11/18/2020 Excimer lamps/Excimer irradiation unit | USHIO INC. HOME Products Information Products Excimer lamps/Excimer irradiation unit Excimer lamps/Excimer irradiation unit Modification Cleaning MEMS, Electronic Semiconductors Components Liquid Crystal Display Printed Circuit Board and Functional Materials Biology and Chemistry PKG Energy Printing Excimer VUV light is the very high-energy light generated by lamps containing noble gases or noble-gas hydride compounds. Externally applying high-energy electrons to a sealed lamp containing a noble gas or noble gas hydride compound generates intense plasma discharge (dielectric barrier discharge). This plasma features high-energy electron content, and can be extinguished instantly. The plasma discharge instantly excites the atoms of the discharge gas (noble gas) to their excimer (Xe) state (high- energy orbital atoms form excimer excited molecules). The excimer-specific spectrum is emitted when atoms return from this excimer state to their original condition (ground state). This emission is called VUV light. Download * * * * Favorites Print catalog For inquiries regarding "222 nm ultraviolet (UV-C) light antibacterial and viral inactivation device," please contact : Sales Department 5, Sales Division, Light Source Business Division TEL: +81-3-5657-1016 / E-Mail: [email protected] Features Main applications Case study Product Lineup Options FAQ High photon energy VUV (vacuum ultraviolet) light at a wavelength of 180 nm or less, which is not available using conventional UV lamps, emits light efficiently to evoke or accelerate chemical reactions otherwise unachievable with conventional UV light. Single wavelength Excimer emission features a single peak emission wavelength with light emitted only in a very narrow range around the peak. This enables efficient irradiation of only the particular UV energy required for a chemical reaction. Low-temperature irradiation With no infrared generation, the shorter irradiation time enables very quick substrate processing. Instantaneous on/off This website uses cookies. By clicking “Accept”, you are agreeing to the usage of cookies as described in our Cookie Policy. If you do not The required amount of energy can be irradiated only when needed. Practical usage benefits include eliminating the need for a want cookies to be set, please click “No thanks!” and change your settings to refuse all or some cookies in accordance with our Cookie shutter, substantially longer life, and avoiding corrosion of the UV processing chamber. Policy. Mercury-Free Accept No thanks! https://www.ushio.co.jp/en/products/1002.html 1/5 11/18/2020 Excimer lamps/Excimer irradiation unit | USHIO INC. No mercury is used. About Excimer VUV Light Excimer VUV light is the very high-energy light generated by lamps containing noble gases or noble-gas hydride compounds. Externally applying high-energy electrons to a sealed lamp containing a noble gas or noble gas hydride compound generates intense plasma discharge (dielectric barrier discharge). This plasma features high-energy electron content, and can be extinguished instantly. The plasma discharge instantly excites the atoms of the discharge gas (noble gas) to their excimer (Xe) state (high-energy orbital atoms form excimer excited molecules). The excimer-specific spectrum is emitted when atoms return from this excimer state to their original condition (ground state). This emission is called VUV light. Excimer Lamp Structural Example Spectral Distribution This website uses cookies. By clicking “Accept”, you are agreeing to the usage of cookies as described in our Cookie Policy. If you do not want cookies to be set, please click “No thanks!” and change your settings to refuse all or some cookies in accordance with our Cookie Policy. Accept No thanks! https://www.ushio.co.jp/en/products/1002.html 2/5 11/18/2020 Excimer lamps/Excimer irradiation unit | USHIO INC. Related papers Techniques for Measuring Rate Constants for Acid Generation from PAG (Photo Acid Generator) during ArF Exposure Photochemical Removal of SO2 and CO2 by 172nm Xe2 and 146nm Kr2 Excimer Lamps in N2 or Air at Atmospheric Pressure Chemical surface modification on polytetrafluoethylene films vacuum ultraviolet excimer lamp irradiation in ammonia gas atmosphere Improvement of Coherency of the Panel Level Package by Integrated Dry Process Vacuum ultraviolet-induced strain in vitreous silica used for xenon lamp bulbs New desmear process of organic substrate applications by Photodesmear technology ⾼効率カドミウムイオンランプ CADMIUM ION LAMPS WITH HIGH RADIANT EFFICIENCY Regeneration of imprint molds using vacuum ultraviolet light Photochemical Removal of NO, NO2, and N2O by 146nm Kr2 Excimer Lamp in N2 at Atmospheric Pressure Recent progress on UV lamps for industries This website uses cookies. By clicking “Accept”, you are agreeing to the usage of cookies as described in our Cookie Policy. If you do not LOW POWER COMPACT ELECTRODELESS LAMPS want cookies to be set, please click “No thanks!” and change your settings to refuse all or some cookies in accordance with our Cookie RPoolelic oyf. UV Irradiation during Si Etching Process in Chlorine Plasma A Study of Photoresist Pattern Freezing for Double ImaginAgc cuespintg 172nm VUVN Folo thoadn Eksxp!osure https://www.ushio.co.jp/en/products/1002.html 3/5 11/18/2020 Excimer lamps/Excimer irradiation unit | USHIO INC. 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