Nanofabrication Techniques in Large-Area Molecular Electronic Devices
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Challenges for Nanomechanics of Biological Systems
NNI Interagency Workshop : Instrumentation and Metrology for Nanotechnology Grand Challenge Workshop National Institute of Standards and Technology, Gaithersburg, MD Jan 27-29, 2004 Challenges for Nanomechanics of Biological Systems Christine Ortiz, Assistant Professor Massachusetts Institute of Technology Department of Materials Science and Engineering WWW : http://web.mit.edu/cortiz/www/ Biological systems are one of the most difficult classes of materials to study mechanically at the nanoscale.1-3 Their complex multilevel and multicomponent structures (e.g. tissues, cells, proteins) need to be highly purified and characterized with minimal sample preparation damage (if possible, with no polishing and chemical treatments) so as to still give information relevant to in vivo function. Nanomechanical testing can be challenging due to the need for near-physiological conditions (i.e. aqueous salt solutions, ionic strength=0.15M, pH=7.4), the existence of varied 3-dimensional geometries and multiple buried interfaces, and their dynamic and sometimes, extremely soft, fluid-like nature. Following is a summary of a few new areas which I believe represent the most significant new paths in this field. I. Integration of Nanomechanical Testing Methods with Nanoscale Chemical/Structural Characterization Techniques Down to the Single Molecule Level in Near-Phys iological Conditions. One promising example of this is the combination of atomic force microscopy (AFM) and surface enhanced Raman spectroscopy (SERS)(Figure 1).4-8 SERS is a higher resolution version of traditional Raman spectroscopy, in which the wavelength and intensity of inelastically scattered light from molecules is measured. These wavelengths are shifted from the incident light by the energies of molecular vibrations and hence, allow for chemical identification and characterization of substances. -
Engineered Carbon Nanotubes and Graphene for Nanoelectronics And
Engineered Carbon Nanotubes and Graphene for Nanoelectronics and Nanomechanics E. H. Yang Stevens Institute of Technology, Castle Point on Hudson, Hoboken, NJ, USA, 07030 ABSTRACT We are exploring nanoelectronic engineering areas based on low dimensional materials, including carbon nanotubes and graphene. Our primary research focus is investigating carbon nanotube and graphene architectures for field emission applications, energy harvesting and sensing. In a second effort, we are developing a high-throughput desktop nanolithography process. Lastly, we are studying nanomechanical actuators and associated nanoscale measurement techniques for re-configurable arrayed nanostructures with applications in antennas, remote detectors, and biomedical nanorobots. The devices we fabricate, assemble, manipulate, and characterize potentially have a wide range of applications including those that emerge as sensors, detectors, system-on-a-chip, system-in-a-package, programmable logic controls, energy storage systems, and all-electronic systems. INTRODUCTION A key attribute of modern warfare is the use of advanced electronics and information technologies. The ability to process, analyze, distribute and act upon information from sensors and other data at very high- speeds has given the US military unparalleled technological superiority and agility in the battlefield. While recent advances in materials and processing methods have led to the development of faster processors and high-speed devices, it is anticipated that future technological breakthroughs in these areas will increasingly be driven by advances in nanoelectronics. A vital enabler in generating significant improvements in nanoelectronics is graphene, a recently discovered nanoelectronic material. The outstanding electrical properties of both carbon nanotubes (CNTs) [1] and graphene [2] make them exceptional candidates for the development of novel electronic devices. -
Springer Handbook of Nanotechnology
Springer Handbook of Nanotechnology Springer Handbooks provide a concise compilation of approved key information on methods of research, general principles, and functional relationships in physi- cal sciences and engineering. The world’s leading experts in the fields of physics and engineer- ing will be assigned by one or several renowned editors to write the chapters comprising each vol- ume. The content is selected by these experts from Springer sources (books, journals, online content) and other systematic and approved recent publications of physical and technical information. The volumes are designed to be useful as readable desk reference books to give a fast and comprehen- sive overview and easy retrieval of essential reliable key information, including tables, graphs, and bibli- ographies. References to extensive sources are provided. HandbookSpringer of Nanotechnology Bharat Bhushan (Ed.) 3rd revised and extended edition With DVD-ROM, 1577 Figures and 127 Tables 123 Editor Professor Bharat Bhushan Nanoprobe Laboratory for Bio- and Nanotechnology and Biomimetics (NLB2) Ohio State University 201 W. 19th Avenue Columbus, OH 43210-1142 USA ISBN: 978-3-642-02524-2 e-ISBN: 978-3-642-02525-9 DOI 10.1007/978-3-642-02525-9 Springer Heidelberg Dordrecht London New York Library of Congress Control Number: 2010921002 c Springer-Verlag Berlin Heidelberg 2010 This work is subject to copyright. All rights are reserved, whether the whole or part of the material is concerned, specifically the rights of translation, reprinting, reuse of illustrations, recitation, broadcasting, reproduction on microfilm or in any other way, and storage in data banks. Duplication of this publication or parts thereof is permitted only under the provisions of the German Copyright Law of September 9, 1965, in its current version, and permission for use must always be obtained from Springer. -
From Sand to Circuits
From sand to circuits By continually advancing silicon technology and moving the industry forward, we help empower people to do more. To enhance their knowledge. To strengthen their connections. To change the world. How Intel makes integrated circuit chips www.intel.com www.intel.com/museum Copyright © 2005Intel Corporation. All rights reserved. Intel, the Intel logo, Celeron, i386, i486, Intel Xeon, Itanium, and Pentium are trademarks or registered trademarks of Intel Corporation or its subsidiaries in the United States and other countries. *Other names and brands may be claimed as the property of others. 0605/TSM/LAI/HP/XK 308301-001US From sand to circuits Revolutionary They are small, about the size of a fingernail. Yet tiny silicon chips like the Intel® Pentium® 4 processor that you see here are changing the way people live, work, and play. This Intel® Pentium® 4 processor contains more than 50 million transistors. Today, silicon chips are everywhere — powering the Internet, enabling a revolution in mobile computing, automating factories, enhancing cell phones, and enriching home entertainment. Silicon is at the heart of an ever expanding, increasingly connected digital world. The task of making chips like these is no small feat. Intel’s manufacturing technology — the most advanced in the world — builds individual circuit lines 1,000 times thinner than a human hair on these slivers of silicon. The most sophisticated chip, a microprocessor, can contain hundreds of millions or even billions of transistors interconnected by fine wires made of copper. Each transistor acts as an on/off switch, controlling the flow of electricity through the chip to send, receive, and process information in a fraction of a second. -
Part III. Functional Polymers for Semiconductor Applications Outline
Functional Polymer/1st Semester, 2006 _________________________________________ Part III. Functional Polymers for Semiconductor Applications Outline of Part Photoresist for Semiconductor Applications Introduction of photolithography Photoresist Materials for Exposure at 193 nm Wavelength Chemically Amplified Resists for F2 Excimer laser Lithography Prof. Jin-Heong Yim Motivations Creation of integrated circuits, which are a major component in computer technology An extension of photolithography processes are used to create standard semiconductor chips Play a key role in the production of technically demanding components of advanced microsensors Used to make adhesives in electronics Prof. Jin-Heong Yim History Historically, lithography is a type of printing technology that is based on the chemical repellence of oil and water. Photo-litho-graphy: latin: light-stone-writing In 1826, Joseph Nicephore Niepce, in Chalon, France, takes the first photograph using bitumen of Judea on a pewter plate, developed using oil of lavender and mineral spirits In 1935 Louis Minsk of Eastman Kodak developed the first negative photoresist In 1940 Otto Suess developed the first positive photoresist. In 1954, Louis Plambeck, Jr., of Du Pont, develops the Dycryl polymeric letterpress plate Prof. Jin-Heong Yim Microlithography A process that involves transferring an integrated circuit pattern into a polymer film and subsequently replicating that pattern in an underlying thin conductor or dielectric film Prof. Jin-Heong Yim How Small Can We Print ? SEM picture of typical lithographic pattern Comparison of the dimensions of lithographic images and familiar objects Thompson, L. F.; Willson, C. G.; Bowden, M. J. Introduction to Microlithography; 2nd Ed; ACS Professional Reference Book; American Chemical Society; Washington, DC, 1994 Prof. -
Scale Effects of Nanomechanical Properties and Deformation Behavior of Au Nanoparticle and Thin Film Using Depth Sensing Nanoindentation
Scale effects of nanomechanical properties and deformation behavior of Au nanoparticle and thin film using depth sensing nanoindentation Dave Maharaj and Bharat Bhushan* Full Research Paper Open Access Address: Beilstein J. Nanotechnol. 2014, 5, 822–836. Nanoprobe Laboratory for Bio-& Nanotechnology and Biomimetics doi:10.3762/bjnano.5.94 (NLBB), The Ohio State University, 201 W.19th Avenue, Columbus, Ohio 43210-1142, USA Received: 14 January 2014 Accepted: 14 May 2014 Email: Published: 11 June 2014 Bharat Bhushan* - [email protected] This article is part of the Thematic Series "Advanced atomic force * Corresponding author microscopy techniques II". Keywords: Guest Editors: T. Glatzel and T. Schimmel gold (Au); Hall–Petch; hardness; nanoindentation; nano-objects © 2014 Maharaj and Bhushan; licensee Beilstein-Institut. License and terms: see end of document. Abstract Nanoscale research of bulk solid surfaces, thin films and micro- and nano-objects has shown that mechanical properties are enhanced at smaller scales. Experimental studies that directly compare local with global deformation are lacking. In this research, spherical Au nanoparticles, 500 nm in diameter and 100 nm thick Au films were selected. Nanoindentation (local deformation) and compression tests (global deformation) were performed with a nanoindenter using a sharp Berkovich tip and a flat punch, respec- tively. Data from nanoindentation studies were compared with bulk to study scale effects. Nanoscale hardness of the film was found to be higher than the nanoparticles with both being higher than bulk. Both nanoparticles and film showed increasing hardness for decreasing penetration depth. For the film, creep and strain rate effects were observed. In comparison of nanoindentation and compression tests, more pop-ins during loading were observed during the nanoindentation of nanoparticles. -
Biocompatibility of SU-8 and Its Biomedical Device Applications
micromachines Review Biocompatibility of SU-8 and Its Biomedical Device Applications Ziyu Chen and Jeong-Bong Lee * Department of Electrical and Computer Engineering, The University of Texas at Dallas, Richardson, TX 75080, USA; [email protected] * Correspondence: [email protected]; Tel.: +1-972-883-2893; Fax: +1-972-883-5842 Abstract: SU-8 is an epoxy-based, negative-tone photoresist that has been extensively utilized to fabricate myriads of devices including biomedical devices in the recent years. This paper first reviews the biocompatibility of SU-8 for in vitro and in vivo applications. Surface modification techniques as well as various biomedical applications based on SU-8 are also discussed. Although SU-8 might not be completely biocompatible, existing surface modification techniques, such as O2 plasma treatment or grafting of biocompatible polymers, might be sufficient to minimize biofouling caused by SU-8. As a result, a great deal of effort has been directed to the development of SU-8-based functional devices for biomedical applications. This review includes biomedical applications such as platforms for cell culture and cell encapsulation, immunosensing, neural probes, and implantable pressure sensors. Proper treatments of SU-8 and slight modification of surfaces have enabled the SU-8 as one of the unique choices of materials in the fabrication of biomedical devices. Due to the versatility of SU-8 and comparative advantages in terms of improved Young’s modulus and yield strength, we believe that SU-8-based biomedical devices would gain wider proliferation among the biomedical community in the future. Keywords: SU-8; biocompatibility; biosensing; biomedical; implantable Citation: Chen, Z.; Lee, J.-B. -
“Nanomechanics: Elasticity and Friction in Nano-Objects”
“NanoMechanics : Elasticity and Friction in Nano-Objects” Start Date: August 2006 Applicant: Elisa Riedo Institution: Georgia Institute of Technology PI: Elisa Riedo Address: School of Physics, 837 State St, Atlanta GA 30332-0430Email: [email protected] DOE Division of Materials Sciences and Engineering, Office of Basic Energy Sciences Mechanical Behavior and Radiation Effects Program DOE Office of Science Program Manager Contact: John S. Vetrano 1. Introduction Nanosheets, nanotubes, nanowires, and nanoparticles are gaining a large interest in the scientific community for their exciting properties, and they hold the potential to become building blocks in integrated nano-electronic and photonic circuits, nano-sensors, batteries electrodes, energy harvesting nano-systems, and nano-electro-mechanical systems (NEMS). While several experiments and theoretical calculations have revealed exciting novel phenomena in these nanostructures, many scientific and technological questions remain open. A fundamental objective guiding the study of nanoscale materials is to understanding what are the new rules governing nanoscale properties and at what extent well-known physical macroscopic laws still apply in the nano-world. The vision of this DoE research program is to understand the mechanical properties of nanoscale materials by exploring new experimental methods and theoretical models at the boundaries between continuum mechanics and atomistic models, with the overarching goal of defining the basic laws of mechanics at the nanoscale. The group of the PI has developed in the last years several studies on the mechanical properties of Carbon nanotubes and oxide nanobelts, more recently the PI and her collaborators have focused their attention on the properties of two-dimensional (2D) materials, such as graphene and MoS2, which are a few-atomic- layer thick films with strong in-plane bonds and weak interactions between the layers. -
Research Article Nanomechanics of Single Crystalline Tungsten Nanowires
Hindawi Publishing Corporation Journal of Nanomaterials Volume 2008, Article ID 638947, 9 pages doi:10.1155/2008/638947 Research Article Nanomechanics of Single Crystalline Tungsten Nanowires Volker Cimalla,1 Claus-Christian Rohlig,¨ 1 Jorg¨ Pezoldt,1 Merten Niebelschutz,¨ 1 Oliver Ambacher,1 Klemens Bruckner,¨ 1 Matthias Hein,1 Jochen Weber,2 Srdjan Milenkovic,3 Andrew Jonathan Smith,3 and Achim Walter Hassel3 1 Institut fur¨ Mikro- und Nanotechnologien, Technische Universitat¨ Ilmenau, Gustav-Kirchhoff-Strasse 7, 98693 Ilmenau, Germany 2 Max-Planck-Institut fur¨ Festkorperforschung,¨ HeisenbergStrasse 1, 70569 Stuttgart, Germany 3 Max-Planck-Institut fur¨ Eisenforschung, Max-Planck-Strasse 1, 40237 Dusseldorf,¨ Germany Correspondence should be addressed to Achim Walter Hassel, [email protected] Received 2 September 2007; Accepted 29 January 2008 Recommended by Jun Lou Single crystalline tungsten nanowires were prepared from directionally solidified NiAl-W alloys by a chemical release from the resulting binary phase material. Electron back scatter diffraction (EBSD) proves that they are single crystals having identical crys- tallographic orientation. Mechanical investigations such as bending tests, lateral force measurements, and mechanical resonance measurements were performed on 100–300 nm diameter wires. The wires could be either directly employed using micro tweezers, as a singly clamped nanowire or in a doubly clamped nanobridge. The mechanical tests exhibit a surprisingly high flexibility for such a brittle material resulting from the small dimensions. Force displacement measurements on singly clamped W nanowires by an AFM measurement allowed the determination of a Young’s modulus of 332 GPa very close to the bulk value of 355 GPa. Doubly clamped W nanowires were employed as resonant oscillating nanowires in a magnetomotively driven resonator running at 117 kHz. -
NSF Summer Institute on Nanomechanics, Nanomaterials
NSF Summer Institute on Nanomechanics, Nanomateriials and Micro/Nanomanufacturing NSF Summer Institute Short Course on Materiomics—Merging Biology and Engineering in Multiscale Structures and Materials Location: Massachusetts Institute of Technology, LeMeridien Hotel (former Hotel@MIT) Chair: Markus J. Buehler, Massachusetts Institute of Technology ([email protected]) Dates: May 30 (Wednesday) morning to June 1 (Friday) evening, 2012 Course Objectives: Theme-based introduction into emerging science at the interface of engineering and biology This course will provide an introduction into the emerging science at the interface of engineering and biology, with a focus on the integration of multiscale modeling and experiment. Applying material design principles derived from biology—and specifically, the concept of developing diverse hierarchical structures composed of universal and simple design elements, used to derive sustainable and robust materials—is crucial for the next-generation engineering materials that are highly functional while satisfying multiple design constraints. This finds practical applications for example in regenerative medicine for de novo tissue growth, advanced carbon-based materials that are not only strong and tough, and self-learning material systems whose properties can be tailored by solely changing the structure without a need to introduce new building blocks. This Summer Institute features experimental, computational and theoretical instructors from various areas of science, dealing with multiple length-scales, from nano to macro. Participants and instructors will engage in in- depth discussions on the frontiers, challenges, and opportunities in this emerging field referred to as materiomics. A unique feature of this short course is the participation of scientists from disparate fields that includes engineering mechanics, synthetic biology and architecture. -
Nanomechanics and Nanoelectronics: Molecule-Size Machines
Report Number 11 February, 2004 Nanomechanics and Nanoelectronics: Molecule-Size Machines Executive Summary Nanotechnology research is aimed at building minuscule machines and electronics and constructing materials molecule- by-molecule. The technology promises to open the way to faster and lower-power electronics, jewelry-size computers, data storage densities in the realm of several terabits per square centimeter, ultrahigh-bandwidth communications devices, microscopic transmitters and receivers, new types of devices like handheld biological sensors, and inexpensive manufacturing processes. Near-term nanotech developments will make materials tougher and lubricants slipperier. Longer-term research is largely focused on developing the basic building blocks of nanoscale technology — components that are hundreds of times smaller than a red blood cell. Nanoelectronics researchers are working to develop tiny transistors, memory devices, switches, wires, light emitters and networks. What to Look For Nanomechanics researchers are working to develop ratchets, actuators, motors, shuttles, springs, pistons and bearings. Nanotube electronics: There are two approaches to building both types of devices: the top- Carbon nanotubes sensors down method of today’s microelectronics manufacturing and the Hybrid nanotube-silicon chips bottom-up techniques of biology, chemistry and materials engineering. Carbon nanotube logic circuits Raw materials include inorganic matter like metals and Mass production of nanoelectronics semiconductors, molecules like polymers and carbon nanotubes, and biological molecules like DNA and proteins. Nanowire electronics: Carbon nanotubes and nanowires are especially promising because Nanowire memory chips they can be exceedingly small, assembled chemically, and have the Nanowire LEDs and lasers potential to be grown in place and en mass. Carbon nanotubes are Nanowire processor chips also very strong mechanically. -
What Is Photolithography, the Core Technology of TOK?
What is photolithography, the core technology of TOK? The basic principle of the technology called photolithography related to the manufacturing of semiconductor devices is the same as taking a picture of a subject with a camera (= transcribing the image to the photosensitizing agent of the film) and printing the exposed film on photographic paper. In the case of the print of a photograph, a lens is used to expand an image burned onto the original plate (the exposed film) whereas with the manufacturing of semiconductor devices a lens is used to shrink the design blueprint drawn on the original plate (the photomask). Reproducing majestic scenery in a small film through the lens of a camera is precisely the principle of photolithography itself. The photoresist is equivalent to the photosensitizing agent used in this film and photographic paper. A variety of circuits are etched on the wafer, which is equivalent to the film and photographic paper, to create LSIs and other semiconductor devices. This is the microprocessing technology of TOK that we have developed over many years at the cutting edge of our industry. Mechanism of the exposure equipment In the case of photographic prints In the case of i-line In the case of an ArF excimer laser photoresist (immersion) 365nm 193nm light light lm photomask lens lens Pure water photoresist photographic wafer paper The width of the wiring The width of the wiring The light source used for the exposure We can conclude that the high-level integration of semiconductor devices is the result of the progress of optical lithography, including photoresists.