372 barium borate, 77 charge density, 19 Bartholinus, Erasmus, 8 chirp Bayer filter, 436 in gratings, 295 BD, see Blu-ray disc in modulators, 440 beam chocolate expander, 234–235 optical properties, 523 optical, see optical beam chromatic aberration, 244–248 shaping, 310 axial, 244 Beer’s law, 78, 396, 457 correction, 245–248 Beer, August, 78 diffractive lenses, 304 Bessel function, 187, 279, 373 lateral, 244 recurrence relation, 280 circle of least confusion, 240, 244 Bessel, Friedrich Wilhelm, 187 circular polarization, see polarization Bi3Fe5O12, 448 Clausius, Rudolf, 67 biaxial materials, 73 Clausius–Mossotti equation, 67 binary compound semiconductor, 90 CMOS, 194, 384, 436 binary optics, 12, 303, 475–478 coherence, 126–128 Biot, Jean-Baptist, 20 definition, 126 birefringence, 8, 72–75, 85, 95 length, 126, 142 BK7, see glass time, 126 blazed gratings, 11, 297–299 collimation, 42, 51, 210, 233 Blu-ray disc, 283, 308, 452–455, 515 coma, 238–239, 242 Bohr, Niels, 6, 60 in microlenses, 472 Boltzmann, Ludwig, 394 compound semiconductors, 89–93, 403 Bordeaux, 258 concave Bragg definition, 175, 208 filters, see filters lens behavior, 210 for photonic crystals, 540–543 conductivity, 58 mirrors, see mirrors confusion, maximum, 240 stack, 311 conjugates, 214, 260 Bragg, William Henry, 161 convex Bragg, William Lawrence, 161 definition, 175, 208 bread lens behavior, 210 with butter, 228 coupled mode analysis Brewster in photonic crystals, 540–543 angle, 111, 116 coupling window, 111 efficiency, 356 Brewster, David, 8, 111, 258 waveguides, 355–359 Brillouin scattering, 82 critical angle, 115–116, 327, 330 Brillouin, Léon, 82 crown glass, 71 broad-area laser, see lasers cryolite, 155 Bunsen, Robert, 6 cutoff butt coupling in a waveguide, 325 waveguides, 356 CVD, 465 CaCO3, 73 DBR laser, see lasers CaF2, 83, 85, 256 decibel, 79 camera on a chip, 436 depth of field, see depth of focus © in this web service Cambridge University Press www.cambridge.org Cambridge University Press 978-0-521-89542-2 - Fundamentals of Micro-Optics Hans Zappe Index More information Index 607 depth of focus, 48, 51, 230 ruled, 294 Descartes, René, 5, 7, 27 stray light, 293 detectors, see photodetectors surface emission, 426 DFB laser, see lasers tunable, 516–519 diamond, 85 VCSELs, 420–423 dielectric Wood’s anomalies, 294 constant, 19, 57 kinoform, 308, 472, 475 films, 93 limit, 219, 265, 282 dielectrophoresis, 504, 507 microlenses, 250 diffraction near-field, 267 apertures orders, 284 circular, 278–283 diffractive lenses, see diffraction dual slit, 274–275 diffractive optical elements, see diffraction multiple slits, 275–276 Digital Micromirror Device, see DMD rectangular, 277–278 diopter, 210, 505 single slit, 270–273 dipole moment, 63 binary optics, 12, 303, 475–478 Dirac, Paul, 6, 395 definition, 265 direct-bandgap semiconductor, 87, 88 diffractive lenses, 299–308 dispersion aberrations, 304–305 diffractive microlenses, 303 achromatic, 307–308 fiber, 376–379 athermal, 305–307 grating, 290, 299 binary optics, 12, 303, 475–478 material, 68, 71, 244 hybrids, 305–308 displays kinoforms, 308, 472, 475 optofluidic, 532–533 diffractive optical elements, 308–310, 472 distortion, 242 applications, 310 distributed feedback lasers, see lasers beam shaping, 310 DMD, 14–15, 193–196 design, 309–310 DOE, see diffractive optical elements fan-outs, 310 DOF, see depth of focus efficiency, 286 Dollond, John, 10 far field, 267, 269 Doppler shift, 127 Fraunhofer regime, 267, 269 Drude model, 65 Fresnel Drude, Paul, 65 regime, 267, 300 Ducasse, Alain, 56 zone plates, 303–304, 476 DVD, 283, 308, 452–455, 480 Fresnel–Kirchhoff formula, 268–270 gratings, 11, 283–299 e-beam, 473, 543 blazed, 11, 295, 297–299 echelette gratings, see blazed gratings chirped, 295 Edison, Thomas, 10 coupled-mode analysis, 540–543 effective couplers for waveguides, 358 focal length, 226, 257 Dammann, 311 index, 312, 331–332 DBR/DFB lasers, 418–420 eigenvalue equation, 46, 119, 337 diffraction pattern, 288 Einstein, Albert, 6 dispersion, 290, 299 elastomers, 224, 483, 485 efficiency, 293 electric fabrication, 478–480 field, 18 free spectral range, 291–293 flux density, 18, 72 ghosts, 293 electro-optic effects, 75, 438–441, 520 grating equation, 284, 288, 298 electroabsorption, 439 holographic, 295, 315, 478–480 electroactive polymers, 516 lamellar, 294 electromagnetic Littrow mount, 298–299 field profiles, 294–295 energy density, 32 resolution, 316 power density, 33 © in this web service Cambridge University Press www.cambridge.org Cambridge University Press 978-0-521-89542-2 - Fundamentals of Micro-Optics Hans Zappe Index More information 608 Index model for waveguides, 337–349 PDMS, 483, 485, 508, 509 waves, 30–36 photonic crystals, 543–545 boundary conditions, 106–107, 150–152 photoresist reflow, 12, 466–470 one-dimensional, 27 Pyrex, 85, 135, 197, 221, 465, 506, 508 polarization, 36–40, 107 replication, 480–485 spectrum, 34–36 self-assembly, 466–472, 543–545, 550 three-dimensional, 41 semiconductor processes, 464–466 transverse, 27–28 Si optical bench, 493–496 electrorefraction, 438 soft lithography, 470, 526, 528 electrowetting, 502–508 sol-gels, 484–485, 551 displays, 532–533 SU-8, 192, 484, 509 on dielectrics, 504 UV casting, 483 opto-electrowetting, 507 V-grooves, 491–492, 494 elliptical polarization, see polarization Fabry, Georges, 145 end-fire coupling Fabry–Pérot waveguides, 357 etalon, 145 energy interferometer, see interferometers bands, 87–88, 540–543 laser, see lasers conversion to wavelength, 35 resonances in electromagnetic fields, 32–34 for waveguide loss measurement, 363 epitaxial crystal growth, 91 laser, 398–401 erbium-doped fiber amplifiers, 427 parasitic, 357 etalon, see Fabry–Pérot fan-outs, 310 Euclid, 4, 7 far field Euler, Leonhard, 147 broad-area lasers, 417 evanescent field, 119–122, 342–344 diffraction, 267, 269 external cavity laser, see lasers edge-emitting lasers, 420 external incidence, 109, 111, 114 mirror, 186 extraordinary axis, 73 VCSELs, 423 waveguide, 360–361 f-number, see lenses Faraday effect, 97, 447 fabrication Faraday’s law, 21 binary optics, 475–478 Faraday, Michael, 5, 21 continuous-profile optics, 472–475 Fermat’s principle, 102–103, 204, 206 direct-write lithography, 472–473 Fermat, Pierre de, 5, 7, 102 e-beam, 473, 543 Fermi, Enrico, 395 electroplating, 480 Fermi–Dirac distribution, 395 embossing, 259, 482–483 fiber, optical, 13, 369–379 etching, 465 attenuation, 374–376 flip-chip, 492–494 Bragg gratings (FBG), 390, 516 glass molding, 484 dispersion, 376–379 gray-scale lithography, 473–475 dispersion-flattened, 379 hybrid integration, 489–490 dispersion-shifted, 379 injection molding, 259, 481–482 field distribution, 373–374 interference lithography, 12, 294, 295, 478–480, graded-index, 370 545 gyroscope, 144 ion exchange, 487–489 hollow-core, 371, 551 layer deposition, 465 modes, 374 LIGA, 481 multimode, 370 lithography, 12, 465, 472–480 photonic crystal, 371, 551 microcontact printing, 252, 470–472 plastic, 372, 385 MOEMS, 485–487 polarization-maintaining, 371 monolithic integration, 489–490 single-mode, 370 nano-imprint lithography, 483, 526 Fick, Adolf Eugen, 10 near-field holography, 480 field optical assembly, 489–496
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