Register Today This program is current as of 17 June 2010. Please visit spie.org/pmadvance for event updates, travel, and registration information. he premier optical sciences and technology memeetingete ing Connecting minds for global solutions Connecting minds for global solutions The premier meeting for the photomask industry • Mask Infrastructure • Mask Integration • Emerging Mask Technology • Patterned Media Advance Technical Program The international technical group of SPIE dedicated to the advancement of photomask technology Conferences + Courses: 13-16 September 2010 Exhibition: 14-15 September 2010 Monterey Conference Center and Monterey Marriott Hotel Monterey, California, USA Showcase your results When you present your research at SPIE Photomask Technology it is exposed to a forum of leaders in photomask from around the world. This showcases your results and gives you immediate feedback from an audience of your peers. Collaborate with your Participate in colleagues SPIE Photomask Technology provides the largest and the perfect environment to enhance your professional value. Experience a rich most important marketplace of ideas, an audience of technical experts, and a dynamic atmosphere that worldwide supports professional networking. technical event Publish your research Within days or weeks of presentation your work will be published in the SPIE Digital Library in the photomask and be distributed through leading scientifi c databases and indexes. Your work will become industry. part of the scientifi c literature of the world. U.S. Patent literature cites over 40,000 SPIE publications, with 161 universities and 2,785 non-academic organizations from 43 different countries citing SPIE papers. Advance Technical Program Conferences + Courses: 13-16 September 2010 Exhibition: 14-15 September 2010 Monterey Conference Center and Monterey Marriott Hotel Monterey, California, USA Contents Exhibition . 2 Invitation . 3 Special Events . .4-5 Special Session on E-Beam/Direct-Write . 5 Photomask Reception . 5 Daily Schedule . 6 Sponsors . 6 Conference . 7-12 Proceedings . .12 Courses . .13–15 Registration Information . .16–17 Keynote Presentation The Future is Bright for Those with Open Eyes Tuesday 14 September, 8:10 to 8:50 am Franklin Kalk, Executive Vice-President, Technology Toppan Photomasks Don’t miss this exciting opening Keynote on Tuesday morning. Visit the SPIE Photomask Technology website to make your time in Monterey a success! Everything you need to know about the conference and location is available online. Up-to-date paper listings and session times Use the My Schedule tool to build a custom, printable schedule Updated lists of exhibiting companies and activity on the show fl oor Hotel, travel, and registration information And more! Register today and save spie.org/pmadvance spie.org/pmadvance 1 TEL:TEL: +1 SPIE360 676 Photomask 3290 · Technology+1 888 504 2010 8171 · · spie.org/[email protected]@spie.org 1 MAKE TIME FOR THE FREE EXHIBITION Monterey Conference Center · Serra Ballrooms Exhibition Dates: 14 – 15 September 2010 Tuesday-Wednesday · 10:00 am to 4:00 pm Tuesday Poster Reception · 6:15 to 7:45 pm Photomask 2010 Exhibitor List New and returning companies confi rmed for 2010 are highlighted in boldface. (Current as of 5/25/2010) Advantest Corporation n&k Technology, Inc. Applied Materials, Inc. Nippon Control System Corp. See the latest in: Beam Services, Inc. Park Systems Inc. Carl Zeiss SMS GmbH Plasma-Therm LLC · Electron-beam lithography Corning Inc. Pozzetta Products, Inc. Cyantek Corp. RAVE LLC · EUV Gudeng Precision Industrial Co., Ltd. Semiconductor International · Metrology Hamatech USA, Inc. Magazine Heidelberg Instruments Inc. Shin-Etsu MicroSi, Inc. · Lasers Hitachi High Technologies America, Inc. Sigmameltec Ltd. · Nanotechnology Infi nite Graphics Incorporated SII NanoTechnology Inc. · Optical/laser microlithography Inko Industrial Corp. SoftJin Technologies Pvt. Ltd. KLA-Tencor Corp. Synopsys, Inc. · Resist technology and KM ACT Corp. TOOL Corp. processing Mentor Graphics Corp. XEI Scientifi c, Inc. · Software Micro Lithography, Inc. XYALIS Micronic Laser Systems AB · Electronic imaging components Mitsui Chemicals America, Inc. SPIE Sales [email protected] Tel +1 360 676 3290 2 SPIESPIE Photomask Technology 2010 · spie.org/pmadvancespie.org/pmadvance BACUS Steering Committee Plan now to Attend Frank E. Abboud, On behalf of SPIE, BACUS, and the Organizing Committee, we invite you to at- Intel Corp. tend the 29th Annual SPIE/BACUS Photomask Symposium. Photomask Technol- Paul W. Ackmann, ogy continues to be the premier worldwide technical meeting for the photomask GLOBALFOUNDRIES Inc. industry. This year’s symposium will give the authors an opportunity to present their exciting research fi ndings that relate to the emerging technical challenges facing Michael D. Archuletta, the photomask industry, to an international audience of their peers. RAVE LLC Artur P. Balasinski, Cypress This year we will open on Tuesday with the Keynote Presentation by Dr. Franklin D. Semiconductor Corp. Kalk, Toppan Photomasks, titled, The Future is Bright for Those with Open Eyes. Dr. Kalk will certainly have insight into the photomask industry, so you won’t want Uwe F. W. Behringer, UBC to miss his presentation! Microelectronics (Germany) Peter D. Buck, We have received 144 presentations this year, so it should be a very informative Toppan Photomasks, Inc. week. The all-day Wednesday Special Session is on EBDW/ML2: 13.5 Nanometer Brian Cha, or 17.3 Picometer?: not enough R&D $s to go around? From ‘Plenty, but Never SEMATECH North Enough’ to ‘Badly Needed’: are we funding the right technology/wavelength? Our Co-Chairs Brian Grenon and Wolf Staud have solicited the contributions of Thomas B. Fauer, industry luminaries on the various subjects and challenges that ML2 is facing: start- IBM Corp. ing with Burn Lin, TSMC [Keynote Speaker], Hans Pfeiffer [historical background], Brian J. Grenon, Neil Berglund [CoO], Aki Fujimura, [Invited: Design challenges], David Lam, Grenon Consulting, Inc. [Complimentary Lithography], Tor Sandstrom [platform], Laurent Pain [datapath] and many more tool and sub-system suppliers to give you a great program on this Naoya Hayashi, more than viable alternative. Dai Nippon Printing Co., Ltd. (Japan) We hope that you will be joining us in beautiful Monterey. Not only will you have a Mark T. Jee, great experience attending the sessions, you can also plan on staying on for a few HOYA Corp. USA days in the City by the Bay! Wilhelm Maurer, Conference Chair Infi neon Technologies AG (Germany) M. Warren Montgomery M. Warren Montgomery, College of NanoScale Science and Engineering CNSE/SEMATECH (CNSE) and SEMATECH Inc. Emmanuel Rausa, Plasma-Therm LLC Douglas J. Resnick, Molecular Imprints, Inc. Conference Co-Chair Steffen F. Schulze, Mentor Graphics Corp. Wilhelm Maurer Infi neon Technologies AG (Germany) Wolf Staud, Applied Materials, Inc. J. Tracy Weed, Synopsys, Inc. John M. Whittey, KLA-Tencor Corp. Banqiu Wu, Applied Materials, Inc. Larry S. Zurbrick, Agilent Technologies, Inc. SPIE would like to express its deepest appreciation to the symposium chairs, conference chairs, program committees, session chairs, and authors who have so generously given their time and advice to make this symposium possible. The symposium, like our other conferences and activities, would not be possible without the dedicated contribution of our participants and members. This program is based on commitments received up to the time of publication and is subject to change without notice. TEL: +1 360 676 3290 · +1 888 504 8171 · [email protected] 3 Special Events Keynote Presentation The Future is Bright for Those with Open Eyes Tuesday 14 September 8:10 to 8:50 am Dr. Franklin Kalk is Toppan Photomasks’ executive vice president of Technology, with responsibility for the company’s global R&D programs. His recent interest is the effect of next generation lithography on semiconductor industry business models. He is widely published and Franklin Kalk, holds 18 U.S. patents. He received a Ph.D. in Optics from the University Executive Vice-President, of Rochester. Technology Toppan Photomasks Don’t miss this exciting opening Keynote. Poster Viewing Exhibition/Poster Reception Tuesday 14 September . 10:00 am to 4:00 pm, and 6:15 to 7:45 pm Monterey Conference Center, Serra Grand Ballroom Wednesday 15 September . 10:00 am to 3:00 pm Tuesday 14 September . 6:15 to 8:15 pm Poster Reception Beer Poster authors may set up their poster papers between 10:00 am and 4:00 pm on Tuesday and will leave them up until Wednesday afternoon. Sponsored by Authors will be present during the Poster Reception 6:15 to 7:45 pm Tuesday to answer questions and provide in-depth discussion regard- ing their papers. Any papers not removed by Wednesday at 3:00 pm Symposium attendees and guests are invited to attend an Exhibition/ will be considered unwanted and will be discarded. SPIE assumes no Poster Reception on Tuesday evening in the Serra Grand Ballroom. The responsibility for papers left up after Wednesday at 3:00 pm. reception provides an opportunity for attendees to meet colleagues, network, view poster papers, and visit the exhibition booths. Refresh- ments will be served. Attendees are requested to wear their conference registration badges. SPIE Green Initiative As host to events that bring together scientists and engineers from around the globe, SPIE is committed to making our symposia as environmentally