Design of Diamond Power Devices: Application to Schottky Barrier Diodes
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The Pennsylvania State University the Graduate School THE
The Pennsylvania State University The Graduate School THE EFFECTS OF INTERFACE AND SURFACE CHARGE ON TWO DIMENSIONAL TRANSITORS FOR NEUROMORPHIC, RADIATION, AND DOPING APPLICATIONS A Dissertation in Electrical Engineering by Andrew J. Arnold © 2020 Andrew J. Arnold Submitted in Partial Fulfillment of the Requirements for the Degree of Doctor of Philosophy August 2020 The dissertation of Andrew J. Arnold was reviewed and approved by the following: Thomas Jackson Professor of Electrical Engineering Co-Chair of Committee Saptarshi Das Assistant Professor of Engineering Science and Mechanics Dissertation Advisor Co-Chair of Committee Swaroop Ghosh Assistant Professor of Electrical Engineering Rongming Chu Associate Professor of Electrical Engineering Sukwon Choi Assistant Professor of Mechanical Engineering Kultegin Aydin Professor of Electrical Engineering Head of the Department of Electrical Engineering ii Abstract The scaling of silicon field effect transistors (FETs) has progressed exponentially following Moore’s law, and is nearing fundamental limitations related to the materials and physics of the devices. Alternative materials are required to overcome these limitations leading to increasing interest in two dimensional (2D) materials, and transition metal dichalcogenides (TMDs) in particular, due to their atomically thin nature which provides an advantage in scalability. Numerous investigations within the literature have explored various applications of these materials and assessed their viability as a replacement for silicon FETs. This dissertation focuses on several applications of 2D FETs as well as an exploration into one of the most promising methods to improve their performance. Neuromorphic computing is an alternative method to standard computing architectures that operates similarly to a biological nervous system. These systems are composed of neurons and operate based on pulses called action potentials. -
Chapter Iii Power Bipolar Junction Transistor (Bjt)
50 CHAPTER III POWER BIPOLAR JUNCTION TRANSISTOR (BJT) 3.1 INTRODUCTION Switching time and switching losses are primary concerns in high power applications. These two factors can significantly influence the frequency of operation and the efficiency of the circuit. Ideally, a high power switch should be able to turn-on and turn-off controllably and with minimum switching loss. The Bipolar junction transistor is an important power semiconductor device used as a switch in a wide variety of applications. The switching speed of a BJT is often limited by the excess minority charge storage in the base and collector regions of the transistor during the saturation state. The conventional methods for improving the switching frequency by reducing the lifetime of the lightly doped collector region through incorporation of impurities such as Au, Pt or by introducing radiation-induced defects have been found unsuitable for high voltage devices due to increased leakage, soft breakdown and high ‘ON’ state voltage [27]. Among the techniques proposed to overcome these problems, use of universal contact (UC) [2, 14] is particularly promising. The present work looks in detail at the various aspects arising out of incorporation of UC in BJTs. The UC is incorporated in the transistor by creating additional diffused regions in an otherwise conventional transistor. These diffused regions influence the minority carrier distribution, nature of minority current flow and also some other parameter such as VCE(sat). To study these phenomena, 51 an analytical model is developed and is utilized to understand the effect of universal contact on reverse recovery, VCE(sat) and other related issues. -
Electrical Properties of Silicon Nanowires Schottky Barriers Prepared by MACE at Different Etching Time
Electrical Properties of Silicon Nanowires Schottky Barriers Prepared by MACE at Different Etching Time Ahlem Rouis ( [email protected] ) Universite de Monastir Faculte des Sciences de Monastir https://orcid.org/0000-0002-9480-061X Neila Hizem Universite de Monastir Faculte des Sciences de Monastir Mohamed Hassen Institut Supérieur des Sciences Appliquées et de Technologie de Sousse: Institut Superieur des Sciences Appliquees et de Technologie de Sousse Adel kalboussi Universite de Monastir Faculte des Sciences de Monastir Original Research Keywords: Electrical Properties of Silicon, Etching Time, symmetrical current-voltage, capacitance-voltage Posted Date: February 11th, 2021 DOI: https://doi.org/10.21203/rs.3.rs-185736/v1 License: This work is licensed under a Creative Commons Attribution 4.0 International License. Read Full License Electrical properties of silicon nanowires Schottky barriers prepared by MACE at different etching time Ahlem Rouis 1, *, Neila Hizem1, Mohamed Hassen2, and Adel kalboussi1. 1Laboratory of Microelectronics and Instrumentation (LR13ES12), Faculty of Science of Monastir, Avenue of Environment, University of Monastir, 5019 Monastir, Tunisia. 2Higher Institute of Applied Sciences and Technology of Sousse, Taffala City (Ibn Khaldoun), 4003 Sousse, Tunisia. * Address correspondence to E-mail: [email protected] ABSTRACT This article focused on the electrical characterization of silicon nanowires Schottky barriers following structural analysis of nanowires grown on p-type silicon by Metal (Ag) Assisted Chemical Etching (MACE) method distinguished by their different etching time (5min, 10min, 25min). The SiNWs are well aligned and distributed almost uniformly over the surface of a silicon wafer. In order to enable electrical measurement on the silicon nanowires device, Schottky barriers were performed by depositing Al on the vertically aligned SiNWs arrays. -
Download Technical Paper
TECHNICAL PAPER Thermal and Electrical Breakdown Versus Reliability of Ta2O5 under Both – Bipolar Biasing Conditions P. Vašina, T. Zedníček, Z. Sita AVX Czech Republic, s.r.o., Dvorakova 328, 563 01 Lanskroun, Czech Republic J. Sikula and J. Pavelka CNRL TU Brno, Technicka 8, 602 00 Brno, Czech Republic Abstract: Our investigation of breakdown is mainly oriented to find a basic parameters describing the phenomena as well as its impact on reliability and quality of the final product that is “GOOD” tantalum capacitor. Basically, breakdown can be produced by a number of successive processes: thermal breakdown because of increasing conductance by Joule heating, avalanche and field emission break, an electromechanical collapse due to the attractive forces between electrodes electrochemical deterioration, dendrite formation and so on. Breakdown causes destruction in the insulator and across the electrodes mainly by melting and evaporation, sometimes followed by ignition. An identification of breakdown nature can be achieved from VA characteristics. Therefore, we have investigated the operating parameters both in the normal mode, Ta is a positive electrode, as well as in the reverse mode with Ta as a negative one. In the reverse mode we have reported that the thermal breakdown is initiated by an increase of the electrical conductance by Joule heating. Consequently followed in a feedback cycle consisting of temperature - conductivity - current - Joule heat - temperature. In normal mode an electrical breakdown can be stimulated by an increase of the electrical conductance in a channel by an electrical pulse and stored charge leads to the sample destruction. Both of these breakdowns have got a stochastic behaviour and could be hardly localized in advance. -
ECE 255, Diodes and Rectifiers
ECE 255, Diodes and Rectifiers 23 January 2018 In this lecture, we will discuss the use of Zener diode as voltage regulators, diode as rectifiers, and as clamping circuits. 1 Zener Diodes In the reverse biased operation, a Zener diode displays a voltage breakdown where the current rapidly increases within a small range of voltage change. This property can be used to limit the voltage within a small range for a large range of current. The symbol for a Zener diode is shown in Figure 1. Figure 1: The symbol for a Zener diode under reverse biased (Courtesy of Sedra and Smith). Figure 2 shows the i-v relation of a Zener diode near its operating point where the diode is in the breakdown regime. The beginning of the breakdown point is labeled by the current IZK also called the knee current. The oper- ating point can be approximated by an incremental resistance, or dynamic resistance described by the reciprocal of the slope of the point. Since the slope, dI proportional to dV , is large, the incremental resistance is small, generally on the order of a few ohms to a few tens of ohms. The spec sheet usually gives the voltage of the diode at a specified test current IZT . Printed on March 14, 2018 at 10 : 29: W.C. Chew and S.K. Gupta. 1 Figure 2: The i-v characteristic of a Zener diode at its operating point Q (Cour- tesy of Sedra and Smith). The diode can be fabricated to have breakdown voltage of a few volts to a few hundred volts. -
A Vertical Silicon-Graphene-Germanium Transistor
ARTICLE https://doi.org/10.1038/s41467-019-12814-1 OPEN A vertical silicon-graphene-germanium transistor Chi Liu1,3, Wei Ma 1,2,3, Maolin Chen1,2, Wencai Ren 1,2 & Dongming Sun 1,2* Graphene-base transistors have been proposed for high-frequency applications because of the negligible base transit time induced by the atomic thickness of graphene. However, generally used tunnel emitters suffer from high emitter potential-barrier-height which limits the tran- sistor performance towards terahertz operation. To overcome this issue, a graphene-base heterojunction transistor has been proposed theoretically where the graphene base is 1234567890():,; sandwiched by silicon layers. Here we demonstrate a vertical silicon-graphene-germanium transistor where a Schottky emitter constructed by single-crystal silicon and single-layer graphene is achieved. Such Schottky emitter shows a current of 692 A cm−2 and a capacitance of 41 nF cm−2, and thus the alpha cut-off frequency of the transistor is expected to increase from about 1 MHz by using the previous tunnel emitters to above 1 GHz by using the current Schottky emitter. With further engineering, the semiconductor-graphene- semiconductor transistor is expected to be one of the most promising devices for ultra-high frequency operation. 1 Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016, China. 2 School of Materials Science and Engineering, University of Science and Technology of China, 72 Wenhua Road, Shenyang 110016, China. 3These authors contributed equally: Chi Liu, Wei Ma. *email: [email protected] NATURE COMMUNICATIONS | (2019) 10:4873 | https://doi.org/10.1038/s41467-019-12814-1 | www.nature.com/naturecommunications 1 ARTICLE NATURE COMMUNICATIONS | https://doi.org/10.1038/s41467-019-12814-1 n 1947, the first transistor, named a bipolar junction transistor electron microscope (SEM) image in Fig. -
Capacitors and Dielectrics Dielectric - a Non-Conducting Material (Glass, Paper, Rubber….)
Capacitors and Dielectrics Dielectric - A non-conducting material (glass, paper, rubber….) Placing a dielectric material between the plates of a capacitor serves three functions: 1. Maintains a small separation between the plates 2. Increases the maximum operating voltage between the plates. 3. Increases the capacitance In order to prove why the maximum operating voltage and capacitance increases we must look at an atomic description of the dielectric. For now we will show that the capacitance increases by looking at an experimental result: Experiment Since VVCCoo, then Since Q is the same: Coo V CV C V o K CVo C K Dielectric Constant Co Since C > Co , then K > 1 C kCo V V o k kvacuum = 1 (vacuum) k = 1.00059 (air) kglass = 5-10 Material Dielectric Constant k Dielectric Strength (V/m) Air 1.00054 3 Paper 3.5 16 Pyrex glass 4.7 14 A real dielectric is not a perfect insulator and thus you will always have some leakage current between the plates of the capacitor. For a parallel-plate capacitor: C kCo kA C o d From this equation it appears that C can be made as large as possible by decreasing d and thus be able to store a very large amount of charge or equivalently a very large amount of energy. Is there a limit on how much charge (energy) a capacitor can store? YES!! +q K e- - F =qE E e e- E dielectric -q As charge ‘q’ is added to the capacitor plates, the E-field will increase until the dielectric becomes a conductor (dielectric breakdown). -
Power MOSFET Basics by Vrej Barkhordarian, International Rectifier, El Segundo, Ca
Power MOSFET Basics By Vrej Barkhordarian, International Rectifier, El Segundo, Ca. Breakdown Voltage......................................... 5 On-resistance.................................................. 6 Transconductance............................................ 6 Threshold Voltage........................................... 7 Diode Forward Voltage.................................. 7 Power Dissipation........................................... 7 Dynamic Characteristics................................ 8 Gate Charge.................................................... 10 dV/dt Capability............................................... 11 www.irf.com Power MOSFET Basics Vrej Barkhordarian, International Rectifier, El Segundo, Ca. Discrete power MOSFETs Source Field Gate Gate Drain employ semiconductor Contact Oxide Oxide Metallization Contact processing techniques that are similar to those of today's VLSI circuits, although the device geometry, voltage and current n* Drain levels are significantly different n* Source t from the design used in VLSI ox devices. The metal oxide semiconductor field effect p-Substrate transistor (MOSFET) is based on the original field-effect Channel l transistor introduced in the 70s. Figure 1 shows the device schematic, transfer (a) characteristics and device symbol for a MOSFET. The ID invention of the power MOSFET was partly driven by the limitations of bipolar power junction transistors (BJTs) which, until recently, was the device of choice in power electronics applications. 0 0 V V Although it is not possible to T GS define absolutely the operating (b) boundaries of a power device, we will loosely refer to the I power device as any device D that can switch at least 1A. D The bipolar power transistor is a current controlled device. A SB (Channel or Substrate) large base drive current as G high as one-fifth of the collector current is required to S keep the device in the ON (c) state. Figure 1. Power MOSFET (a) Schematic, (b) Transfer Characteristics, (c) Also, higher reverse base drive Device Symbol. -
Dielectric Strength of Insulator Materials
electrical-engineering-portal.com http://electrical-engineering-portal.com/dielectric-strength-insulator-materials Dielectric Strength Of Insulator Materials Edvard The atoms in insulating materials have very tightly- bound electrons, resisting free electron flow very well. However, insulators cannot resist indefinite amounts of voltage. With enough voltage applied, any insulating material will eventually succumb to the electrical ”pressure” and electron flow will occur. However, unlike the situation with conductors where current is in a linear proportion to applied voltage (given a fixed resistance), current through an insulator is quite nonlinear: for voltages below a certain threshold level, virtually no electrons will flow, but if the voltage exceeds that threshold, there will be a rush of current. Once current is forced through an insulating material, breakdown of that material’s molecular structure has Medium voltage mastic tape - self-amalgamating insulating compound occurred. After breakdown, the material may or may designed for quick, void-free insulation layering not behave as an insulator any more, the molecular structure having been altered by the breach. There is usually a localized ”puncture” of the insulating medium where the electrons flowed during breakdown. Dielectric strength comparison between materials Material * Dielectric strength (kV/inch) Vacuum 20 Air 20 to 75 Porcelain 40 to 200 Paraffin Wax 200 to 300 Transformer Oil 400 Bakelite 300 to 550 Rubber 450 to 700 Shellac 900 Paper 1250 Teflon 1500 Glass 2000 to 3000 Mica 5000 * = Materials listed are specially prepared for electrical use. Thickness of an insulating material plays a role in determining its breakdown voltage, otherwise known as dielectric strength. -
2300V Reverse Breakdown Voltage Ga2o3 Schottky Rectifiers
Q92 ECS Journal of Solid State Science and Technology, 7 (5) Q92-Q96 (2018) 2162-8769/2018/7(5)/Q92/5/$37.00 © The Electrochemical Society 2300V Reverse Breakdown Voltage Ga2O3 Schottky Rectifiers Jiancheng Yang,1,∗ F. Ren, 1,∗∗ Marko Tadjer,2 S. J. Pearton, 3,∗∗,z and A. Kuramata4 1Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, USA 2Naval Research Laboratory, Washington, DC 20375, USA 3Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611, USA 4Tamura Corporation and Novel Crystal Technology, Inc., Sayama, Saitama 350-1328, Japan We report field-plated Schottky rectifiers of various dimensions (circular geometry with diameter 50–200 μm and square diodes −3 −2 2 15 −3 with areas 4 × 10 –10 cm ) fabricated on thick (20μm), lightly doped (n = 2.10 × 10 cm ) β-Ga2O3 epitaxial layers grown by Hydride Vapor Phase Epitaxy on conducting (n = 3.6 × 1018 cm−3) substrates grown by Edge-Defined, Film-Fed growth. The −4 −2 maximum reverse breakdown voltage (VB) was 2300V for a 150 μm diameter device (area = 1.77 × 10 cm ), corresponding to a breakdown field of 1.15 MV.cm−1. The reverse current was only 15.6 μA at this voltage. This breakdown voltage is highest reported 2 2 for Ga2O3 rectifiers. The on-state resistance (RON) for these devices was 0.25 .cm , leading to a figure of merit (VB /RON)of21.2 MW.cm−2. The Schottky barrier height of the Ni was 1.03 eV, with an ideality factor of 1.1 and a Richardson’s constant of 43.35 A.cm−2.K−2 obtained from the temperature dependence of the forward current density. -
Schottky Barrier Height Dependence on the Metal Work Function for P-Type Si Schottky Diodes
Schottky Barrier Height Dependence on the Metal Work Function for p-type Si Schottky Diodes G¨uven C¸ ankayaa and Nazım Uc¸arb a Gaziosmanpas¸a University, Faculty of Sciences and Arts, Physics Department, Tokat, Turkey b S¨uleyman Demirel University, Faculty of Sciences and Arts, Physics Department, Isparta, Turkey Reprint requests to Prof. N. U.; E-mail: [email protected] Z. Naturforsch. 59a, 795 – 798 (2004); received July 5, 2004 We investigated Schottky barrier diodes of 9 metals (Mn, Cd, Al, Bi, Pb, Sn, Sb, Fe, and Ni) hav- ing different metal work functions to p-type Si using current-voltage characteristics. Most Schottky contacts show good characteristics with an ideality factor range from 1.057 to 1.831. Based on our measurements for p-type Si, the barrier heights and metal work functions show a linear relationship of current-voltage characteristics at room temperature with a slope (S = φb/φm) of 0.162, even though the Fermi level is partially pinned. From this linear dependency, the density of interface states was determined to be about 4.5 · 1013 1/eV per cm2, and the average pinning position of the Fermi level as 0.661 eV below the conduction band. Key words: Schottky Diodes; Barrier Height; Series Resistance; Work Function; Miedema Electronegativity. 1. Introduction ear dependence should exist between the φb and the φm. Corresponding to this, SB heights of various el- The investigation of rectifying metal-semiconductor emental metals, including Au, Ti, Pt, Ni, Cr, have contacts (Schottky diodes) is of current interest for been reported [14 – 16]. -
Technology Brief 8: Supercapacitors As Batteries
214 TECHNOLOGY BRIEF 8: SUPERCAPACITORS AS BATTERIES Technology Brief 8: Supercapacitors as Batteries As recent additions to the language of electronics, the names supercapacitor , ultracapacitor , and nanocapacitor suggest that they represent devices that are somehow different from or superior to traditional capacitors. Are these just fancy names attached to traditional capacitors by manufacturers, or are we talking about a really different type of capacitor? The three aforementioned names refer to variations on an energy storage device known by the technical name electrochemical double-layer capacitor (EDLC), in which energy storage is realized by a hybrid process that incorporates features from both the traditional electrostatic capacitor and the electrochemical voltaic battery. For the purposes of this Technology Brief, we refer to this relatively new device as a supercapacitor: The battery is far superior to the traditional capacitor with regard to energy storage, but a capacitor can be charged and discharged much more rapidly than a battery. As a hybrid technology, the supercapacitor offers features that are intermediate between those of the battery and the traditional capacitor. The supercapacitor is now used to support a wide range of applications, from motor startups in large engines (trucks, locomotives, submarines, etc.) to flash lights in digital cameras, and its use is rapidly extending into consumer electronics (cell phones, MP3 players, laptop computers) and electric cars (Fig. TF8-2). Figure TF8-1 Examples of electromechanical double- layer capacitors (EDLC), otherwise known as a superca- Figure TF8-2 Examples of systems that use pacitor. supercapacitors. TECHNOLOGY BRIEF 8: SUPERCAPACITORS AS BATTERIES 215 Capacitor Energy Storage Limitations Energy density W is often measured in watts-hours per kg (Wh/kg), with 1 Wh = 3.6 × 103 joules.