APPLICATIONNOTE Effect of cleaning on carbon support Model 1020PlasmaCleanerand1070NanoClean www.fischione.com [email protected] Fax: Tel: PA 15632Export, USA Circle Corporate 9003 Inc. Instruments, Fischione E.A. formed from copper, or nickel, molybdenum. often grid metal supported by astandard turn, in is, film This carbon. as such a support film them on place to first (FIB), it necessary be may beam afocused with prepared specimens Model 1070 NanoClean. Model 1020 the or as such the Cleaner Plasma instrument an in contamination carbonaceous of removal requires TEM) (FEG microscopy transmission gun field emission microscopy films for field emission gun transmission electron

+1 724.325.5443 +1 To plasma clean cross section (XTEM) To (XTEM) section cross clean plasma ahigh-performance in of specimens Analysis +1 724.325.5444 Document Number AN018 Number 01 Revision 07/2014Document reserved. rights All Inc. ©2014 Instruments, Fischione E.A. without film degradation was increased from increased was degradation without film cleaning for effective time the that was result The were optimized. power settings RF and flow, gas pressure, ), is gas the (balance 25% 2% for standard the substituting After support films. carbon to accommodate modified be can cleaners Fischione plasma be lost. excessively, may the is specimen degraded film the If cleaned. is the specimen as film from the 3 minutes. times approaching for cleaned plasma significantthinning the of film until it was cleaning. examination TEM revealed no 2minutes of plasma after is depicted grid copper by a400-mesh supported A standard (~50 film nm thick) carbon FILMS SUPPORT CARBON CLEANING PLASMA 25% in 20 seconds O The standard operating parameters of both both of parameters operating Thestandard remove carbon will oxygen-rich plasma An

2 to 2 minutes in 2% to in 2 minutes O 2 .