(12) United States Patent (10) Patent No.: US 6,548,240 B2 Yamaguchi (45) Date of Patent: Apr
USOO654824OB2 (12) United States Patent (10) Patent No.: US 6,548,240 B2 Yamaguchi (45) Date of Patent: Apr. 15, 2003 (54) PHOTOTHERMOGRAPHIC MATERIAL 6,060,228 A 5/2000 Suzuki ....................... 430/522 6,190,854 B1 * 2/2001 Sampei....................... 430/617 (75) Inventor: Tetsuo Yamaguchi, Kanagawa (JP) * cited by examiner (73) Assignee: Fuji Photo Film Co., Ltd., Kanagawa Primary Examiner Thorl Chea (JP) (74) Attorney, Agent, or Firm-Birch, Stewart, Kolasch & (*) Notice: Subject to any disclaimer, the term of this Birch, LLP patent is extended or adjusted under 35 (57) ABSTRACT U.S.C. 154(b) by O. davs. (b) by y Disclosed is a photothermographic material containing a non-photoSensitive Silver Salt, a photosensitive Silver halide (21) Appl. No.: 09/962,449 and a binder on a Support, which comprises a nucleating (22) Filed: Sep. 26, 2001 agent and a Surfactant represented by the following formula (65) Prior Publication Data US 2003/0008251A1 Jan. 9, 2003 Rf-(Rc)nm-Z Formula (F): (30) Foreign Application Priority Data wherein Rf represents a perfluoroalkyl group, Rc represents an alkylene group, and Z represents a group having an Sep. 27, 2OOO (JP) - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - 2OOO-293867 anionic grOup, cationic grOup, betaine group or nonionic (51) Int. Cl." ................................................ G03C 11498 group required for imparting Surface activity, n is 0 or 1 and (52) U.S. Cl. ........................ 430/619, 430/598; 430/631 m is 1, 2 or 3. According to the present invention, there is (58) Field of Search ................................. 430/619, 264, provided a photothermographic material, in particular, for photomechanical processes, more specifically, for Scanners 430/631,598 and image Setters, which shows low fog and high Dmax References Cited (maximum density), and exhibits little increase of fog even (56) after the photoSensitive material after development is Stored U.S.
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