Study of Growth Parameters for Refractory Carbide Single Crystals
Total Page:16
File Type:pdf, Size:1020Kb
Load more
Recommended publications
-
Spark Plasma Sintering of Tantalum Carbide and Graphene Reinforced Tantalum Carbide Ceramic Composites
SPARK PLASMA SINTERING OF TANTALUM CARBIDE AND GRAPHENE REINFORCED TANTALUM CARBIDE COMPOSITES By AJITH KUMAR KALLURI Bachelor of Science in Mechanical Engineering VIT University Vellore, India 2010 Submitted to the Faculty of the Graduate College of the Oklahoma State University in partial fulfillment of the requirements for the Degree of MASTER OF SCIENCE December, 2012 SPARK PLASMA SINTERING OF TANTALUM CARBIDE AND GRAPHENE REINFORCED TANTALUM CARBIDE COMPOSITES Thesis Approved: Dr. Sandip P. Harimkar Thesis Adviser Dr. A. Kaan Kalkan Dr. Raman P. Singh ii ACKNOWLEDGEMENTS I would like to thank my advisor Dr. Sandip P. Harimkar for his kind advise, guidance, and patience throughout my masters. I would also be grateful to Dr. A. Kaan Kalkan and Dr. Raman P. Singh for being my committee members and their valuable suggestions throughout my thesis. I would like to convey my deepest sense of gratitude to Ashish Singh for his valuable suggestions, support, and care, Sriharsha Karumuri for his encouragement, moral support and Sudheer Bandla for his help with my thesis. I could not have completed my thesis without their help. It will take a life time to forget the precious time, love and support which they gave when in need. I would also like to thank Amy Aurilio for her help with my thesis write up. Last but not the least; I am very grateful to my parents (Ramesh Babu Kalluri and Sarada Gogineni) and my sister (Divya Sree Kalluri) for their love, support and encouragement throughout my career. Heartful thanks to my uncle Dr. Sridhar Gogineni, his wife Manasa Gogineni, my sister Neelima Kalluri and my very lovable niece Sreeja Gogineni who never let me miss home. -
Sapphire: Properties, Growth, and Applications
Sapphire: Properties, Growth, and 1904), which is sometimes called the flame fusion method. In this technique, alumina powder to be Applications crystallized is fused in a hydrogen–oxygen flame and falls on the molten upper surface of an oriented seed Sapphire has a high refractive index and a broad crystal placed in a furnace (Fig. 1(a)). transmission band spanning the UV, visible, and IR Since this is not a refined process, the material can bands. Sapphire also has a high hardness and melting contain voids and powder inclusions and is likely to be point, and very good thermal conductivity, tensile strained. However, crystals of up to 60mm in diameter strength, and thermal shock resistance (Table 1). The can be grown by this method. Figure 2 shows typical favorable combination of excellent optical and mech- sapphire boules grown by the Verneuil technique. anical properties of sapphire, together with high chemical durability, makes it an attractive structural material for high-technology applications. Sapphire crystals are used in medicine and blood chemistry as 1.2 Czochralski Growth they are resistant to human blood and body fluids, and are totally impervious to moisture and chemically This technique originates from pioneering work by inert. Frequently it is the combination of two, or more, Czochralski (1917). Crystals grow from the meniscus of its properties that make sapphire the only material formed on a free surface of the melt onto the seed available to solve complex engineering design crystal of the required crystallographic orientation. problems. The pull rod is lifted and rotated, and crystallization However, sapphire is difficult to shape owing to its onto the end of the seed occurs (Fig. -
Crystal Growth and Defects
Hartmut S. Leipner, Reinhard Krause-Rehberg Structure of imperfect solids (2) A. Advanced topics B. Methods Syllabus 1–2. Defects and crystal growth 3–4. Defects and semiconductor technology 5–7.* Defect engineering; diffusion 8. Optical methods 9. * Electrical methods 10. * Positron annihilation 11. * Resonance techniques 12. X-ray methods 13. * Probe techniques (* given by Reinhard Krause-Rehberg) 2 Summary As the continuation of the introduction into crystal defects (in the SS 2001), advanced topics of solid state physics related to defects are treated in this semester. Topics are the crystal growth from the point of view of crystal imperfections, diffusion in solids, and the role of defects in the production and the function of solid state devices. In the second part of this lecture, basic experimental techniques of the investigation of defects are introduced. The following methods are treated: optical and electrical methods (luminescence, Hall effect, DLTS), X-ray techniques, probe and resonance techniques (positron annihilation, pertubed angular correlation, electron paramagnetic resonance). The pieces of information to be extracted from the particular methods for the characterization of the defect structure are discussed. 3 Literature K.-T. Wilke: Kristallzüchtung. Berlin: Deutscher Verlag der Wissenschaften 1988. Silicon devices. Ed. K. A. Jackson. Weinheim: Wiley-VCH 1998. Bergmann Schäfer Lehrbuch der Experimentalphysik. Band 6 Festkörper. Hrg. W. Raith. Berlin: De Gruyter 1992. B. G. Jacobi, D. B. Holt: Cathodoluminescence microscopy of inorganic solids. New York: Plenum 1990. S. Pfüller: Halbleitermeßtechnik. Berlin: Verlag Technik 1976. G. Schatz, A. Weidinger: Nukleare Festkörperphysik. Stuttgart: Teubner 1992. Identification of defects in semiconductors. Ed. M. Stavola. San Diego: Academic Press 1998 Hartmut S. -
Development Team
Material science Paper No. : Crystallography & crystal growth Module : Growth from melt II Development Team Prof. Vinay Gupta, Department of Physics and Astrophysics, Principal Investigator University of Delhi, Delhi Prof. P. N. Kotru ,Department of Physics, University of Jammu, Paper Coordinator Jammu-180006 Content Writer Prof. P. N. Kotru ,Department of Physics, University of Jammu, Jammu-180006 Prof Mahavir Singh Department of Physics, Himachal Pradesh Content Reviewer University, Shimla 1 Crystallography & crystal growth Material science Growth from melt II Description of Module Subject Name Physics Paper Name Crystallography & crystal growth Module Name/Title Growth from melt II Module Id 31 2 Crystallography & crystal growth Material science Growth from melt II 31 Bridgman-Stockbarger Growth Technique. 31.1 Introduction The techniques were originated by Bridgman (1925) and Stockbarger (1938) and so are named after them. In these techniques a crucible containing the material to be grown is lowered through a furnace in such a way that the lowest point in the crucible and the solidification surface rises slowly up the crucible. It means that the melt contained in the crucible is progressively frozen to yield a single crystal. The rate of lowering the crucible may range from about 0.1 to 200 mmh─1 but in most of the cases it may range somewhere in between 1-30 mmh─1. There are situations where the movement of the crucible is reversed. In other words, the crucible is raised up through the furnace and so is advantageously applicable for materials which are volatile; the interface with the vapour being the coolest part of the charge. -
Ga2o3 and Its Vertical Structure Leds
micromachines Review Epitaxy of III-Nitrides on β-Ga2O3 and Its Vertical Structure LEDs Weijiang Li 1,2,3, Xiang Zhang 1,2,3, Ruilin Meng 1,2,3, Jianchang Yan 1,2,3, Junxi Wang 1,2,3, Jinmin Li 1,2,3 and Tongbo Wei 1,2,3,* 1 State Key Laboratory of Solid-State Lighting, Institute of Semiconductors, University of Chinese Academy of Sciences, Beijing 100083, China; [email protected] (W.L.); [email protected] (X.Z.); [email protected] (R.M.); [email protected] (J.Y.); [email protected] (J.W.); [email protected] (J.L.) 2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China 3 Beijing Engineering Research Center for the 3rd Generation Semiconductor Materials and Application, Beijing 100083, China * Correspondence: [email protected]; Tel.: +86-010-8230-5430 Received: 7 April 2019; Accepted: 8 May 2019; Published: 13 May 2019 Abstract: β-Ga2O3, characterized with high n-type conductivity, little lattice mismatch with III-Nitrides, high transparency (>80%) in blue, and UVA (400–320 nm) as well as UVB (320–280 nm) regions, has great potential as the substrate for vertical structure blue and especially ultra violet LEDs (light emitting diodes). Large efforts have been made to improve the quality of III-Nitrides epilayers on β-Ga2O3. Furthermore, the fabrication of vertical blue LEDs has been preliminarily realized with the best result that output power reaches to 4.82 W (under a current of 10 A) and internal quantum efficiency (IQE) exceeds 78% by different groups, respectively, while there is nearly no demonstration of UV-LEDs on β-Ga2O3. -
A Case for Capacitor Grade Sintered Tantalum
Bull. Mater. Sci., Vol. 28, No. 4, July 2005, pp. 305–307. © Indian Academy of Sciences. Powder metallurgical processing and metal purity: A case for capacitor grade sintered tantalum G S UPADHYAYA Department of Materials and Metallurgical Engineering, Indian Institute of Technology, Kanpur 208 016, India Abstract. The paper reviews the role of sintered tantalum as volumetric efficient electrical capacitor. Powder characteristics and sintering aspects are discussed. The role of impurities in influencing the electrical properties has been described. Today’s driving force behind the Ta market is the use of surface mounted versions known as chip types, for applications requiring a wide range of operational temperature, such as automotive electronics. Keywords. Tantalum powder; sintering; capacitor. 1. Introduction tantalum powder. The pellet, with an attached tantalum lead wire, is electrochemically oxidized to grow a thin Many products and devices are being manufactured through layer of insulating tantalum oxide on the surface of the powder metallurgy route, because of many associated tantalum. Next, the anodized pellet is impregnated with advantages (Upadhyaya 1997). The purity of the starting manganese nitrate which is then thermally decomposed to metal or ceramic powder is of significance in controlling leave or deposit semiconducting manganese dioxide on the microstructure/properties/processing and performance the tantalum oxide. These processes create the conduc- of such products. The major methods of production of tor (Ta)/insulator(Ta2O5)/conductor(MnO2) configuration metal powders are: chemical, physical and mechanical. needed for a capacitor. Finally, the unit is encapsulated Tantalum is used mainly as a corrosion resistant metal usually in the chip configuration. -
INTERNSHIP REPORT Single Crystal Growth of Constantan by Vertical
INTERNSHIP REPORT Single Crystal Growth of Constantan by Vertical Bridgman Method Supervisor: Prof. Henrik Rønnow Laboratory for Quantum Magnetism (LQM) Rahil H. Bharani 08D11004 Third year Undergraduate Metallurgical Engineering and Materials Science IIT Bombay May – July 2011 ACKNOWLEDGEMENT I thank École Polytechnique Fédérale de Lausanne (EPFL) and Prof. Henrik Rønnow, my guide, for having me as an intern here. I have always been guided with every bit of help that I could possibly require. I express my gratitude to Prof. Daniele Mari, Iva Tkalec and Ann-Kathrin Maier for helping me out with my experimental runs and providing valuable insights on several aspects of crystal growth related to the project. I thank Julian Piatek for his help in clearing any doubts that I have had regarding quantum magnetism pertaining to understanding and testing the sample. I am indebted to Neda Nikseresht and Saba Zabihzadeh for teaching me to use the SQUID magnetometer, to Nikolay Tsyrulin for the Laue Camera and Shuang Wang at PSI for the XRF in helping me analyse my samples. I thank Prof. Enrico Giannini at the University of Geneva for helping me with further trials that were conducted there. Most importantly, I thank Caroline Pletscher for helping me with every little thing that I needed and Caroline Cherpillod, Ursina Roder and Prof Pramod Rastogi for co-ordinating the entire internship program. CONTENTS INTRODUCTION REQUIREMENTS OF THE SAMPLE SOME METHODS TO GROW SINGLE CRYSTALS • CZOCHRALSKI • BRIDGMAN • FLOATING ZONE TESTING THE SAMPLES • POLISH AND ETCH • X-RAY DIFFRACTION • LAUE METHOD • SQUID • X-RAY FLUORESCENCE THE SETUP TRIAL 1 TRIAL 2 TRIAL 3 TRIAL 4 Setup, observations, results and conclusions. -
Chemical Vapor Deposition of Tac/Sic on Graphite Tube and Its Ablation and Microstructure Studies
coatings Article Chemical Vapor Deposition of TaC/SiC on Graphite Tube and Its Ablation and Microstructure Studies Suresh Kumar 1,*, Samar Mondal 2, Anil Kumar 2, Ashok Ranjan 1 and Namburi Eswara Prasad 1 1 Directorate of Ceramics and CMCs, Defence Materials & Stores Research and Development Establishment, Defence Research and Development Organization, Kanpur 208013, India; [email protected] (A.R.); [email protected] (N.E.P.) 2 Advanced Systems Laboratory, Defence Research and Development Organization, Hyderabad 500058, India; [email protected] (S.M.); [email protected] (A.K.) * Correspondence: [email protected]; Tel.: +91-512-240-3693 Received: 15 June 2017; Accepted: 10 July 2017; Published: 13 July 2017 Abstract: Tantalum carbide (TaC) and silicon carbide (SiC) layers were deposited on a graphite tube using a chemical vapor deposition process. Tantalum chloride (TaCl5) was synthesized in ◦ situ by reacting tantalum chips with chlorine at 550 C. TaC was deposited by reacting TaCl5 with ◦ ◦ CH4 in the presence of H2 at 1050–1150 C and 50–100 mbar. SiC was deposited at 1000 C using methyl-tri-chloro-silane as a precursor at 50 mbar. At 1150 ◦C; the coating thickness was found to be about 600 µm, while at 1050 ◦C it was about 400 µm for the cumulative deposition time of 10 h. X-ray diffraction (XRD) and X-ray Photo-Electron Spectroscopy (XPS) studies confirmed the deposition of TaC and SiC and their phases. Ablation studies of the coated specimens were carried out under oxyacetylene flame up to 120 s. The coating was found to be intact without surface cracks and with negligible erosion. -
Growth from Melt by Micro-Pulling Down (Μ-PD) and Czochralski (Cz)
Growth from melt by micro-pulling down (µ-PD) and Czochralski (Cz) techniques and characterization of LGSO and garnet scintillator crystals Valerii Kononets To cite this version: Valerii Kononets. Growth from melt by micro-pulling down (µ-PD) and Czochralski (Cz) techniques and characterization of LGSO and garnet scintillator crystals. Theoretical and/or physical chemistry. Université Claude Bernard - Lyon I, 2014. English. NNT : 2014LYO10350. tel-01166045 HAL Id: tel-01166045 https://tel.archives-ouvertes.fr/tel-01166045 Submitted on 22 Jun 2015 HAL is a multi-disciplinary open access L’archive ouverte pluridisciplinaire HAL, est archive for the deposit and dissemination of sci- destinée au dépôt et à la diffusion de documents entific research documents, whether they are pub- scientifiques de niveau recherche, publiés ou non, lished or not. The documents may come from émanant des établissements d’enseignement et de teaching and research institutions in France or recherche français ou étrangers, des laboratoires abroad, or from public or private research centers. publics ou privés. N° d’ordre Année 2014 THESE DE L‘UNIVERSITE DE LYON Délivrée par L’UNIVERSITE CLAUDE BERNARD LYON 1 ECOLE DOCTORALE Chimie DIPLOME DE DOCTORAT (Arrêté du 7 août 2006) Soutenue publiquement le 15 décembre 2014 par VALERII KONONETS Titre Croissance cristalline de cristaux scintillateurs de LGSO et de grenats à partir de l’état liquide par les techniques Czochralski (Cz) et micro-pulling down (μ-PD) et leurs caractérisations Directeur de thèse : M. Kheirreddine Lebbou Co-directeur de thèse : M. Oleg Sidletskiy JURY Mme Etiennette Auffray Hillemans Rapporteur M. Alain Braud Rapporteur M. Alexander Gektin Examinateur M. -
Thermal Analysis of Tantalum Carbide-Hafnium Carbide Solid Solutions from Room Temperature to 1400 ◦C
coatings Article Thermal Analysis of Tantalum Carbide-Hafnium Carbide Solid Solutions from Room Temperature to 1400 ◦C Cheng Zhang, Archana Loganathan, Benjamin Boesl and Arvind Agarwal * Plasma Forming Laboratory, Department of Mechanical and Materials Engineering, Florida International University, Miami, 33139 FL, USA; czhan009@fiu.edu (C.Z.); aloga006@fiu.edu (A.L.); bboesl@fiu.edu (B.B.) * Correspondence: agarwala@fiu.edu; Tel.: +1-305-348-1701 Received: 5 June 2017; Accepted: 25 July 2017; Published: 28 July 2017 Abstract: The thermogravimetric analysis on TaC, HfC, and their solid solutions has been carried out in air up to 1400 ◦C. Three solid solution compositions have been chosen: 80TaC-20 vol % HfC (T80H20), 50TaC-50 vol % HfC (T50H50), and 20TaC-80 vol % HfC (T20H80), in addition to pure TaC and HfC. Solid solutions exhibit better oxidation resistance than the pure carbides. The onset of oxidation is delayed in solid solutions from 750 ◦C for pure TaC, to 940 ◦C for the T50H50 sample. Moreover, T50H50 samples display the highest resistance to oxidation with the retention of the initial carbides. The oxide scale formed on the T50H50 sample displays mechanical integrity to prevent the oxidation of the underlying carbide solid solution. The improved oxidation resistance of the solid solution is attributed to the reaction between Ta2O5 and HfC, which stabilizes the volume changes induced by the formation of Ta2O5 and diminishes the generation of gaseous products. Also, the formation of solid solutions disturbs the atomic arrangement inside the lattice, which delays the reaction between Ta and O. Both of these mechanisms lead to the improved oxidation resistances of TaC-HfC solid solutions. -
A Comparison Among Pressureless Sintered Ultra-Refractory Carbides
Hindawi Publishing Corporation Advances in Materials Science and Engineering Volume 2010, Article ID 835018, 11 pages doi:10.1155/2010/835018 Research Article Sintering Behavior, Microstructure, and Mechanical Properties: A Comparison among Pressureless Sintered Ultra-Refractory Carbides Laura Silvestroni and Diletta Sciti CNR-ISTEC, Institute of Science and Technology for Ceramics, Via Granarolo 64, I-48018 Faenza, Italy Correspondence should be addressed to Laura Silvestroni, [email protected] Received 12 July 2010; Accepted 10 October 2010 Academic Editor: Paul Munroe Copyright © 2010 L. Silvestroni and D. Sciti. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. Nearly fully dense carbides of zirconium, hafnium, and tantalum were obtained by pressureless sintering at 1950 ◦C with the addition of 5–20 vol% of MoSi2. Increasing the amount of sintering aid, the final density increased too, thanks to the formation of small amounts of liquid phase constituted by M-Mo-Si-O-C, where M is either Zr, Hf, or Ta. The matrices of the composites obtained with the standard procedure showed faceted squared grains; when an ultrasonication step was introduced in the powder treatment, the grains were more rounded and no exaggerated grains growth occurred. Other secondary phases observed in the microstructure were SiC and mixed silicides of the transition metals. Among the three carbides prepared by pressurless sintering, TaC-based composites had the highest mechanical properties at room temperature (strength 590 MPa, Young’s modulus 480 GPa, toughness 3.8 MPa·m1/2). -
Cemented Carbidescarbides Forfor Powderpowder Metalmetal Toolingtooling Applicationsapplications
AdvancedAdvanced CementedCemented CarbidesCarbides forfor PowderPowder MetalMetal ToolingTooling ApplicationsApplications Dr. Leonid I. Frayman Chief Metallurgist 41th Anniversary 41th Anniversary Presented at MPIF “PM Compacting & Tooling” 1968-2009 1968-2009 Seminar (October 27-28, 2009. Cleveland, OH.) CARBIDES?… ……WWhhaatt ddoo wwee kknnooww aabboouutt tthheemm?? Agenda: What is a cemented carbide? Why do we use cemented carbide in PM? What advancements have been made for PM tooling applications in: - carbide processing and manufacturing? - carbide grade development? - carbide failure analysis and troubleshooting? WhatWhat isis CementedCemented Carbide?Carbide? Definition: Cemented Carbide is a composite material of a soft binder metal usually either Cobalt (Co) or Nickel (Ni) or Iron (Fe) or a mixture thereof and hard carbides like WC (Tungsten Carbide), Mo2C (Molybdenum Carbide), TaC (Tantalum Carbide), Cr3C2 (Chromium Carbide), VC (Vanadium Carbide), TiC (Titanium Carbide), etc. or their mixes. Carbides: Selected Mechanical Properties. Carbide Vickers (HV) Hardness @ Various Rockwell Hardness Ultimate Compressive Transverse Modulus of Formula Temperatures, oC (oF) @ Room Strength, Rupture Strength, Elasticity, Temperature, MPa (ksi) MPa (ksi) GPa (106 ksi) 20 oC (78 oF) 730 oC (1350 oF) HRa TiC* 2930 640 93 1330-3900 (193-522) 280-400 (40.6-58.0) 370 (52.9) HfC* 2860 - 84 - - - VC* 2800 250 83 620 (89.9) 70 (10.1) 360 (51.4) NbC 2400 350 83 1400 (203) - 270 (38.5) * TaC* 1570 800 82 - - 470 (68,2) - - 81 100 (14.5) 170-380 ((24.7-55.1) 280 (40.0) Cr3C2* - - 2700 (392) 50 (7.3) Mo2C* 74 375 (53.6) WC* 2400 280 81 2700-3600 (392-522) 530-560 (76.9-81.2) 665 (95) *NOTE: TiC-Titanium Carbide; HfC-Hafnium Carbide; VC-Vanadium Carbide; NbC-Niobium Carbide; TaC-Tantalum Carbide; Cr3C2 - Chromium Carbide; Mo2C - Molybdenum Carbide; WC-Tungsten Carbide.