The High-Electron Mobility Transistor at 30: Impressive Accomplishments and Exciting Prospects The MIT Faculty has made this article openly available. Please share how this access benefits you. Your story matters. Citation del Alamo, Jesus A. "The High-Electron Mobility Transistor at 30: Impressive Accomplishments and Exciting Prospects." 2011 International Conference on Compound Semiconductor Manufacturing Technology, May 16-19, 2011, Indian Wells, California. As Published http://www.csmantech.org/Conference%20Information/ APfiles/2011%20AP%20REV%20K.pdf Publisher CS ManTech Version Author's final manuscript Citable link http://hdl.handle.net/1721.1/87102 Terms of Use Creative Commons Attribution-Noncommercial-Share Alike Detailed Terms http://creativecommons.org/licenses/by-nc-sa/4.0/ The High Electron Mobility Transistor at 30: Impressive Accomplishments and Exciting Prospects Jesús A. del Alamo Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA 02139
[email protected]; T. +1-617-253-4764 Keywords: high electron mobility transistor, HEMT, III-V, two-dimensional electron gas, modulation doping Abstract that is created between dopants and electrons confers these 2010 marked the 30th anniversary of the High- with a mobility that exceeds the bulk value even at relatively Electron Mobility Transistor (HEMT). The HEMT high carrier concentrations. represented a triumph for the, at the time, relatively new concept of bandgap engineering and nascent molecular The first demonstrations of modulation doping and the beam epitaxy technology. The HEMT showcased the HEMT took place in the AlGaAs/GaAs system. These would outstanding electron transport characteristics of two- not have been possible without the atomic layer precision dimensional electron gas (2DEG) systems in III-V growth capabilities of molecular beam epitaxy.