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Materials and Anti-Adhesive Issues in UV-NIL Achille Francone Materials and anti-adhesive issues in UV-NIL Achille Francone To cite this version: Achille Francone. Materials and anti-adhesive issues in UV-NIL. Materials. Institut National Poly- technique de Grenoble - INPG, 2010. English. tel-00666073 HAL Id: tel-00666073 https://tel.archives-ouvertes.fr/tel-00666073 Submitted on 3 Feb 2012 HAL is a multi-disciplinary open access L’archive ouverte pluridisciplinaire HAL, est archive for the deposit and dissemination of sci- destinée au dépôt et à la diffusion de documents entific research documents, whether they are pub- scientifiques de niveau recherche, publiés ou non, lished or not. The documents may come from émanant des établissements d’enseignement et de teaching and research institutions in France or recherche français ou étrangers, des laboratoires abroad, or from public or private research centers. publics ou privés. THESE DE L’UNIVERSITE DE GRENOBLE Délivrée par l’Institut Polytechnique de Grenoble N° attribué par la bibliothèque |__|__|__|__|__|__|__|__|__|__| T H E S E pour obtenir le grade de DOCTEUR DE L’UNIVERSITE DE GRENOBLE Spécialité : « 2MGE Matériaux, Mécanique, Génie civil, Electrochimie » préparée au Laboratoire des Technologies de la Microélectronique (LTM-CNRS) dans le cadre de l’Ecole Doctorale « I-MEP2 Ingénierie Matériaux Mécanique Energétique Environnement Procéés Production » présentée et soutenue publiquement par Achille FRANCONE Le 9 Décembre 2010 Materials and anti-adhesive issues in UV-NIL Directeur de thèse: BOUSSEY Jumana JURY Président M.me AUZELY-VELTY Rachel Prof. à Université Joseph Fourier, Grenoble (France) Rapporteur M. SCHLATTER Guy Prof. à Université de Strasbourg, Strasbourg (France) Rapporteur M. SOPPERA Olivier Chargé de recherche CNRS-IS2M, Mulhouse (France) Directeur de thèse M.me BOUSSEY Jumana Chargé de recherche CNRS-LTM, Grenoble (France) Examinateur M. ZELSMANN Marc Chargé de recherche CNRS-LTM, Grenoble (France) Examinateur M. KEHAGIAS Nikolaos Postdoctorant ICN , Bellaterra (Espagne) Invité M.me IOJOIU Cristina Chargé de recherche CNRS-LEPMI, Grenoble (France) 2 Acknowledgments Although a lot of efforts were necessary to write this PhD thesis, I feel really satisfied about the final result. A lot of persons contributed directly and indirectly, more or less, to the achievement of this work. I am grateful to all the persons that accepted to participate to the jury of my thesis: Pr. AUZELY-VELTY Rachel, Dr. KEHAGIAS Nikolaos, Dr. IOJOIU, Cristina, Dr. ZELSMANN Marc, Dr. BOUSSEY Jumana, Dr. SOPPERA and Pr. SCHLATTER Guy, with the last two that accepted to evaluate my manuscript as rapporteurs. I really appreciated the hospitality shown during this three-year thesis work at the Laboratoire des Technologies de la Microélectronique (LTM) in Grenoble (France) inside the CEA-LETI-Minatec center. I would like indeed to thank Dr. JOUBERT Olivier t, LTM Head, for enabling me to carry out this work in an excellent technical and scientific environment. I am grateful to Région Rhône-Alpes for financing my three years PhD fellowship. Special thanks go to Dr. BOUSSEY Jumana my thesis director for having made this work possible. She launched me on this adventure, and I have received high-value support from her throughout the thesis. Her patience in front of di fficult situations taught me a lot. Sincere thanks go to Dr. ZELSMANN Marc, my daily supervisor at LTM lab, with whom I have spent uncountable hours engaged in enjoyable and enriching discussions. His broad background in physics and engineering, his sportive spirit, his rigorous work and his methodology have contributed significantly to my scientific and human apprenticeship. Then, I would like to thank a group of persons for the nice collaborations we had during my PhD, managing to get interesting results during different kinds of experiments. These persons are: Dr. POULAIN Christophe during nanoindentation experiments at CEA Grenoble-LETI- DIHS-Laboratoire de Caractérisation et de Fiabilité des Microsystèmes; LOMBARD Christophe and Dr. PEPIN-DONAT Brigitte during electron spin resonance experiments at CEA Grenoble-INAC- Laboratoire de Structure et Propriétés d’Architecture Moléculaires; Dr. IOJOIU, Cristina during Fourier Transform Infrared Spectroscopy experiments at CNRS- Grenoble Laboratoire d’Electrochimie et de Physicochimie des Matériaux et des Interfaces. During my Phd I had also the possibility to collaborate and to run experiments away from Grenoble. In particular I had the pleasure to collaborate with Dr. ZOMPATORI Alberto, dependent of SOLVAY Solexis S.p.A., who hosted me in the Italian research and development centre at Bollate to select an anti-adhesive commercial product. His collaboration continued during all the experiments run on the product, giving precious advices over the interpretation of the results. Many thanks go to HAATAINEN Tomi, that although several difficulties allows to me to run a week demolding force experiments in the Finnish VTT technical research centreat Espoo. Particular acknowledgments go to Pr. SOTOMAYOR TORRES Clivia who allowed to me to join her Spanish group, ICN Phononic and Photonics Nanostructures Group, at Bellaterra. I spent seventh months of my Phd working with this group and it was a great experience under human and professional point of view. I found a wonderful atmosphere thanks to Nik, Vincent, Olivier, Damien, John, Michael, Sinead. 3 I cannot forget about all the friends that shared unforgettable experiences with me in Grenoble (sports, parties, trips, etc.) and that determined my positive judgment over the time I spent in France during my PhD. A million thanks to my beloved family members back home in Italy, that encouraged me throughout the PhD time, sharing positive and negative moments. Last but not least, my sincere thanks go to my lovely girlfriend Chiara, which gave me the moral support and motivations to go on, especially during the most critical moments of the PhD thesis writing period. 4 Preface The works of research obtained after my three year Phd were well valorized. In fact, the results were presented during different events (international conferences, scientific day, summer school) and in different manners (journal publications, poster and oral presentations). These are listed below. Journal Publications 1) D. Boutry, R. Galand, A. Beaurain, A. Francone , B. Pelissier, M. Zelsmann, and J. Boussey, “Mold cleaning and fluorinated anti-sticking treatments in nanoimprint lithography”, Microelectron Eng, 86 (4-6), p. 669-672, 2009. 2) M. Zelsmann, C. Alleaume, D. Boutry , A. Francone, A. Beaurain, B. Pelissier and J. Boussey , “Degradation and surfactant-aided regeneration of fluorinated anti-sticking mold treatments in UV nanoimprint lithography”, Microelectron Eng, 87 (5-8), p. 1029-1032, 2010. 3) M. Zelsmann, D. Boutry, A. Francone , C. Allaume, I. Kurt, A. Beaurain, B. Pelissier, B. Pépin-Donat, C. Lombard and J. Boussey , “Double-anchoring fluorinated molecules for anti- adhesion mold treatment in UV nanoimprint lithography”, J. Vac. Sci. Technol. B, 27(6), p. 2873-2876, 2009. 4) A. Francone , C. Iojoiu, C. Poulain, C. Lombard, B. Pépin-Donat, J. Boussey and M. Zelsmann, “Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography”, J. Vac. Sci. Technol. B, 28(6), p. C6M72-C6M76, 2010. 5) N. Kehagias, A. Francone , M. Chouiki, M. Zelsmann, V. Reboud, R. Schoeftner and C. Sotomayor Torres, “Low temperature direct imprint of polyhedral silsequioxane (PSSQ) resist”, to appear in Microelectron Eng. Poster Presentations All the works of research above listed as journal publications were presented as well during international conferences. Those published in Microelectronic Engineering were exposed as poster presentations during the same year edition of Micro and Nano engineering conference; those published in Journal of Vacuum Science & Technology B were exposed as poster presentations during the same year edition of Electron, Ion, Photon Beam Technology and Nanofabrication conference. Another poster was presented, as follows: N. Kehagias, R. A. Farrell, M. Zelsmann, A. Francone , M. Chouiki, V. Reboud, J. D. Holmes, M. A. Morris and C. Sotomayor Torres, “PSSQ templates fabricated by RUVNIL technique for graphoepitaxy”, Nanoprint and Nanoimprint Technology conference, Copenhagen (Denmark), Oct 13-15, 2010. 5 Oral Presentations 1) A. Francone , “Materials and process development of UV-based nanoimprint lithography”, NanoSciences Summer school, Tremblay (France), Jun 23-28, 2008. 2) A. Francone , “Développement de la lithographie par nano-impression assistée par UV (UV-NIL)”, Cluster Microéléctronique, Nanosciences et Nanoélectronique Scientific day, Grenoble (France), Oct 10, 2009. 3) M. Zelsmann, C. Alleaume, D. Boutry , A. Francone, A. Beaurain, B. Pelissier and J. Boussey , “Degradation and surfactant-aided regeneration of fluorinated anti-sticking mold treatments in UV nanoimprint lithography”, Micro and Nano Engineering conference, Ghent (Belgium), Sept 28-Oct 1, 2009. 6 Table of contents INTRODUCTION ................................................................................................................................................. 9 CHAPTER I. LITHOGRAPHY AND UV-ASSISTED NANOIMPRINT LITHOGRAPHY ................. 11 1 INTRODUCTION ........................................................................................................................................ 11 2 LITHOGRAPHY IN MICROELECTRONICS ...................................................................................................
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