nanomaterials Article Highly Aligned Polymeric Nanowire Etch-Mask Lithography Enabling the Integration of Graphene Nanoribbon Transistors Sangheon Jeon 1,†, Pyunghwa Han 2,†, Jeonghwa Jeong 1, Wan Sik Hwang 3,4,* and Suck Won Hong 1,* 1 Department of Cogno-Mechatronics Engineering, Department of Optics and Mechatronics Engineering, College of Nanoscience and Nanotechnology, Pusan National University, Busan 46241, Korea;
[email protected] (S.J.);
[email protected] (J.J.) 2 Research Center for S-T/F, Samsung Electro-Mechanics, Busan 46754, Korea;
[email protected] 3 Department of Materials Engineering, Korea Aerospace University, Goyang 10540, Korea 4 Smart Drone Convergence, Korea Aerospace University, Goyang 10540, Korea * Correspondence:
[email protected] (W.S.H.);
[email protected] (S.W.H.) † These authors contributed equally to this work. Abstract: Graphene nanoribbons are a greatly intriguing form of nanomaterials owing to their unique properties that overcome the limitations associated with a zero bandgap of two-dimensional graphene at room temperature. Thus, the fabrication of graphene nanoribbons has garnered much attention for building high-performance field-effect transistors. Consequently, various methodolo- gies reported previously have brought significant progress in the development of highly ordered graphene nanoribbons. Nonetheless, easy control in spatial arrangement and alignment of graphene nanoribbons on a large scale is still limited. In this study, we explored a facile, yet effective method for the fabrication of graphene nanoribbons by employing orientationally controlled electrospun poly- meric nanowire etch-mask. We started with a thermal chemical vapor deposition process to prepare graphene monolayer, which was conveniently transferred onto a receiving substrate for electrospun polymer nanowires.