High-Sensitivity Elemental Mass Spectrometry of Fluorine by Ionization in Plasma Afterglow

Total Page:16

File Type:pdf, Size:1020Kb

High-Sensitivity Elemental Mass Spectrometry of Fluorine by Ionization in Plasma Afterglow Supporting Information High-Sensitivity Elemental Mass Spectrometry of Fluorine by Ionization in Plasma Afterglow Joseph E. Lesniewski†, Kunyu Zheng†, Paolo Lecchi‡, David Dain‡, and Kaveh Jorabchi†* † Department of Chemistry, Georgetown University, Washington, DC ‡ DSM Nutritional Products, Columbia, MD * Corresponding author: [email protected] Table of contents Experimental details o Operating parameters for PARCI-MS and ion chromatography-PARCI-MS o Sample preparation and data analysis Details for ab initio calculations Background spectrum of PARCI-MS with aqueous sodium acetate Flow injections of NaF and p-F-phenylalanine Flow injections for F LOD calculations Calibration curve for fluoride detection with IC-PARCI-MS Experimental Details Sample introduction and PARCI. Aqueous analytes were introduced by flow injection using a 20 μL injection loop at 250 μL/min water supplied by an HPLC pump (LC10AD, Shimadzu, Columbia, MD). The analyte stream was then mixed with 80 μL/min 10 mM aqueous NaOH solution supplied by a syringe pump (Model 100, KD Scientific, Holliston, MA). The mixed stream was then guided into a nebulizer (HEN-120, Meinhard, Golden, CO) operated at a constant argon flow rate of 1.25 L/min. The aerosols passed through a cyclonic spray chamber (Twister Cyclonic, Glass Expansion, Pocasset, MA) and were mixed with a makeup gas flow of 0.55-1.25 L/min using a tangential mixer (ML151008N, Meinhard, Golden, CO) to provide total aerosol gas flow rates of 1.8-2.5 L/min. The total aerosol gas flow was injected via a 1.5-mm injector into an Ar ICP sustained at 1100 W (14 L/min outer gas flow, 1.2 L/min auxiliary flow) using a stand-alone RF generator (Nexion 2000, PerkinElmer Inc., Waltham, MA) with the exhaust flow adjusted to produce 3.5 m/s air flow at the bottom intake of the torch box. Note that exhaust flow has a significant impact in PARCI unlike conventional ICP- MS.1 Analytes underwent vaporization and breakdown within the plasma. The plasma products were then guided through a cooled aluminum sampler (2.5 mm orifice) into a stainless steel atmospheric-pressure reaction tube (5 cm long, ¼” o.d., 4.8 mm i.d.) where ion-molecular reactions led to ionization of plasma products. S-1 Mass Spectrometer. The mass spectrometer used for detection of ions was a single quadrupole MS (SQ 300, PerkinElmer Inc., Waltham, MA). The electrospray ion source was removed from the instrument and the PARCI source was placed so that the reaction tube was aligned with the inlet, 5-10 mm from the MS end plate. Neutrals were restricted from entering the mass spectrometer by a 5.5 L/min N2 counterflow gas controlled by an external mass flow controller (Model 246B, MKS, Andover, MA). Positive ions were pulled in to the MS inlet by applying potentials of -200 V to the end plate and -600 V to the glass capillary entrance. Background scans were collected using 1000 μs pulse counting time per point, 10 points per mass, and were averaged for 30 seconds. A nozzle-skimmer declustering potential of 50 V was used for all + acquisitions (+70 V capillary exit, +20 V skimmer). Na2F sensitivity measurements were conducted in selected ion monitoring (SIM) mode at an m/z value of 65 with an integration time of 500 ms. For measurements of LOD, an integration time of 1000 ms was utilized. To minimize premature aging of the detector due to the high background ion flux, an intentional ion deflection was applied to reduce the ion current impinging on the detector. This was accomplished by setting the Q1 offset parameter to zero (normally it is set to -2 V). The signal suppression factor was measured using flow injections with sequential suppressed and unsuppressed ion flux settings. The ion intensities measured at suppressed flux conditions were corrected using the measured factor for all of the values reported in this work. Sample Preparation and Data Analysis. All solvents were LC-MS grade (Chromasolv, Sigma- Aldrich, St. Louis, MO). p-fluoro-phenylalanine (p-F-phe) was purchased from Sigma-Aldrich, St. Louis, MO and sodium fluoride was purchased from the JT Baker Chemical Company, Phillipsburg, NJ. Analyte solutions were prepared by dissolving solids in 2-mM NaOH in water at concentrations of ~100 mM for NaF and ~15 mM for p-F-phe followed by dilution in water to final concentrations of 6-500 μM fluorine in water. ACS grade sodium hydroxide (VWR, Radnor, PA) and sodium acetate (Fisher, Waltham, MA) were used for post-column sodium addition. Sodium salt solutions were prepared by dissolving the solids in water at a concentration of ~2 M, followed by dilution to 10 mM in water. All selected ion chromatograms from flow injections were exported as text files, and then manually integrated using the trapezoid rule by selecting the beginning and end points of a baseline for each peak. Peak heights were calculated as the difference between the top of the peak and the baseline. Ab initio calculations. Gaussian 162 was used to calculate reaction thermochemistries at a theory level of ωB97xD/aug-cc-pVTZ at 600 K (the approximate temperature at the end of the reaction tube). This level of theory has previously been used to describe the thermochemical properties of halide-neutral adducts.3 Structures were optimized using the MMFF94 force field in the Avogadro program4 to generate starting geometries for each species prior to optimization at the final theory level. For molecules where more than one conformer is possible, the lowest energy conformer was used. Ion Chromatography. For measurements of F- in infant formula, an ion chromatography unit (ICS- 2000 pump, 300-uL injection loop, an IonPac AG11-HC 4x50 mm guard column, and IonPac AS-11HC 4x250 mm anion exchange column, Thermo Fisher Scientific, Waltham, MA) with NaOH gradient elution was utilized. Separations occurred at a flow rate of 1.1 mL/min and the eluent was split after the conductivity detector with 250 uL/min mixed with 80 uL/min 10 mM NaOH prior to introduction into PARCI-MS. This arrangement allowed simultaneous conductivity and PARCI-MS detection. Use of NaOH rather than other sodium salts was preferred to increase the pH of the solution after the column and to prevent reactions and loss of F- in transfer to the plasma. PARCI-MS was operated at a total aerosol carrier gas flow rate of 2.2 L/min (1.25 L/min nebulizer, 0.95 L/min auxiliary) while other parameters were kept constant as described above. Fluoride calibration curve was constructed using injections of NaF standard in 18 MΩ water from 6.7 to 122 µM of fluoride using a 5 mM NaOH isocratic elution. For infant formula analysis, 1.5 g of powder sample (Enfamil, Mead Johnson & Company, LLC, Evansville, IN) was dissolved in 12 ml of 18 MΩ water. The sample was subjected to centrifugal filtration using 3000 Da filters (Amicon Ultra-15, Millipore Sigma, Burlington, MA) to separate the proteins and S-2 large fats. Spiked infant formula samples were prepared by adding 15 and 52 µM fluoride to 10 ml of infant formula sample using a NaF standard solution prior to filtration. The filtrate was directly injected into ion chromatography without any further sample treatment. Separation of fluoride in infant formula was achieved via a multi-step NaOH gradient starting at 0.2 mM for 4 min followed by 5 mM for 16 min. The eluent from the IC was connected to PARCI only between elution times of 5 and 10 min for infant formula samples to avoid introduction of unretained and strongly retained matrix into PARCI. The column was cleaned using 80 mM NaOH for 10 min followed by reconditioning at 0.2 mM NaOH for 10 min prior to each injection. Figure S1. Background spectrum of PARCI-MS using aqueous 10 mM sodium acetate for post-flow injection (post-column) sodium addition. S-3 Figure S2. Flow injections of 50 µM NaF (first triplicate) and 50 µM p-F-phe (second triplicate) lead to + formation of Na2F in PARCI-MS. Note that difference in peak heights for the two compounds is a result of differences in flow injection peak shapes. Figure S3. Ten replicate flow injections of 10 µM NaF used for estimation of limit of detection. S-4 Figure S4. Calibration curve for IC-PARCI-MS using NaF standards in water with a linear least-squares fit. References (1) Lesniewski, J. E.; McMahon, W. P.; Jorabchi, K. J Anal Atom Spectrom 2018, 33, 1981-1992. (2) Frisch, M. J.; Trucks, G. W.; Schlegel, H. B.; Scuseria, G. E.; Robb, M. A.; Cheeseman, J. R.; Scalmani, G.; Barone, V.; Petersson, G. A.; Nakatsuji, H.; Li, X.; Caricato, M.; Marenich, A. V.; Bloino, J.; Janesko, B. G.; Gomperts, R.; Mennucci, B.; Hratchian, H. P.; Ortiz, J. V.; Izmaylov, A. F.; Sonnenberg, J. L.; Williams; Ding, F.; Lipparini, F.; Egidi, F.; Goings, J.; Peng, B.; Petrone, A.; Henderson, T.; Ranasinghe, D.; Zakrzewski, V. G.; Gao, J.; Rega, N.; Zheng, G.; Liang, W.; Hada, M.; Ehara, M.; Toyota, K.; Fukuda, R.; Hasegawa, J.; Ishida, M.; Nakajima, T.; Honda, Y.; Kitao, O.; Nakai, H.; Vreven, T.; Throssell, K.; Montgomery Jr., J. A.; Peralta, J. E.; Ogliaro, F.; Bearpark, M. J.; Heyd, J. J.; Brothers, E. N.; Kudin, K. N.; Staroverov, V. N.; Keith, T. A.; Kobayashi, R.; Normand, J.; Raghavachari, K.; Rendell, A. P.; Burant, J. C.; Iyengar, S. S.; Tomasi, J.; Cossi, M.; Millam, J. M.; Klene, M.; Adamo, C.; Cammi, R.; Ochterski, J. W.; Martin, R. L.; Morokuma, K.; Farkas, O.; Foresman, J. B.; Fox, D. J.: Wallingford, CT, 2016.
Recommended publications
  • Humidity Effects on Fragmentation in Plasma-Based Ambient Ionization Sources
    B American Society for Mass Spectrometry, 2015 J. Am. Soc. Mass Spectrom. (2016 ) 27:135Y143 DOI: 10.1007/s13361-015-1259-y RESEARCH ARTICLE Humidity Effects on Fragmentation in Plasma-Based Ambient Ionization Sources G. Asher Newsome,1 Luke K. Ackerman,2 Kevin J. Johnson3 1Nova Research, Inc., 1900 Elkin St. Suite 230, Alexandria, VA 22308, USA 2US-FDA Center for Food Safety and Applied Nutrition, Office of Regulatory Science - Division of Analytical Chemistry, 5100 Paint Branch Parkway, College Park, MD 20740, USA 3US Naval Research Laboratory, Naval Technical Center for Safety and Survivability, Code 6180, 4555 Overlook Ave. SW, Washington, DC 20375, USA Abstract. Post-plasma ambient desorption/ionization (ADI) sources are fundamen- tally dependent on surrounding water vapor to produce protonated analyte ions. There are two reports of humidity effects on ADI spectra. However, it is unclear whether humidity will affect all ADI sources and analytes, and by what mechanism humidity affects spectra. Flowing atmospheric pressure afterglow (FAPA) ionization and direct analysis in real time (DART) mass spectra of various surface-deposited and gas-phase analytes were acquired at ambient temperature and pressure across a range of observed humidity values. A controlled humidity enclosure around the ion source and mass spectrometer inlet was used to create programmed humidity and temperatures. The relative abundance and fragmentation of molecular adduct ions for several compounds consistently varied with changing ambient humidity and also were controlled with the humidity enclosure. For several compounds, increasing humidity decreased protonated molecule and other molecular adduct ion fragmentation in both FAPA and DART spectra. For others, humidity increased fragment ion ratios.
    [Show full text]
  • DOE Center for Predictive Control of Plasma Kinetics: Multi-Phase And
    DOE Center for Predictive Control of Plasma Kinetics: Multi‐Phase and Bounded Systems 10th Annual Meeting May 30‐31, 2019 Edward St. John Learning & Teaching Center, University of Maryland College Park, MD Participating Institutions We gratefully acknowledge the funding from The U.S. Department of Energy Office of Science Fusion Energy Sciences Program Grant # DE‐SC0001939 2 Schedule Thursday, May 30, 2019 7:45 – 8:00 am Registration 8:00 – 8:15 Mark J. Kushner (University of Michigan) Introduction to Annual Meeting 8:15 –10:45 am Session I. Low Pressure and Dusty Plasmas Moderator: Yangyang Fu Page 8:15 – 8:45 Vincent Donnelly (University of Houston) Ubiquitous Ignition Delays in Power-Modulated and Spatially Separated Electronegative Plasmas 9 8:45 – 9:15 Steven Girshick (University of Minnesota) Numerical Modeling of Nanodusty Plasmas 10 9:15 – 9:45 Uwe Kortshagen (University of Minnesota) Particle Dynamics in Pulsed Dusty RF Plasmas 11 9:45 – 10:15 Edward Thomas (Auburn University) Modification of Nanoparticle Formation in a Strongly Magnetized Plasma 12 10:15 – 10:45 Valery Godyak (University of Michigan) Volt-Ampere Characteristics of Capacitively Coupled Plasma 13 10:45 – 11:00 am Coffee break 3 Thursday, May 30, 2019 11:00 am – 1:00 Session II. Fundamental Properties of Plasma pm Diagnostics Moderator: Alexander Khrabrov Page 11:00 – 11:30 Igor Adamovich (Ohio State University) Laser Diagnostics for Measurements of Electric Field and Excited Metastable Species in Nonequilibrium Plasmas 14 11:30 – 12:00 Ed Barnat (Sandia National Labs) Advancing Diagnostics to Interrogate Dynamic and Structured Plasma 15 12:00 – 12:30 Peter Bruggeman (University of Minnesota) Ions and Reactive Species Measurements in Time- modulated RF Driven Atmospheric Pressure Plasma Jets by Molecular Beam Mass Spectrometry 16 12:30 – 1:00 Marien Simeni Simeni (University of Minnesota) Measurements of Electric Field in Ns Pulse Discharges in Helium by Stark Splitting Polarization Spectroscopy 17 1:00 – 2:00 pm Lunch 4 Thursday, May 30, 2019 2:00 – 4:00 pm Session III.
    [Show full text]
  • Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents
    Linköping Studies in Science and Technology Dissertation No. 2147 Hama Nadhom Nadhom Hama Area Selective Chemical Vapor FACULTY OF SCIENCE AND ENGINEERING Linköping Studies in Science and Technology, Dissertation No. 2147, 2021 Deposition of Metallic Films Department of Physics, Chemistry and Biology (IFM) Linköping University using Plasma Electrons as SE-581 83 Linköping, Sweden www.liu.se Reducing Agents Plasma Electrons as Reducing Agents as Electrons Plasma Area Selective Deposition Chemical Vapor Metallic Films of using Hama Nadhom 2021 Linköping Studies in Science and Technology Dissertations, No. 2147 Area Selective Chemical Vapor Deposition of Metallic Films using Plasma Electrons as Reducing Agents Hama Nadhom Department of Physics, Chemistry and Biology (IFM) Linköping University SE-581 83 Linköping, Sweden Linköping 2021 This work is licensed under a Creative Commons Attribution- NonCommercial 4.0 International License. https://creativecommons.org/licenses/by-nc/4.0/ © Hama Nadhom, 2021 ISBN: 978-91-7929-632-2 ISSN 0345-7524 Printed by LiU-Tryck, Linköping, 2021 Abstract Metallic films are used to improve optical, chemical, mechanical, magnetic, and electrical properties and are therefore of high importance in many applications, from electronics and catalysis, environmental protection and health, to wearable and flexible electronic materials. Many of these applications, however, require that the metal films are deposited uniformly on topographically complex surfaces and structures. Some form of chemical vapor deposition (CVD) where the deposition is governed by the surface chemistry is needed for uniform film deposition on topographically complex surfaces. Furthermore, area selective deposition (ASD) has gained large considerations lately, where films deposited only on specified areas of the substrate, and not on others, simplifies the processing significantly and opens the way for less complex fabrication of, for instance, nanoscaled electronics.
    [Show full text]
  • Download Author Version (PDF)
    Journal of Analytical Atomic Spectrometry Mechanistic Insights into Chloride Ion Detection from the Atmospheric-Pressure Afterglow of an Argon Inductively Coupled Plasma Journal: Journal of Analytical Atomic Spectrometry Manuscript ID JA-ART-07-2018-000244.R1 Article Type: Paper Date Submitted by the Author: 28-Aug-2018 Complete List of Authors: Lesniewski, Joseph; Georgetown University, Chemistry McMahon, William; Georgetown University, Chemistry Jorabchi, Kaveh; Georgetown University, Chemistry Page 1 of 36 Journal of Analytical Atomic Spectrometry 1 2 3 4 5 6 Mechanistic Insights into Chloride Ion Detection from 7 8 9 10 the Atmospheric-Pressure Afterglow of an Argon 11 12 13 14 Inductively Coupled Plasma 15 16 * 17 Joseph E. Lesniewski, William P. McMahon, and Kaveh Jorabchi 18 19 20 21 Department of Chemistry, Georgetown University, Washington, DC 20057, USA 22 23 24 25 * Corresponding author: [email protected], phone: 2026872066 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 1 60 Journal of Analytical Atomic Spectrometry Page 2 of 36 1 2 3 Abstract 4 5 Elemental analysis of chlorine using inductively coupled plasma mass spectrometry (ICP-MS) is 6 7 challenging because of poor ion formation efficiency of Cl+ in the argon plasma, and prevalence of 8 9 isobaric interferences. To improve Cl detection, we have recently developed plasma assisted reaction 10 11 12 chemical ionization (PARCI) in which an Ar-ICP is coupled to an atmospheric-pressure afterglow 13 - 14 reaction tube, leading to high-sensitivity detection of Cl .
    [Show full text]
  • Georgetown University in Partial Fulfillment of the Requirements for the Degree of Doctor of Philosophy in Chemistry
    ENHANCED ELEMENTAL MASS SPECTROMETRY OF FLUORINE AND CHLORINE VIA CHEMICAL IONIZATION IN THE AFTERGLOW OF AN INDUCTIVELY COUPLED PLASMA A Dissertation submitted to the Faculty of the Graduate School of Arts and Sciences of Georgetown University in partial fulfillment of the requirements for the degree of Doctor of Philosophy in Chemistry By Joseph E. Lesniewski, M.S. Washington, D.C. February 5, 2021 Copyright 2021 by Joseph E. Lesniewski All Rights Reserved ii ENHANCED ELEMENTAL MASS SPECTROMETRY OF FLUORINE AND CHLORINE VIA CHEMICAL IONIZATION IN THE AFTERGLOW OF AN INDUCTIVELY COUPLED PLASMA Joseph E. Lesniewski, M.S. Thesis Advisor: Kaveh Jorabchi, Ph.D. ABSTRACT There is an increasing need for trace-level analysis of fluorinated and chlorinated compounds in complex samples due to their prevalence among pharmaceuticals and environmental and food contaminants. Importantly, elemental analysis offers major quantitation advantages in this area by alleviating the need for compound-specific standards. However, the current state-of- the-art elemental analysis method, inductively coupled plasma-mass spectrometry (ICP-MS), faces fundamental limitations in sensitivity for F and Cl detection because the high ionization potentials of these elements reduce formation efficiencies of Cl+ and F+. In this dissertation, new ionization chemistries are reported to overcome the fundamental limitations of ICP-MS. In the new methods, solutions of analytes are introduced into an ICP as aerosols, producing common gas-phase Cl and F small molecules from analytes. These species are then ionized via ion-neutral reactions in the atmospheric-pressure plasma afterglow where plasma gasses cool significantly. Detection of chlorine as Cl- is demonstrated in one method with sensitivities twice as large as that of ICP-MS, highlighting the fundamental advantage of this approach.
    [Show full text]
  • A Review of Plasma Synthesis Methods for Polymer Films and Nanoparticles Under Atmospheric Pressure Conditions
    polymers Review A Review of Plasma Synthesis Methods for Polymer Films and Nanoparticles under Atmospheric Pressure Conditions Hyo Jun Jang 1,†, Eun Young Jung 1,†, Travis Parsons 2, Heung-Sik Tae 1,3,* and Choon-Sang Park 4,* 1 School of Electronic and Electrical Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, Korea; [email protected] (H.J.J.); [email protected] (E.Y.J.) 2 GBS (Global Business Services) IT, The Procter & Gamble Company, Cincinnati, OH 45202, USA; [email protected] 3 School of Electronics Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, Korea 4 Department of Electronics and Computer Engineering, College of Engineering, Kansas State University, Manhattan, KS 66506, USA * Correspondence: [email protected] (H.-S.T.); [email protected] (C.-S.P.) † These authors contributed equally to this work. Abstract: In this paper, we present an overview of recent approaches in the gas/aerosol-through- plasma (GATP) and liquid plasma methods for synthesizing polymer films and nanoparticles (NPs) using an atmospheric-pressure plasma (APP) technique. We hope to aid students and researchers starting out in the polymerization field by compiling the most commonly utilized simple plasma synthesis methods, so that they can readily select a method that best suits their needs. Although APP methods are widely employed for polymer synthesis, and there are many related papers for specific applications, reviews that provide comprehensive coverage of the variations of APP methods Citation: Jang, H.J.; Jung, E.Y.; Parsons, T.; Tae, H.-S.; Park, C.-S. A for polymer synthesis are rarely reported.
    [Show full text]
  • Spatio-Temporal Dynamics of a Pulsed Microwave Argon Plasma: Ignition and Afterglow
    Home Search Collections Journals About Contact us My IOPscience Spatio-temporal dynamics of a pulsed microwave argon plasma: ignition and afterglow This content has been downloaded from IOPscience. Please scroll down to see the full text. 2015 Plasma Sources Sci. Technol. 24 015015 (http://iopscience.iop.org/0963-0252/24/1/015015) View the table of contents for this issue, or go to the journal homepage for more Download details: IP Address: 134.129.182.74 This content was downloaded on 15/05/2015 at 17:16 Please note that terms and conditions apply. Plasma Sources Science and Technology Plasma Sources Sci. Technol. 24 (2015) 015015 (17pp) doi:10.1088/0963-0252/24/1/015015 Spatio-temporal dynamics of a pulsed microwave argon plasma: ignition and afterglow Emile Carbone1,2, Nader Sadeghi1,3, Erik Vos2, Simon Hubner ¨ 2, Eddie van Veldhuizen2, Jan van Dijk2, Sander Nijdam2 and Gerrit Kroesen2 1 Universite´ Grenoble Alpes, CNRS, CEA-Leti Minatec, LTM, F-38054 Grenoble Cedex, France 2 Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven, The Netherlands 3 LIPhy, Universite´ Grenoble Alpes & CNRS, UMR 5588, Grenoble F-38041, France E-mail: [email protected] and [email protected] Received 30 July 2014, revised 20 October 2014 Accepted for publication 3 November 2014 Published 9 December 2014 Abstract In this paper, a detailed investigation of the spatio-temporal dynamics of a pulsed microwave plasma is presented. The plasma is ignited inside a dielectric tube in a repetitively pulsed regime at pressures ranging from 1 up to 100 mbar with pulse repetition frequencies from 200 Hz up to 500 kHz.
    [Show full text]
  • Modeling of Argon–Acetylene Dusty Plasma Igor Denysenko, Eric Von Wahl, Safa Labidi, Maxime Mikikian, Holger Kersten, Titaïna Gibert, Eva Kovacevic, N
    Modeling of argon–acetylene dusty plasma Igor Denysenko, Eric von Wahl, Safa Labidi, Maxime Mikikian, Holger Kersten, Titaïna Gibert, Eva Kovacevic, N. Azarenkov To cite this version: Igor Denysenko, Eric von Wahl, Safa Labidi, Maxime Mikikian, Holger Kersten, et al.. Modeling of argon–acetylene dusty plasma. Plasma Physics and Controlled Fusion, IOP Publishing, 2019, 61 (1), pp.014014. 10.1088/1361-6587/aade2d. hal-01978171 HAL Id: hal-01978171 https://hal.archives-ouvertes.fr/hal-01978171 Submitted on 18 Apr 2020 HAL is a multi-disciplinary open access L’archive ouverte pluridisciplinaire HAL, est archive for the deposit and dissemination of sci- destinée au dépôt et à la diffusion de documents entific research documents, whether they are pub- scientifiques de niveau recherche, publiés ou non, lished or not. The documents may come from émanant des établissements d’enseignement et de teaching and research institutions in France or recherche français ou étrangers, des laboratoires abroad, or from public or private research centers. publics ou privés. Modelling of argon-acetylene dusty plasma I.B. Denysenko1, E. von Wahl2,3, S. Labidi3, M. Mikikian3, H. Kersten2, T. Gibert3, E. Kovačević3 and N.A. Azarenkov1 1School of Physics and Technology, V. N. Karazin Kharkiv National University, Kharkiv, Ukraine 2Institut für Experimentelle und Angewandte Physik, Universität Kiel, Kiel, Germany 3GREMI, UMR7344 CNRS/Université d’Orléans, F-45067 Orléans, France E-mail: [email protected] Abstract The properties of an Ar/C2H2 dusty plasma (ion, electron and neutral particle densities, effective electron temperature and dust charge) in glow and afterglow regimes are studied using a volume-averaged model and the results for the glow plasma are compared with mass spectrometry measurements.
    [Show full text]
  • An Ion-Electron Recombination in Hydrogen/Helium Plasma at Low Temperatures
    22nd International Symposium on Plasma Chemistry July 5-10, 2015; Antwerp, Belgium An ion-electron recombination in hydrogen/helium plasma at low temperatures R. Plašil, P. Dohnal, Á. Kálosi, P. Rubovič, M. Hejduk and J. Glosík Charles University in Prague, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holešovičkách 2, CZ-18000 Prague, Czech Republic Abstract: We present a study of ion-electron recombination in low temperature hydrogen/helium plasma. A near infrared cavity ring-down spectrometer has been used to + measure decay of H3 ions in afterglow plasma. The main aim of the study was to understand ternary processes that govern an evolution of hydrogen/helium plasma composition at higher pressures. Keywords: ion-electron recombination, hydrogen plasma, absorption spectroscopy 1. Introduction ternary recombination further below 300 K to understand Hydrogen plasma is present in many technological this extremely fast process. applications and also in many astrophysical environments. It may be found in hydrogen dominated atmospheres of 2. Experiment Jovian planets and in cold interstellar clouds. The Measurements took place in stationary afterglow with + important constituent of typical hydrogen plasma is H3 time-resolved cavity ring-down spectrometer [6]. Pulsed + ion. H3 is the most abundantly produced molecular ion in microwave discharge was periodically ignited in a interstellar space and it stands on the beginnings of many mixture of He, Ar and H2 gas. Helium was used to ensure reaction chains. As proton affinity of H2 molecule is low, thermalization of ions and electrons and to reduce + H3 starts a tree of ion-molecular reactions leading to diffusion of plasma.
    [Show full text]
  • Investigating Recent Developments and Applications of Optical Plasma Spectroscopy: a Review
    Investigating recent developments and applications of optical plasma spectroscopy: A review Cite as: J. Vac. Sci. Technol. A 38, 020806 (2020); https://doi.org/10.1116/1.5141844 Submitted: 08 December 2019 . Accepted: 05 February 2020 . Published Online: 24 February 2020 Angela R. Hanna, and Ellen R. Fisher COLLECTIONS Paper published as part of the special topic on 30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS Note: This paper is part of the Special Topic Collection on 30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS. ARTICLES YOU MAY BE INTERESTED IN Plasma etching of wide bandgap and ultrawide bandgap semiconductors Journal of Vacuum Science & Technology A 38, 020802 (2020); https:// doi.org/10.1116/1.5131343 Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2 Journal of Vacuum Science & Technology A 38, 023001 (2020); https:// doi.org/10.1116/1.5132800 Inside the mysterious world of plasma: A process engineer’s perspective Journal of Vacuum Science & Technology A 38, 031004 (2020); https:// doi.org/10.1116/1.5141863 J. Vac. Sci. Technol. A 38, 020806 (2020); https://doi.org/10.1116/1.5141844 38, 020806 © 2020 Author(s). REVIEW avs.scitation.org/journal/jva Investigating recent developments and applications of optical plasma spectroscopy: A review Cite as: J. Vac. Sci. Technol. A 38, 020806 (2020); doi: 10.1116/1.5141844 Submitted: 8 December 2019 · Accepted: 5 February 2020 · View Online Export Citation CrossMark Published Online: 24 February 2020 Angela R. Hanna and Ellen R.
    [Show full text]
  • Optical and Spectroscopic Study of a Supersonic Flowing Helium Plasma
    www.nature.com/scientificreports OPEN Optical and spectroscopic study of a supersonic fowing helium plasma: energy transport in the afterglow F. Brandi1*, L. Labate1,2*, D. Rapagnani3,4,5, R. Buompane5,7, A. di Leva6,7, L. Gialanella5,7 & L. A. Gizzi1,2 Flowing plasma jets are increasingly investigated and used for surface treatments, including biological matter, and as soft ionization sources for mass spectrometry. They have the characteristic capability to transport energy from the plasma excitation region to the fowing afterglow, and therefore to a distant application surface, in a controlled manner. The ability to transport and deposit energy into a specimen is related to the actual energy transport mechanism. In case of a fowing helium plasma, the energy in the fowing afterglow may be carried by metastable helium atoms and long-lived helium dimer ions. In this work a systematic investigation of the optical and spectroscopic characteristics of a supersonic fowing helium plasma in vacuum and its afterglow as function of the helium gas density is presented. The experimental data are compared with numerical modeling of the plasma excitation and helium dimer ion formation supported by a Computational Fluid Dynamic simulation of the helium jet. The results indicate that the plasma afterglow is efectively due to helium dimer ions recombination via a three-body reaction. Te study of noble gas fowing plasma has gained much attention in recent years due to its impact on the applica- tion of cold plasma jet and torches for sof ionization and mass spectrometry1–10. For a fowing helium plasma the dynamics of the energy transport in the aferglow is very complicated due to the peculiar helium plasma characteristics: presence of highly energetic metastable states and energetic excited states close to the ionization limit, as well as the prominent tendency, at increasing particle density, to form helium dimer ions11,12.
    [Show full text]
  • Plasma Enhanced Chemical Vapour Deposition of Hydrogenated Amorphous Silicon at Atmospheric Pressure
    INSTITUTE OF PHYSICS PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 13 (2004) 8–14 PII: S0963-0252(04)67711-5 Plasma enhanced chemical vapour deposition of hydrogenated amorphous silicon at atmospheric pressure M Moravej1, S E Babayan2,GRNowling1,XYang1 and R F Hicks1 1 Chemical Engineering Department, University of California, Los Angeles, CA 90095, USA 2 Surfx Technologies LLC, 10624 Rochester Ave., Los Angeles, CA 90024, USA E-mail: [email protected] Received 10 January 2003, in final form 13 August 2003 Published 11 November 2003 Online at stacks.iop.org/PSST/13/8 (DOI: 10.1088/0963-0252/13/1/002) Abstract Amorphous hydrogenated silicon films were grown using an atmospheric pressure helium and hydrogen plasma with silane added downstream of the source. A maximum deposition rate of 120 ± 12 Å min−1 was recorded at a substrate temperature of 450˚C, 6.3 Torr H2, 0.3 Torr SiH4, 778 Torr He, 32.8 W cm−3, and an electrode-to-substrate spacing of 6.0 mm. The deposition rate increased rapidly with the silane and hydrogen partial pressures, up to 0.1 and 7.0 Torr, respectively, then remained constant thereafter. By contrast, the deposition rate decreased exponentially as the electrode-to-substrate distance was increased from 5.0 to 10.5 mm. The total hydrogen content of the films ranged from 2.5 to 8.0 ± 1.0 at%. These results together with a model of the plasma chemistry indicate that H atoms and SiH3 radicals play an important role in the deposition process.
    [Show full text]