Extreme Ultraviolet Source Based on Microwave Discharge Produced Plasma Using Cavity Resonator

Extreme Ultraviolet Source Based on Microwave Discharge Produced Plasma Using Cavity Resonator

<p><strong>APPC12 </strong></p><p>The 12th Asia Pacific Physics Conference </p><p>D2-PMo-1 </p><p><strong>Extreme Ultraviolet Source based on microwave discharge produced plasma using cavity resonator </strong></p><p>S. Tashima, M. Ohnishi, H. Osawa, W. Hugrass<sup style="top: -0.54em;">a </sup></p><p><em>Department of Electrical and Electronic Engineering, Faculty of Engineering Science, </em><br><em>Kansai University, 3-3-35 Yamate-cho, Suita, Osaka 564-8680, Japan </em><sup style="top: -0.5401em;"><em>a</em></sup><em>School of Computing and Information Systems, University of T a smania, Locked Bag </em><br><em>1359, Launceston, T a smania 7250, Australia </em></p><p><a href="mailto:[email protected]" target="_blank">[email protected] </a><br>Extreme ultra violet (EUV) lithography is a leading technology for the production of the next-generation chips with small features. The 13.5-nm EUV radiation can be obtained using either discharge-produced plasma (DPP) or laser-produced plasma (LPP) sources. Because the EUV radiation is strongly absorbed by all known materials, the entire EUV scanner system must be in a vacuum environment. The debris and the tin vapor generated in some EUV sources may cause contamination of the EUV mirrors and the silicon wafers. The microwave discharge produced plasma (MDPP) source invented at Kansai University does not produce debris because it is electrode-less and the working gas is Xe.. </p><p>Figure 1 shows the photo of MDPP. The microwave frequency is 2.45 GHz, the maximum power (<em>P</em><sub style="top: 0.17em;">rf</sub>) is 6 kW and the cavity mode is TM110. The Xe gas is fed in a glass tube with inner diameter 3 mm. </p><p>The EUV radiation is measured using a calorie meter and EUV spectroscopy. The preliminary experiments show that the </p><p>Figure 1 The system of microwave discharge produced plasma system </p><p>MDPP produces pulsed EUV radiation of <br>10 W/4π str. for <em>P</em><sub style="top: 0.17em;">rf </sub>= 300 W at a repetition frequency of 100 Hz. </p><p>― 590 ― </p>

View Full Text

Details

  • File Type
    pdf
  • Upload Time
    -
  • Content Languages
    English
  • Upload User
    Anonymous/Not logged-in
  • File Pages
    1 Page
  • File Size
    -

Download

Channel Download Status
Express Download Enable

Copyright

We respect the copyrights and intellectual property rights of all users. All uploaded documents are either original works of the uploader or authorized works of the rightful owners.

  • Not to be reproduced or distributed without explicit permission.
  • Not used for commercial purposes outside of approved use cases.
  • Not used to infringe on the rights of the original creators.
  • If you believe any content infringes your copyright, please contact us immediately.

Support

For help with questions, suggestions, or problems, please contact us