Rochester Institute of Technology RIT Scholar Works Theses 6-19-2017 Bayesian Analysis for Photolithographic Models Andrew M. Burbine
[email protected] Follow this and additional works at: https://scholarworks.rit.edu/theses Recommended Citation Burbine, Andrew M., "Bayesian Analysis for Photolithographic Models" (2017). Thesis. Rochester Institute of Technology. Accessed from This Thesis is brought to you for free and open access by RIT Scholar Works. It has been accepted for inclusion in Theses by an authorized administrator of RIT Scholar Works. For more information, please contact
[email protected]. Bayesian Analysis for Photolithographic Models By Andrew M. Burbine A Thesis Submitted in Partial Fulfillment of the Requirements for the Degree of Master of Science in Microelectronic Engineering Approved by: Prof. _____________________________ Dr. Bruce W. Smith (Thesis Advisor) Prof. _____________________________ Dr. Robert Pearson (Committee Member & Program Director) Prof. _____________________________ Dr. Dale Ewbank (Committee Member) Prof. _____________________________ Dr. Ernest Fokoue (Committee Member) Dr. John L. Sturtevant (External Collaborator) Rochester Institute of Technology Kate Gleason College of Engineering Department of Electrical and Microelectronic Engineering June 19 th , 2017 1 Abstract The use of optical proximity correction (OPC) as a resolution enhancement technique (RET) in microelectronic photolithographic manufacturing demands increasingly accurate models of the systems in use. Model building and inference techniques in the data science community have seen great strides in the past two decades in the field of Bayesian statistics. This work aims to demonstrate the predictive power of using Bayesian analysis as a method for parameter selection in lithographic models by probabilistically considering the uncertainty in physical model parameters and the wafer data used to calibrate them.