RFRF DISCHARGEDISCHARGE TYPETYPE EXCIMEREXCIMER LAMPLAMP L12431L12431 Reforming Cleaning Making it "PERFECT" with "LIGHT" ! Making changes with "LIGHT" ! The possibilities of light for "Reforming" and "CLEANING" ! Principle Application examples Features of the Hamamatsu excimer lamps Reforming ISurface reforming of PET plastic Excimer lamp 80° Uniformity irradiates a large area Hamamatsu 1 long flat lamps Surface reforming technology is utilized in a 15° by use of a long flat lamp In air (wavelength 172 nm) wide range of industrial fields. Material re- Uniformity characteristics (along short axis) forming using excimer lamps is considered O2 O3 + O(1D) Long flat lamps vs. cylindrical lamps precision reforming compared to ordinary 3 1 3 1 3 O O( D) O O( D) O H2OH2O techniques because it occurs via a chemical H2O H2O Before irradiation After irradiation reaction on the atomic or molecular level. HHHH 100 Plastic I Moreover, this is a clean reforming that does CCCC CCCC Bonding pre-processing (improve adhesiveness) 90 material not harm the substrate or generate dust parti- Example: PPS (polyphenylene sulfide) + PO (polyolefin) 80 HHHH HHHH Good uniformity since entire surface is cles and so is an effective technology in 3 in close proximity Vacuum ultraviolet light at a wave- Bonds in material surface are bro- 70 fields requiring more advanced levels of mate- length of 172 nm generates ozone ken simultaneously with ozone and rial reforming. Improved 60 and active oxygen in large quanti- active oxygen generation, and the 2 Cylindrical lamps from ties. resulting moisture evaporates. about other companies Surface reforming using excimer lamps can 3 times 50 be used to increase adhesiveness and improve 40 1 functionality of materials such as by giving Bonding strength 30 UV power meter: Hamamatsu H9535-172 hydrophilicity to them, making it useful in a Lamp to UV power meter distance: 5 mm 2 20 Pinhole is interposed between lamp and UV power meter wide range of fields and materials. 0 TLS B0013EA 3 1 3 1 3 Before Excimer After Excimer Pinhole diameter: 1 mm This technique also performs oxidation clean- O O( D) O O( D) O lamp processing lamp processing RELATIVE LIGHT IRRADIANCE (%) 10 Measurement atmosphere: Air ing using active oxygen to clean away residual 0 -20 -15 -10 -5 0 5 10 15 20 organic contamination on the material surface Reaction Others DISTANCE FROM IRRADIATED CENTER (mm) simultaneous with the surface reforming. • Adhesion improvement during printing Poor uniformity since only portions directly below lamp is in close proximity OH O OH COOH • Adhesion improvement during coating Long flat lamp Irradiation intensity distribution Gives the desired properties to material • Reforming of printed circuit boards CCCC surface since chemical reaction forms functional groups on dangling bonds to • Wettability improvement of resin, 15 10 HHHH help obtain functionalities. metal and rubber materials 5 0 -5 -10 -15 IRRADIATED CENTER (mm) DISTANCE FROM -200 -150-100-50050 100 150 200 DISTANCE FROM IRRADIATED CENTER (mm) Principle Application examples 80 % or more UV power meter: Hamamatsu H9535-172 Pinhole diameter: 1 mm 60 % – 80 % Lamp to UV power meter distance: 5 mm Measurement atmosphere: Air IOptical cleaning of gold-coated mirror for laser Below 60 % Pinhole is interposed between lamp and UV power meter TLS B0012EA Cleaning Excimer lamp Gives a stable output with minimal flicker by 1 In air (wavelength 172 nm) using RF (radio frequency) discharge The excimer lamp emits vacuum ultraviolet light at a wavelength of 172 nm which is 1 RF discharge vs. dielectric barrier discharge O2 O3 + O( D) greatly absorbed by oxygen high so that high O3 O(1D) O3 O(1D) O3 GRF discharge GDielectric barrier discharge concentration active oxygen can be generated. Organic Before irradiation After irradiation Vacuum ultraviolet light is capable of break- contaminants Dielectric material (glass, etc.) External electrode Dielectric material (glass, etc.) External electrode I ing the organic molecular bonds and so pro- Substrate Removal of acetone cleaning residues vides benefits in various processes by acceler- Vacuum ultraviolet light at a wave- Chemical bonds in organic matter ating the cleaning speed, improving the length of 172 nm generates ozone are broken simultaneously with Glow discharge Microplasma discharge quality of cleaning, and boosting the product and active oxygen in large quanti- ozone and active oxygen genera- yield. ties. tion. Optical cleaning is an efficient cleaning meth- od for eliminating contaminants that wet type cleaning cannot remove, materials where wet Before irradiation After irradiation cleaning is not usable, or materials easily 2 damaged by heat. O3 O(1D) O3 O(1D) O3 Others Uniform discharge without irregular light emissions Thread-like discharge with irregular light emissions • Silicon wafer cleaning • Glass substrate cleaning Power supply auto-tuning function for efficient light emission Reaction H2O H2O • Reticle cleaning Ozone and active oxygen react with CO2 CO2 • Organic contamination removal the broken organic contaminants, • Resist residue removal Single wavelength at 172 nm allows highly efficient processing and evaporate as carbon dioxide and moisture, etc. • Adhesive residue removal • Oil stain removal Instantaneous lamp ON/OFF operation As a leading company specializing in light, we can offer technology that boosts efficiency and quality in various processes to high levels. Our excimer lamps help improve adhesiveness, make materials hydrophilic, improve functional properties, accelerate cleaning speed, improve cleaning quality, and boost product yield. Specifications GRF Discharge Type Excimer Lamp L12431 Excimer Lamp L11751 Parameter Description / Value Rating 250 W Emission wavelength 172 nm Irradiation intensity * 50 mW/cm2 or more Weight 220 g * Measured with a Hamamatsu UV power meter H9535-172. Lamp House for Excimer Lamp E11752 Parameter Description / Value Irradiation area (W × H) 488 mm × 38 mm Dimensions (W × H × D) * 700 mm × 180 mm × 105 mm Cooling method Forced-air cooling by duct Duct suction air flow rate 0.35 ± 0.08 m3/min Weight 8.2 kg * Not including protrusions. Power Supply for Excimer Lamp C11753 L12431 consists of an excimer lamp, a lamp house, and Parameter Description / Value a power supply. Input voltage Single phase AC200 V Input current Below 4 A Oscillation frequency Approx. 2 MHz RF output power 0 to 250 W Power consumption 1000 VA or less Dimensions (W × H × D) * 430 mm × 99 mm × 500 mm Weight 13.4 kg * Not including protrusions. Related products GCompact Excimer Lamp Light Source L12530 GUV Power Meters C9536 / H9535 Series The EX-mini is a space-sav- ing compact excimer lamp light source ideal for R&D work. Hamamatsu shrunk its pop- ular RF discharge excimer lamp into a compact shape that still These UV power meters directly detect ultraviolet light at the has the same great performance. The EX-mini delivers simple designated wavelengths without using optical filters to yet highly accurate testing and evaluations using vacuum UV monitor and control the absolute optical power (mW/cm2). light whenever and wherever needed. Hamamatsu carries out testing with customers or using customer samples free of Guide to testing charge. Hamamatsu also provides loaner/demo units for use by customers, so if and loaner/demo units these are needed, contact us by phone or via our homepage. (Feel free to consult us for details on scheduling.) This product complies with safety standard IEC61010-1, EMC standard IEC61326. * Patent pending: 1 HAMAMATSU PHOTONICS K.K. www.hamamatsu.com HAMAMATSU PHOTONICS K.K., Electron Tube Division 314-5, Shimokanzo, Iwata City, Shizuoka Pref., 438-0193, Japan, Telephone: (81)539/62-5248, Fax: (81)539/62-2205 U.S.A.: Hamamatsu Corporation: 360 Foothill Road, P. O. Box 6910, Bridgewater. N.J. 08807-0910, U.S.A., Telephone: (1)908-231-0960, Fax: (1)908-231-1218 E-mail: [email protected] Germany: Hamamatsu Photonics Deutschland GmbH: Arzbergerstr. 10, D-82211 Herrsching am Ammersee, Germany, Telephone: (49)8152-375-0, Fax: (49)8152-2658 E-mail: [email protected] France: Hamamatsu Photonics France S.A.R.L.: 19, Rue du Saule Trapu, Parc du Moulin de Massy, 91882 Massy Cedex, France, Telephone: (33)1 69 53 71 00, Fax: (33)1 69 53 71 10 E-mail: [email protected] United Kingdom: Hamamatsu Photonics UK Limited: 2 Howard Court, 10 Tewin Road Welwyn Garden City Hertfordshire AL7 1BW, United Kingdom, Telephone: 44-(0)1707-294888, Fax: 44(0)1707-325777 E-mail: [email protected] North Europe: Hamamatsu Photonics Norden AB: Thorshamnsgatan 35 SE-164 40 Kista, Sweden, Telephone: (46)8-509-031-00, Fax: (46)8-509-031-01 E-mail: [email protected] Italy: Hamamatsu Photonics Italia: S.R.L.: Strada della Moia, 1/E, 20020 Arese, (Milano), Italy, Telephone: (39)02-935 81 733, Fax: (39)02-935 81 741 E-mail: [email protected] TLS 1007E03 China: Hamamatsu Photonics (China) Co., Ltd.: 1201 Tower B, Jiaming Center, 27 Dongsanhuan Road North, Chaoyang District, Beijing 100020, China, Telephone: (86)10-6586-6006, Fax: (86)10-6586-2866 E-mail: [email protected] JUL. 2013 IP.