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Plasma etcher
Post Plasma Etch Residue Removal Using Carbon
Characterization of Post-Plasma Etch Residues and Plasma Induced
State-Of-The-Art Device Fabrication Techniques
Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication
Factorial Experimental Design Applied to DRIE for Optimised Process in Power Electronics Applications Requiring High Aspect Ratio Trenches
Plasma Etching Outline
Dry Etching Performance and Gas-Phase Parameters of C6F12O + Ar Plasma in Comparison with CF4 + Ar
Heat Transfer Between Wafer and Electrode in a High Density Plasma Etcher
TALASILA-THESIS-2016.Pdf (3.454Mb)
Fabrication of Nanoscale Silicon Membranes on SOI Wafers
United States Patent (19) 11 Patent Number: 5,811,022 Savas Et Al
Characterization and Optimization of High Density Plasma Etching Processes for Advanced Memories Application Maria Mercedes Rizquez Moreno
A Process Technology for Realizing Integrated Inertial Sensors Using
Etch Overview for Microsystems
Plasma Etching ROCHESTER INSTITUTE of TECHNOLOGY MICROELECTRONIC ENGINEERING Plasma Etching
A UHF-ECR Plasma Etcher for Insulation Films
Plasma Parameters and Etching Characteristics of Sioxny Films in CF4 + O2 + X (X = C4F8 Or Cf2br2) Gas Mixtures
MEMS-Based Tunable Optical Filter Arrays for Nano-Spectrometer in the Visible Spectral Range
Top View
REVIEW ARTICLE Plasma Etching: Yesterday, Today, and Tomorrow
Board 29: Creating a Virtual Reality Simulation of Plasma Etcher to Facili- Tate Teaching and Practice of Dry Etching in Nanotechnology Education
End Point Detection in Reactive Ion Etching Christopher James Pugh
Development and Characterization of Plasma Etching Processes for The
Jack Phd Thesis
Microfabrication of Optical Components in Synthetic Diamond