PELCO® and Support Films

PELCO ® Silicon Nitride Hydrophobic / PELCO ® Holey Silicon

Support Films for TEM Hydrophilic Si 3N4 Support Nitride Support Films for Films TEM

PELCO ® Silicon Dioxide Silicon Aperture Frames Silicon Nitride Coated Support Films for TEM (without support films) 3mm Discs (blanks)

The PELCO ® Silicon Nitride Support Films for TEM niques.The Silicon Nitride Support Film is grown on a silicon wafer to the desired thickness of 50nm or 200nm.The speci - (also called Si 3N4 membranes) have been developed as an addition to our extensive range ofTEM support films to further men viewing area is created by etching away a window in the enable nanotechnology applications and extend molecular silicon substrate, leaving a perfectly smooth, resilient and biology research.These superior products are made by state- chemically robust silicon nitride film. of-the-art semiconductor and MEMS fabrication techniques continued on next page using resilient, low- inorganic silicon nitride thin films supported by a sturdy silicon frame. PELCO ® Silicon Nitride Support Films are available in five window sizes combined with either ultra-low-stress 50nm or low-stress 200nm thin support film thickness on an EM industry standard 3mm diam - eter frame, making them the most desirable and useful silicon nitride support films in today's marketplace. Thin films can be directly deposited on the Silicon Nitride Support Films to conduct a variety of experiments and imag - ing techniques. FIB technique can also be used to make nano Tomography Type SiN oxidized @350°C holes in the SiN Support Film. ® Support Film on PELCO Si 3N4 Support Film. Silicon Nitride Support Films have the advantages of being Haitao Liu, Dept. of Chemistry, chemically and mechanically robust and can withstand tem - UC Berkeley, California. perature changes up to 1000°C.They are extremely stable and suitable to conduct a variety of nanotechnology experiments with particles or cells mounted directly on the support films. TED PELLA, INC. The PELCO ® Silicon Nitride Support Films are indispensable Microscopy Products for Science and Industry tools for virtually all fields of nanotechnology research.They enable direct deposition and in situ observations of dynamic P. O. Box 492477 Redding, CA 96049-2477 reactions over a wide temperature range.The support film can Phone: 530-243-2200 or 800-237-3526 (USA) be used as a passive support film but can also play a role as FAX: 530-243-3761 an active participant in experiments. Domestic (USA): [email protected] PELCO ® Silicon Nitride Support Films are manufactured using International: [email protected] state-of-the-art semiconductor and MEMS manufacturing tech - www.tedpella.com

©Ted Pella, Inc., 11-08. All rights reserved. The frame is manufactured as a 3mm silicon disc with Ordering Information smooth EasyGrip ™ edges for easy manipulation by tweezers and will fit perfectly in standardTEM holders.Thickness of 50nm Membrane Thickness: the silicon frame is 200µm. Easy handling capabilities and 21505-10 Silicon Nitride Support Film, 50nm with smoothness of the edges are design advantages over other 0.25 x 0.25mm Window ...... pkg/10 brands of silicon nitride support films.The PELCO ® Silicon 21500-10 Silicon Nitride Support Film, 50nm with Nitride Support Films are manufactured like grids and are 0.5 x 0.5mm Window ...... pkg/10 completely free from debris particles.The mechanical and chemical stability allow for cleaning of the Silicon Nitride 21501-10 Silicon Nitride Support Film, 50nm with Support Films with chemicals (solvents, acids and bases), 0.75 x 0.75mm Window ...... pkg/10 glow discharge and plasma cleaning. It is recommended 21502-10 Silicon Nitride Support Film, 50nm with that ultrasonic cleaning not be used, as it can easily shatter 1.0 x 1.0mm Window ...... pkg/10 the Silicon Nitride Support Films. 21504-10 Silicon Nitride Support Film, 50nm with EasyGrip ™ Edge 0.5 x 1.5mm Window ...... pkg/10 200nm Membrane Thickness: 21525-10 Silicon Nitride Support Film, 200nm with 0.25 x 0.25mm Window ...... pkg/10 21520-10 Silicon Nitride Support Film, 200nm with 0.5 x 0.5mm Window ...... pkg/10 21521-10 Silicon Nitride Support Film, 200nm with 0.75 x 0.75mm Window ...... pkg/10 21522-10 Silicon Nitride Support Film, 200nm with Applications Fields 1.0 x 1.0mm Window ...... pkg/10 G Cell biology: attached cells can be grown in their environ - 21524-10 Silicon Nitride Support Film, 200nm with ment on the support film and subsequently analyzed 0.5 x 1.5mm Window ...... pkg/10 G Analysis of colloids, aerosols, nanoparticles G Self-assembled mono-layers G Polymer research G research (directly deposited on the Silicon Nitride Support Film) G Materials science G Properties of nano-structures for semiconductor devices G Semiconductor: characterization of thin films G Catalyst development Product Description Defining parameters for the PELCO ® Silicon Nitride Support Films are: ab G Film Thickness: resilient, ultra-low-stress 50nm giving rise to minimum absorption to enable clear imaging; robust, low stress 200nm for better handling and use on multiple (a) (b) Single slice electron platforms; tomogram of a single synapse in (a) where G Window Sizes: 0.25 x 0.25mm, 0.75 x 0.75mm, synaptic vesicles and 0.5 x 0.5mm, 1.0 x 1.0mm and 0.5 x 1.5mm. Larger win - microtubules can be clearly dows give a greater viewing area and for example, allow discerned. (c)Three-dimen - for the higher tilt angles required for tomography applica - sional model of the tomo - tions; graphic data in (b) created G Frame Thickness: silicon support structure is 200µm stan - by the use of the IMOD dard.This allows for fitting in all standardTEM holders suite of programs. and gives a sturdy support frame; Prof. M. Stowell, et. al., MCDB, CU-Boulder, Colorado. G Surface Roughness: The RMS (Rq) is 0.65 ±0.06nm which gives a mean roughness (Ra) of 0.45 ± 0.02nm; c G Frame Diameter: EM standard 3mm diameter disc, fully compatible withTEM holders and with EasyGrip ™ edges for improved handling; www.tedpella.com/grids_html/silicon-nitride.htm G Packaging: The PELCO ® Silicon Nitride Support Films are packaged under cleanroom conditions in the PELCO #160 TEM Grid Storage Box. Each box holds 10 support films. PELCO ® Hydrophobic and Hydrophilic Silicon PELCO ® Holey Silicon Nitride Support Films Nitride Membrane Surfaces for TEM 50nm Silicon Nitride membranes Advanced MEMs technologies have been modified using Atomic have been applied to incorporate Layer-Deposited (ALD) techniques to many improvements into this change their surface properties. truly unique next generation Depending on the process used, both holey Silicon Nitride support Hydrophobic and Hydrophilic sub - membrane. Holey membranes or strates have been created with the support films are also referred to following advantages: as perforated or patterned films. The platform for this holey G Choice between low and high surface energies Silicon Nitride support film is the G Smooth and conformal substrates low stress 200nm Silicon Nitride support film on a circular G Enhanced wetting and biocompatibility (hydrophilic) 3mm silicon frame with a 0.5 x 0.5mm membrane.The diam - G No need for plasma treatment prior to cell growth eter of the holes is 2.5µm with a pitch of 4.5µm in an array of 100 rows x 100 columns in a hexagonal high G Hydrophobic coating offers novel platform for deposition and growth of nanomaterials arrangement.This design has a number of advantages over previously offered products: These coatings are available on 50nm Silicon Nitride Membrane with a window size of 0.5 x 0.5mm on a 200µm G Relatively large open area silicon frame with a diameter of 3mm, compatible with all G Added resilience of membrane standardTEM grid holders.Smooth and conformal substrates G Practical hole size for experiments Specifications G A boundary of 25µm non-perforated membrane surrounding the holey membrane area G Hydrophobic: 5nm atomic layer-deposited alumina and fluoro-methyl-silane on ultra-low-stress silicon nitride G TEM standard circular shape membrane G EasyGrip ™ edge for improved handling G Hydrophilic: 5nm atomic layer-deposited hydroxylated Specifications alumina on 50nm ultra-low-stress silicon nitride mem - ® brane Defining parameters for the PELCO Holey Silicon Nitride Support Films are: G Surface Energy: G Membrane Thickness: 200nm for added resilience Surface Surface Energy Standard Deviation (mj/m 2) G Window Size: 0.5 x 0.5mm SiN Membrane 46.1 4.3 G Hole Size and Pitch: 2.5µm circular holes with a 4.5µm Hydrophobic 24.6 4.4 pitch Hydrophilic 76.1 2.2 G Pattern: close packed hexagonal arrangement of 100 x 100 rows/columns with a total of 10,000 holes. A 25um G Surface Roughness: boundary of non-perforated membrane surrounds the Surface Surface Roughness Standard Deviation perforated area (nm) (nm) G Perforated Area: 0.45 x 0.45mm SiN Membrane Rq=0.65 / Ra=0.45 0.06 / 0.02 G Frame Thickness: Silicon support structure is 200µm stan - Hydrophobic Rq=0.66 / Ra=0.40 0.03 / 0.05 dard.This allows for fitting in standardTEM holders and Hydrophilic Rq=0.57 / Ra=0.40 0.04 / 0.03 gives a sturdy support frame G Surface Roughness: The RMS (Rq) is 0.65 ±0.06nm which G Film Thickness: resilient, ultra-low-stress 50nm gives a mean roughness (Ra) of 0.45 ±0.02nm G Window Size: 0.5 x 0.5mm G Frame Diameter: TEM standard 3mm diameter disc, fully G Frame Thickness: silicon support is 200µm standard compatible with regularTEM holders and with EasyGrip ™ G Frame Diameter: EM standard 3mm diameter disc, fully edges for improved handling compatible with standardTEM holders (no broken edges) G Packaging: The PELCO ® Holey Silicon Nitride Support G EasyGrip ™: edges for easy handling with tweezers Films are packaged under cleanroom conditions in the PELCO ® #160TEM Grid Storage Box. Each box holds 10 Packaging: The PELCO ® Silicon Nitride Support Films are G support films packaged under cleanroom conditions in the PELCO #160 TEM Grid Storage box. Each box holds 10 support films. Ordering Information Ordering Information 21535-10 Holey Silicon Nitride Support Film, 200nm, 2.5µm holes ...... pkg/10 21550-10 Hydrophilic 50nm Silicon Nitride Membrane, 0.5 x 0.5mm Window ...... pkg/10 www.tedpella.com/grids_html/silicon-nitride-holey.htm 21552-10 Hydrophobic 50nm Silicon Nitride Membrane, 0.5 x 0.5mm Window ...... pkg/10 www.tedpella.com/grids_html/silicon-nitride.htm PELCO ® Silicon Dioxide Support Films for TEM PELCO ® Silicon Aperture Frames (without support film) These PELCO ® membranes of Silicon

Dioxide (SiO 2) offer superior flatness. Using advanced MEMS manufacturing technologies combined with novel stress- reducing techniques, we have been able to provide Silicon Dioxide Support Films with 0.5 x 0.5mm 1.0 x 1.0mm 1.5 x 0.5mm unsurpassed flatness and a membrane ® thickness of only 40nm. It is truly the next The PELCO Silicon Aperture Frames are 3mm disc-type frames with a thickness of 200µm and square or rectangular generation Silicon Dioxide membranes. apertures.They offer a variety of applications: The Silicon Dioxide (SiO ) Support Films are manufactured 2 G Support frame to attachTEM lamellae made with FIB using the PELCO ® 200nm Silicon Nitride (Si N ) Support Films 3 4 G Support frame for thin films, foils, wires and fibers with the 0.5 x 0.5mm window as a platform.The 0.5 x 0.5mm G Mask for thin film research (deposition mask) membrane is patterned into 50 x 50µm apertures and etched back to the thermally-deposited Silicon Dioxide leaving a struc - Specifications ture-free 40nm SiO 2 thin membrane suspended by a 200nm G Aperture Opening Sizes: 0.5 x 0.5mm, 1 x 1mm, and optically transparent (Si 3N4) support mesh.The bar size 0.5 x 1.5mm between the SiO 2 apertures is 30µm and the boundary width is G Window Side Angle: 35.26° 65µm.The result is a Silicon Dioxide Support Film with a truly G Aperture Frame Thickness: 200µm superior flatness. G Aperture Frame Diameter: 3mm < Presentation of film flatness using a simulation G Aperture Material: Si for the displacement of SiO 2 membrane versus x-y position on the 500 x 500 µm grid. G Surface: Top side Si, bottom side (larger opening) has 50nm Si N Optical image showing only 3 4 minor distortion > G Packaging: The PELCO ® Silicon Aperture Frames are pack - Areas with minor distortion aged under cleanroom conditions in the PELCO ® #160TEM Grid Storage Box. Each box holds 10 Aperture Frames. Ordering Information < 60 degree tilted image 21540-10 PELCO ® Silicon Aperture Frame of one 50 x 50µm Silicon Dioxide Support (no support film), 0.5 x 0.5mm ...... pkg/10 Film showing smooth surface. 21541-10 PELCO ® Silicon Aperture Frame Thermal Silicon Dioxide is one of most functionalized surfaces (no support film), 1.0 x 1.0mm ...... pkg/10 in analytical chemistry and can be used as a platform to study 21542-10 PELCO ® Silicon Aperture Frame base materials and biological entities.The support films can be (no support film), 1.5 x 0.5mm ...... pkg/10 either used as a passive physical support forTEM imaging or as an active participant in experiments.The Silicon Dioxide www.tedpella.com/grids_html/silicon-aperture.htm Support Films have excellent chemical, physical and thermal stability. Examples of applications are: PELCO ® Silicon Nitride Coated 3mm Discs (blanks) G Nanomaterial deposition and growth These 3mm Silicon discs have an ultra-flat G Thin film analysis and characterization (Ra 0.45 ± 0.2nm) 50nm ultra-low-stress G Catalyst research and development Silicon Nitride layer on both sides.The G Support for FIB lamellae ultra-low-stress film is nonstoichiometric and closer to SiN than Si N .They can be G Study of attached biological molecules. 3 4 used for a number of applications: Specifications Defining parameters for the PELCO ® Silicon Dioxide Support G Specimen mounts for SEM and FESEM applications Films are: G Specimen discs for AFM applications G Membrane Thickness: 40nm G Blanks to build the PELCO ® Liquid Cell ™ together with the PELCO ® Silicon Nitride Membrane G Aperture Size / Number: 50 x 50µm / 24 apertures Specifications G Pattern: 5 rows x 5 columns with 200nm Si 3N4 support structure, 30µm bar width and 65µm boundary G Film Thickness: 50nm ultra-low-stress Silicon Nitride on G Total Window Area: 0.5 x 0.5mm both sides G Frame Thickness: Silicon support is 200µm. G Disc Thickness: 200µm silicon support G Frame Diameter: TEM standard 3mm diameter disc, fully G Disc Diameter: 3mm compatible with regularTEM holders and with EasyGrip ™ G Surface Roughness: The RMS (Rq) is 0.65 ±0.06nm which edges for improved handling gives a mean roughness (Ra) of 0.45 ±0.02nm G Packaging: The PELCO ® Silicon Dioxide Support Films are G Packaging: The PELCO ® Silicon Aperture Frames are pack - packaged under cleanroom conditions in the PELCO ® #160 aged under cleanroom conditions in the PELCO ® #160TEM TEM Grid Storage Box. Each box holds 10 support films. Grid Storage Box. Each box holds 10 Blanks. Ordering Information Ordering Information 21530-10 Silicon Dioxide Support Film ...... pkg/10 21555-10 PELCO ® Silicon Nitride Discs, ø3mm . . . . . pkg/10 www.tedpella.com/grids_html/silicon-dioxide.htm www.tedpella.com/grids_html/silicon-aperture.htm

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