20210315 REV. REV.

1.5 % rms % 1.5 OPCPA

1.5 % rms % 1.5 repetitionrate WWW.EKSPLA.COM 12 hour period hour 12

1 kHz 1 energy pulse mJ 3 250 – 320 nm 320 – 250 nm 320 – 250 375 – 480 nm, 480 – 375 nm, 480 – 375 210 – 230 nm 230 – 210 Excellent long-term average long-term average Excellent < stability: power > over Excellent pulse energy energy pulse Excellent < stability: – – Femtosecond Femtosecond Systems Optically synchronized ps output ps synchronized Optically for Loop) Locking (Phase PLL with locking rms) ps, (<1 precise pulse externalsynchronization High contrast pulses without any any without pulses contrast High equipment additional improvement SFG CARS and Broadband pump-probe Femtosecond spectroscopy Nonlinear harmonicgeneration High harmonicsmodule: SH/TH SH harmonicsmodule: SH/TH/FH SH Based on the novel the novel on Based Pulse Chirped Parametric (Optical Amplification) technologysimple – cost-efficientand operation (patentsdesign front-end Patented EP2924500) and EP2827461 no. tuning wavelength free Hands toUp toUp TH TH FH Tunable Wavelength Wavelength Tunable

APPLICATIONS OPTIONS FEATURES ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ ▶ [email protected] MAIL MAIL - E +370 5 2649629 +370

Nd:Glass TEL

02300 , VILNIUS, 02300 - Incorporation of parametric level of customization and easy with a novel ultrafast fiber laser lab than ever before. requirements. helped to create and bring to the market a new tool for femtosecond pump-probe, nonlinear spectroscopy, emerging high harmonic generation experiments and other femtosecond ensure excellent long-term stability. scalability. These systems can be science breakthrough is closer to any Modular internal design offers high amplification technology together and nonlinear spectroscopy applications. With this laser ultrafast assembled on a rigid breadboard to customized according to customer All UltraFlux series laser systems are SAVANORIU 237, AV. LT

laser for seeding both picosecond ▪ APL2100/2200/4000 ▪ NL120 ▪ NL310 ▪ NL940 ▪ ANL ▪ ▪ NL940 ▪ NL310 ▪ NL120APL2100/2200/4000 ▪ ▪ UltraFlux HIGH INTENSITY LASERSHIGH nanosecond time scale is potentially pump and seed pulse synchronization. parametric amplifier by spectrally broadened output. This approach parametric amplification technologies. high energy tunable wavelength increased. uses the same picosecond fiber incorporates the advantages of ultrafast fiber laser, solid-state and output pulses in picosecond to greatly simplifies the system – excludes femtosecond regenerative DPSS pump laser and femtosecond Novel OPCPA front-end technology Novel OPCPA In addition to that, contrast of the femtosecond laser system which UltraFlux FT300 series is a compact amplifier and eliminates the need of

series FT300 UltraFlux UltraFlux

Femtosecond Picosecond Lasers Picosecond Tunable Systems Nanosecond Lasers Nanosecond Tunable Lasers HighHigh Intensity Lasers Other Ekspla Products 100 4) 3) 2) 1) PERFORMANCE SPECIFICATIONS HIGH LASERS INTENSITY REV. Pulse contrast Beam diameter(1/e²) Spatial mode Long-term powerstability Pulse energystability Pulse repetitionrate Optical toRFsignaljitter Beam pointingstability Polarization Max. Pulseenergy Model Pulse duration Footprint onopticaltable Scanning steps Wavelength tuningrange MAIN SPECIFICATIONS With SH/THorSH/TH/FHmodule. With -PLLoptionpurchased. eliminated byusingwedgedtransmissionoptics. device capabilities(third-order autocorrelator). There are nopre-pulses generatedinthesystemandpost-pulses are (Fig. below).OursystemisASE-free andpulsecontrastvalueinnanosecondrangeislimitedonlybymeasurement OPCPAcovers APFcontrastdependsonOPCPA :1. pumppulsedurationandisbetterthan10⁶ saturationlevel Pulse contrastisonlylimitedbyamplifiedparametricfluorescence (APF)inthetemporalrange of~90pswhich Presented requirements. are parameters from delivered systemsandcanbecustomizedtomeetcustomer‘s 0135 SAVANORIU 20210315 TH output FH output SH output TH output SH output Standard version FH output TH output FH output SH output 4) 4) 4) 4) 4) 4) 2) 4) 4) 4)

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LT

- Power, W 02300 0.5 0.0 0.1 0.2 0.3 0.4 00:00 measurement at800nmwavelength Fig 1.

VILNIUS, 02:00 Long-termpowerstability

LITHUANIA 04:00 UltraFlux FT031k 700 –1010nm 1.2 ×0.75m 35 –60fs TEL 300 µJ 2 mm 06:00

+370 Adjacent-averaging (10min) – – – Time,

5 2649629 08:00 h

Psmooth / Pmean 0.99 1.00 1.01 00:00 E 10:00 - MAIL 1 kHz Time, h

07:00 [email protected] 12:00 ≥ 10⁻⁶:1(within±50ps) ≥ 10⁻⁸:1(innsrange) 14:00 UltraFlux FT31k Linear, horizontal Super Gaussian UltraFlux FT300 14:00 ≤50 µrad,rms < 1.5%,rms < 1.5%,rms < 1ps WWW.EKSPLA.COM 20 %conversionat440nm 5 %conversionat290nm 1 %conversionat220nm Output pulseenergy0.3mJat890 nm Fig 2. 250 –320nm 375 –480nm 750 –960nm 210 –230nm 1.2 ×2.0m 20 –60fs Typical beamprofileofFT031k. 7 mm 2 nm 3 nm 5 nm 3 mJ UltraFlux FT310 DANGER CLASS IV LASER PRODUCT IV LASER CLASS Max. 3mJ,pulse30–50fs Tunable, 700–1010nm REFLECTED ORSCATTERED RADIATION AVOID EYEORSKINEXPOSURETO DIRECT RADIATIONVISIBLE AND/ORINVISIBLELASER 10 Hz series

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Other Ekspla Products HighHigh Intensity Lasers Nanosecond Tunable Lasers Nanosecond Lasers Picosecond Tunable Systems Picosecond Lasers Femtosecond Lasers 20210315 REV. REV. series WWW.EKSPLA.COM

160 [email protected] MAIL MAIL - 100 E UltraFlux FT300 UltraFlux 0 +370 5 2649629 +370

TEL

-100 Time, ps -200 Noise level Temporal contrast -300 Typical temporal contrast of UltraFlux systems temporal Typical 02300 VILNIUS, LITHUANIA VILNIUS, 02300 - Fig 3. UltraFlux FT310. pumped, tunable Customised compact (1.2 × 0.9 m), fully diode up to 2.5 mJ pulse energy with pulse wavelength femtosecond laser system delivering duration down to 20 fs. Optically synchronized (low jitter) fs and ps outputs available. -400

10⁰ 10⁻² 10⁻⁴ 10⁻⁶ 10⁻⁸ 10⁻¹⁰ 10⁻¹² Contrast ratio, a.u. ratio, Contrast SAVANORIU 237, AV. LT HIGH INTENSITY LASERSHIGH DELIVERED SYSTEMS DELIVERED

Femtosecond Lasers Picosecond Lasers Picosecond Tunable Systems Nanosecond Lasers Nanosecond Tunable Lasers HighHigh Intensity Lasers Other Ekspla Products 102