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Atomic layer deposition
Atomic Layer Deposition of High-K Insulators on Epitaxial Graphene: a Review
Integrated Sustainability Analysis of Atomic Layer Deposition for Microelectronics Manufacturing
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High-Temperature Atomic Layer Deposition of Gan on 1D Nanostructures
Atomic Layer Deposition on Phase-Shift Lithography Generated Photoresist Patterns ARTICLE for 1D Nanochannel Fabrication
Atomic Layer Deposition (ALD): from Precursors to Thin Film Structures
Investigation of Gate Dielectric Materials and Dielectric/Silicon Interfaces for Metal Oxide Semiconductor Devices
Atomic Layer Deposition Applications in Nanotechnology Alexandra Burke Taylor University
Atomic Layer Deposition of Advanced Gate Oxides for Scaled MOSFET
Ozone As the Oxidizing Precursor in Atomic Layer Deposition
Development of Nanostructures by Atomic and Molecular Layer Deposition
Atomic Layer Deposition of Lanthanum Oxide Gate Dielectrics for Ingaas Channel
Atomic Layer Deposition of Aluminum (111) Thin Film by Dimethylethylaminealane
Planar Gaas Nanowire Tri-Gate Mosfets by Vaporâ
Ingaas Finfets with Sub-5 Nm Fin-Width Featuring in Situ ALE-ALD
Atomic Layer Deposition of Hafnium Dioxide on Sulfur- Passivated Silicon-Germanium Surfaces
Atomic Layer Deposition for Semiconductors Cheol Seong Hwang Editor
Applications of Vapor Deposition in Microelectronics and Dye-Sensitized Solar Cells
Top View
Atomic Layer Deposition of Metal, Metal Oxide, and Metal Carbide Thin Films
Hafnium Oxide-Based Dielectrics by Atomic Layer Deposition
The Integration of High-K Dielectric on Two-Dimensional Crystals By
Plasma-Enhanced Atomic Layer Deposition of Boron Carbide For
Atomic Layer Deposition Prepared Nanostructured Materials for Various Catalytic Reactions
Silicon Diffusion Control in Atomic-Layer-Deposited Al2o3
Coating Strategies for Atomic Layer Deposition Films [5]
Chemical Vapor Deposited Monolayer Mos2 Top-Gate MOSFET with Atomic-Layer-Deposited Zro2 As Gate Dielectric
Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks
Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
Emerging Technologies and Moore's
Atomic Layer Deposition for Nanoscale Devices
Precursors for Atomic Layer Deposition of High-K Dielectrics
Surface Engineering of Synthetic Nanopores by Atomic Layer Deposition and Their Applications
Mos2 Dual-Gate MOSFET with Atomic-Layer-Deposited Al2o3 As Top-Gate Dielectric Han Liu and Peide D
Atomic Layer Deposition for Continuous Roll-To-Roll Processing S.M
Gaas Metal–Oxide–Semiconductor Field-Effect Transistor with Nanometer
NANOCHIP Technology Journal
Challenges for Non-Ideal Atomic Layer Deposition Processes and Systems
Surface Morphology and Crystallinity Control in the Atomic Layer Deposition (ALD) of Hafnium and Zirconium Oxide Thin Films
ALD (Atomic Layer Deposition) Separates Reactive Precursors in Time (Or Space), and Grows Materials One “Atomic” Layer at a Time
Antimonide-Based III-V Multigate Transistors
Atomic Layer Deposition in Semiconductor Manufacturing
Atomic Layer Deposition for Semiconductors Atomic Layer Deposition for Semiconductors Cheol Seong Hwang • Cha Young Yoo Editors
Electrostatic Supercapacitors by Atomic Layer Deposition on Nanoporous Anodic Alumina Templates for Environmentally Sustainable Energy Storage
Atomic Layer Deposition (ALD) of Metal Gates for CMOS
A Finfet with One Atomic Layer Channel