Spinelectronics: From Basic Phenomena to Applications
[email protected] Spintronics tutorial Santander 20/06/2017 John Slonczewski
We will miss you, John
[email protected] Spintronics tutorial Richmond 03/06/2019 Spin-electronics
Electronics Magnetism
Electron charge Electron Spin
Main goal : Discover new phenomena taking advantage of the electrons’ spin and try to use them in devices having new functionalities or improved peformances (higher sensitivity, lower power consumption…etc).
Started in 1988 with the discovery of Giant Magnetoresistance
[email protected] Spintronics tutorial Richmond 03/06/2019 Spintronics/nanomagnetism broadening spectrum of interest 1988 Spin injection/detection 1995 1989 Giant 2000 Tunnel 2006 /manipulation: Magnetoresistance 2004 2010 -semiconductors (Si, GaAs) (GMR) Magnetoresistance -Graphene and other 2D materials (TMR) -Topological insulators 1996 Spin transfer 2000 Control of torque (STT) 2004 magnetic properties by electric field/strain : Spintronic -Interfacial anisotropy phenomena Current induced motion 2004 -Multiferroïcs of magnetic textures: 2008 2013 2003-2007 domain walls, skyrmions Antiferro spintronics TeraHertz emission Spin orbit torque (SOT) 1996-2010 Dzyaloshinskii-Moriya interaction (DMI) Spincaloritronics Interconversion Interplay Heat/Spin/Charge spin charge current 2008 2010 2008-2010 2008
[email protected] Spintronics tutorial Richmond 03/06/2019 Spintronics/nanomagnetism broadening spectrum of interest
Magnetic recording : MRAM -Heat Assisted Standalone -Microwave assisted MR Embedded Sensors : -MR heads -3D position sensors Non-volatile logic -Biotechnology Normally-Off/Instant-On electronics Spintronics Spin-waves based Energy : applications Thermoelectricity with logic spincaloritronics effects Race track STT or SOT based Shift registers RF devices -oscillators, filters and demodulators -data communication Memristor applications -neuromorphic computing Neuromorphic architecture -power harvesting
[email protected] Spintronics tutorial Richmond 03/06/2019 Spinelectronics: From Basic Phenomena to Applications
OUTLINE
• Part 1 : Basic phenomena in spintronics:
- Giant Magnetoresistance - Tunnel magnetoresistance (TMR) - Spin-Transfer Torque (STT) - Spin-orbit Torques (SOT)
• Part 2 : Spintronics main applications
- Magnetic Recording (Hard disk drives Read-heads) - MRAMs - Magnetic field sensors - RF applications
[email protected] Spintronics tutorial Richmond 03/06/2019 Spinelectronics: From Basic Phenomena to Applications
OUTLINE
• Part 1 : Basic phenomena in spintronics:
- Giant Magnetoresistance - Tunnel magnetoresistance (TMR) - Spin-Transfer Torque (STT) - Spin-orbit Torques (SOT)
• Part 2 : Spintronics main applications
- Magnetic Recording (Hard disk drives Read-heads) - MRAMs - Magnetic field sensors - RF applications
[email protected] Spintronics tutorial Richmond 03/06/2019 Giant magnetoresistance (1988)
Fe/Cr multilayers Baibich, M. et al, Phys.Rev.Lett., 61 (1988) 2472. Two geometries of measurement: I
~ 80% V
I Current-in-plane
I
V Magnetic field (kG) I I
Current-perpendicular-to-plane R − R GMR = AP P R Antiferromagnetically coupled multilayers P
[email protected] Spintronics tutorial Richmond 03/06/2019 NOBEL PRIZE IN PHYSICS IN 2007
Albert Fert Peter Grünberg
Albert Fert & Peter Grünberg received the Nobel Prize from His Majesty King Carl XVI Gustaf of Sweden at the Stockholm Concert Hall, 10 December 2007.
[email protected] Spintronics tutorial Richmond 03/06/2019 -9- Other GMR systems
B.Dieny et al , Phys. Rev.B.(Condensed-Matter) 43 (1991)1297
[email protected] Spintronics tutorial Richmond 03/06/2019 Two current model (Mott 1930) for transport in magnetic metals
As long as spin-flip is negligible, current can be considered as carried in parallel by two categories of electrons: spin ↑ and spin ↓ (parallel and antiparallel to quantization axis)
− 1 ρ ρ ρ = 1 + 1 = ↑ ↓ ρ ρ ρ + ρ ↑ ↓ ↑ ↓
Sources of spin flip: magnons and spin-orbit scattering
Negligible spin-flip often crude approximation (spin diffusion length in NiFe~4.5nm, 30% spin memory loss at Co/Cu interfaces)
Mott N.F. and H.H.Wills, Proc.Roy.Soc.A156, 368 (1936).
[email protected] Spintronics tutorial Richmond 03/06/2019 Spin dependent transport in magnetic transition metals (1)
Band structure of 3d transition metals In transition metals, partially filled bands which participate to conduction are s and d bands Non-magnetic Cu : Magnetic Ni :
E E s (E) s (E) s↓(E) s↑ (E) ↓ ↑
D (E) D↑ (E) D↓ (E) D↑ (E) ↓
EF
EF
≠ D↑(EF) = D↓(EF) D↑(EF) D↓(EF) Most of transport properties are determined by DOS at Fermi energy Spin-dependent density of state at Fermi energy
Fert, A., Campbell, I.A., J.Phys.F6, 849 (1976).
[email protected] Spintronics tutorial Richmond 03/06/2019 Spin dependent transport in magnetic metals (2) m*(d) >> m*(s) J mostly carried by s electrons in transition metals
Scattering of electrons determined by DOS at EF : E
σ s↓(E) s↑(E) Fermi Golden rule : ∝ < >2 P iW f D f (EF )
D↓(E) D (E) s↑ s↑ ↑ d↑
s↓ s↓ d↓ Most efficient scattering channel
Spin-dependent scattering rates in magnetic transition metals
Example: λ↑ = 10 nm;λ↓ = 1nm Co Co Fert, A., Campbell, I.A., J.Phys.F6, 849 (1976).
[email protected] Spintronics tutorial Richmond 03/06/2019 Simple model of Giant Magnetoresistance
Parallel config Antiparallel config Baibich, M. et al, Phys.Rev.Lett., 61 (1988) 2472. Fe Cr Fe Fe Cr Fe
2 ∆ρ ρ − ρ α −1 2 = ↑ ↓ = ρ ρ + ρ α + ap ↑ ↓ 1 Equivalent resistances : ρ ρ ρ ρ ρ α = ↑ ρ ρ ρ ρ ρ ↓
Key role of 2ρ ρ (ρ + ρ ) ρ = ↑ ↓ ρ = ↑ ↓ scattering contrast α P ()ρ + ρ AP ↑ ↓ 2
[email protected] Spintronics tutorial Richmond 03/06/2019 Two configurations of GMR measurement
1) Current in-plane (CIP) I
V
I
• Straightforward to measureCIP at wafer level, no need for patterning • Measured in 4 point probe geometry CIP-GMR described by Boltzman formalism (R. E. Camley and J. Barna ś, Phys. Rev. Lett. 63 , 664 (1989) • Important characteristic lengths : elastic spin-dependent mean free paths λ λ e.g. ↑ ↓ = 7 ; = 1
[email protected] Spintronics tutorial Richmond 03/06/2019 2) Current Perpendicular to Plane GMR (CPP-GMR)
I
V I I
Much more difficult to measure but richer physics, Either on macroscopic samples (0.1mm diameter) with superconducting leads (R~ ρ . thickness / area ~ 10 −5Ω) or on patterned microscopic pillars of area < µm² (R~ a few Ohms)
Pratt,W.P.Jr, et al, Phys.Rev.Lett. 66 (1991) 3060 Eid, K.,Pratt Jr., W.P., and Bass, J. Journ.Appl.Phys.93, 3445 (2003). Michigan State Univ
[email protected] Spintronics tutorial Richmond 03/06/2019 Current Perpendicular to Plane GMR
Measurement limited at 4K
[email protected] Spintronics tutorial Richmond 03/06/2019 Serial resistance model for CPP-GMR
Without spin-filp, serial resistance network can be used for CPP transport
CPP transport through F/NM/F sandwich described by:
(a) Parallel magnetic configuration :
ρ ↑ ↑ ρ t ↑ ρ ↑ F tF AR F / NM NM NM AR F / NM F tF ρ ↓ ↓ ρ t ↓ ρ ↓ F tF AR F / NM NM NM AR F / NM F tF
(b) Antiparallel magnetic configuration :
ρ ↑ ↑ ρ t ↓ ρ ↓ F tF AR F / NM NM NM AR F / NM F tF ρ ↓ ↓ ρ t ↑ ρ ↑ F tF AR F / NM NM NM AR F / NM F tF
[email protected] Spintronics tutorial Richmond 03/06/2019 Spin accumulation – spin relaxation in CPP geometry F1 F2
J J↑ ()1+ β e flow 2 e flow
J ()1− β 2 J↓ lSF lSF Valet and Fert theory of CPP-GMR (Phys.Rev.B48, 7099(1993)) z In F1: Different scattering rates for spin ↑ and spin ↓ electrons ⇒ different spin ↑ and spin ↓ currents. Larger scattering rates for spin ↓ : J ↑ >>J ↓ far from the interface.
In F2: Larger scattering rates for spin ↑ : J↓ >> J↑ far from the interface. Majority of incoming spin ↑electrons, majority of outgoing spin ↓ electrons Building up of a spin ↑accumulation around the interface balanced in steady state by spin-relaxation
[email protected] Spintronics tutorial Richmond 03/06/2019 Starting point : Valet and Fert theory of CPP-GMR (Phys.Rev.B48, 7099(1993)) Spin-relaxation at F ↑/F ↓ interface: µσ : spin-dependent chemical potential In homogeneous material, µ=ε -eφ F J J↑ ()1+ β r 2 Spin-dependent current driven by ∇µ ()− β J ∂µ 1 1 σ 2 J l l Jσ = ↓ SF SF eρσ ∂z
Generalization of Ohm law z
Spin relaxation : β ρ * F e F lSF J ∂Jσ µσ − µ−σ eρσ = ∂ 2 ∆µ z 2lSF
lSF =spin-diffusion length (~5nm in NiFe, ~20nm in Co)) lSF lSF
[email protected] Spintronics tutorial Richmond 03/06/2019 z Interfacial boundary conditions
↑ ↓ ↑ ↓ ↑ ↓ ↑ ↓ µ ( ) ( )− µ ( ) ( )= ( ) ( ) ( ) (Ohm law at interfaces) i+1 zi+1 i zi+1 ri+1 J i zi+1
↑ ↓ ↑ ↓ ( ) ( )= ( ) ( ) (if no interfacial spin-flip is considered) J i+1 zi+1 J i zi+1
Note: Interfacial spin memory loss can be introduced by : ↑(↓) ( )= δ ↑(↓) ( ) Ji+1 zi+1 Ji zi+1
30% memory loss as at Co/Cu interface yields δ=0.7
[email protected] Spintronics tutorial Richmond 03/06/2019 Input microscopic transport parameters to describe macroscopic CPP properties :
Within each layer : ρ = ρ [ − + β ] -The measured resistivity ρ. ↑()↓ 2 * 1 ( ) β ρ ρ -The scattering asymmetry . ρ = ↑ ↓ = ρ * ()− β 2 measured 1 ρ↑ + ρ↓ -The spin diffusion length l sf . At each interface :
-The measured interfacial area*resistance product rmeasured -The interfacial scattering asymmetry γ.
= [ − + γ ] r↑()↓ 2r * 1 ( ) r r r = ↑ ↓ = r *()1−γ 2 measured + r↑ r↓
[email protected] Spintronics tutorial Richmond 03/06/2019 Examples of bulk parameters β Material Measured lSF resistivity Bulk 4K/300K scattering asymmetry Cu 0.5-0.7 µΩ .cm 0 500nm 3-5 0 50-200nm Au 2µΩ .cm 0 35nm 8 0 25nm
Ni 80 Fe 20 10-15 0.73-0.76 5.5 22-25 0.70 4.5
Ni 66 Fe 13 Co 21 9-13 0.82 5.5 Review on 20-23 0.75 4.5 CPP-GMR: Co 4.1-6.45 0.27 – 0.38 60 Bass, JMMM 408 (2016) 12-16 0.22-0.35 25 244–320 Co 90 Fe 10 6-9 0.6 55 13-18 0.55 20
Co 50 Fe 50 7-10 0.6 50 15-20 0.62 15
Pt 50 Mn 50 160 0 1 180 0 1 Ru 9.5-11 0 14 [email protected] Spintronics tutorial Richmond 03/06/2019 14-20 0 12 Examples of interfacial parameters
Material Measured R.A γ interfacial Interfacial resistance scattering assymetry Co/Cu 0.21mΩ.µm2 0.77 0.21-0.6 0.7
Co 90 Fe 10 /Cu 0.25-0.7 0.77 0.25-0.7 0.7
Co 50 Fe 50 /Cu 0.45-1 0.77 0.45-1 0.7 NiFe/Cu 0.255 0.7 0.25 0.63 Review on NiFe/Co 0.04 0.7 CPP-GMR: 0.04 0.7 Bass, JMMM 408 (2016) 244–320 Co/Ru 0.48 -0.2 0.4 -0.2 Co/Ag 0.16 0.85 0.16 0.80
[email protected] Spintronics tutorial Richmond 03/06/2019 Spinelectronics: From Basic Phenomena to Applications
OUTLINE
• Part 1 : Basic phenomena in spintronics:
- Giant Magnetoresistance - Tunnel magnetoresistance (TMR) - Spin-Transfer Torque (STT) - Spin-orbit Torques (SOT)
• Part 2 : Spintronics main applications
- Magnetic Recording (Hard disk drives Read-heads) - MRAMs - Magnetic field sensors - RF applications
[email protected] Spintronics tutorial Richmond 03/06/2019 Magnetic tunnel junctions – Tunnel magnetoresistance
Structure of a magnetic tunnel junction NiFe CoFe Al(Zr)O x Storage layer: CoFe 4 nm Magnetic Tunnel junction CoFe Al O barrier 1.5nm or 2 3 IrMn Reference layer :CoFe 3nm NiFe IrMn 7nm
Acts as a couple polarizer/analyzer with the spin of the electrons.
•First observation of TMR at low T in MTJ: Julliere (1975) (Fe/Ge/Co) •TMR at 300K : Moodera et al, PRL (1995); Myazaki et al, JMMM(1995). ∆R/R~50% 10mT 20mT in AlO x based junctions
[email protected] Spintronics tutorial Richmond 03/06/2019 Julliere model of tunnel magnetoresistance (TMR)
Jullière,Phys. Lett. Isolant A54 225 (1975) Ferro 1 F1 F2
EF Isolant eV EF Ferro 2 0
σ Fermi Golden rule: proba of tunneling P ∝ < >2 iW f D2 (EF ) ∝ Nb of electrons candidate for tunneling D1 (EF ) ⇒ σ ∝ σ × σ tunneling current in each spin channel J D1 (EF ) D2 (EF ) Parallel configuration Antiparallel configuration parallel ∝ ↑ ↑ + ↓ ↓ antiparall el ∝ ↑ ↓ + ↓ ↑ J D1 D2 D1 D2 J D1 D2 D1 D2
↑ ↓ D ( E ) − D ( E ) ∆R 2 P P ∆R 2 P P = F F = = 1 2 = = 1 2 P ↑ ↓ TMR TMR D ( E ) + D ( E ) − + F F R P 1 P1 P2 R AP 1 P1 P2
[email protected] Spintronics tutorial Richmond P~50%03/06/2019 in Fe, Co ∆R/R~40 - 70% with alumina barriers Giant TMR of MgO tunnel barriers
S.S.P.Parkin et al, Nature Mat. (2004), nmat1256. S.Yuasa et al, Nature Mat. (2004), nmat 1257. Very well textured MgO barriers grown by sputtering or MBE on bcc CoFe or Fe magnetic electrodes, or on amorphous CoFeB electrodes followed by annealing to recrystallize the electrode.
Yuasa et al, APL89, 042505(2006)
10mT 20mT
[email protected] Spintronics tutorial Richmond 03/06/2019 Amorphous barrier Vs Crystalline barrier Amorphous barrier Crystalline barrier ex: amorphous AlO ex: MgO(001)
bcc
No crystallographic symmetry in the barrier: ‹ Incoherent tunneling: Bloch states are not conserved during tunneling. ‹ Every electron symmetry contributes equally to the tunneling process. ‹ Observed TMR < 100% @RT
Butler et al., PRB 2001 ; Khvalkovskiy et al., J. Phys. D Appl. Phys 2013
[email protected] Spintronics tutorial Richmond 03/06/2019 Amorphous barrier Vs Crystalline barrier Amorphous barrier Crystalline barrier ex: amorphous AlO ex: MgO(001)
bcc
bcc
bcc
Epitaxially grown crystalline barrier: ‹ Coherent tunneling: the electrons' wave-functions in the FM are coupled with evanescent wave-functions having the same symmetry in the barrier. ‹ Tunneling probability of e- strongly depends on its orbital symmetry ‰ possible effective symmetry filtering of the tunneling current.
Butler et al., PRB 2001 ; Khvalkovskiy et al., J. Phys. D Appl. Phys 2013
[email protected] Spintronics tutorial Richmond 03/06/2019 Crystalline barrier – The example of Fe/MgO/Fe
+ +
‹ Exponential tunneling decay is much stronger for and states than for states ∆ ∆ ‹ Both majority and∆ minority and symmetry states can be found at the Fermi level ‰ low∆ P. ∆ ‹ Only majority electrons fill symmetry states, implying a full polarization . ∆ ∆ = 100% a Spin filtering of the wave functions : large values of TMR expected in epitaxial or highly textured structures (TMR>1000% @RT).
Butler et al., PRB 2001 ; Khvalkovskiy et al., J. Phys. D Appl. Phys 2013
[email protected] Spintronics tutorial Richmond 03/06/2019 Standard out-of-plane MTJ stack
Ta ~3nm Must have a bcc structure storage CoFeB 1.4nm (001 textured) for large TMR Tunnel barrier MgO (4-fold symmetry)
CoFeB 1.4nm Nanocrystalline material to enable Reference Ta 0.3nm fcc/bcc structural transition (SyAF) Co 0.5nm Ru 0.7 Hard layer Must have a fcc structure (Pt0.4/Co 0.5) for strong perpendicular 4 anisotropy (i.e. strong pinning) Ta ~5nm (3-fold symmetry, (111) texture) underlayer Ta/Ru/Ta or Ta/CuN/Ta Same basic problem of in-stack symmetry compatibility
[email protected] Spintronics tutorial Richmond 03/06/2019 Growth and annealing of the tunnel barrier
Djayaprawira D D et al, Appl. Phys. Lett. 86 092502 (2005) Problem of symmetry compatibility solved by using amorphous CoFeB electrodes during growth amorphous Polycrystalline As-deposited (001) bcc textured amorphous
[email protected] Spintronics tutorial Richmond 03/06/2019 Annealing of the magnetic tunnel junction
o o Annealing at Tanneal ~300 C-400 C. The higher Tanneal , the better from the barrier formation standpoint
As-deposited Annealing After annealing
Crystallization of bcc Cap layer (Ta or Ru) CoFe from the MgO Cap layer (Ta or Ru) interface and expulsion of the B out-of the CoFeB B rich CoFeB Amorphous CoFeB alloy bcc CoFe Polycrystalline (001) Improvement of MgO crystalline (001) textured MgO crystallization textured MgO Amorphous CoFeB Crystallization of bcc bcc CoFe CoFe from the MgO interface and expulsion B rich CoFeB Ru spacer of the B out-of the CoFeB Ru spacer alloy
• Important to attract B away from the tunnel barrier during the crystallization process. Choose materials which are good B getters on the opposite side of the free (storage) and reference layers ( Ta, Ru, W, Mo, Nb, Zr, Hf,…).
[email protected] Spintronics tutorial Richmond 03/06/2019 Magnetic tunnel junctions based on MgO tunnel barriers
•As-deposited, CoFeB amorphous, MgO polycristalline •Upon annealing, recrystallization of CoFeB from the MgO interfaces and improvement in MgO crystallinity with (100) bcc texture
J. Hayakawa et al. Jap. J. Appl. Physics 2005
°C °C
Also, Yuasa et al. Applied Physics Letters, 2005
[email protected] Spintronics tutorial Richmond 03/06/2019 Giant TMR of MgO tunnel barriers
MgO
Amorphous : Incoherent tunneling of various Bloch states
AlOx Crystalline: Spin-filtering mechanism according to symmetry of Bloch states
[email protected] Spintronics tutorial Richmond 03/06/2019 MTJ : a reliable path for CMOS/magnetic 3D integration
- Resistance compatible with CMOS (cell R ~ k Ω) - MTJ used as a variable resistance driven by field or current/voltage. -MTJ can be deposited at any metallic level in the CMOS technology in replacement of a via. Magnetic - Above IC technology (‘end-of-back-end’ process) element level - Front-end contamination under control CMOS logic - Low-T BE process (250 oC-350 oC) compatible with level Cu interconnect process - Easy / cheap to embed (3 add-masks, no trade-off with logic process)
Rapid progress in technology maturity thanks to the involvement of major IDM and equipment manufacturers. No CMOS contamination during the integration Etching of MTJ remains the main difficulty at advanced nodes More and more fabs now enabled with 200/300mm magnetic BEOL lines
[email protected] Spintronics tutorial Richmond 03/06/2019 Spinelectronics: From Basic Phenomena to Applications
OUTLINE
• Part 1 : Basic phenomena in spintronics:
- Giant Magnetoresistance - Tunnel magnetoresistance (TMR) - Spin-Transfer Torque (STT) - Spin-orbit Torques (SOT)
• Part 2 : Spintronics main applications
- Magnetic Recording (Hard disk drives Read-heads) - MRAMs - Magnetic field sensors - RF applications
[email protected] Spintronics tutorial Richmond 03/06/2019 Spin-Transfer Torque (STT) Predicted by Slonczewski (JMMM.159, L1(1996)) and Berger (Phys.Rev.B54, 9359 (1996)) Giant or Tunnel magnetoresistance : Acting on electrical current via the magnetization orientation Spin transfer is the reciprocal effect : Acting on the magnetization via the spin polarized current ~1nm CoCu ~1nm Co Reflected e -
M.D.Stiles et al, Phys.Rev.B.66, 014407 (2002)
Polarizing layer layer Free layerlayer
Conduction electron electron flow flow Reorientation of spin polarization ⇒ Torque on the free layer magnetization A new way to manipulate the magnetization of magnetic nanostructures
[email protected] Spintronics tutorial Richmond 03/06/2019 Classical expression of the Spin Transfer torque e- FM1 FM2 ∆S⊥ S 1 S S2 1 S2 Pinned layer Free layer Bohr magneton eh t µ = μ B 2m = − e g =electron gyromagnetic ratio
VThe whole transverse part of spin current is absorbed next to the interface V Incident spin direction is aligned along the magnetization of the pinned layer
FM1 ‹ Torque acting on the magnetization of FM2 ?
[email protected] Spintronics tutorial Richmond 03/06/2019 Classical expression of the Spin Transfer torque