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Performance of the Fermi Fel Photoinjector Laser*

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Performance of the Fermi Fel Photoinjector Laser* WEPPH014 Proceedings of FEL 2007, Novosibirsk, Russia PERFORMANCE OF THE FERMI FEL PHOTOINJECTOR LASER* M. B.Danailov, A.Demidovich, R.Ivanov, I.Nikolov, P.Sigalotti ELETTRA, 34012 Trieste, Italy Abstract amplifier system described here is a custom system The photoinjector laser system for the FERMI FEL has constructed by Coherent Inc. This is in fact the first been installed at the ELETTRA laser laboratory. It is amplifier system of this type, reaching an energy level based on a completely CW diode pumping technology above 18 mJ in the infrared, with the use of entirely CW and features an all-CW-diode-pumped Ti:Sapphire diode pumping technology, which is the base for the amplifier system, a two stage pulse shaping system, a extremely high UV energy stability reported below. The time-plate type third harmonic generation scheme and amplifier design is shown on Figure 1. aspheric shaper based beam shaping. The paper will As it is seen, the seed coming from a Ti:Sapphire present experimental results describing the overall oscillator (Mira), is stretched and amplified to a mJ level performance of the system. The data demonstrates that in a regenerative cavity, after which it is further amplified all the initially set parameters were met and some largely in two two-pass amplifier stages. Each of these is pumped exceeded. We present what is to our knowledge the first by up to 45 mJ from two Evolution HE Nd:YLF Q- direct measurement of the timing jitter added by a switched pump lasers. As mentioned above, they are Ti:Sapphire amplifier system and show that for our case it pumped by diodes in CW. Table 1 summarizes some of is below 10 fs. the main laser parameters. INTRODUCTION Parameter Specs Measured IR output energy > 18 mJ > 18 mJ The photoinjector laser (PIL) is known to be one of the (~15 mJ in very important sub-systems for all single-pass UV and X- operation) ray FELs. The charge and quality of the electron bunch Pulse duration (Gauss.fit) <100 fs ~90 fs created at the photoinjector (PI) affect dramatically the Center WL 780+/-5 ~783 nm operation of the FEL and can be a strong limitation in nm 2 2 2 obtaining the expected FEL performance. This is M value M x,y<1.5 M x~1.27, 2 especially true for the challenging projects that are now in M y<1.17 construction phase (like LCLS, SLAC, European XFEL). UV energy before shaping >2 mJ >2.3 mJ A lot of attention has thus been devoted previously for Short term energy stability <3% <0.6% studying the optimum parameters of the PIL. It is now UV (500 shots), RMS well accepted that the UV beam should have a nearly flat Long term energy stability <3% <0.8% UV (8 hours), RMS top spatial profile, while the optimum longitudinal Beam pointing stability <10 μrad <5 μrad (temporal) shape may vary [1-3]. In addition, laser Timing jitter (10 Hz-10MHz), <350 fs <180 fs parameters like energy and beam pointing that may seem RMS easier to control, have also to be very carefully optimised. The overall system design appears to be more difficult in Table 1: Main laser parameters , left- specified, right- the case of copper photocathode, because of the required measured very high UV energy (~0.5 mJ for extracting 1 nC). The implementation of beam and pulse shaping techniques at We note that the system is capable of delivering >18 mJ these energy levels in UV is quite challenging. In this energy per pulse in IR, however the reported 2.3 mJ of paper we describe the schemes and technologic solutions UV energy is obtained at ~15 mJ in the IR. This regime is developed at Elettra for the FERMI PIL. As it will be preferred for everyday operation because of lower diode seen the system fully meets and in some aspects exceeds current (~19A) and also lower load on the optical the requirements. components. Conversion efficiency to third harmonic (261 nm) is about 15% and has been fixed after careful MAIN SYSTEM DESIGN balancing of spot-size and pulse duration. Both As it has already been discussed in earlier papers [4], interferometer like and ‘time-plate’ designs of the THG the only laser technology that can meet all the PIL unit have been tested with similar results. However, in the parameters requested for copper photocathode, and is latter we have observed a deterioration of the calcite plate enough mature and reliable, is the one based on which pre-compensates the group velocity mismatch, so Ti:Sapphire as an active material and regenerative at present the interferometric version is in operation. amplifier/multipass chirped-pulse amplifier design. The ___________________________________________ ∗ This work has been partially supported by the EU Commission in the Sixth Framework Program, Contract No. 011935 EUROFEL FEL Technology I 358 Proceedings of FEL 2007, Novosibirsk, Russia WEPPH014 Figure 1: Amplifier design. TIME SHAPING IN G2 G1 The concept chosen for our time-shaping system has Δ been already described previously [4]. In brief, it implements a two-step hybrid shaping system in which a f preliminary shaping is performed in IR by an acoustooptic dispersive filter (DAZZLER , Fastlite), and the final shape and duration of the pulse are done in the UV in a Fourie system. In principle the DAZZLER allows both amplitude and phase modulation [5]. We note that the amplitude shaping done by the DAZZLER is partially lost in the amplification process due to the strong ‘red’ M1 DM shift of the amplified spectrum with respect to the seeding Δ L f one. For this reason the DAZZLER alone is not sufficient OUT M2 for producing the required pulse shapes. The main temporal shaping is thus performed in UV by the 4-f system shown on Fig.2. The UV pulse coming from the harmonic generation system enters a Fourier- shaping scheme consisting of the grating G1, folding mirror M1, lens L, deformable mirror (DM) and retro- reflecting mirror M2. The modulation is mostly performed by the DM (OKO Technologies). The particular mirror used is a custom made dielectric plate (HR at 260 nm) glued on a 20 piezo transducers (2lines of 10), each of them can be moved by up to 10 micron. As it is seen from the figure we use a configuration where the mirror is used at a large angle, thus increasing the number of useful actuators and the induced phase difference. In alternative configuration, a longer focal distance lens and DM at normal incidence can be used. The DM is used for providing mostly the high order dispersion terms, while Figure 2: UV pulse shaping optical scheme (up) and half of the large second order dispersion term giving the photo of the setup (down). final (several ps range) pulse lengthening is given by the FEL Technology I 359 WEPPH014 Proceedings of FEL 2007, Novosibirsk, Russia off-focus distance Δ of the grating with respect to the system. Typical results at the output of the shaper and front Fourier plane. The second half of the required group after a Relay imaging is shown on Fig.5, left and right, velocity dispersion (GVD) is provided by the double respectively. passage through the grating G2, which is also used to cancel the residual spatial chirp introduced by the shaper. 1,0 The pulse length can be changed by changing Δ in both the shaper and stretcher and respectively adjusting the 0,8 shape of the DM. 0,6 1,0 0,9 rms=4.5% 0,4 0,8 INTENSITY (a.u) 0,7 0,2 0,6 a.u. 0,5 0,0 0,4 18 16 14 12 10 8 6 4 2 0 0,3 a. TIME (ps) 0,2 1,0 0,1 0,9 0,0 02468101214 0,8 ps 0,7 0,6 0,5 1,0 rms=3.2% a.u. 0,9 0,4 0,8 0,3 0,7 0,2 0,6 0,1 0,0 0,5 a.u. 0 2 4 6 8 10 12 14 16 0,4 b. ps 0,3 0,2 1,0 0,1 0,9 0,0 0,8 compr.=0 cm 0246810121416 compr.=1 cm 0,7 compr.=2 cm ps 0,6 Figure 3: Flat-top pulses with duration of 6 and 10 ps 0,5 a.u. produced using phase modulation by the DM. 0,4 0,3 Typical examples of the commonly requested flat-top 0,2 type temporal profile are shown on Figs5. The flat-top 0,1 duration could be made even longer, up to 15 ps, with the 0,0 expense of increased modulation (~7% RMS) and fall 02468101214161820 ps time (~ 2ps). c. As mentioned above, in the case of FERMI a nearly quadratically increasing ramp, as shown on Fig.4 a, is Figure 4: Increasing ramp pulse shapes, a-plot of the required [3], so the system has at present been optimized required pulse shape; b- cross-correlation trace of the for generating such a profile. Fig. 4b presents typical obtained UV pulse; c- pulses of variable duration pulse profile measured by cross-correlating the UV pulse obtained by adjusting the compressor with an IR pulse using down-conversion in a 250 micron thick BBO crystal. It was possible to change the duration of the ramp by adjusting the UV stretcher length. For small duration changes the pulse shape was not strongly affected, so no other adjustments were needed. For larger (i.e. more than 2 ps) duration changes, an additional adjustment of the piezo-mirror was necessary.
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