Fox River Valley Industrial Properties Intensive Survey
Fox River Valley Industrial Properties Intensive Survey Stacks of logs at the Thilmany Paper Company Plant, Kaukauna, c.1950. WHS Image ID: 82885 Prepared By Legacy Architecture, Inc. 605 Erie Avenue, Suite 101 Sheboygan, Wisconsin 53081 Prepared For Wisconsin Historical Society State Historic Preservation Office 816 State Street Madison, Wisconsin 53706 2019 Acknowledgments The following persons or organizations assisted in completing this project: Legacy Architecture, Inc. City of Appleton Jennifer L. Lehrke, Principal Historic Preservation ConsultantDeAnn Brosman, Assessor Rowan Davidson, Historic Preservation Consultant Matt Tooke, Property Assessor Leila Saboori, Historic Preservation Institute Intern Robert Short, Historic Preservation Consultant City of Menasha Gail Biederwolf, Administrative Services Coordinator Joe Stephenson, Associate Planner Wisconsin Historical Society State Historic Preservation Office City of Neenah Daina J. Penkiunas, State Historic Preservation Officer Brad R. Schmidt, Deputy Director Joseph R. DeRose, Survey & Registration Historian Cassie Kohls, Assessment Technician Amy D. Wyatt, Historic Preservation Specialist Felipe Avila, GIS Coordinator City of Oshkosh Wisconsin Department of Revenue Jan Rogers, Office Assistant Kurt Keller, Supervisor City of Fond du Lac Judy Lara, Operations Program Associate Linda Baxter, Property Appraiser II City of Green Bay The generous donors who made this survey Alex Drews, Appraiser II possible. City of Kaukauna Allyson Watson Brunette, Principal Planner Jason Holmes, Planning/Engineering Technician This intensive survey has been financed entirely with private funds raised and administered by the Wisconsin Historical Society. The contents and opinions contained in this report do not necessarily reflect the views or policies of the Wisconsin Historical Society, nor does the mention of trade names or commercial products constitute endorsement or recommendation by the Wisconsin Historical Society.
[Show full text]