Tritium Technology At

Tritium Technology At

Chalk River Tritium Activities: Select Topics Presented by Hugh Boniface Tritium Focus Group Meeting, Princeton, NJ, 2015 May UNRESTRICTED/ ILLIMITÉ -1- Topics • Canadian Nuclear Labs – former AECL • New Tritium Facility • Tritium-resistant e-cell materials • Beta-voltaics • Helium-3 recovery UNRESTRICTED/ ILLIMITÉ -2- Chalk River Labs • Main campus of Canadian Nuclear Labs – former AECL • Established 1952 Crown Corporation • 3100 employees (500 advanced degrees) • 600 M$ in revenue and funding • 9000 acres in Ontario, next to the Ottawa River UNRESTRICTED/ ILLIMITÉ -3- Restructuring Canadian-style GOCO model (government owned, company operated). AECL split: AECL(crown) + CNL(corporation) • CNL corporate entity sold to private company with operating contract (term) • AECL represents Government to manage operating contract and retain ownership of physical assets and liabilities UNRESTRICTED/ ILLIMITÉ -4- Restructuring Canadian-style (cont.) • Private operator selected May, transfer October • Bidders: • ICA – Babcock & Wilcox, Cavendish Nuclear & Battelle Memorial Institute • CNEA – Energy Solutions, CH2M Hill, Kinectrics, Lockheed Martin & SNC Lavalin • CNRP – Golder, Bechtel GCSC & Hatch • NNLA – URS corporation, McMaster U & Ontario Power Generation UNRESTRICTED/ ILLIMITÉ -5- CNL Tritium Facility • Set up before 1980 • One-of-a-kind in Canada • Six R&D Labs in an old building • Commercial and R&D Operations • Handles up to 1 MCi T2 (100 g) • Tritiated water to 1000 Ci/kg • 15 technical staff UNRESTRICTED/ ILLIMITÉ -6- New Tritium Laboratories UNRESTRICTED/ ILLIMITÉ -7- New Tritium Laboratories UNRESTRICTED/ ILLIMITÉ -8- New Tritium Laboratories • Two inert atmosphere glove boxes (IAGB) – dispensing, CECE-T • Gas standards preparation fumehood (FH) • Cylinder paint booth and conditioning booth • Air-purged GBs (maintenance) • Gas sampling FH • Tritium assay FH • Tritium counting room • Tritium storage vault • Gas storage areas • 15 general use FHs (three active drains) UNRESTRICTED/ ILLIMITÉ -9- T-resistant PEM-Cell Materials • New proton-exchange membrane materials capable of retaining integrity and performance in high-tritium environment • Demonstrate full-scale cell with new materials • Nafion is most widely-used, breaks down with 100 kGy • Two new membrane materials developed at Chalk River show promise at >100 kGy • Initial exposure tests in 1000 Ci/kg water show improved tolerance for new materials • Tests in full-scale e-cell requires exposure followed by decontamination and this has been difficult – tritium is strongly bound to membrane UNRESTRICTED/ ILLIMITÉ -10- Tritium-Powered Batteries • Use of tritium decay-energy as power source • Convert high-energy electrons into low-voltage current • Two methods: • Indirect: beta → photons → conduction electrons • Direct: beta → conduction electrons UNRESTRICTED/ ILLIMITÉ -11- Tritium-powered batteries Direct Conversion Indirect Conversion UNRESTRICTED/ ILLIMITÉ -12- Indirect Tritium battery-Tritium lights plus photocell Gen1 Gen2 •Cells degraded on repeated exposure to •Max power: 0.4 µW, 0.1 µW/cm2 tritium, dead after ~ 10 hours •About 4 Ci tritium •No loss in several days UNRESTRICTED/ ILLIMITÉ -13- Direct Tritium battery-Immobilized Tritium Layers UNRESTRICTED/ ILLIMITÉ -14- Direct Tritium battery 5-10 nm Pd 600 nm Ti (700 nm TiTx) 50 nm p-GaAs 400 nm i-GaAs micron n-GaAs UNRESTRICTED/ ILLIMITÉ -15- Direct Tritium battery-Immobilized Tritium Layers Surface layer? Titanium T2 Ti→ TiTx substrate Metal vapour deposition UNRESTRICTED/ ILLIMITÉ -16- Sample Design •GaAs substrate •Large contacts for clips UNRESTRICTED/ ILLIMITÉ -17- Samples and Vessel UNRESTRICTED/ ILLIMITÉ -18- Delamination of Titanium Metal J328B J328E Flecks of metal left behind in sample holder from these two samples UNRESTRICTED/ ILLIMITÉ -19- Betavoltaic “Pitfalls” • Large pits (up to 10 µm x 10 µm) form in the GaAs wafers after multiple etching steps, short circuits with Ti layer • Thin stabilizing oxide layer to minimize damage from etching • Materials which are resistant to chemical etching such as GaN or SiC UNRESTRICTED/ ILLIMITÉ -20- Choice of Semiconductor by Bandgap UNRESTRICTED/ ILLIMITÉ -21- Helium-3 recovery •Heat ITCs to ? •Determine He-3 recovery as function of temperature •Determine recovery as function of decay time •Determine if a one-step purification can be effective •Determine best means of collecting and storing He-3 UNRESTRICTED/ ILLIMITÉ -22- Helium-3 recovery from ITCs 8 years decay measured recovery UNRESTRICTED/ ILLIMITÉ -23- Helium-3 recovery from ITCs 12 years decay estimated recovery UNRESTRICTED/ ILLIMITÉ -24- Helium-3 purification • Minimium steps to clean up He-3 for use: • In-house (non-hazardous) • For general sale (free-release) • After heating, see tritiated methane, water, ammonia(?) • Current work to investigate cleanup and storage UNRESTRICTED/ ILLIMITÉ -25- Thank you - Merci UNRESTRICTED/ ILLIMITÉ -26- Main IAGB UNRESTRICTED/ ILLIMITÉ -27- .

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