V8/ Issue I /2013 Advanced Service 6 Toshiba: 12 Predict, Avoid 35 Detects Arcing Looking Ahead to and Minimize and Boosts Yield Continued Leadership Process Excursions F A B SOLUTIONS Solutions for Factory and Equipment Efficiency Engineering a better customer experience F A B N ANOCHIP SOLUTIONS FAB SOLUTIONS SURVEY SAYS: YOU CAN DO BETTER—AND WE ARE EXECUTIVE PUBLISHER Dana Tribula CONTENTS [email protected] PUBLISHER Peggy Marcucci A Letter from Charlie Pappis [email protected] EDITOR-IN-CHIEF 1 Liz Baird A Letter from Applied Materials is a place where the voice of the customer comes through loud and clear. Charlie Pappis [email protected] Each year we conduct a comprehensive customer satisfaction survey so you can tell us how we’re doing. We are now preparing for the 2013 survey, but last summer we contacted more than 1400 2 CONTRIBUTING EDITORS Swimming customers globally and got a response rate of 70%. Much of what we heard from you made us proud: in Data Gary Dagastine CHI ARL E PAPPIS across the board our customer satisfaction and loyalty ratings have gone up significantly. But there David Lammers GU ERO P VIC PRESIDENT Jill O’Nan were still some pain points you asked us to address. AND GENERAL MANAGER, In this issue of Nanochip Fab Solutions, you’ll learn what Applied is doing to engineer a better APPLIED GLOBAL SERVICES DESIGN customer experience. This companywide effort encompasses technology, services, training, and Jane Olson Graphic Design process improvements. For example, you’ll read about our new TechEdge advanced support solutions that combine sensors, software and specialized services to solve the most complex manufacturing problems. With TechEdge Prizm you can quickly access data from all your CD-SEM tools so you can analyze 6 NANOCHIP is published by Advanced Service Applied Materials, Inc. problems and performance by tool, layer, recipe, product or process. And TechEdge Excursion Detects Arcing and Boosts Yield 12 © Copyright Applied Materials, Inc., 2013 Control provides automated near-real-time notification of process issues and deviations to help Toshiba: you avoid unscheduled downtime and scrap. www.appliedmaterials.com Looking Ahead to We also discuss our development efforts in arc detection in PVD chambers, using data- Continued Leadership collection hardware and software and advanced algorithms to reliably detect arc events while minimizing false positives. The result is a double-win: increased tool uptime and reduced wafer scrap and yield loss. Nanochip Fab Solutions is now delivered 15 in an environmentally-friendly online version. New technology and advanced support services are only part of Applied’s efforts. Our customer Specialty Devices Printed copies are available upon request. Filling Foundries’ service story describes how we are preparing Applied customer engineers to handle increasingly Legacy Fabs For a free subscription, or to complex problems in the field quickly and accurately, boosting system uptime and reducing costs. add colleagues to the mailing list, Availability of parts was a key issue identified in our last customer satisfaction survey, and High-Performance please send an email to Parts Teams: [email protected] in this issue you’ll read about the process and performance improvements we’ve made there. Bridging the Speed/ with the following information: When customers need new, high-performance parts to enable improvements in particle control Performance Gap • Name or uniformity, we engage with them to engineer and validate the parts with a very short cycle time. • Title When customers need parts not currently stocked in inventory, Applied’s new “idle parts program” • Company • Business address gauges availability before orders are placed, providing an accurate timeframe for delivery and 18 • Business email* enabling customers to better plan their operations. *Sorry—no general accounts, e.g., Gmail, AOL, Yahoo Rounding out this issue are two articles that let you hear from well-known industry leaders in their own words. The first is a conversation with prominent Toshiba executive Kiyoshi Kobayashi, discussing that company’s future as a 3D NAND leader, and the future of Japan as a leading Enhanced Tools and Training All trademarks so designated or semiconductor provider. The second article is an interview with Gary Dickerson, who took over as Reshape the otherwise indicated as product names Applied’s president last year. Gary touches on the role of mobility in reshaping the semiconductor Customer Experience 20 or services are trademarks of industry and on the challenges facing the display and solar segments. He also offers this insight into Applied Materials, Inc. in the U.S. and PLUS: how he does business: “My philosophy is that to win, you must understand what customers need other countries. All other product and 25: FABulous Tools: Maxim Integrated service marks contained herein are and then be there first with solutions that have valuable, sustainable differentiation.” 26: Case Study: Recipe Optimization Improves Film Uniformities, Maximizes CVD Chamber Uptimes trademarks of their respective owners. The stories in this issue of Nanochip demonstrate how we live this philosophy every day as 28: Raising the Bar: Predictable Parts Deliveries we work with customers to earn their trust and continuously improve their experience with 30: New Abatement Solutions Help Achieve GHG Targets 32: Agent of Change: An Interview with Gary Dickerson Applied Materials. We hope it’s a satisfying read. 35: Predict, Avoid and Minimize Process Excursions 41: The Last Word NANOCHIP 1 with electrons in the material being the data to improve everything from a Applied is the only one to bundle scanned. That sends back signals, chip’s performance and power to yield. it with a multi-core machine. That which are mapped by the equipment. “Since you’re already taking machine contains 1 TB of RAM, The more critical dimensions that the image, it’s a question of how which is large even by supercomputer need to be mapped, the greater you make full use of that data,” standards. the amount of data that must be said John Allgair, senior member Applied’s new data mining processed and stored. of the technical staff and Fab 8 software, called TechEdge Prizm, patterning metrology manager at provides CD-SEM tool/recipe/ SOUR CE OF THE PROBLEM GLOBALFOUNDRIES. “We’ve been process issue identification, issue able to do traditional measurements diagnosis, and tool fleet matching. “Everyone wants to use in-line of a feature or a line width. We’ve That delivers the abstraction layer characterization because you can also seen some progress to 2D necessary for critical insights within see what you’re measuring,” said information or being able to add a a reasonable period of time. What SWIMMING Carol Gustafson, metrology sector contour around a feature, so you get used to take days or weeks now manager at IBM. “Other tools can’t the entire feature instead of a point. can be done in seconds, and that’s show what it looks like. With CD- But it would be nice if we also could particularly important because SEM you get numbers and images. get height information with that. metrology increasingly is moving into A characterization lab can’t produce Right now you can partially get there the realm of distributions rather than the quality of information that we with signal modeling or by tilting, or a hard numbers (see figure 1). I N DATA can, but it’s a lot of data. And in the combination of both.” Consider line-edge roughness development phase, integrators That’s more data, though. Add (LER), for example, where fixed and engineers like to look at in-chip in more mask layers and increased numbers no longer exist. Rather than information because it expands the density and the amount of data goes just reporting the data, Prizm also number of targets you can see.” up yet again. provides the context necessary to “A lot of data” is an understate- utilize that data in a meaningful way. ment. Even IBM, which is credited SOLUTIONS “When you’re dealing with line-edge WHAT’S HAPPENING with inventing data mining, won’t roughness, there is not just one tackle this problem without help. Both Applied Materials and number,” said Paul Llanos, product AT THE EXTREME END OF “In an area like this within Hitachi have been working to provide development manager for Prizm IBM, at a 300mm wafer fab, with solutions to the data overload THE DATA OVERLOAD WORLD data mining software at Applied. partners going in and out all the time problem in CD-SEM. Of the two, BY AND WHY IT’S SO IMPORTANT along with their customers, IT likes to keep a high view of the world,” ED SPERLING FOR BIG DATA MANAGEMENT said Gustafson. “But at 22nm we 4 have more mask levels, and we 3.5 have to measure more things. That 3 Nowhere is this more evident (CD-SEM). Its files are measured in also gives us the opportunity to do 2.5 So many warnings about Hours more metrology, and that increases 2 than in the semiconductor metrology tens or hundreds of gigabytes. Just Required data overload have been world, where files are measured in being able to decipher this much data the amount of data because now 1.5 issued over the past decade gigabytes. At each new process node, requires a higher level of abstraction. we’re dealing with the complexity 1 0.5 as the number of transistors and There is no equipment powerful of developing and understanding that people have stopped 0 features increase—and the number of enough to process it within a an OPC cycle or budgeting in litho paying attention. The numbers measurements increase—so does the reasonable time frame, and no way to patterning and yields issues.