“Wiiu!I!L%%Iiiir COPY
Total Page:16
File Type:pdf, Size:1020Kb

Load more
Recommended publications
-
Lecture 09 Closing Switches.Pdf
High-voltage Pulsed Power Engineering, Fall 2018 Closing Switches Fall, 2018 Kyoung-Jae Chung Department of Nuclear Engineering Seoul National University Switch fundamentals The importance of switches in pulsed power systems In high power pulse applications, switches capable of handling tera-watt power and having jitter time in the nanosecond range are frequently needed. The rise time, shape, and amplitude of the generator output pulse depend strongly on the properties of the switches. The basic principle of switching is simple: at a proper time, change the property of the switch medium from that of an insulator to that of a conductor or the reverse. To achieve this effectively and precisely, however, is rather a complex and difficult task. It involves not only the parameters of the switch and circuit but also many physical and chemical processes. 2/44 High-voltage Pulsed Power Engineering, Fall 2018 Switch fundamentals Design of a switch requires knowledge in many areas. The property of the medium employed between the switch electrodes is the most important factor that determines the performance of the switch. Classification Medium: gas switch, liquid switch, solid switch Triggering mechanism: self-breakdown or externally triggered switches Charging mode: Statically charged or pulse charged switches No. of conducting channels: single channel or multi-channel switches Discharge property: volume discharge or surface discharge switches 3/44 High-voltage Pulsed Power Engineering, Fall 2018 Characteristics of typical switches A. Trigger pulse: a fast pulse supplied externally to initiate the action of switching, the nature of which may be voltage, laser beam or charged particle beam. -
Lawrence Berkeley National Laboratory Recent Work
Lawrence Berkeley National Laboratory Recent Work Title TESTING TECHNIQUES USED IN THE QUALITY SELECTION OF RCA 6810 MULTIPLIER PHOTOTUBES Permalink https://escholarship.org/uc/item/5jv0v3kb Author Kirsten, Frederick A. Publication Date 1956-10-16 eScholarship.org Powered by the California Digital Library University of California UNIVERSITY OF CALIFORNIA ' TWO-WEEK LOAN COPY This is a Library Circulating Copy which may be borrowed for two weeks. For a personal retention copy, call Tech. Info. Diuision, Ext. 5545 BERKELEY, CALIFORNIA DISCLAIMER This document was prepared as an account of work sponsored by the United States Government. While this document is believed to contain correct information, neither the United States Government nor any agency thereof, nor the Regents of the University of California, nor any of their employees, makes any warranty, express or implied, or assumes any legal responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by its trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply its endorsement, recommendation, or favoring by the United States Government or any agency thereof, or the Regents of the University of California. The views and opinions of authors expressed herein do not necessarily state or reflect those of the United States Government or any agency thereof or the Regents of the University of California. · UCRL- 3430(rev.) Engineering Distribution UNIVERSITY OF CALIFORNIA Radiation Laboratory Berkeley,. California Contract No. W -7405-eng-48 • •·l TESTING TECHNIQUES USED IN THE QUALITY SELECTION OF RCA 6810 MULTIPLIER PHOTOTUBES . -
CHARGE-Series Instructions
CHARGE-SERIES operating instructions REV216 Use for models CHARGE1000, CHARGE5000, CHARGE10000 DANGER do not use this unit unless you fully understand high -voltage and its hazards. DANGER A SERIOUS DEADLY SHOCK HAZARD WILL EXIST WHEN USING WITH HIGH ENERGY CAPACITORS ABOVE 50 J You can calculate joules by squaring the charging voltage, then multiplying by one half the capacitance in microfarads and dividing by 1 million. If over 50 J use extreme caution as improper contact can electrocute OR cause serious burns. PLEASE READ THE FOLLOWING VERY CAREFULLY Capacitive energy storage over 1000 joules MUST use for the high-voltage charge feed wire from the unit to the capacitors being SEVERAL FEET of a thin insulated preferably Teflon wire of a gauge that will disintegrate as a fuse between 100-500 amps. This wire should be sleeved into some polyethylene tubing that is available in a hardware store. You may even want to use several telescopic layers as this sleeving to provide a positive voltage rating and good mechanical rigidity. Note on knob Figure 1: Front Panel Controls CHARGE-SERIES ● rev216 © 2014 Information Unlimited www.amazing1.com 1 All rights reserved Figure 2: Back Panel CHARGE-SERIES ● rev216 © 2014 Information Unlimited www.amazing1.com 2 All rights reserved APPLICATIONS Electronic circuit charges up high energy banks of electrolytic, photo flash or other types storage capacitors from 200 to 30,000 V (depending on charger model) . Recommended capacities are between 100 to 10,000 µF. This equates out to many thousands of joules! Note the kinetic energy of a 30-06 is 750 J. -
Iii. Modern Electronic Techniques Applied to Physics and Engineering
_~__~~n~~____ I_~__ III. MODERN ELECTRONIC TECHNIQUES APPLIED TO PHYSICS AND ENGINEERING A. DESIGN AND CONSTRUCTION OF A MICROWAVE ACCELERATOR Staff: Professor J. C. Slater Professor A. F. Kip Dr. W. H. Bostick R. J. Debs P. T. Demos M. Labitt L. Maier S. J. Mason I. Polk J. R. Terrall Since the last progress report, primary emphasis has been on con- struction of additional lengths of accelerating cavity and the associated equipment necessary for operation. Primary design work has been finished on all components necessary for operation of the accelerator and most com- ponents are in the process of being assembled. The following items include recent developments and design details which have not been mentioned earlier. Delivery on the 2-Mev Van de Graaff machine is expected at an early date. A pulsing circuit to modulate the electron beam from the Van de Graaff machine has been designed and built. Since this circuit is to be placed in the dome of the machine at high pres- sure, all component parts have been subjected to 400 lb/in2 pressure to ensure that they have the necessary strength. Machining work on the one-foot accelerator sections is essentially completed. Assembly and brazing of the parts are now in progress. The final design for the 20-foot accelerator tube has been slightly modified in that it has been divided into three sections which are isolated from each other rf-wise by short drift tubes which act as waveguides beyond cut-off. The primary purpose of this procedure is to allow for tuning each section to optimum frequency independently. -
Capillary Discharge XUV Radiation Source M
Acta Polytechnica Vol. 49 No. 2–3/2009 Capillary Discharge XUV Radiation Source M. Nevrkla A device producing Z-pinching plasma as a source of XUV radiation is described. Here a ceramic capacitor bank pulse-charged up to 100 kV is discharged through a pre-ionized gas-filled ceramic tube 3.2 mm in diameter and 21 cm in length. The discharge current has ampli- tude of 20 kA and a rise-time of 65 ns. The apparatus will serve as experimental device for studying of capillary discharge plasma, for test- ing X-ray optics elements and for investigating the interaction of water-window radiation with biological samples. After optimization it will be able to produce 46.9 nm laser radiation with collision pumped Ne-like argon ions active medium. Keywords: Capillary discharge, Z-pinch, XUV, soft X-ray, Rogowski coil, pulsed power. 1 Introduction column by the Lorentz force FL of a magnetic field B of flowing current I – a Z-pinch. First, the current flows along the In the region of XUV (eXtended Ultra Violet) radiation, walls of the capillary. The flowing current creates a magnetic i.e. in the region of ~ (0.2–100) nm there are two significant field, which affects the charged particles of the plasma by sub-regions. The first is the water-window region (2.3–4.4) a radial force. This force compresses the particles like a nm. Radiation in this region is highly absorbed in carbon, but snowplow till the magnetic pressure is equilibrated by the not much absorbed in water, so it is useful for observing or- plasma pressure. -
7.4 UV, Visible and Near IR Detectors
7.4 UV, Visible and Near IR Detectors • in the photoelectric effect light ejects an electron from a metal surface • a vacuum phototube converts a light flux into an electrical current, and is useful for detecting high levels of light • a photomultiplier converts a single photon into a current pulse, and is useful for detecting low levels of light • photodiodes are based on the promotion of electrons from the valence band to the conduction band of semiconductors, and are useful for detecting both high and low levels of light 7.4 : 1/8 Photoelectric Effect • because metals contain free electrons they can absorb UV, visible, and near IR radiation • if the energy of the absorbed photon is greater than the ______ ________ of the metal, an electron is ejected into the vacuum • the energy of the photon equals the work function of the metal plus the kinetic energy of the electron hc1 hc =+mv2 ωλ = λ 2 0 ω where ω is the work function, and λ0 is the wavelength that just barely ejects an electron • alkali metals are commonly used in detectors metal Li Na K Rb Cs ω 2.9 eV 2.75 2.3 2.16 2.14 λ0 428 nm 451 539 574 579 • mixtures of alkali metals can give λ0 as high as ______ nm • because __________ energy can combine with optical energy, the onset of photo-ejection is gradual 7.4 : 2/8 Vacuum Phototube A metallic surface with a low work function is placed inside an evacuated tube. When light interacts with the metal, electrons are photo-ejected. -
Type Here the Title of Your Paper
CIGRE-183 2019 CIGRE Canada Conference Montréal, Québec, September 16-19, 2019 The Research on the Key Equipment for 750kV Fixed Series Compensation in 3000m a.s.l. CHEN Yuanjun,ZHOU Qiwen,WANG Dechang,Gao Jian,Chen Wei, Zhang Daoxiong (1. NR Electric Co., Ltd., Nanjing 211102, China) SUMMARY The Qinghai 750kV fixed series compensation is officially put into operation in December 2018, it is located in the Qaidam area of China where the altitude is 3000m.In this paper, the high-altitude insulation calculation of the main equipment is carried out, and the power frequency withstand voltage, lightning impulse voltage, dry arc distance and creepage distance of each main equipment are proposed. Based on the project, we researched the key equipment such as spark gap and measurement system. According to the ANSYS simulation, the structure of the main electrode of the spark gap is optimized from ball-ball electrode to ball-plate electrode to make the self-trigger voltage be more stable. Considering the self-trigger voltage of the trigatron is up to 60kVpeak, the electrode structure of the trigatron is optimized to the structure with large curvature spherical design. The new trigatron has a better linearity and the maximum standard deviation is less than 0.6. In order to research the triggering characteristics, we completed the self-trigger test in the laboratory where the altitude is 0m, and fit the curve of the main gap air distance and the self-trigger voltage. Considering the altitude correction, we calculate the theoretical value of the main gap air distance according the self-trigger curve. -
BU4-20DCOMPONENT LIST Serial Item No
BU4-20DCOMPONENT LIST Serial Item No. Component Type Manufacturer Quantity Approval No. 1 Fuse Fuse 20N250V 2A Xiamen Hollyland 1 E156471/E23 NF02-2A Co.,Ltd./Southern Electronic 4086 Element Factory 2 D1-D5 Diode 1N4007 1A,1KV Changda Electronic Component 5 No Factory No 3 T1-T2 Transistor D4128L 5 Jilin Huawei Electronics Co., Ltd. 2 A Shenzhen Shen’ai Electronics Co., Ltd 4 R3,R5 Resistor RT14 15Ω 1/4W Xiamen Gaoming Electronics Co., 2 No Ltd./ChangZhou WuJin HuaYu Electronic Co.,Ltd 5 R0、R1、 Resistor RT14 680kΩ 1/4W Xiamen Gaoming Electronics Co., 3 No R2 Ltd./ChangZhou WuJin HuaYu Electronic Co.,Ltd 6 C1 Capacitor CD11G 105℃ 22µF Yiyang Zijiang Electronic 1 No DC250V Component Co., Ltd. HXB 105℃ 22µF Xiamen Fala HeXin Capacitor DC250V Factory 7 C01 Capacitor CL 125℃ 68nF Xiamen Faratronic Co., Ltd. 1 No DC250V Epcos 8 C2 Capacitor CBB 125℃500pF Shanghai JiaLiBao Electron Co.,Ltd 1 No DC1250V Zhejiang Changxing Huaqiang Electron Co., Ltd. 9 C3 Capacitor CL 125℃ 22nF Zhuji Wufeng Capacitor Factory 1 No DC160V Zhejiang Changxing Huaqiang Electron Co., Ltd. 10 C4 Capacitor CL 125℃ 68nF Xiamen Faratronic Co., Ltd. 1 No DC250V Epcos 11 C5 Capacitor CBB 125℃5.6nF Shanghai JiaLiBao Electron Co.,Ltd 1 No DC1250V Zhejiang Changxing Huaqiang Electron Co., Ltd. Xiamen Faratronic Co., Ltd. Epcos 12 DB3 Trigatron DB3 Vz=32V Jinan Jifu Semiconductor Co., Ltd. 1 No 13 L0 Inductor LGA0410 Southern Electronic Element 1 No 100μH Factory 14 L1 Inductor EE161.5-1.6mH Xiamen XiaoTian Electronics Co., 1 No Ltd. -
14F1417 Doc 01
This document is made available through the declassification efforts and research of John Greenewald, Jr., creator of: The Black Vault The Black Vault is the largest online Freedom of Information Act (FOIA) document clearinghouse in the world. The research efforts here are responsible for the declassification of hundreds of thousands of pages released by the U.S. Government & Military. Discover the Truth at: http://www.theblackvault.com . - ·- - --·--·---------------------- A RAND NOTE ; '\Ill C: \ I I P;iS IIF ,\ ~l lrJ I T "•\ ~TI Cl l ·IIINI l\1':,\l'Cl :-o; J'R(\(;:c.N II . i•l. ''ii'll-l'•l\~ FR r: wsn:r: 'i\~ TT CJIJ·::: cl' l PrPpared For J)v2S4 forr.~ dat..:d 10/23/80 for t:o•ttrac t tiDI\903-; 8-C-018~ .and C l os~ified by multic.:..P=.lc::..' ...:s:..::o:..::u:..::r:..::c:..::I!:.:.S:...·----- Downgrade to o •._ ____ _ Declassify on____ _________ or Re·,iew on.--J\wiJ..;.'!.!ill:~:t~-·"'-!.... _ •...!. '1 !..!11____ _ .. ,.,. , : ~·~ . ' Un1:ut.ho-:-iz;J1 u; 6:wo tl ou:~ •--~ · ·- A RAND NOTE INDICATIONS Of A SOVIET PARTI CLE-S~! WF.APON PROGRAM II. PULSED-POWER CLOSlh~ SWITCHES (U) Simon Ka esel 1\uguc;t 1981 / N-1738- ARPA The Defense Advanced Re sear ch Projects Agency >- 8 ~ 81.. 10 ~ b.;.. r ... ~ -,4-- .,_~ -· ~..-.-.... - ·- BEST AVAILABLE COPY .. I.: I'· .u.: ·ilit:a J 1he research described i n this report was spon~ored by t h• Defense Advanced Research P~·oject$ Agency cnder ARPA Order No. 3520, Contract No. M!lA90J-78-I~-0 189, Director' s Office. -
A Relatively Simple Device for Recording Radiation Intensities in The
A RELATIVELY SIMPLE DEVICE FOR RECORDING RADIATION INTENSITIES IN HE ULTRAVIOLET PORTION OF THE SPECTRUM by HENRY WALLACE HENDRICKS A THESIS submitted to OREGON STATE COLLEGE in partial fulfillment of the requirements for the degree of MASTER OF SCIENCE June 19S0 APPROVED: Professor of Physics In Charge of Major Chairman of School Graduate Committee Dean of Graduate School ACKN OWLEDGMENT Sincere appreciation and thanks are expressed to Dr. Weniger for his interest and assistance in the preparation of this thesis. TABLE OF CONThNTS a ge I NTROD[JCTION . ..... , . i Statement of . Problem . i Some Basic Information about Ultraviolet, Sun and Sky Radiation, Its Biological Etc. Effectiveness, . 1 INSTRUMLNTS FOR RECORDING ULTRAVIOLET INTENSITIES . 3 DESIGNOONSIDERATIONS. ... .. .. The R e e e i y e . r ....... The . Receiving Circuit . 9 The R e c o e . rd r . 9 . ThePowerSupply . .10 EX>ERIMENTAL . 1)EVELOPMENT . 11 THE FINAL CIRCUIT AND . 7OER SUPPLY . 16 PREPARATION AND SILVERING OF THE QUARTZ PLATES . 20 THERECEIVERUNIT..................23 TESTOFAPPARATtJS . .26 Adjustment8 . 26 Results and Conclusions . 27 . Data . 3]. BILIOGRAPHY . 37 LIST OF ILLUBTRATIONS Figure Page J. Spectral Sensitivfty of the S Photocathode 6 2 OriginalCircuit . 12 3 First Vacuum Tube Circuit . 12 Lj. Variation of the Counts per Minute with Filament Voltage . 11i The Final Circuit . ........ 17 6 The Power Suoply, Counter and Receiver . 22 The 7 Receiver ............... 2)4. 8 Step-diagram from Data ObtaIned on MaylO,l9O ............. 28 9 Step-diagram from Data Obtained on Mayll,l9O ............. 29 10 Step-diagram from Data Obtained on Mayl2,l95O ......... .. 30 A RELATIVELY SIMPLE DEVICE FOR RECORDING RADIATION .LNTENSITIES IN T}IE ULTRAVIOLET PORTION OF THE SPECTRUM INTRODUCTION Statement of Problem The purpose of this thesis is to develop a more or less portable aiaratua that will measure ultraviolet energy in or near the erythemal region. -
Controlled Dynamics of Laser-Cooled Ions in a Penning Trap
Controlled Dynamics of Laser-Cooled Ions in a Penning Trap Eoin Seymour Gwyn Phillips December 2004 Thesis submitted in partial fulfilment of the requirements for the degree of Doctor of Philosophy of the University of London and for the Diploma of Imperial College Abstract I report on a scheme for improved control over the motion of small numbers of laser-cooled ions in a Penning trap. This work is part of a larger project to assess the suitability of the Penning trap for quantum information processing (QIP). Laser cooling of ions in this type of trap is complicated by large Zeeman shifts of the cooling- and repumping-transition wavelengths from those in zero mag- netic field. Lasers can not, therefore, be tuned to the unshifted atomic spectral lines using an external reference such as a hollow-cathode lamp. In order to address this difficulty I built a wavemeter with a precision of one part in 107 for direct tuning of the lasers to the transition wavelengths. It was also necessary to improve the laser-frequency stabilities by building reference cavities to which they could be locked. In evaluating the suitability of the Penning trap for QIP, one must address the poor localisation of the ions due to the difficulty in cool- ing one of the radial motions: the magnetron motion. I have implemented a technique called axialisation that reduces this motion's amplitude by coupling it to the other radial motion: the modified cyclotron motion, which is efficiently laser-cooled. This was done with small clouds of magnesium ions and later with small clouds of calcium ions. -
What Is Pulsed Power
SAND2007-2984P PULSED POWER AT SANDIA NATIONAL LABORATORIES LABORATORIES NATIONAL SANDIA PULSED POWER AT WHAT IS PULSED POWER . the first forty years In the early days, this technology was often called ‘pulse power’ instead of pulsed power. In a pulsed power machine, low-power electrical energy from a wall plug is stored in a bank of capacitors and leaves them as a compressed pulse of power. The duration of the pulse is increasingly shortened until it is only billionths of a second long. With each shortening of the pulse, the power increases. The final result is a very short pulse with enormous power, whose energy can be released in several ways. The original intent of this technology was to use the pulse to simulate the bursts of radiation from exploding nuclear weapons. Anne Van Arsdall Anne Van Pulsed Power Timeline (over) Anne Van Arsdall SAND2007-????? ACKNOWLEDGMENTS Jeff Quintenz initiated this history project while serving as director of the Pulsed Power Sciences Center. Keith Matzen, who took over the Center in 2005, continued funding and support for the project. The author is grateful to the following people for their assistance with this history: Staff in the Sandia History Project and Records Management Department, in particular Myra O’Canna, Rebecca Ullrich, and Laura Martinez. Also Ramona Abeyta, Shirley Aleman, Anna Nusbaum, Michael Ann Sullivan, and Peggy Warner. For her careful review of technical content and helpful suggestions: Mary Ann Sweeney. For their insightful reviews and comments: Everet Beckner, Don Cook, Mike Cuneo, Tom Martin, Al Narath, Ken Prestwich, Jeff Quintenz, Marshall Sluyter, Ian Smith, Pace VanDevender, and Gerry Yonas.