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pulse energy energy pulse mJ 4 variable Hz 2500 wavelengths as standard standard as wavelengths nm 1064 DPSS Compact Compact Q-switched OPO pumping OPO sensing Remote Simple and robust and Simple cooled Air ExternalTTL triggering keypad via control Remote with supplied PC and/or LabVIEW™drivers pad control Remote Materialprocessing repair LCD Marking Micromachining Engraving deposition cleaning Laser Ablation Up toUp at toUp repetitionrate nm, 266 nm, 355 nm, 532 213 options nm 1064 at duration pulse ns <10 Q-switching Electro-optical operation Turn-key cavity sealed Rugged size compact Extremely

APPLICATIONS APPLICATIONS FEATURES ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ [email protected]

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Mechanically stable and Variety of control interfaces: USB, USB, interfaces: control of Variety WLANensures LANand RS232, with integration and control easy equipment OEM or laboratory Fast wavelength selection is superioris selection Fast wavelength applications wherealternatingfor arerequired, like wavelengths LIBS and ablation material cost-effective and cooling, Air technology end-pumping reliable design DPSS amplifier-free and and operation easy guarantee and installation simple alignment costs maintenance low

laser components. wavelength options make this laser hermetically sealed design ensures reliable operation and long lifetime of pulsed laser deposition, ablation pulse energy is required. Excellent remote sensing applications. of transparent materials, when higher energy stability and a wide range of through mask or intravolume marking sources for specific applications like a perfect tool for spectro­ ▶ ▶ ▶ 02300 , VILNIUS, 02300 - series

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Easy toon transport Easy saves and laboratory valuable todue space design light and compact Close to Gaussian smooth beam smooth Gaussian to Close and 1.3 < M² value low with profile arebeneficial good focusability pixel LCD applications such as for repair Continuous tuning of repetition of tuning Continuous constant maintaining while rate beam superior energy, pulse make stability energy and pointing for choice first the NL200 the thin and marking micromachining, applications removal film

Featuring short pulse duration, BENEFITS BENEFITS ▶ ▶ ▶ NL200 ▪ NL210 ▪ NL230 ▪ NL300 ▪ NL740 ▪ NL300 ▪ NL230 ▪ NL210 ▪ NL200 lasers are excellent cost effective laser frame. NANOSECOND LASERS NANOSECOND wavelengths are easily attached to the nanosecond lasers offer high pulse pumped NL200 series Q-switched energy at kHz repetition rates. variable repetition rate and external NL200 series DPSS Q-switched End-pumped design makes this laser Harmonic generation modules for compact and easy to integrate. 532 nm, 355 nm, 266 nm and 213 nm

TTL triggering, nanosecond diode NL200 48 Femtosecond Lasers Picosecond Lasers Picosecond Tunable Systems Nanosecond Lasers Nanosecond Tunable Lasers High Intensity Lasers Other Ekspla Products 5) 4) 3) 2) 1) SPECIFICATIONS NANOSECOND LASERS REV. Pulse topulseenergystability(StdDev) Beam pointingstability(StDev) Typical beamdiameter Polarization Power drift Pulse repetitionrate Pulse energy Model Ambient temperature Cooling Laser head(W×LH) Optical jitter(StdDev) Typical pulseduration Umbilical length Power supplyunit(W×LH) Beam divergence M² Ellipticity Beam spatialprofile Power consumption Power requirements Realtive humidity OPERATING REQUIREMENTS PHYSICAL CHARACTERISTICS FWHM at 1064 nm. FWHM at1064 time interval. Averaged from pulsesemittedduring30sec measured Hzpulserepetition at1000 rate. allspecificationsare Unless statedotherwise measured at2500Hzpulserepetition rate. allspecificationsare Unless statedotherwise without options. measured nmandforbasicsystem at1064 allspecificationsare Unless statedotherwise witheachunitwemanufacture. and willvary they are indicationsof typicalperformance Parameters markedtypicalare illustrative; specifications are subjecttochange. Due tocontinuousimprovement, all at 213nm at 266nm at 355nm at 532nm at 1064nm at 213nm at 266nm at 355nm at 532nm at 1064nm 0013 SAVANORIU 20200123 6) 7) 10)

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Other Ekspla Products High Intensity Lasers Nanosecond Tunable Lasers Nanosecond Lasers Picosecond Tunable Systems Picosecond Lasers Femtosecond Lasers 20200123 . . REV

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Pulse energy, mJ energy, Pulse 38 SAVANORIU 237, AV. LT longer that 1 hour then laser NANOSECOND LASERS NANOSECOND few hours before switching on. will be no mains electricity for Laser must be Note: connected to the mains electricity all the time. If there ORDERING INFORMATION ORDERING OUTLINE DRAWINGS OUTLINE PERFORMANCE (system) needs warm up for a 50 Femtosecond Lasers Picosecond Lasers Picosecond Tunable Systems Nanosecond Lasers Nanosecond Tunable Lasers High Intensity Lasers Other Ekspla Products