DOCSLIB.ORG

Pulsed-Laser Deposition of Silicon Dioxide Thin-Films Using the Molecular Flourine Laser

Total Page：16

File Type：pdf, Size：1020Kb

Download full-text PDF Read full-text
Pulsed-Laser Deposition of Silicon Dioxide Thin-Films Using the Molecular Flourine Laser Pulsed-Laser Deposition of Silicon Dioxide Thin-Films Using the Molecular Flourine Laser Brian Douglas Jackson A thesis submitted in conforrnity with the requirements for the degree of Master of Applied Science Graduate Department of Electrical and Computer Engineering University of Toronto O Copyright by Brian Douglas Jackson 1997 395 Wellington Street 395, rue Wellington Ottawa ON KIA ON4 Ottawa ON K1A ON4 Canada Canada Your fila Votre réference Our file Nolre rdldrence The author has granted a non- L'auteur a accordé une licence non exclusive licence alîowing the exclusive permettant à la National Library of Canada to Bibliothéque nationale du Canada de reproduce, loan, distribute or sell reproduire, prêter, distribuer ou copies of this thesis in microforni, vendre des copies de cette thèse sous paper or electronic fonnats. la forme de microfiche/nlm, de reproduction sur papier ou sur format électronique. The author retains ownership of the L'auteur conserve la propriété du copyright in this thesis. Neither the droit d'auteur qui protège cette thèse. thesis nor substantial extracts from it Ni la thése ni des extraits substantiels may be printed or otherwise de celle-ci ne doivent être imprimés reproduced without the author's ou autrement reproduits sans son permission. autorisation. Thin-Films Using ;he Molecular Fluorine Laser Brian Douglas Jackson Master of Applied Science Degree, 1997 The Department of Electrical and Computer Engineering The University of Toronto Abstract The short-wavelength extension of pulsed-laser deposition (PLD) to the 157-nm F2 laser may enable low-temperature growth of silica films for electronics and photonics applications. This thesis examines the effects of laser fluence, background gas, and substrate temperature on the properties of SiOz films grown for the first time using the F2-laser. The deposited films were characterized by atomic force microscopy, x-ray photoelectron spectroscopy and Fourier-transform infrared spectroscopy. The strong absorption of 157-nm radiation in fused silica enabled the growth of virtually particulate-free Si02 films by F2-PLD, in contrast to results with longer wavelength lasers. Stoichiometric films were produced in ambient oxygen (4x10'' Ton), which compensated for oxygen loss due to Siondissociation by the 7.9-eV laser photons. Akhough the process parameters were not fully optimized, F2-PLD produced films with comparable properties to the best-previous PLD-grown SiO2 films, but inferior to films deposited by VUV-assisted CVD. 1 would first like to thank my thesis supervisor, Professor Peter Herman, for his ongoing advice during the coarse of this project. Additionally, 1 would like to recognize the financial contributions of NSERC and the Ontario Laser and Lightwave Research Centre. Several individuals provided assistance through the use of diagnostics instruments: Professor Stefan Zukotynski, of the Department of Electrical and Cornputer Engineering, allowed me the use of his FTIR spectrometer and mechanical profilorneter; Dr. Rana Sohdi, of the Surface Science Lab in the Centre for Biornaterials, provided ongoing advice regarding the use of the x-ray photoelectron spectrometer in his lab; and finally, Prof. Cynthia Goh, of the Department of Chemistry, provided the use of her atomic force microscope. 1 would also like to thank my fellow graduate students in the lab: Keith Beckley, Knsten Coupland, Jianhao Yang, David Moore, and Sola Ness. They helped in a variety of ways. Additionally, a high school CO-opstudent under my supervision, Tony Yoo, was a great help in designing and building Our deposition system. Finally, 1 would like to thank my fiancée, Trish, for her ongoing patience and encouragement in the face of adversity. * * Abstract ........................................................................................................................... ii ... Acknowledgements ............................................................................................................ iii .. List of TabIes ................................................................................................................... vil ... List of Figures .................................................................................................................. viii 1. Introduction .............................................................................................................1 1.1 Project Motivation .............................................................................................1 1.2 Thesis Outline ..................................................................................................2 2. Background Information .............................................................................................. 4 2.1 Pulsed-Laser Deposition ....................................................................................4 2.1.1 Basic Mechanisms ..................................................................................4 2.1.2 Advantages and Disadvantages of PLD .................................................6 2.1.3 Applications of PLD .............................................................................. 8 2.2 Laser Ablation .................................................................................................. 10 2.2.1 Overview ..............................................................................................10 2.2.2 Photothermal Ablation .........................................................................10 2.2.3 Photochernical Ablation ....................................................................... 13 2.2.4 Particul@e Generation During Laser Ablation ..................................... 15 2.2.5 Minimization of Particulate Generation ............................................... 17 2.3 Silicon Dioxide Thin-Films ..............................................................................18 2.3.1 Applications .........................................................................................18 2.3.2 Growth Techniques ..............................................................................20 2.4 Pulsed-Laser Deposition of Silicon Dioxide .................................................... 21 2.4.1 Motivation for PLD of Silicon Dioxide ...............................................21 2.4.2 Past Results of SiOz Growth by PLD ................................................... 22 2.4.3 Vacuum-Ultraviolet F2-Laser Ablation of Silicon Dioxide ................. 25 3 . Experimental Procedures ........................................................................................... 30 3.1 Overview .......................................................................................................... 30 3.2 Film Deposition ................................................................................................ 31 3.2.1 The Molecular Fluorine Laser .............................................................. 31 3.2.1.1 Basic Principles of Operation ................................................ 31 3.2.1.2 Ruorine Operation ................................................................. 33 3.2.1.3 Argon Fluoride Operation ......................................................34 3.2.2 Initial Experimental Configuration ...................................................... 34 3.2.3 Follow-up Experimental Configuration ...............................................37 3.2.3.1 F2-PLD Deposition Chamber Design ..................................... 37 3.2.3.2 Experimental Procedure ......................................................... 39 3.3 Film Characterization .......................................................................................41 3.3.1 Surface Roughness .............................................................................41 3.3.1 .1 Atornic Force Microscopy ................................................... 42 3.3.2 Chernical Composition and Structure ................................................42 3.3.3.1 X-ray Photoelectron Spectroscopy ...................................... 42 3.3.3.2 .Fourier-Transfomi Infrared Spectroscopy .............................47 3.3.3 Film Thickness ..................................................................................... 50 3.3.3.1 Mechanical Profilometry ....................................................... 50 3.3.3.2 Fourier-Transform Infrared Spectroscopy ............................. 50 3.3.3.3 X-ray Photoelectron Spectroscopy ......................................51 3.3.4 Film Density .........................................................................................51 4 . ExperimentalResults ................................................................................................ 52 4.1 Overview ..........................................................................................................52 4.2 Surface Roughness ........................................................................................... 53 4.4 Chernical Structure .......................................................................................... 62 4.4.1 Wide-Range FïIR Transmission Spectra (450-5200 cm-') ................. 62 4.4.2 Si-O-Si Asymmetric Stretching Mode Peak Spectra ........................... 65 4.5 Film Thickness, Deposition Rate. and Density ................................................ 69 5 . Discussion ..................................................................................................................72 5.1 Overview ..........................................................................................................72
Load more

Recommended publications
  • Next Generation High Temperature Superconducting Wires” A
    To be published in “Next Generation High Temperature Superconducting Wires” A. Goyal (Ed.), Kluwer Academic/Plenum Publishers PULSED LASER DEPOSITION OF YBa2Cu3O7-δ FOR COATED CONDUCTOR APPLICATIONS: CURRENT STATUS AND COST ISSUES Hans M. Christen Oak Ridge National Laboratory Solid-State Division Oak Ridge, TN 37831-6056 INTRODUCTION Amongst the numerous techniques currently being tested for the fabrication of coated conductors (i.e. high-temperature superconducting oxides deposited onto metallic tapes), pulsed laser deposition (PLD) plays a prominent role. Recent results from groups in the United States (e.g. Los Alamos National Laboratory), Europe (e.g. University of Göttingen), and Japan (e.g. Fujikura Ltd.) are most promising, yielding record numbers for Jc and Ic. As a method for depositing films of complex materials, such as the high-temperature superconductors (HTS) relevant to this chapter, PLD is well established and conceptually simple. Issues that have kept PLD from becoming a successful technique for devices and optical materials, namely particulate formation and thickness non-uniformities, are much less of a concern in the fabrication of HTS tapes. Nevertheless, the approach still presents ongoing challenges in the fundamental understanding of the laser-target interaction and growth from the resulting energetic plasma plume. Numerous issues related to the scale-up, control, reproducibility, and economic feasibility of PLD remain under investigation. It is clearly beyond the scope of this short chapter to give a complete treatise of such a complex subject – fortunately, several excellent reviews have already been published.1-3 It is thus the intent of the author to introduce PLD only briefly and with a strong focus on HTS deposition, summarizing the most important developments and referring the reader to the numerous cited works.
    [Show full text]
  • Femtosecond-Pulsed Laser Deposition of Erbium-Doped Glass Nanoparticles in Polymer Layers for Hybrid Optical Waveguide Amplifiers
    Femtosecond-Pulsed Laser Deposition of Erbium-Doped Glass Nanoparticles in Polymer Layers for Hybrid Optical Waveguide Amplifiers. Eric Kumi Barimah*1, Marcin W. Ziarko2, Nikolaos Bamiedakis2, Ian H. White2, Richard V. Penty2, Gin Jose1 School of Chemical and Process Engineering, University of Leeds, Clarendon Road, Leeds LS2 9JT, United Kingdom Centre for Photonic Systems, Department of Engineering, University of Cambridge, 9 JJ Thomson Ave, Cambridge CB3 0FA, United Kingdom *[email protected] Tellurium oxide (TeO2) based glasses are widely used in many applications such as fibre optic, waveguide devices and Raman gain, and are now being considered for use in optical waveguide amplifiers. These materials exhibit excellent transmission in the visible and near IR wavelength range (up to 2.0 µm), low phonon energy, and high rare-earth solubility [1-3]. Siloxane polymer materials on the other hand, have remarkable thermal, mechanical and optical properties and allow the fabrication of low-loss optical waveguides directly on printed circuit boards. In recent years, various low-cost optical backplanes have been demonstrated using this technology [4-7].However, all polymer optical circuits used in such applications are currently passive, requiring therefore amplification of the data signals in the electrical domain to extend the transmission distance beyond their attenuation limit. The combination of the TeO2 and siloxane technologies can enable the formation of low-cost optical waveguide amplifiers that can be deployed in board-level communications. However, there are significant technical challenges associated with the integration of these two dissimilar materials mainly due to the difference in their thermal expansion coefficients. In this paper therefore, we propose a new approach for incorporating erbium (Er3+)-doped tellurium- oxide glass nanoparticles into siloxane polymer thin films using femtosecond pulsed laser deposition (fs-PLD).
    [Show full text]
  • RAPID COMMUNICATIONS Resonant Infrared Pulsed-Laser Deposition Of
    RAPID COMMUNICATIONS This section is reserved for short submissions which contain important new results and are intended for accelerated publication. Resonant infrared pulsed-laser deposition of polymer films using a free-electron laser Daniel M. Bubb,a) J. S. Horwitz, J. H. Callahan, R. A. McGill, E. J. Houser, and D. B. Chrisey Naval Research Laboratory, Washington, DC 20375 M. R. Papantonakis and R. F. Haglund, Jr. Department of Physics and Astronomy and W. M. Keck Foundation Free-Electron Laser Center, Vanderbilt University, Nashville, Tennessee 37235 M. C. Galicia and A. Vertes Department of Chemistry, George Washington University, Washington, DC 20001 ͑Received 12 March 2001; accepted 29 May 2001͒ Thin films of polyethylene glycol ͑MW 1500͒ have been prepared by pulsed-laser deposition ͑PLD͒ using both a tunable infrared ͑␭ϭ2.9 ␮m, 3.4 ␮m͒ and an ultraviolet laser ͑␭ϭ193 nm͒.A comparison of the physicochemical properties of the films by means of Fourier transform infrared spectroscopy, electrospray ionization mass spectrometry, and matrix-assisted laser desorption and ionization shows that when the IR laser is tuned to a resonant absorption in the polymer, the IR PLD thin films are identical to the starting material, whereas the UV PLD show significant structural modification. These results are important for several biomedical applications of organic and polymeric thin films. © 2001 American Vacuum Society. ͓DOI: 10.1116/1.1387052͔ I. INTRODUCTION physical characteristics of the bulk PEG material, whereas Polyethylene glycol ͑PEG͒ is a technologically important the UV PLD deposited PEG materials do not. In addition, the polymer with many biomedical applications.1 Examples in- results also show clearly that the mechanism of IR PLD is clude tissue engineering,2 spatial patterning of cells,3,4 drug fundamentally different than UV PLD.
    [Show full text]
  • Redalyc.Synthesis and Characterization of Linio2 Targets
    Superficies y vacío ISSN: 1665-3521 [email protected] Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. México López-Iturbe, J.; Camacho-López, M. A.; Escobar-Alarcón, L.; Camps, E. Synthesis and characterization of LiNiO2 targets for thin film deposition by pulsed laser ablation Superficies y vacío, vol. 18, núm. 4, diciembre, 2005, pp. 27-30 Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. Distrito Federal, México Available in: http://www.redalyc.org/articulo.oa?id=94218407 How to cite Complete issue Scientific Information System More information about this article Network of Scientific Journals from Latin America, the Caribbean, Spain and Portugal Journal's homepage in redalyc.org Non-profit academic project, developed under the open access initiative Superficies y Vacío 18(4), 27-30, diciembre de 2005 ©Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales Synthesis and characterization of LiNiO2 targets for thin film deposition by pulsed laser ablation J. López-Iturbe Posgrado en Ciencia de Materiales, Facultad de Química, Universidad Autónoma del Estado de México M.A. Camacho-López Facultad de Química-Universidad Autónoma del Estado de México Paseo Colón y Tollocan, C.P. 50130, Toluca, México L. Escobar-Alarcón, E. Camps Departamento de Física, Instituto Nacional de Investigaciones Nucleare Apartado Postal 18-1027, México DF 11801, México (Recibido: 26 de septiembre de 2005; Aceptado: 31 de octubre de 2005) In order to deposit LiNiO2 thin films by pulsed laser deposition (PLD), a LiNiO2 target was prepared by a solid-state reaction from NiO and Li2O. The effect of the Li2O wt.
    [Show full text]
  • Phase Formation of Manganese Oxide Thin Films Using Pulsed Laser Deposition† Cite This: Mater
    Materials Advances View Article Online PAPER View Journal | View Issue Phase formation of manganese oxide thin films using pulsed laser deposition† Cite this: Mater. Adv.,2021, 2,303 Lauren M. Garten, *‡ Praneetha Selvarasu, § John Perkins,¶ David Ginley and Andriy Zakutayev * Manganese oxides have enabled a wide range of technologies including oxygen evolution catalysts, lithium ion batteries, and thermochemical water splitting. However, the variable oxidation state and rich polymorphism of manganese oxides make it difficult to find the processing conditions to target a particular phase of manganese oxide. Targeted synthesis requires a more complete understanding of the phase space and the impact of multiple processing variables on phase formation. Here, we demonstrate the impact of substrate temperature, total deposition pressure, partial pressure of oxygen, and target composition on the phase formation of manganese oxides grown using combinatorial pulsed laser deposition (PLD). Thin films were deposited from a MnO, Mn2O3 or MnO2 target onto amorphous glass Creative Commons Attribution 3.0 Unported Licence. substrates with a continuously varied temperature provided by a combinatorial heater. A combination of X-ray diffraction, Rutherford backscattering spectroscopy, and Raman and Fourier transform infrared (FTIR) spectroscopies were used to determine the phases present in the samples. The oxygen partial pressure was found to be the critical factor determining phase formation, while the total pressure, target composition, and substrate temperature have smaller and more complex effects on phase formation. Received 15th June 2020, Comparing the results of this work to the published temperature–pressure phase diagrams shows that Accepted 20th October 2020 the PLD thin films vary significantly from the expected equilibrium phases of either the bulk materials DOI: 10.1039/d0ma00417k or nanoparticles.
    [Show full text]
  • By Pulsed Laser Deposition
    Western Kentucky University TopSCHOLAR® Masters Theses & Specialist Projects Graduate School Spring 2020 Morphology and Structure of Pb Thin Films Grown On Si (111) by Pulsed Laser Deposition Bektur Abdisatarov Western Kentucky University, [email protected] Follow this and additional works at: https://digitalcommons.wku.edu/theses Part of the Engineering Science and Materials Commons, Physical Sciences and Mathematics Commons, and the Semiconductor and Optical Materials Commons Recommended Citation Abdisatarov, Bektur, "Morphology and Structure of Pb Thin Films Grown On Si (111) by Pulsed Laser Deposition" (2020). Masters Theses & Specialist Projects. Paper 3178. https://digitalcommons.wku.edu/theses/3178 This Thesis is brought to you for free and open access by TopSCHOLAR®. It has been accepted for inclusion in Masters Theses & Specialist Projects by an authorized administrator of TopSCHOLAR®. For more information, please contact [email protected]. MORPHOLOGY AND STRUCTURE OF PB THIN FILMS GROWN ON SI (111) BY PULSED LASER DEPOSITION A Thesis Presented to The Department of Physics and Astronomy Western Kentucky University Bowling Green, Kentucky In Partial Fulfillment Of the Requirements for the Degree Master of Science By Bektur Abdisatarov May 2020 Digitally signed by Cheryl D Davis Cheryl D Davis Date: 2020.05.12 08:54:22 -05'00' It would be an honor to dedicate this thesis to my family and friends. I have a unique feeling of gratitude and appreciation for my loving mother, Raikhan, for her encouragement and inspiring words that have motivated me to become a master of science. My sisters Aizat and Aiperi and my brother Bekzat gave me faith, and they were my source of strength when I was weak.
    [Show full text]
  • Atmospheric Pressure Matrix-Assisted Laser Desorption/Ionization in Transmission Geometry
    Anal. Chem. 2002, 74, 1891-1895 Atmospheric Pressure Matrix-Assisted Laser Desorption/Ionization in Transmission Geometry Marsha C. Galicia,² Akos Vertes,² and John H. Callahan*,³ Department of Chemistry, The George Washington University, Washington, D.C. 20052, and Chemical Dynamics and Diagnostics Branch, Naval Research Laboratory, Code 6115, Washington, D.C. 20375 In both atmospheric pressure matrix-assisted laser de- sorption/ionization (AP MALDI) and vacuum MALDI, the laser typically illuminates the analyte on the front side of an opaque surface (reflection geometry). Another config- uration consisting of laser illumination through the sample backside (transmission geometry) has been used in conventional MALDI; however, its use and the number of reports in the literature are limited. The viability of transmission geometry with AP MALDI is demonstrated here. Such a geometry is simple to implement, eliminates the restriction for a metallic sample holder, and allows for the potential analysis of samples on their native transparent surfaces, e.g., cells or tissue sections on slides. With the widespread application of matrix-assisted laser de- sorption/ionization (MALDI) mass spectrometry for high-volume biomedical analysis, there is strong motivation to increase the throughput of the method. While large-capacity sample holders go a long way to speed up the analysis, the need to evacuate the sample presents a significant impediment. Atmospheric pressure (AP) MALDI promises to eliminate the need for this step.1,2 Various implementations of AP MALDI have proved the feasibility of this approach in combination with both time-of-flight (TOF)1,2 Figure 1. and ion trap (IT)3,4 mass analyzers.
    [Show full text]
  • University of Patras
    University of Patras • Physics Department Prof. S. Couris, Th. Efthimiopoulos Group Prof. A.T. Georges Group • Materials Science Department Prof. N. Vainos, M. Sigalas ( Phasma Group) Prof. S. Couris (also at FORTH/ICE-HT) Th. Efthimiopoulos Group •Nonlinear Optics •Characterization and fundamental studies of the NLO response of Photonic materials •Molecular Electronics •Laser Spectroscopy •Molecules in strong fields •Plasma Diagnostics •Laser produced plasmas for analytical applications for environmental applications and monitoring of industrial metallurgical processes (LIBS) •Laser Induced Fluorescence (LIF) • Laser Diagnostics in Combustion •Physics and Spectroscopy of Electrical Discharges •Applications of Lasers Contact : [email protected] Prof. A.T. Georges Group • Nonlinear Optics • Free Electron Lasers • Resonant Multiphoton Processes in Atoms • Stochastic Laser Fluctuations • Laser-Metal Surface Interaction Contact : [email protected] PHASMA PHotonic Applications, Structures & MAterials Group Group Members Prof N. A . Vainos Prof M. Sigalas Dr. D. Alexandropoulos Dr. V. Karoutsos Mr. M. Vasileiadis Mr. L. Athanasekos Contact : [email protected] Mr. N. Aspiotis [email protected] Ms. P. Orfanou I. Applications III. Advanced Photonic Structures .Optical sensors (remote sensing) .Micro-ring structures and CROWs .Optical photonic circuits .Vertical Cavities .Optical communications .Diffractive optics and Holography .Solar Cells .Photonic and phononic crystals .Plasmonic cavities II. Materials and Fabrication
    [Show full text]
  • Pulsed Laser Deposition of Thin Film Heterostructures
    University of New Orleans ScholarWorks@UNO University of New Orleans Theses and Dissertations Dissertations and Theses Summer 8-4-2011 Pulsed Laser Deposition of Thin Film Heterostructures Ezra Garza University of New Orleans, [email protected] Follow this and additional works at: https://scholarworks.uno.edu/td Part of the Physics Commons Recommended Citation Garza, Ezra, "Pulsed Laser Deposition of Thin Film Heterostructures" (2011). University of New Orleans Theses and Dissertations. 459. https://scholarworks.uno.edu/td/459 This Thesis is protected by copyright and/or related rights. It has been brought to you by ScholarWorks@UNO with permission from the rights-holder(s). You are free to use this Thesis in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights- holder(s) directly, unless additional rights are indicated by a Creative Commons license in the record and/or on the work itself. This Thesis has been accepted for inclusion in University of New Orleans Theses and Dissertations by an authorized administrator of ScholarWorks@UNO. For more information, please contact [email protected]. Pulsed Laser Deposition of Thin Film Heterostructures A Thesis Submitted to the Graduate Faculty of the University of New Orleans in partial fulfillment of the requirements for the degree of Master of Science in Applied Physics by Ezra Garza B.S. University of New Orleans, 2008 August, 2011 Copyright 2011, Ezra Garza ii Acknowledgments I would like to thank Dr. Leonard Spinu for giving me the opportunity of being a part of such a great research group and guidance during the research process.
    [Show full text]
  • Erbium-Doped Yttria-Stabilised Zirconia Thin Films Grown by Pulsed Laser Deposition for Photonic Applications A
    Erbium-doped yttria-stabilised zirconia thin films grown by pulsed laser deposition for photonic applications A. Ruiz-Caridad, G. Marcaud, J.M. Ramirez, E. Durán-Valdeiglesias, C. Lafforgue, J. Zhang, L. Largeau, T. Maroutian, S. Matzen, C. Alonso-Ramos, et al. To cite this version: A. Ruiz-Caridad, G. Marcaud, J.M. Ramirez, E. Durán-Valdeiglesias, C. Lafforgue, et al.. Erbium- doped yttria-stabilised zirconia thin films grown by pulsed laser deposition for photonic applications. Thin Solid Films, Elsevier, 2020, 693, pp.137706. 10.1016/j.tsf.2019.137706. hal-02415781 HAL Id: hal-02415781 https://hal.archives-ouvertes.fr/hal-02415781 Submitted on 4 Feb 2021 HAL is a multi-disciplinary open access L’archive ouverte pluridisciplinaire HAL, est archive for the deposit and dissemination of sci- destinée au dépôt et à la diffusion de documents entific research documents, whether they are pub- scientifiques de niveau recherche, publiés ou non, lished or not. The documents may come from émanant des établissements d’enseignement et de teaching and research institutions in France or recherche français ou étrangers, des laboratoires abroad, or from public or private research centers. publics ou privés. Erbium-doped yttria-stabilised zirconia thin films grown by PLD for photonic applications. A. Ruiz-Caridada, G. Marcauda, J. M. Ramirezb, Elena Durán-Valdeiglesiasa, Christian Lafforguea, Jianhao Zhanga, L. Largeaua, T. Maroutian a, S. Matzen a, C. Alonso-Ramos a, S. Collin a, G. Agnus a, S. Guerber a,c, C. Baudot c, F. Boeuf c, Stéphane Monfray c, Sébastien Crémer c, V. Vakarin d, E. Cassan a, D. Marris-Morini a, P.
    [Show full text]
  • Laser Induced Breakdown Spectroscopy (Libs) and Time-Resolved Studies of Copper Plasma Excited by Nanosecond and Femtosecond Laser Pulses
    LASER INDUCED BREAKDOWN SPECTROSCOPY (LIBS) AND TIME-RESOLVED STUDIES OF COPPER PLASMA EXCITED BY NANOSECOND AND FEMTOSECOND LASER PULSES A project report submitted to the Cochin University of Science and Technology for the award of five year integrated Masters of Science Degree in Photonics (2007-2012) Submitted by Anusha Keloth X Semester 5 Year Integrated MSc in Photonics Centre of Excellence in Lasers and Optoelectronic Sciences (CELOS) Cochin University of Science and Technology (CUSAT) Under the guidance of: Dr. Reji Philip Associate Professor Raman Research Institute Bangalore DECLARATION I hereby declare that the project report entitled "Laser induced breakdown spectroscopy (LIBS) and time-resolved studies of copper plasma excited by nanosecond and femtosecond laser pulses" comprises of my original work carried out under the guidance of Dr.Reji Philip, Associate Professor, Raman Research Institute, Bangalore. Anusha Keloth ACKNOWLEDGMENT It has been a wonderful experience for me to be a part of the Ultrafast and nonlinear optics group at Raman Research Institute, Bangalore. With immense pleasure, I express my proud gratitude and indebtedness to my supervising guide Dr. Reji Philip, Associate Professor Raman Research Institute, Bangalore for giving me an opportunity to do my project with his group and for his valuable suggestions and help throughout the period of my work. I am grateful to the Director Prof.P Radhakrishnan, ISP, CUSAT for his support and encouragement throughout my studies. I also express my sincere gratitude to the Project assistant Anoop for his guidance and constant support in completing my project. I would like to thank Dr. Priya Rose T, Post Doctoral Fellow, RRI for her motivation and support.
    [Show full text]
  • Nikolaos A. Vainos
    CURRICULUM VITAE NIKOLAOS A. VAINOS PERSONAL DATA Date / Place of Birth: 9 January 1960 / Amfissa, Greece Orign/Nationality: Greek Marital Status: Married / One daughter Professional Address: Dept. of Materials Science, Univ. of Patras, Patras 26500, Greece EDUCATION 1982 Ptihio Physikis, University of Ioannina, Greece 1985 Master of Science in “Lasers and their Applications”, University of Essex, UK 1989 Doctorate of Philosophy in Physics, University of Essex, UK PROFESSIONAL POSITIONS 1988-1991 Research Associate; SERC-Central Laser Facility, Rutherford Appleton Laboratory, U.K. 1991-1995 Research Scientist; Foundation for Res. and Tech. Hellas-IESL (FORTH-IESL), Head of Applied Nonlinear Optics & Opt. Proces. Laboratory, Heraklion, Greece 1995- 2000 Researcher C’ (1995) and Researcher B’ (1998) FORTH-IESL, Founder and Head of Applied NLO & Optical Processing Laboratory 1992-2000 Member and Consultant; Association for Research Tech. & Training, Greece 1991-2000 Visiting Professor; Department of Physics, University of Crete, Greece 1999-2002 Visiting Professor; Dept. of Physics, Aristotle Univ. of Thessaloniki, Greece 2000-2003 Visiting Professor; Department of Physics, Univ. of Ioannina, Greece 2000-2005 Researcher B’, National Hellenic Research Foundation (NHRF-TPCI), Founder and Head of Photonic Media Laboratory, Athens, Greece 2005- Collaborating Faculty Member, NHRF, Coordinator of Photonic Media Lab activities 2005-2009 Associate Professor; Department of Materials Science, University of Patras, Greece Founder and Head of Photonic Materials, Structures Applications Labs, 2009-2011 Deputy Chair of the Department of Materials Science, 2010- Professor of Photonic Materials Science & Applications, Department of Materials Science, Univ. of Patras 2011-2015 Chair of the Department of Materials Science, Member of the Senate of the University of Patras 2011-2018 Director of the School of Graduate Studies, Dept.
    [Show full text]