<p> Wisconsin Center for Applied Microelectronics</p><p>1550 Engineering Drive Phone: 608/262-6877 Madison, WI 53706 Fax: 608/265-2614</p><p>HEADWAY PPHOTORESIST SSPINNER #2#2</p><p>Process Description: For reproducible lithography, the photoresist needs to be uniform and pinhole-free. The standard method of application is spinning. In this method, the substrate is mounted on a vacuum chuck; a metered amount of photoresist is deposited onto the center of the wafer; and then the revolving wafer flings off the excess resist and a uniform film is produced. Viscosity of the photoresist, rotational speed and time of the spin are the controlling parameters.</p><p>Equipment Description: The Headway spinners are capable of coating substrates up to 8 inches in diameter. A variety of chuck holders are available. The spinning speed is adjustable from 500 to 5,000 rpm and an electronic timer automatically controls the spin cycle. </p><p>Approved Materials for use in this equipment: Check the APPROVED MATERIALS for this equipment on http://mywebscape.wisc.edu under WCAM in the group directories.</p><p>Date last modified: 4/8/2018 Date created: 4/8/2018 Content by: Rebecca Bauer</p>