Quantitative Imaging of Rapidly Decaying Evanescent Fields Using Plasmonic Near-Field Scanning Optical Microscopy
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Calibrating Evanescent-Wave Penetration Depths for Biological TIRF Microscopy
Oheim et al. (2019) TIRF calibration Calibrating evanescent-wave penetration depths for biological TIRF microscopy Short title: TIRF image quantification Martin Oheim, *,†,‡,1 *, Adi Salomon, ¶,2 Adam Weissman, ¶ Maia Brunstein, *,†,‡,§ and Ute Becherer£ * SPPIN – Saints Pères Paris Institute for the Neurosciences, F-75006 Paris, France; † CNRS, UMR 8118, Brain Physiology Laboratory, 45 rue des Saints Pères, Paris, F-75006 France; ‡ Fédération de Recherche en Neurosciences FR3636, Faculté de Sciences Fondamentales et Biomédicales, Université Paris Descartes, PRES Sorbonne Paris Cité, F-75006 Paris, France; ¶Department of Chemistry, Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, Ramat-Gan, 5290002, Israel; §Chaire d’Excellence Junior, Université Sorbonne Paris Cité, Paris, F-75006 France; £Saarland University, Department of Physiology, CIPMM, Building 48, D-66421 Homburg/Saar, Germany; * Address all correspondence to Dr Martin Oheim SPPIN – Saints Pères Paris Institute for the Neurosciences 45 rue des Saints Pères F-75006 Paris Phone: +33 1 4286 4221 (Lab), -4222 (Office) Fax: +33 1 4286 3830 E-mails: [email protected] 1) MO is a Joseph Meyerhof invited professor with the Department of Biomolecular Sciences, The Weizmann Institute for Science, Rehovot, Israel. 2) AS was an invited professor with the Faculty of Fundamental and Biomedical Sciences, Paris Descartes University, Paris, France during the academic year 2017-18. arXiv - presubmission 1 Oheim et al. (2019) TIRF calibration ABSTRACT. Roughly half of a cell’s proteins are located at or near the plasma membrane. In this restricted space, the cell senses its environment, signals to its neighbors and ex- changes cargo through exo- and endocytotic mechanisms. -
Evanescent Wave Imaging in Optical Lithography
Evanescent wave imaging in optical lithography Bruce W. Smith, Yongfa Fan, Jianming Zhou, Neal Lafferty, Andrew Estroff Rochester Institute of Technology, 82 Lomb Memorial Drive, Rochester, New York, 14623 ABSTRACT New applications of evanescent imaging for microlithography are introduced. The use of evanescent wave lithography (EWL) has been employed for 26nm resolution at 1.85NA using a 193nm ArF excimer laser wavelength to record images in a photoresist with a refractive index of 1.71. Additionally, a photomask enhancement effect is described using evanescent wave assist features (EWAF) to take advantage of the coupling of the evanescent energy bound at the substrate-absorber surface, enhancing the transmission of a mask opening through coupled interference. Keywords: Evanescent wave lithography, solid immersion lithography, 193nm immersion lithography 1. INTRODUCTION The pursuit of optical lithography at sub-wavelength dimensions leads to limitations imposed by classical rules of diffraction. Previously, we reported on the use of near-field propagation in the evanescent field through a solid immersion lens gap for lithography at numerical apertures approaching the refractive index of 193nm ArF photoresist.1 Other groups have also described achievements with various configurations of a solid immersion lens for photolithography within the refractive index limitations imposed by the image recording media, a general requirement for the frustration of the evanescent field for propagation and detection. 2-4 We have extended the resolution of projection lithography beyond the refractive index constraints of the recording media by direct imaging of the evanescent field into a photoresist layer with a refractive index substantially lower than the numerical aperture of the imaging system. -
Superconducting Metamaterials for Waveguide Quantum Electrodynamics
ARTICLE DOI: 10.1038/s41467-018-06142-z OPEN Superconducting metamaterials for waveguide quantum electrodynamics Mohammad Mirhosseini1,2,3, Eunjong Kim1,2,3, Vinicius S. Ferreira1,2,3, Mahmoud Kalaee1,2,3, Alp Sipahigil 1,2,3, Andrew J. Keller1,2,3 & Oskar Painter1,2,3 Embedding tunable quantum emitters in a photonic bandgap structure enables control of dissipative and dispersive interactions between emitters and their photonic bath. Operation in 1234567890():,; the transmission band, outside the gap, allows for studying waveguide quantum electro- dynamics in the slow-light regime. Alternatively, tuning the emitter into the bandgap results in finite-range emitter–emitter interactions via bound photonic states. Here, we couple a transmon qubit to a superconducting metamaterial with a deep sub-wavelength lattice constant (λ/60). The metamaterial is formed by periodically loading a transmission line with compact, low-loss, low-disorder lumped-element microwave resonators. Tuning the qubit frequency in the vicinity of a band-edge with a group index of ng = 450, we observe an anomalous Lamb shift of −28 MHz accompanied by a 24-fold enhancement in the qubit lifetime. In addition, we demonstrate selective enhancement and inhibition of spontaneous emission of different transmon transitions, which provide simultaneous access to short-lived radiatively damped and long-lived metastable qubit states. 1 Kavli Nanoscience Institute, California Institute of Technology, Pasadena, CA 91125, USA. 2 Thomas J. Watson, Sr., Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA. 3 Institute for Quantum Information and Matter, California Institute of Technology, Pasadena, CA 91125, USA. Correspondence and requests for materials should be addressed to O.P. -
DIGITAL PLASMONICS: from the Concept to Microscopy
UvA-DARE (Digital Academic Repository) Digital plasmonics: from concept to microscopy Gjonaj, B. Publication date 2012 Link to publication Citation for published version (APA): Gjonaj, B. (2012). Digital plasmonics: from concept to microscopy. General rights It is not permitted to download or to forward/distribute the text or part of it without the consent of the author(s) and/or copyright holder(s), other than for strictly personal, individual use, unless the work is under an open content license (like Creative Commons). Disclaimer/Complaints regulations If you believe that digital publication of certain material infringes any of your rights or (privacy) interests, please let the Library know, stating your reasons. In case of a legitimate complaint, the Library will make the material inaccessible and/or remove it from the website. Please Ask the Library: https://uba.uva.nl/en/contact, or a letter to: Library of the University of Amsterdam, Secretariat, Singel 425, 1012 WP Amsterdam, The Netherlands. You will be contacted as soon as possible. UvA-DARE is a service provided by the library of the University of Amsterdam (https://dare.uva.nl) Download date:02 Oct 2021 CHAPTER 6 OUTLOOK AND VALORIZATION In this chapter we do not provide new experiments or theory. In this chapter we discuss possible application of the results already presented in the previous chapters. We will describe the potential for the plasmonic microscope along with some other potential applications. Part of the information in this chapter has been filed for a patent. 91 OUTLOOK AND VALORIZATION 6.1 Introduction In this chapter we describe ideas for applications based on amplitude and phase structured plasmonic waves. -
High-Throughput Plasmonic Nanolithography
High-Throughput Plasmonic Nanolithography by Liang Pan A dissertation submitted in partial satisfaction of the requirements for the degree of Doctor of Philosophy in Engineering-Mechanical Engineering in the Graduate Division of the University of California, Berkeley Committee in charge: Professor David B. Bogy, Co-Chair Professor Xiang Zhang, Co-Chair Professor Roberto Horowitz Professor Ming Wu Fall 2010 High-Throughput Plasmonic Nanolithography ©2010 by Liang Pan Abstract High-Throughput Plasmonic Nanolithography by Liang Pan Doctor of Philosophy in Engineering-Mechanical Engineering University of California, Berkeley Professor David B. Bogy, Co-Chair Professor Xiang Zhang, Co-Chair The conventional projection-type photolithography approach to nanoscale manufacturing is facing possibly insurmountable challenges, especially to invent novel technical solutions that remain economical for the next generation of semi-conductor integrated circuits. Although extreme ultra violet (EUV) lithography with the next generation photo-masks and 193-nm immersion lithography with double patterning are expected to deliver 22 nm and smaller nodes, it still cannot effectively address the reliability and cost issues required for mass production. Maskless nanolithography is a potentially agile and cost effective approach, but most of the current solutions have throughputs that are too low for manufacturing purposes. This dissertation reports a new low-cost high-throughput approach to maskless nanolithography that uses an array of plasmonic lenses (PL) that "fly" above the rotating surface to be patterned, concentrating short wavelength surface plasmons into sub-100 nm spots. However, these nanoscale spots are only formed in the near field (within a few nanometers of the surface), which makes it very difficult to scan the array above the surface at high speeds. -
Focusing and Scanning Microscopy with Propagating Surface Plasmons
week ending PRL 110, 266804 (2013) PHYSICAL REVIEW LETTERS 28 JUNE 2013 Focusing and Scanning Microscopy with Propagating Surface Plasmons B. Gjonaj,1,* J. Aulbach,1 P. M. Johnson,1 A. P. Mosk,2 L. Kuipers,1 and A. Lagendijk1 1FOM-Institute for Atomic and Molecular Physics AMOLF, Science Park 104, 1098 XG Amsterdam, Netherlands 2Complex Photonic Systems, Faculty of Science and Technology, and MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, Netherlands (Received 18 March 2013; published 26 June 2013) Here we demonstrate a novel surface plasmon polariton (SPP) microscope which is capable of imaging below the optical diffraction limit. A plasmonic lens, generated through phase-structured illumination, focuses SPPs down to their diffraction limit and scans the focus with steps as small as 10 nm. This plasmonic lens is implemented on a metallic nanostructure consisting of alternating hole array gratings and bare metal arenas. We use subwavelength scattering holes placed within the bare metal arenas to determine the resolution of our microscope. The resolution depends on the size of the scanning SPP focus. This novel technique has the potential for biomedical imaging microscopy, surface biology, and functionalization chemistry. DOI: 10.1103/PhysRevLett.110.266804 PACS numbers: 73.20.Mf, 68.37.Àd, 87.64.MÀ In conventional microscopy, features smaller than about microscopy. Nevertheless, due to intrinsic problems of half a wavelength cannot be resolved due to the diffraction these techniques (the degree of complexity, resolution, limit of far-field optics. As the basic constituents of cells field of view, or speed), superresolution plasmonic micros- and nanotechnological devices are smaller than the wave- copy has yet to be implemented. -
Plasmonic Waveguide As an Efficient Transducer for High-Density Data
APPLIED PHYSICS LETTERS 95, 171112 ͑2009͒ Plasmonic waveguide as an efficient transducer for high-density data storage ͒ D. O’Connor,1 M. McCurry,2 B. Lafferty,2 and A. V. Zayats1,a 1Centre for Nanostructured Media, The Queen’s University of Belfast, Belfast BT7 1NN, United Kingdom 2Seagate Technology, 1 Disc Drive, Derry BT48 0BF, United Kingdom ͑Received 17 July 2009; accepted 9 October 2009; published online 30 October 2009͒ A design of high optical throughput nanoscale light sources has been proposed based on plasmonic wedge waveguides. It provides localization of the 1500 nm wavelength light at the output of less than 30ϫ30 nm2 area at about 80% coupling efficiency from a dielectric loaded surface plasmon polariton waveguide and nearly 90% efficient power deposition in the absorbing media placed at the output for an experimentally viable 10 nm apex radius of the wedge. Such nanoscale light sources can be useful for high-density data storage, scanning near-field optical microscopy, and sensing. © 2009 American Institute of Physics. ͓doi:10.1063/1.3257701͔ As the areal density of digital data storage increases to- a planar plasmonic lens and plasmonic nanoparticle concen- ward the Tb/in2 regime, the dimensions of individual bits trator has been proposed for the use in HAMR.5,6 A metal- shrink down to below 500 nm2 size. Manipulation of data on insulator-metal taper has also been modeled and optimized such dimensions in optical, magneto-optical, and indeed for high power throughput.7 The coupling efficiency of about magnetic media relying on heat-assisted magnetic recording 8% into 74ϫ80 nm spot in a recording medium at 830 nm ͑HAMR͒ requires development of viable optical means of has been achieved using two coupled disks.6 The outcoupling efficient confinement and delivery of high power light to ϫ 1,2 into a perfectly matched layer with mode size 21 24 nm at nanometer-sized areas. -
7 Plasmonics
7 Plasmonics Highlights of this chapter: In this chapter we introduce the concept of surface plasmon polaritons (SPP). We discuss various types of SPP and explain excitation methods. Finally, di®erent recent research topics and applications related to SPP are introduced. 7.1 Introduction Long before scientists have started to investigate the optical properties of metal nanostructures, they have been used by artists to generate brilliant colors in glass artefacts and artwork, where the inclusion of gold nanoparticles of di®erent size into the glass creates a multitude of colors. Famous examples are the Lycurgus cup (Roman empire, 4th century AD), which has a green color when observing in reflecting light, while it shines in red in transmitting light conditions, and church window glasses. Figure 172: Left: Lycurgus cup, right: color windows made by Marc Chagall, St. Stephans Church in Mainz Today, the electromagnetic properties of metal{dielectric interfaces undergo a steadily increasing interest in science, dating back in the works of Gustav Mie (1908) and Rufus Ritchie (1957) on small metal particles and flat surfaces. This is further moti- vated by the development of improved nano-fabrication techniques, such as electron beam lithographie or ion beam milling, and by modern characterization techniques, such as near ¯eld microscopy. Todays applications of surface plasmonics include the utilization of metal nanostructures used as nano-antennas for optical probes in biology and chemistry, the implementation of sub-wavelength waveguides, or the development of e±cient solar cells. 208 7.2 Electro-magnetics in metals and on metal surfaces 7.2.1 Basics The interaction of metals with electro-magnetic ¯elds can be completely described within the frame of classical Maxwell equations: r ¢ D = ½ (316) r ¢ B = 0 (317) r £ E = ¡@B=@t (318) r £ H = J + @D=@t; (319) which connects the macroscopic ¯elds (dielectric displacement D, electric ¯eld E, magnetic ¯eld H and magnetic induction B) with an external charge density ½ and current density J. -
Decorative Plasmonic Surfaces
> REPLACE THIS LINE WITH YOUR PAPER IDENTIFICATION NUMBER (DOUBLE-CLICK HERE TO EDIT) < 1 Decorative Plasmonic Surfaces Hamid T. Chorsi, Ying Zhu, and John X. J. Zhang However, the implementation of these concepts in real Abstract— Low-profile patterned plasmonic surfaces are microsystems are limited by a variety of factors, including synergized with a broad class of silicon microstructures to greatly technological challenges in realizing three-dimensional enhance near-field nanoscale imaging, sensing, and energy specific nano-structured patterns; inherent device sensitivity to harvesting coupled with far-field free-space detection. This fabrication induced disorder and losses; and experiment- concept has a clear impact on several key areas of interest for the guided modeling of structure interaction with photons across MEMS community, including but not limited to ultra-compact multiple scales. microsystems for sensitive detection of small number of target molecules, and “surface” devices for optical data storage, micro- Inspired by the concepts of optical metamaterials and the imaging and displaying. In this paper, we review the current peculiar features of plasmonic nanopatterns, “Plasmonic state-of-the-art in plasmonic theory as well as derive design microsystems” is an emerging field that is evolving into a guidance for plasmonic integration with microsystems, novel paradigm for the conception of optical plasmonic fabrication techniques, and selected applications in biosensing, surfaces. Plasmonic patterning is the 2-D sub-wavelength including refractive-index based label-free biosensing, plasmonic conformal arrangements of plasmonic nanoparticles, integrated lab-on-chip systems, plasmonic near-field scanning nanoantennas, and nanoapertures or nanogrooves to achieve optical microscopy and plasmonics on-chip systems for cellular unconventional optical wave interactions with nanoscale imaging. -
Metamaterial Lensing Devices
molecules Review Metamaterial Lensing Devices Jiangtao Lv 1, Ming Zhou 1, Qiongchan Gu 1, Xiaoxiao Jiang 1, Yu Ying 2 and Guangyuan Si 1,3,* 1 College of Information Science and Engineering, Northeastern University, Shenyang 110004, China 2 College of Information & Control Engineering, Shenyang Jianzhu University, Shenyang 110168, China 3 Melbourne Centre for Nanofabrication, Clayton, Victoria 3168, Australia * Correspondence: [email protected] Academic Editor: Xuejun Lu Received: 15 May 2019; Accepted: 2 July 2019; Published: 4 July 2019 Abstract: In recent years, the development of metamaterials and metasurfaces has drawn great attention, enabling many important practical applications. Focusing and lensing components are of extreme importance because of their significant potential practical applications in biological imaging, display, and nanolithography fabrication. Metafocusing devices using ultrathin structures (also known as metasurfaces) with superlensing performance are key building blocks for developing integrated optical components with ultrasmall dimensions. In this article, we review the metamaterial superlensing devices working in transmission mode from the perfect lens to two-dimensional metasurfaces and present their working principles. Then we summarize important practical applications of metasurfaces, such as plasmonic lithography, holography, and imaging. Different typical designs and their focusing performance are also discussed in detail. Keywords: metamaterial; nanofocusing; perfect lens; metasurfaces 1. Introduction In recent years, surface plasmons and related devices [1–23] have been thoroughly investigated due to their potentially wide applications in nanophotonics [24–38], biology [39–45], spectroscopy [46–51], and so on. They are capable of manipulating electromagnetic waves [52–62] at the nanometer scale to achieve all-optical integration, providing an effective way to develop smaller, faster and more efficient devices. -
Proximity Correction and Resolution Enhancement of Plasmonic Lens Lithography Far Beyond the Near Cite This: RSC Adv.,2017,7,12366 field Diffraction Limit†
RSC Advances View Article Online PAPER View Journal | View Issue Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near Cite this: RSC Adv.,2017,7,12366 field diffraction limit† Yunfei Luo,‡a Ling Liu,‡ab Wei Zhang,a Weijie Kong,a Chengwei Zhao,a Ping Gao,a Zeyu Zhao,a Mingbo Pu,a Changtao Wanga and Xiangang Luo*a Near-field optical imaging methods have been suffering from the issue of a near field diffraction limit, i.e. imaging resolution and fidelity depend strongly on the distance away from objects, which occurs due to the great decay effect of evanescent waves. Recently, plasmonic cavity lens with off-axis light illumination was proposed as a method for going beyond the near field diffraction limit for imaging dense nanoline patterns. In this paper, this investigation was further extended to more general cases for isolated and discrete line patterns, by enhancing the resolution and correcting the proximity effect with assistant peripheral groove structures. Experiment results demonstrate that the width of single, double Received 4th January 2017 Creative Commons Attribution-NonCommercial 3.0 Unported Licence. and multiple line patterns is well controlled and the uniformity is significantly improved in lithography Accepted 15th February 2017 with a 365 nm light wavelength and 120 nm working distance, being approximately ten times the air DOI: 10.1039/c7ra00116a distance defined by the near field diffraction limit. The methods are believed to find applications in rsc.li/rsc-advances nanolithography, high density -
Far-Field Tunable Nano-Focusing Based on Metallic Slits Surrounded with Nonlinear-Variant Widths and Linear-Variant Depths of Circular Dielectric Grating
Far-Field Tunable Nano-focusing Based on Metallic Slits Surrounded with Nonlinear-Variant Widths and Linear-Variant Depths of Circular Dielectric Grating Peng-Fei Cao1, Ling Cheng1,2, Xiao-Ping Zhang1*, Wei-Ping Lu2, Wei-Jie Kong1, Xue-Wu Liang1 1 School of Information Science and Engineering, Lanzhou University Lanzhou 730000,China 2 Department of Physics, School of Engineering and Physical Sciences, Heriot-Watt University Edinburgh, EH14 4AS, UK ABSTRACT – In this work, we design a new tunable nanofocusing lens by the linear-variant depths and nonlinear-variant widths of circular grating for far field practical applications. The constructively interference of cylindrical surface plasmon launched by the subwavelength metallic structure can form a subdiffraction-limited focus, and the focal length of the this structures can be adjusted if the each groove depth and width of circular grating are arranged in traced profile. According to the numerical calculation, the range of focusing points shift is much more than other plasmonic lens, and the relative phase of emitting light scattered by surface plasmon coupling circular grating can be modulated by the nonlinear-variant width and linear-variant depth. The simulation result indicates that the different relative phase of emitting light lead to variant focal length. We firstly show a unique phenomenon for the linear-variant depths and nonlinear-variant widths of circular grating that the positive change and negative change of the depths and widths of grooves can result in different of variation trend between relative phases and focal lengths. These results paved the road for utilizing the plasmonic lens in high-density optical storage, nanolithography, superresolution optical microscopic imaging, optical trapping, and sensing.