Application of Scanning Probe Microscopy for New Physical
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New Imaging Modes for Analyzing Suspended Ultra-Thin Membranes by Double-Tip Scanning Probe Microscopy Kenan Elibol1,4, Stefan Hummel1,4, Bernhard C
www.nature.com/scientificreports OPEN New imaging modes for analyzing suspended ultra-thin membranes by double-tip scanning probe microscopy Kenan Elibol1,4, Stefan Hummel1,4, Bernhard C. Bayer1,2 & Jannik C. Meyer1,3* Scanning probe microscopy (SPM) techniques are amongst the most important and versatile experimental methods in surface- and nanoscience. Although their measurement principles on rigid surfaces are well understood and steady progress on the instrumentation has been made, SPM imaging on suspended, fexible membranes remains difcult to interpret. Due to the interaction between the SPM tip and the fexible membrane, morphological changes caused by the tip can lead to deformations of the membrane during scanning and hence signifcantly infuence measurement results. On the other hand, gaining control over such modifcations can allow to explore unknown physical properties and functionalities of such membranes. Here, we demonstrate new types of measurements that become possible with two SPM instruments (atomic force microscopy, AFM, and scanning tunneling microscopy, STM) that are situated on opposite sides of a suspended two-dimensional (2D) material membrane and thus allow to bring both SPM tips arbitrarily close to each other. One of the probes is held stationary on one point of the membrane, within the scan area of the other probe, while the other probe is scanned. This way new imaging modes can be obtained by recording a signal on the stationary probe as a function of the position of the other tip. The frst example, which we term electrical cross- talk imaging (ECT), shows the possibility of performing electrical measurements across the membrane, potentially in combination with control over the forces applied to the membrane. -
Application of AFM-Based Techniques in Studies of Corrosion and Corrosion Inhibition of Metallic Alloys
corrosion and materials degradation Review Application of AFM-Based Techniques in Studies of Corrosion and Corrosion Inhibition of Metallic Alloys Kiryl Yasakau Department of Materials and Ceramic Engineering, CICECO—Aveiro Institute of Materials, University of Aveiro, Campus of Santiago, 3810-193 Aveiro, Portugal; [email protected] Received: 7 October 2020; Accepted: 5 November 2020; Published: 7 November 2020 Abstract: In this review several scanning probe microscopy techniques are briefly discussed as valuable assets for corrosionists to study corrosion susceptibility and inhibition of metals and alloys at sub-micrometer resolution. At the beginning, the review provides the reader with background of atomic force microscopy (AFM) and related techniques such as scanning Kelvin probe force microscopy (SKPFM) and electrochemical AFM (EC-AFM). Afterwards, the review presents the current state of corrosion research and specific applications of the techniques in studying important metallic materials for the aircraft and automotive industries. Different corrosion mechanisms of metallic materials are addressed emphasizing the role of intermetallic inclusions, grain boundaries, and impurities as focal points for corrosion initiation and development. The presented information demonstrates the importance of localized studies using AFM-based techniques in understanding corrosion mechanisms of metallic materials and developing efficient means of corrosion prevention. Keywords: AFM; SKPFM; EC-AFM: localized corrosion; corrosion inhibition; metallic alloys 1. Introduction Corrosion of metallic materials and structures is a heavy burden for the economy which costs about 3.4% of the global GDP (2013) according to the Application and Economics of Corrosion Technology (IMPACT) study released by NACE International [1]. The study also acknowledged that corrosion prevention strategies could increase global savings by about 15–35% of the cost of the damage (NACE International, Houston, TX, USA, 2016). -
Nanolithography Activity in the Group: BG Group and AKR Group Has Extensive Activities in the Area of Nanolithography
Nanolithography activity in the group: BG group and AKR group has extensive activities in the area of nanolithography. The work is done in a Clean room of the centre which has been established with support from the Nanomission Projects. The clean room is class 10,000 class room which is maintained at class 1000 in specific areas. The facilities in the clean room allow optical lithography, electron beam lithography (EBL) and focused ion beam (FIB) lithography. Visit of the Honourable Union Minister for Science and Technology and Earth rd Science to the Bose Centre Clean room on 3 May, 2015 (Standing in front of Helios machine, 2nd from left ) One of the activities that is carried out on a routine basis is to integrate sub- 100nm nanowire of any material produced by bottom-up approach like chemical route or physical/chemical vapour deposition to a single nanowire device connected to 2 or 4 probes. Integrating the rich materials base of bottom-up approach with nano-lithograhic process is regularly done . For attaching nanowires to prefabricated contact pads for opt-electronic or electronic measurements in addition to EBL –lift off, FIB or Focused electron beam deposited metals (Pt or W) are also used. The group has done extensive work in the area of interface physics. Cross-sectional lamella using ion-beam lithographic technique is done on regular basis. WO 3/Pt/Si 30 µµµm TEM Lamella preparation of a nanowire grown Omni probe lifting off the sample on substrate using Ion-beam lithography Interface analysis of X-TEM Specimen: Partially/non aligned NWs- Interface cross section c Ankita Ghatak, Samik Roy Moulik Barnali Ghosh, RSC Adv. -
DNA in Nanotechnology
Molecular Manipulations DNA in Nanotechnology There is an avalanche-like increase of reports, where molecules of nucleic acids (DNA and RNA) appear as an object of nanotechnology research and/or as material for nano-sized devices. In many cases scanning probe microscopy (SPM) is the most powerful and informative research tool. Examinations as well as precise manipulations can be performed this way. What is important when SPM is applied to molecular level experiments? Three facets are illustrated further. • Appropriate probes see the next page • Substrates and deposition protocols see page 3 • AFM long-term stability see page 4 www.ntmdt.com 1 Molecular Manipulations Probe sharpness determines resolution AFM probe tip DNA molecule 10-20nm Strand width is usually seen in AFM image Tiny features of the relief can not be detected if the probe tip radius is too large. When imaged with conventional probe, the width of the DNA molecule is 10-20 nm usually, while real strand diameter is about 2 nm. Here are shown short poly(dG)–poly(dC) DNA fragments deposited on modified HOPG (see below). Small unwound single-strand fragments can be seen (bold arrow on the scan) and even helical pitch of the DNA molecule can be resolved (thin arrows) with a sharp enough tip (like DLC probe tip shown on the inlet). See comprehensive discussion on sub-molecular imaging in “High- resolution atomic force microscopy of duplex and triplex DNA molecules” Klinov D. et al. Nanotechnology (2007), V18, N22, p.225102. Related info: 1 micron-long Whisker tip grown on silicon probe apex Whisker-type sharp AFM probes provides extremely high aspect ratio, tip radius is about 10 nm. -
Bilayer, Nanoimprint Lithography Brian Faircloth Nuvonyx, Inc., Bridgeton, Missouri 63044 Henry Rohrs Washington University, St
Bilayer, nanoimprint lithography Brian Faircloth Nuvonyx, Inc., Bridgeton, Missouri 63044 Henry Rohrs Washington University, St. Louis, Missouri 63130 Richard Tiberio Cornell University, Ithaca, New York 14853 Rodney Ruoff Washington University, St. Louis, Missouri 63130 Robert R. Krchnaveka) Rowan University, Glassboro, New Jersey 08028 ͑Received 3 May 1999; accepted 21 April 2000͒ Nanoimprint lithography has been shown to be a viable means of patterning polymer films in the sub-100 nm range. In this work, we demonstrate the use of a bilayer resist to facilitate the metal liftoff step in imprinter fabrication. The bilayer resist technology exhibits more uniform patterns and fewer missing features than similar metal nanoparticle arrays fabricated with single layer resist. The bilayer resist relies upon the differential solubility between poly͑methyl methacrylate͒ and poly͑methyl methacrylate methacrylic acid copolymer͒. Evidence is presented that shows the technique has a resolution of better than 10 nm. © 2000 American Vacuum Society. ͓S0734-211X͑00͒03104-8͔ I. INTRODUCTION tion demonstrated in the polymer resist layer. The formation of patterned metal layers is one application. Finely patterned Due to the inevitable transition from the microelectronic metal layers are used as interconnects in integrated circuits. to the nanoelectronic age, the demand for sub-100 nm fea- They can also be used as catalysts for subsequent layer ture sizes in lithographic techniques will increase greatly. As growth. If the subsequent metal layers cannot readily be current devices rapidly approach the 100 nm barrier, the mi- etched, e.g., due to crystalline dependent etching rates, an croelectronics industry is considering several technologies to additive approach such as liftoff is desirable. -
Polymer Films on Electrodes Part 29. Electropolymerized
www.elsevier.nl/locate/jelechem Journal of Electroanalytical Chemistry 498 (2001) 67–74 Polymer films on electrodes Part 29. Electropolymerized poly(7,14-diphenylacenaphtho[1,2-k]fluoranthene): electrochemistry and conductance of a novel electrochromic hydrocarbon ladder polymer film Maurizio Quinto, Allen J. Bard * Department of Chemistry and Biochemistry, The Uni6ersity of Texas at Austin, Austin, TX 78712, USA Received 13 April 2498; received in revised form 13 June 2000; accepted 22 June 2000 Dedicated to Fred C. Anson for his distinguished contributions to electrochemistry Abstract The electropolymerization of 7,14-diphenylacenaphtho[1,2-k]fluoranthene on a platinum or indium tin oxide (ITO) electrode produces an electroactive film which displays fluorescence and electrochromism. We report a study of the electrochemical properties and other characteristics of this film, such as the resistance dependence by the potential applied to the electrode. In particular, the film showed dramatic changes in the resistance and color as a function of the potential applied to the film because of changes in the electronic state of the polymer. Atomic force microscopy, scanning electrochemical microscopy, and electrochemical quartz crystal microbalance studies were also carried out to characterize the polymer film. © 2001 Elsevier Science B.V. All rights reserved. Keywords: Polymer films; Electrochromic films; Conductance 1. Introduction In a previous preliminary study, a new hydrocarbon ladder polymer (PANF), obtained by electropolymer- In addition to fundamental interest in the properties ization of 7,14-diphenylacenaphtho[1,2-k]fluoranthene of polymer films on electrode surfaces, practical appli- (ANF), showing interesting electrochromic behavior cations, such as electrochromic behavior, have been and high stability of the surface layers was described suggested. -
Electron Beam Lithography for Nanofabrication
Departament de Física, Facultat de Ciències Universitat Autònoma de Barcelona January 2008 ElectronElectron beambeam lithographylithography forfor NanofabricationNanofabrication PhD Thesis by Gemma Rius Suñé Directed by Francesc Pérez-Murano and Joan Bausells Institut de Microelectrònica de Barcelona -------------------------------------------- The cover image corresponds to a PMMA residual found after the stripping of the resist layer. Even though it seems a new planet, it is 1µm in diameter. -------------------------------------------- This memory reflects part of the work performed at the Nanofabrication Laboratory of the IMB–CNM during the past 5 years, based on Electron Beam Lithography (EBL). Nanofabrication is a very active area of research, as can be noticed from the number of publications that appear continuously and from the number of running R&D projects. Most of the work is realized in the framework of three European research projects. Novopoly project deals with the development of new polymer materials for applications in micro and nano systems. The development of a new EBL resist is framed in this project. Within NaPa, Emerging Nanopatterning methods, the development of NEMS fabrication with EBL is used to realise discrete nanomechanical devices. They are used to characterize the performance of resonating nanostructures and signal enhancement is achieved by their integration in CMOS circuits. The aim of Charpan is the development of a new patterning tool based on several charged particle species. The incidence of charged particle beams on devices is studied to evaluate potential effects induced during fabrication. Carbon nanotube (CNT) based devices contribute to some tasks of national projects Crenatun and Sensonat. In particular, the technology for fabrication of high performance CNT field-effect transistors and their preparation for sensing applications is established. -
Low Cost Electrical Probe Station Using Etched Tungsten Nanoprobes: Role
Low cost electrical probe station using etched Tungsten nanoprobes: Role of cathode geometry Rakesh K. Prasada and Dilip K. Singha* aDepartment of Physics, Birla Institute of Technology Mesra, Ranchi-835215. *Email: [email protected] Abstract Electrical measurement of nano-scale devices and structures requires skills and hardware to make nano-contacts. Such measurements have been difficult for number of laboratories due to cost of probe station and nano-probes. In the present work, we have demonstrated possibility of assembling low cost probe station using USB microscope (US $ 30) coupled with in-house developed probe station. We have explored the effect of shape of etching electrodes on the geometry of the microprobes developed. The variation in the geometry of copper wire electrode is observed to affect the probe length and its half cone angle (1.4 to 8.8˚). These developed probes were(0.58 usedmm to 2make.15 mm contact) on micro patterned metal° films and was used for electrical measurement along with semiconductor parameter analyzer. These probes show low contact resistance (~ 4 Ω) and follows Ohmic behavior. Such probes can be used for laboratories involved in teaching and multidisciplinary research activities and Atomic Force Microscopy. Keywords: electrochemical etching, tungsten tip, DC voltage, Low cost probe station. I. INTRODUCTION Advancement in the field of nanofabrication has led to miniaturization of devices to nanometers. Research labs and teaching efforts in the field of electronics and opto-electronic devices to such small dimensions, require probes for micron or smaller size. Additionally, these factors have limited the access of experts from various domains of science and engineering to explore nanoscale structures for multi-disciplinary applications. -
X-Ray Diffraction and Scanning Probe Microscopy
X-Ray Diffraction and Scanning Probe Microscopy X-Ray Diffraction Diffraction can occur when electromagnetic radiation interacts with a periodic structure whose repeat distance is about the same as the wavelength of the radiation. Visible light, for example, can be diffracted by a grating that contains scribed lines spaced only a few thousand angstroms apart, about the wavelength of visible light. X-rays have wavelengths on the order of angstroms, in the range of typical interatomic distances in crystalline solids. Therefore, X-rays can be diffracted from the repeating patterns of atoms that are characteristic of crystalline materials. Electromagnetic Properties of X-Rays The role of X-rays in diffraction experiments is based on the electromagnetic properties of this form of radiation. Electromagnetic radiation such as visible light and X-rays can sometimes behave as if the radiation were a beam of particles, while at other times it behaves as if it were a wave. If the energy emitted in the form of photons has a wavelength between 10-6 to 10-10 cm, then the energy is referred to as X-rays. Electromagnetic radiation can be regarded as a wave moving at the speed of light, c (~3 x 1010 cm/s in a vacuum), and having associated with it a wavelength, l , and a frequency, n, such that the relationship c = ln is satisfied. Gamma X-Rays Ultraviolet Visible Infrared Microwaves Radio rays rays light light Radar Waves Short Wavelength Long Wavelength High Frequency Low Frequency High Energy Low Energy V I B G Y O R 400 nm 700 nm Figure 1. -
Dynamic Perturbation of the Electrical Double Layer with an Electrochemical AFM for Confined Metal Electrodeposition
Dynamic perturbation of the electrical double layer with an electrochemical AFM for confined metal electrodeposition Mark Aarts1 and Esther Alarcon-Llado1 1Center for Nanophotonics, NWO-I Amolf, Science Park 104, 1098 XG Amsterdam, The Netherlands May 17, 2019 Abstract Understanding and directing electrochemical reactions below the micrometer is a long-standing challenge in electrochemistry. Confining reactions to nanoscale areas paradoxically requires both isolation and communication with the bulk electrolyte in terms of potential and access of ions, respectively. Here, we demonstrate the directed electrochemical deposition of copper nanostructures by using an oscillating nanoelectrode operated with an atomic force microscope (AFM). Strikingly, the writing is only possible in highly dilute electrolytes and for a particular combination of AFM and electrochemical parameters. We propose a mechanism based on cyclic charging and discharging of the electrical double layer (EDL). The extended screening length and slower charge dynamics in dilute electrolytes allows the nanoelectrode to operate inside, and disturb, the EDL even for large oscillation amplitudes (~100 nm). Our unique approach can not only be used for controlled additive nano-fabrication but also provides insights into ion behavior and EDL dynamics at the solid-liquid interface. Introduction Electrochemical deposition can revolutionize the fabrication of (opto)electronic nanodevices if carefully con- trolled at the nanoscale. Among its advantages are its relatively small infrastructure -
Large-Area Nanoimprint Lithography and Applications
Chapter 3 Large-Area Nanoimprint Lithography and Applications Hongbo Lan Additional information is available at the end of the chapter http://dx.doi.org/10.5772/intechopen.72860 Abstract Large-area nanoimprint lithography (NIL) has been regarded as one of the most prom- ising micro/nano-manufacturing technologies for mass production of large-area micro/ nanoscale patterns and complex 3D structures and high aspect ratio features with low cost, high throughput, and high resolution. That opens the door and paves the way for many commercial applications not previously conceptualized or economically feasible. Great progresses in large-area nanoimprint lithography have been achieved in recent years. This chapter mainly presents a comprehensive review of recent advances in large- area NIL processes. Some promising solutions of large-area NIL and emerging methods, which can implement mass production of micro-and nanostructures over large areas on various substrates or surfaces, are described in detail. Moreover, numerous industrial- level applications and innovative products based on large-area NIL are also demon- strated. Finally, prospects, challenges, and future directions for industrial scale large- area NIL are addressed. An infrastructure of large-area nanoimprint lithography is proposed. In addition, some recent progresses and research activities in large-area NIL suitable for high volume manufacturing environments from our Labs are also intro- duced. This chapter may provide a reference and direction for the further explorations and studies of large-area micro/nanopatterning technologies. Keywords: large-area nanoimprint lithography, large-area micro/nanopatterning, full wafer NIL, roller-type NIL, roll-to-plate NIL, roll-to-roll NIL 1. -
SPM Nanolithography Workshop
NISTIR 7040 Workshop Summary Report: Scanning Probe Nanolithography Workshop A workshop sponsored by the Precision Engineering Division, Manufacturing Engineering Laboratory, NIST, under a Research Cooperation Agreement on advanced lithography of functional nanostructures signed in 2001 by the National Microelectronics Center of Spain (CNM), the National Institute of Advanced Industrial Science & Technology (AIST) of Japan, and NIST. John A. Dagata National Institute of Standards & held at Technology NIST, Gaithersburg MD 20899 Hiroshi Yokoyama on National Institute of Advanced November 12 – 13, 2002 Industrial Science & Technology of Japan Francesc Perez-Murano National Microelectronics Center of Spain U.S. DEPARTMENT OF COMMERCE Technology Administration National Institute of Standards & Technology Manufacturing Engineering Laboratory Gaithersburg MD 20899 January 2003 2 EXECUTIVE SUMMARY A workshop on Scanning Probe Microscope (SPM)-based Nanolithography was held at NIST Gaithersburg on November 24-25, 2002. The meeting was sponsored by the Precision Engineering Division, Manufacturing Engineering Laboratory, NIST, under a Research Cooperation Agreement on advanced lithography of functional nanostructures signed in 2001 by the National Microelectronics Center of Spain (CNM), the National Institute of Advanced Industrial Science & Technology (AIST) of Japan, and NIST. The workshop program focused on fundamental studies in nanoscience, the kinetics and modeling of SPM oxidation, and applications to nanotechnology, Fundamental studies included discussions of current measurement during SPM oxidation, measurement of charge & density variation in SPM oxides, control & understanding of the meniscus shape, and 3-D multiphysics modeling of electrostatics, transport, and chemical reaction during SPM oxidation. Applications to nanotechnology included the fabrication of nano-electronics, nano-photonics, nano- electromechanical, and microfluidic devices and systems.